GB1041463A - Light-sensitive diazo material - Google Patents
Light-sensitive diazo materialInfo
- Publication number
- GB1041463A GB1041463A GB1677063A GB1677063A GB1041463A GB 1041463 A GB1041463 A GB 1041463A GB 1677063 A GB1677063 A GB 1677063A GB 1677063 A GB1677063 A GB 1677063A GB 1041463 A GB1041463 A GB 1041463A
- Authority
- GB
- United Kingdom
- Prior art keywords
- diazo
- yellow
- light
- compound
- april
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 title abstract 5
- 239000000463 material Substances 0.000 title abstract 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 abstract 3
- 150000008049 diazo compounds Chemical class 0.000 abstract 3
- RGCKGOZRHPZPFP-UHFFFAOYSA-N alizarin Chemical compound C1=CC=C2C(=O)C3=C(O)C(O)=CC=C3C(=O)C2=C1 RGCKGOZRHPZPFP-UHFFFAOYSA-N 0.000 abstract 2
- NYGZLYXAPMMJTE-UHFFFAOYSA-M metanil yellow Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC(N=NC=2C=CC(NC=3C=CC=CC=3)=CC=2)=C1 NYGZLYXAPMMJTE-UHFFFAOYSA-M 0.000 abstract 2
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- JCYPECIVGRXBMO-UHFFFAOYSA-N 4-(dimethylamino)azobenzene Chemical compound C1=CC(N(C)C)=CC=C1N=NC1=CC=CC=C1 JCYPECIVGRXBMO-UHFFFAOYSA-N 0.000 abstract 1
- BELBBZDIHDAJOR-UHFFFAOYSA-N Phenolsulfonephthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2S(=O)(=O)O1 BELBBZDIHDAJOR-UHFFFAOYSA-N 0.000 abstract 1
- PLXBWHJQWKZRKG-UHFFFAOYSA-N Resazurin Chemical compound C1=CC(=O)C=C2OC3=CC(O)=CC=C3[N+]([O-])=C21 PLXBWHJQWKZRKG-UHFFFAOYSA-N 0.000 abstract 1
- CBMCZKMIOZYAHS-NSCUHMNNSA-N [(e)-prop-1-enyl]boronic acid Chemical compound C\C=C\B(O)O CBMCZKMIOZYAHS-NSCUHMNNSA-N 0.000 abstract 1
- 239000002696 acid base indicator Substances 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- UDSAIICHUKSCKT-UHFFFAOYSA-N bromophenol blue Chemical compound C1=C(Br)C(O)=C(Br)C=C1C1(C=2C=C(Br)C(O)=C(Br)C=2)C2=CC=CC=C2S(=O)(=O)O1 UDSAIICHUKSCKT-UHFFFAOYSA-N 0.000 abstract 1
- 238000004140 cleaning Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000007859 condensation product Substances 0.000 abstract 1
- OBRMNDMBJQTZHV-UHFFFAOYSA-N cresol red Chemical compound C1=C(O)C(C)=CC(C2(C3=CC=CC=C3S(=O)(=O)O2)C=2C=C(C)C(O)=CC=2)=C1 OBRMNDMBJQTZHV-UHFFFAOYSA-N 0.000 abstract 1
- 239000012954 diazonium Substances 0.000 abstract 1
- 150000001989 diazonium salts Chemical class 0.000 abstract 1
- 229940051142 metanil yellow Drugs 0.000 abstract 1
- STZCRXQWRGQSJD-GEEYTBSJSA-M methyl orange Chemical compound [Na+].C1=CC(N(C)C)=CC=C1\N=N\C1=CC=C(S([O-])(=O)=O)C=C1 STZCRXQWRGQSJD-GEEYTBSJSA-M 0.000 abstract 1
- 229940012189 methyl orange Drugs 0.000 abstract 1
- 238000005065 mining Methods 0.000 abstract 1
- VXLFYNFOITWQPM-UHFFFAOYSA-N n-phenyl-4-phenyldiazenylaniline Chemical compound C=1C=C(N=NC=2C=CC=CC=2)C=CC=1NC1=CC=CC=C1 VXLFYNFOITWQPM-UHFFFAOYSA-N 0.000 abstract 1
- 229960003531 phenolsulfonphthalein Drugs 0.000 abstract 1
- IYDGMDWEHDFVQI-UHFFFAOYSA-N phosphoric acid;trioxotungsten Chemical compound O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.OP(O)(O)=O IYDGMDWEHDFVQI-UHFFFAOYSA-N 0.000 abstract 1
- 239000001488 sodium phosphate Substances 0.000 abstract 1
- MLVYOYVMOZFHIU-UHFFFAOYSA-M sodium;4-[(4-anilinophenyl)diazenyl]benzenesulfonate Chemical compound [Na+].C1=CC(S(=O)(=O)[O-])=CC=C1N=NC(C=C1)=CC=C1NC1=CC=CC=C1 MLVYOYVMOZFHIU-UHFFFAOYSA-M 0.000 abstract 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 abstract 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 abstract 1
- 235000019801 trisodium phosphate Nutrition 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US19078962A | 1962-04-27 | 1962-04-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1041463A true GB1041463A (en) | 1966-09-07 |
Family
ID=22702786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1677063A Expired GB1041463A (en) | 1962-04-27 | 1963-04-29 | Light-sensitive diazo material |
Country Status (7)
| Country | Link |
|---|---|
| CH (1) | CH439959A (enrdf_load_stackoverflow) |
| DE (1) | DE1447022B2 (enrdf_load_stackoverflow) |
| DK (1) | DK106257C (enrdf_load_stackoverflow) |
| ES (1) | ES286983A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1041463A (enrdf_load_stackoverflow) |
| NL (1) | NL292007A (enrdf_load_stackoverflow) |
| SE (1) | SE306233B (enrdf_load_stackoverflow) |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3969118A (en) * | 1973-06-20 | 1976-07-13 | Hoechst Aktiengesellschaft | Light-sensitive o-quinone diazide containing copying layer |
| WO1981001756A1 (en) * | 1979-12-07 | 1981-06-25 | Minnesota Mining & Mfg | Diazonium imaging system |
| US4296194A (en) * | 1977-04-12 | 1981-10-20 | Vickers Limited | Positive-working light sensitive diazo materials with azo dye |
| EP0061319A1 (en) * | 1981-03-24 | 1982-09-29 | Sensitisers (Research) Limited | Photosensitive relief image-forming materials and method of forming relief images using same |
| US4394433A (en) | 1979-12-07 | 1983-07-19 | Minnesota Mining And Manufacturing Company | Diazonium imaging system |
| US4458000A (en) * | 1981-11-09 | 1984-07-03 | Hoechst Aktiengesellschaft | Light-sensitive mixture and light-sensitive copying material prepared therefrom wherein image produced therein is visible under yellow safety light |
| US4457999A (en) * | 1981-11-09 | 1984-07-03 | Hoechst Aktiengesellschaft | Light-sensitive 1,2 quinone diazide containing mixture and light-sensitive copying material prepared therefrom wherein imaged produced therein is visible under yellow safety light |
| US4486529A (en) * | 1976-06-10 | 1984-12-04 | American Hoechst Corporation | Dialo printing plate made from laser |
| US4564581A (en) * | 1981-06-19 | 1986-01-14 | Sericol Group Limited | Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator |
| JPS61107352A (ja) * | 1984-10-31 | 1986-05-26 | Konishiroku Photo Ind Co Ltd | ポジ型平版印刷版材料 |
| WO1986007473A1 (en) * | 1985-06-03 | 1986-12-18 | Fairmount Chemical Co., Inc. | Contrast enhancement layer |
| US4659649A (en) * | 1983-05-06 | 1987-04-21 | Sericol Group Limited | Photosensitive systems showing visible indication of exposure |
| US4777111A (en) * | 1985-06-03 | 1988-10-11 | Fairmount Chemical Company, Inc. | Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element |
| US4828960A (en) * | 1985-01-07 | 1989-05-09 | Honeywell Inc. | Reflection limiting photoresist composition with two azo dyes |
| US4912013A (en) * | 1985-11-09 | 1990-03-27 | Konishiroku Photo Industry Co., Ltd. | Photosensitive diazo composition and photosensitive diazo lithographic printing plate with metal complex dyes and color changing agent |
| EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
| US5334481A (en) * | 1985-05-02 | 1994-08-02 | Ciba-Geigy Corporation | Positive diazo quinone photoresist compositions containing antihalation compound |
| CN101813888A (zh) * | 2010-04-14 | 2010-08-25 | 东莞市三联科技实业有限公司 | 一种重氮感光胶热稳定性和光化学活性的调控方法 |
-
0
- NL NL292007D patent/NL292007A/xx unknown
-
1963
- 1963-04-11 ES ES286983A patent/ES286983A1/es not_active Expired
- 1963-04-17 SE SE420363A patent/SE306233B/xx unknown
- 1963-04-19 DK DK184063A patent/DK106257C/da active
- 1963-04-19 CH CH490063A patent/CH439959A/de unknown
- 1963-04-24 DE DE19631447022 patent/DE1447022B2/de active Pending
- 1963-04-29 GB GB1677063A patent/GB1041463A/en not_active Expired
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3969118A (en) * | 1973-06-20 | 1976-07-13 | Hoechst Aktiengesellschaft | Light-sensitive o-quinone diazide containing copying layer |
| US4486529A (en) * | 1976-06-10 | 1984-12-04 | American Hoechst Corporation | Dialo printing plate made from laser |
| US4296194A (en) * | 1977-04-12 | 1981-10-20 | Vickers Limited | Positive-working light sensitive diazo materials with azo dye |
| WO1981001756A1 (en) * | 1979-12-07 | 1981-06-25 | Minnesota Mining & Mfg | Diazonium imaging system |
| US4394433A (en) | 1979-12-07 | 1983-07-19 | Minnesota Mining And Manufacturing Company | Diazonium imaging system |
| EP0061319A1 (en) * | 1981-03-24 | 1982-09-29 | Sensitisers (Research) Limited | Photosensitive relief image-forming materials and method of forming relief images using same |
| US4578341A (en) * | 1981-03-24 | 1986-03-25 | Sensitisers (Research) Ltd. | Acidic photosensitive relief image-forming materials with indicator pigment or dye |
| US4564581A (en) * | 1981-06-19 | 1986-01-14 | Sericol Group Limited | Process of preparing screen stencil using diazo photosensitive compositions with acidic p-H indicator |
| US4458000A (en) * | 1981-11-09 | 1984-07-03 | Hoechst Aktiengesellschaft | Light-sensitive mixture and light-sensitive copying material prepared therefrom wherein image produced therein is visible under yellow safety light |
| US4457999A (en) * | 1981-11-09 | 1984-07-03 | Hoechst Aktiengesellschaft | Light-sensitive 1,2 quinone diazide containing mixture and light-sensitive copying material prepared therefrom wherein imaged produced therein is visible under yellow safety light |
| US4659649A (en) * | 1983-05-06 | 1987-04-21 | Sericol Group Limited | Photosensitive systems showing visible indication of exposure |
| JPS61107352A (ja) * | 1984-10-31 | 1986-05-26 | Konishiroku Photo Ind Co Ltd | ポジ型平版印刷版材料 |
| US4828960A (en) * | 1985-01-07 | 1989-05-09 | Honeywell Inc. | Reflection limiting photoresist composition with two azo dyes |
| US5334481A (en) * | 1985-05-02 | 1994-08-02 | Ciba-Geigy Corporation | Positive diazo quinone photoresist compositions containing antihalation compound |
| US5399463A (en) * | 1985-05-02 | 1995-03-21 | Ciba-Geigy Corporation | Process of photopatterning a substrate with a positive photoresist composition containing a diazoquinone photosensitizer |
| WO1986007473A1 (en) * | 1985-06-03 | 1986-12-18 | Fairmount Chemical Co., Inc. | Contrast enhancement layer |
| US4672021A (en) * | 1985-06-03 | 1987-06-09 | Fairmount Chemical Company | Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder |
| US4777111A (en) * | 1985-06-03 | 1988-10-11 | Fairmount Chemical Company, Inc. | Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element |
| US4912013A (en) * | 1985-11-09 | 1990-03-27 | Konishiroku Photo Industry Co., Ltd. | Photosensitive diazo composition and photosensitive diazo lithographic printing plate with metal complex dyes and color changing agent |
| EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
| CN101813888A (zh) * | 2010-04-14 | 2010-08-25 | 东莞市三联科技实业有限公司 | 一种重氮感光胶热稳定性和光化学活性的调控方法 |
| CN101813888B (zh) * | 2010-04-14 | 2012-02-01 | 东莞长联新材料科技有限公司 | 一种重氮感光胶热稳定性和光化学活性的调控方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| SE306233B (enrdf_load_stackoverflow) | 1968-11-18 |
| CH439959A (de) | 1967-07-15 |
| NL292007A (enrdf_load_stackoverflow) | |
| DE1447022A1 (de) | 1968-11-28 |
| DK106257C (da) | 1967-01-09 |
| DE1447022B2 (de) | 1971-11-25 |
| ES286983A1 (es) | 1963-12-01 |
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