GB1492620A - Ortho-quinonediazide light-sensitive copying material - Google Patents

Ortho-quinonediazide light-sensitive copying material

Info

Publication number
GB1492620A
GB1492620A GB442075A GB442075A GB1492620A GB 1492620 A GB1492620 A GB 1492620A GB 442075 A GB442075 A GB 442075A GB 442075 A GB442075 A GB 442075A GB 1492620 A GB1492620 A GB 1492620A
Authority
GB
United Kingdom
Prior art keywords
light
imagewise exposure
copying material
copying
diazide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB442075A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of GB1492620A publication Critical patent/GB1492620A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1492620 Photographic quinone-diazide copying material FUJI PHOTO FILM CO Ltd 31 Jan 1975 [1 Feb 1974] 4420/75 Heading G2C A light-sensitive copying material comprises a copying layer containing (i) a light-sensitive o-quinone diazide, e.g. an o-napthoquinonediazide sulphonic acid ester of a hydroxy-diphenyl or hydroxybenzoquinone or of a condensation product of acetone and pyrogallol, and (ii) a secondary or tertiary amine of boiling point not less than 200‹C e.g. tri-n-butylamine, N-methylethanolamine, N, N-diethylaniline, tri-isopentylamine or hexamethylene-tetramine, the amine being present in an amount of from 0.005 to 1 part by weight per part of said o-quinone diazide. On imagewise exposure and development with aqueous alkali, exposed areas of the copying layer are removed to form a positive image; while on imagewise exposure, heating to 30 -200‹C, overall exposure and development with aqueous alkali, areas unexposed in the imagewise exposure are removed to give a negative image.
GB442075A 1974-02-01 1975-01-31 Ortho-quinonediazide light-sensitive copying material Expired GB1492620A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1346574A JPS5614970B2 (en) 1974-02-01 1974-02-01

Publications (1)

Publication Number Publication Date
GB1492620A true GB1492620A (en) 1977-11-23

Family

ID=11833882

Family Applications (1)

Application Number Title Priority Date Filing Date
GB442075A Expired GB1492620A (en) 1974-02-01 1975-01-31 Ortho-quinonediazide light-sensitive copying material

Country Status (2)

Country Link
JP (1) JPS5614970B2 (en)
GB (1) GB1492620A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5498244A (en) * 1978-01-20 1979-08-03 Toray Industries Method of forming positive photo resist image
US4431725A (en) * 1978-12-28 1984-02-14 Hiromichi Tachikawa Light-sensitive material and image forming processes using the same
GB2143961A (en) * 1983-05-23 1985-02-20 Fusion Semiconductor Systems Hardening photoresist
GB2171530A (en) * 1985-02-27 1986-08-28 Imtec Products Inc Method for image enhancement in positive photoresist by vapor diffusion image reversal
EP0209153A2 (en) * 1985-07-18 1987-01-21 MicroSi, Inc. (a Delaware corporation) High contrast photoresist developer with enhanced sensitivity
EP0212263A2 (en) * 1985-08-05 1987-03-04 Hoechst Celanese Corporation Composition for the development of lithographic printing plates
EP0316667A2 (en) * 1987-11-13 1989-05-24 Ciba-Geigy Ag Storage stable positive photoresist composition
GB2210172A (en) * 1987-09-18 1989-06-01 Fuji Photo Film Co Ltd Light-sensitive material and method for forming images
US5066568A (en) * 1985-08-05 1991-11-19 Hoehst Celanese Corporation Method of developing negative working photographic elements
EP0503402A1 (en) * 1991-03-08 1992-09-16 Hoechst Aktiengesellschaft Coloured positive working light sensitive recording material and process for the production of a colour proofing image using this material
US5380622A (en) * 1990-04-27 1995-01-10 Basf Aktiengesellschaft Production of negative relief copies

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1120763A (en) * 1977-11-23 1982-03-30 James A. Carothers Enhancement of resist development
JPS5532088A (en) * 1978-08-30 1980-03-06 Fuji Photo Film Co Ltd Photo mask forming method
JPS5636648A (en) * 1979-09-03 1981-04-09 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
JP2555589B2 (en) * 1987-03-26 1996-11-20 日本合成ゴム株式会社 Positive type radiation sensitive resin composition for integrated circuit production
US5286609A (en) * 1988-11-01 1994-02-15 Yamatoya & Co., Ltd. Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635860B2 (en) * 1978-01-20 1981-08-20
JPS5498244A (en) * 1978-01-20 1979-08-03 Toray Industries Method of forming positive photo resist image
US4431725A (en) * 1978-12-28 1984-02-14 Hiromichi Tachikawa Light-sensitive material and image forming processes using the same
GB2143961A (en) * 1983-05-23 1985-02-20 Fusion Semiconductor Systems Hardening photoresist
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
GB2171530A (en) * 1985-02-27 1986-08-28 Imtec Products Inc Method for image enhancement in positive photoresist by vapor diffusion image reversal
FR2578065A1 (en) * 1985-02-27 1986-08-29 Imtec Products Inc METHOD FOR IMAGE ENHANCEMENT IN POSITIVE PHOTOGRAPHIC RESERVE MATERIAL BY IMAGE INVERSION
GB2171530B (en) * 1985-02-27 1989-06-28 Imtec Products Inc Method of producing reversed photoresist images by vapour diffusion
EP0209153A3 (en) * 1985-07-18 1987-09-30 Petrarch Systems, Inc. High contrast photoresist developer with enhanced sensitivity
EP0209153A2 (en) * 1985-07-18 1987-01-21 MicroSi, Inc. (a Delaware corporation) High contrast photoresist developer with enhanced sensitivity
EP0212263A2 (en) * 1985-08-05 1987-03-04 Hoechst Celanese Corporation Composition for the development of lithographic printing plates
EP0212263A3 (en) * 1985-08-05 1987-09-02 American Hoechst Corporation Composition for the development of lithographic printing plates
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
US5066568A (en) * 1985-08-05 1991-11-19 Hoehst Celanese Corporation Method of developing negative working photographic elements
GB2210172A (en) * 1987-09-18 1989-06-01 Fuji Photo Film Co Ltd Light-sensitive material and method for forming images
EP0316667A2 (en) * 1987-11-13 1989-05-24 Ciba-Geigy Ag Storage stable positive photoresist composition
EP0316667A3 (en) * 1987-11-13 1990-06-20 Ciba-Geigy Ag Storage stable positive photoresist composition
US5380622A (en) * 1990-04-27 1995-01-10 Basf Aktiengesellschaft Production of negative relief copies
EP0503402A1 (en) * 1991-03-08 1992-09-16 Hoechst Aktiengesellschaft Coloured positive working light sensitive recording material and process for the production of a colour proofing image using this material

Also Published As

Publication number Publication date
JPS5614970B2 (en) 1981-04-07
JPS50108002A (en) 1975-08-26

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19950130