NL292007A - - Google Patents
Info
- Publication number
- NL292007A NL292007A NL292007DA NL292007A NL 292007 A NL292007 A NL 292007A NL 292007D A NL292007D A NL 292007DA NL 292007 A NL292007 A NL 292007A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US19078962A | 1962-04-27 | 1962-04-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL292007A true NL292007A (en) |
Family
ID=22702786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL292007D NL292007A (en) | 1962-04-27 |
Country Status (7)
| Country | Link |
|---|---|
| CH (1) | CH439959A (en) |
| DE (1) | DE1447022B2 (en) |
| DK (1) | DK106257C (en) |
| ES (1) | ES286983A1 (en) |
| GB (1) | GB1041463A (en) |
| NL (1) | NL292007A (en) |
| SE (1) | SE306233B (en) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2331377C2 (en) * | 1973-06-20 | 1982-10-14 | Hoechst Ag, 6000 Frankfurt | Photosensitive copying material |
| US4486529A (en) * | 1976-06-10 | 1984-12-04 | American Hoechst Corporation | Dialo printing plate made from laser |
| GB1604652A (en) * | 1977-04-12 | 1981-12-16 | Vickers Ltd | Radiation sensitive materials |
| US4394433A (en) | 1979-12-07 | 1983-07-19 | Minnesota Mining And Manufacturing Company | Diazonium imaging system |
| EP0041984B1 (en) * | 1979-12-07 | 1984-09-19 | Minnesota Mining And Manufacturing Company | Diazonium imaging system |
| ZA821588B (en) * | 1981-03-24 | 1983-02-23 | Sensitisers Ltd | Photosensitive relief image-forming materials |
| DE3222684A1 (en) * | 1981-06-19 | 1983-05-05 | Sericol Group Ltd., London | LIGHT SENSITIVE PREPARATION AND USE |
| DE3144499A1 (en) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF |
| DE3144480A1 (en) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF |
| GB2139369B (en) * | 1983-05-06 | 1987-01-21 | Sericol Group Ltd | Photosensitive systems showing visible indication of exposure |
| JPS61107352A (en) * | 1984-10-31 | 1986-05-26 | Konishiroku Photo Ind Co Ltd | Positive plating material for lithographic printing |
| US4828960A (en) * | 1985-01-07 | 1989-05-09 | Honeywell Inc. | Reflection limiting photoresist composition with two azo dyes |
| US5334481A (en) * | 1985-05-02 | 1994-08-02 | Ciba-Geigy Corporation | Positive diazo quinone photoresist compositions containing antihalation compound |
| US4777111A (en) * | 1985-06-03 | 1988-10-11 | Fairmount Chemical Company, Inc. | Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element |
| US4672021A (en) * | 1985-06-03 | 1987-06-09 | Fairmount Chemical Company | Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder |
| JPH0642071B2 (en) * | 1985-11-09 | 1994-06-01 | コニカ株式会社 | Photosensitive composition and photosensitive lithographic printing plate |
| JP2944296B2 (en) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | Manufacturing method of photosensitive lithographic printing plate |
| CN101813888B (en) * | 2010-04-14 | 2012-02-01 | 东莞长联新材料科技有限公司 | Method for regulating and controlling heat stability and photochemical activity of diazonium photoresists |
-
0
- NL NL292007D patent/NL292007A/xx unknown
-
1963
- 1963-04-11 ES ES286983A patent/ES286983A1/en not_active Expired
- 1963-04-17 SE SE420363A patent/SE306233B/xx unknown
- 1963-04-19 CH CH490063A patent/CH439959A/en unknown
- 1963-04-19 DK DK184063A patent/DK106257C/en active
- 1963-04-24 DE DE19631447022 patent/DE1447022B2/en active Pending
- 1963-04-29 GB GB1677063A patent/GB1041463A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| SE306233B (en) | 1968-11-18 |
| DE1447022B2 (en) | 1971-11-25 |
| CH439959A (en) | 1967-07-15 |
| DE1447022A1 (en) | 1968-11-28 |
| DK106257C (en) | 1967-01-09 |
| GB1041463A (en) | 1966-09-07 |
| ES286983A1 (en) | 1963-12-01 |