JPS5635860B2 - - Google Patents
Info
- Publication number
- JPS5635860B2 JPS5635860B2 JP431978A JP431978A JPS5635860B2 JP S5635860 B2 JPS5635860 B2 JP S5635860B2 JP 431978 A JP431978 A JP 431978A JP 431978 A JP431978 A JP 431978A JP S5635860 B2 JPS5635860 B2 JP S5635860B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP431978A JPS5498244A (en) | 1978-01-20 | 1978-01-20 | Method of forming positive photo resist image |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP431978A JPS5498244A (en) | 1978-01-20 | 1978-01-20 | Method of forming positive photo resist image |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5498244A JPS5498244A (en) | 1979-08-03 |
JPS5635860B2 true JPS5635860B2 (en) | 1981-08-20 |
Family
ID=11581142
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP431978A Granted JPS5498244A (en) | 1978-01-20 | 1978-01-20 | Method of forming positive photo resist image |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5498244A (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0164248B1 (en) * | 1984-06-01 | 1991-10-09 | Rohm And Haas Company | Photosensitive coating compositions, thermally stable coatings prepared from them, and the use of such coatings in forming thermally stable polymer images |
JPH0650398B2 (en) * | 1985-03-16 | 1994-06-29 | 互応化学工業株式会社 | Wiring board manufacturing method |
JPH0782233B2 (en) * | 1986-01-23 | 1995-09-06 | 東レ株式会社 | Plate-making method of image forming laminate |
EP0265387B1 (en) * | 1986-10-23 | 1995-11-15 | Ciba-Geigy Ag | Method of forming images |
JP2692241B2 (en) * | 1988-02-26 | 1997-12-17 | 三菱電機株式会社 | Method of forming resist pattern |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49127615A (en) * | 1973-04-07 | 1974-12-06 | ||
GB1492620A (en) * | 1974-02-01 | 1977-11-23 | Fuji Photo Film Co Ltd | Ortho-quinonediazide light-sensitive copying material |
JPS52150619A (en) * | 1976-06-10 | 1977-12-14 | Toray Industries | Photosensitive resin composition |
-
1978
- 1978-01-20 JP JP431978A patent/JPS5498244A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49127615A (en) * | 1973-04-07 | 1974-12-06 | ||
GB1492620A (en) * | 1974-02-01 | 1977-11-23 | Fuji Photo Film Co Ltd | Ortho-quinonediazide light-sensitive copying material |
JPS52150619A (en) * | 1976-06-10 | 1977-12-14 | Toray Industries | Photosensitive resin composition |
Also Published As
Publication number | Publication date |
---|---|
JPS5498244A (en) | 1979-08-03 |