GB2171530B - Method of producing reversed photoresist images by vapour diffusion - Google Patents

Method of producing reversed photoresist images by vapour diffusion

Info

Publication number
GB2171530B
GB2171530B GB8518585A GB8518585A GB2171530B GB 2171530 B GB2171530 B GB 2171530B GB 8518585 A GB8518585 A GB 8518585A GB 8518585 A GB8518585 A GB 8518585A GB 2171530 B GB2171530 B GB 2171530B
Authority
GB
Grant status
Grant
Patent type
Prior art keywords
method
vapour diffusion
photoresist images
producing reversed
reversed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8518585A
Other versions
GB2171530A (en )
GB8518585D0 (en )
Inventor
Craig M Stauffer
Eric Alling
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IMTEC PRODUCTS Inc
Original Assignee
IMTEC PRODUCTS Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Grant date

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2022Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/265Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation
GB8518585A 1985-02-27 1985-07-23 Method of producing reversed photoresist images by vapour diffusion Expired GB2171530B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US70646485 true 1985-02-27 1985-02-27

Publications (3)

Publication Number Publication Date
GB8518585D0 GB8518585D0 (en) 1985-08-29
GB2171530A true GB2171530A (en) 1986-08-28
GB2171530B true GB2171530B (en) 1989-06-28

Family

ID=24837690

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8518585A Expired GB2171530B (en) 1985-02-27 1985-07-23 Method of producing reversed photoresist images by vapour diffusion

Country Status (4)

Country Link
JP (1) JPS61200537A (en)
DE (1) DE3541451A1 (en)
FR (1) FR2578065A1 (en)
GB (1) GB2171530B (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1309291C (en) * 1986-03-13 1992-10-27 Peter Garth Processing of exposed lithographic printing plates
JPS63165845A (en) * 1986-12-26 1988-07-09 Toshiba Corp Pattern forming method
JP2603935B2 (en) * 1987-03-04 1997-04-23 株式会社東芝 A resist pattern forming method
JP2598059B2 (en) * 1987-03-27 1997-04-09 ホーセル グラフィック インダストリーズ リミッティッド The method of manufacturing exposure type lithographic
DE3771501D1 (en) * 1987-03-27 1991-08-22 Horsell Graphic Ind Ltd Treatment methods for exposed flat plates.
DE68927989D1 (en) * 1988-08-09 1997-05-28 Toshiba Kawasaki Kk Imaging process
US5407786A (en) * 1988-08-09 1995-04-18 Kabushiki Kaisha Toshiba Method of forming a mask on a semiconductor substrate via photosensitive resin deposition, ammonia treatment and selective silylation
JPH0299960A (en) * 1988-10-06 1990-04-11 Matsushita Electric Ind Co Ltd Pattern forming method
GB2224362B (en) * 1988-11-01 1993-05-19 Yamatoya Shokai A process and apparatus for forming a negative resist pattern with a resist containing a diazoquinone sensitiser
US4985374A (en) * 1989-06-30 1991-01-15 Kabushiki Kaisha Toshiba Making a semiconductor device with ammonia treatment of photoresist
EP0412326A3 (en) * 1989-08-10 1991-08-28 Sgs-Thomson Microelectronics S.R.L. A high-resolution lithographic method of making monolithic integrated circuits
DE3940911A1 (en) * 1989-12-12 1991-06-13 Hoechst Ag A process for producing negative copies
DE4004719A1 (en) * 1990-02-15 1991-08-22 Hoechst Ag A radiation-sensitive mixture, hereby produced radiation-sensitive recording material and process for the preparation of relief recordings
EP0487794A1 (en) * 1990-11-27 1992-06-03 Sony Corporation Process for preparing resist patterns
GB2305517B (en) * 1995-08-23 1999-07-28 Kodak Ltd Improvements in imaging systems
KR100569542B1 (en) * 2000-06-13 2006-04-10 주식회사 하이닉스반도체 Patterning method using gas phase amine treatment
US8582079B2 (en) 2007-08-14 2013-11-12 Applied Materials, Inc. Using phase difference of interference lithography for resolution enhancement
US20090117491A1 (en) * 2007-08-31 2009-05-07 Applied Materials, Inc. Resolution enhancement techniques combining interference-assisted lithography with other photolithography techniques
JP5107329B2 (en) * 2009-10-14 2012-12-26 東京エレクトロン株式会社 Developing method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1003857A (en) * 1961-07-28 1965-09-08 Kalle Ag Production of reversed images from light sensitive material containing diazo compounds
GB1489167A (en) * 1975-06-30 1977-10-19 Ibm Method of making a negative photoresist image
GB1492620A (en) * 1974-02-01 1977-11-23 Fuji Photo Film Co Ltd Ortho-quinonediazide light-sensitive copying material
GB1501194A (en) * 1974-06-06 1978-02-15 Ibm Photoresist process

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1224147B (en) * 1963-08-23 1966-09-01 Kalle Ag A process for reversal development of diazo compounds containing emulsions
JPS5636648A (en) * 1979-09-03 1981-04-09 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
US4307178A (en) * 1980-04-30 1981-12-22 International Business Machines Corporation Plasma develoment of resists
JPH0128373B2 (en) * 1980-07-17 1989-06-02 Matsushita Electric Ind Co Ltd
DE3151078A1 (en) * 1981-12-23 1983-07-28 Hoechst Ag A process for the production of relief images
JPH0432377B2 (en) * 1982-07-21 1992-05-29
DE3482934D1 (en) * 1983-11-08 1990-09-13 Hoechst Ag A light-sensitive mixture and process for the production of negative relief copies.

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1003857A (en) * 1961-07-28 1965-09-08 Kalle Ag Production of reversed images from light sensitive material containing diazo compounds
GB1492620A (en) * 1974-02-01 1977-11-23 Fuji Photo Film Co Ltd Ortho-quinonediazide light-sensitive copying material
GB1501194A (en) * 1974-06-06 1978-02-15 Ibm Photoresist process
GB1489167A (en) * 1975-06-30 1977-10-19 Ibm Method of making a negative photoresist image

Also Published As

Publication number Publication date Type
GB2171530A (en) 1986-08-28 application
JPS61200537A (en) 1986-09-05 application
GB8518585D0 (en) 1985-08-29 grant
FR2578065A1 (en) 1986-08-29 application
DE3541451A1 (en) 1986-08-28 application

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19920723