JPS49127615A - - Google Patents
Info
- Publication number
- JPS49127615A JPS49127615A JP3988073A JP3988073A JPS49127615A JP S49127615 A JPS49127615 A JP S49127615A JP 3988073 A JP3988073 A JP 3988073A JP 3988073 A JP3988073 A JP 3988073A JP S49127615 A JPS49127615 A JP S49127615A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3988073A JPS49127615A (en) | 1973-04-07 | 1973-04-07 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3988073A JPS49127615A (en) | 1973-04-07 | 1973-04-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS49127615A true JPS49127615A (en) | 1974-12-06 |
Family
ID=12565285
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3988073A Pending JPS49127615A (en) | 1973-04-07 | 1973-04-07 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS49127615A (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2547905A1 (en) * | 1975-10-25 | 1977-04-28 | Hoechst Ag | LIGHT-SENSITIVE COPY MATERIAL |
JPS5498244A (en) * | 1978-01-20 | 1979-08-03 | Toray Industries | Method of forming positive photo resist image |
JPS5532088A (en) * | 1978-08-30 | 1980-03-06 | Fuji Photo Film Co Ltd | Photo mask forming method |
JPS5692536A (en) * | 1979-12-27 | 1981-07-27 | Fujitsu Ltd | Pattern formation method |
JPS56140345A (en) * | 1980-04-02 | 1981-11-02 | Hitachi Ltd | Formation of pattern |
JPS58114031A (en) * | 1981-12-23 | 1983-07-07 | ヘキスト・アクチエンゲゼルシヤフト | Manufacture of relief image |
JPS59181536A (en) * | 1983-03-31 | 1984-10-16 | Oki Electric Ind Co Ltd | Resist pattern formation |
JPS59202462A (en) * | 1983-05-02 | 1984-11-16 | Oki Electric Ind Co Ltd | Formation of negative type resist pattern |
JPS6039641A (en) * | 1983-07-11 | 1985-03-01 | ヘキスト・アクチエンゲゼルシヤフト | Manufacture of negative relief copy |
JPS6045243A (en) * | 1983-08-23 | 1985-03-11 | Oki Electric Ind Co Ltd | Formation of resist pattern |
JPS6180246A (en) * | 1984-09-28 | 1986-04-23 | Nec Corp | Positive resist material |
JPS61241745A (en) * | 1985-04-18 | 1986-10-28 | Oki Electric Ind Co Ltd | Negative type photoresist composition and formation of resist pattern |
JPH01147453A (en) * | 1987-10-21 | 1989-06-09 | Samsung Semiconductor & Teleommun Co Ltd | Negative pattern formation utilizing positive photosensitive resin |
US5286609A (en) * | 1988-11-01 | 1994-02-15 | Yamatoya & Co., Ltd. | Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray |
-
1973
- 1973-04-07 JP JP3988073A patent/JPS49127615A/ja active Pending
Cited By (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2547905A1 (en) * | 1975-10-25 | 1977-04-28 | Hoechst Ag | LIGHT-SENSITIVE COPY MATERIAL |
JPS5498244A (en) * | 1978-01-20 | 1979-08-03 | Toray Industries | Method of forming positive photo resist image |
JPS5635860B2 (en) * | 1978-01-20 | 1981-08-20 | ||
JPS5532088A (en) * | 1978-08-30 | 1980-03-06 | Fuji Photo Film Co Ltd | Photo mask forming method |
JPS5692536A (en) * | 1979-12-27 | 1981-07-27 | Fujitsu Ltd | Pattern formation method |
JPS6029936B2 (en) * | 1979-12-27 | 1985-07-13 | 富士通株式会社 | Pattern formation method |
JPS56140345A (en) * | 1980-04-02 | 1981-11-02 | Hitachi Ltd | Formation of pattern |
JPH0128374B2 (en) * | 1980-04-02 | 1989-06-02 | Hitachi Ltd | |
JPH0347493B2 (en) * | 1981-12-23 | 1991-07-19 | Hoechst Ag | |
JPS58114031A (en) * | 1981-12-23 | 1983-07-07 | ヘキスト・アクチエンゲゼルシヤフト | Manufacture of relief image |
JPS59181536A (en) * | 1983-03-31 | 1984-10-16 | Oki Electric Ind Co Ltd | Resist pattern formation |
JPH0334054B2 (en) * | 1983-03-31 | 1991-05-21 | Oki Electric Ind Co Ltd | |
JPS59202462A (en) * | 1983-05-02 | 1984-11-16 | Oki Electric Ind Co Ltd | Formation of negative type resist pattern |
JPH0334055B2 (en) * | 1983-05-02 | 1991-05-21 | Oki Electric Ind Co Ltd | |
JPH0455501B2 (en) * | 1983-07-11 | 1992-09-03 | Hoechst Ag | |
JPS6039641A (en) * | 1983-07-11 | 1985-03-01 | ヘキスト・アクチエンゲゼルシヤフト | Manufacture of negative relief copy |
JPS6045243A (en) * | 1983-08-23 | 1985-03-11 | Oki Electric Ind Co Ltd | Formation of resist pattern |
JPS6180246A (en) * | 1984-09-28 | 1986-04-23 | Nec Corp | Positive resist material |
JPS61241745A (en) * | 1985-04-18 | 1986-10-28 | Oki Electric Ind Co Ltd | Negative type photoresist composition and formation of resist pattern |
JPH01147453A (en) * | 1987-10-21 | 1989-06-09 | Samsung Semiconductor & Teleommun Co Ltd | Negative pattern formation utilizing positive photosensitive resin |
US5286609A (en) * | 1988-11-01 | 1994-02-15 | Yamatoya & Co., Ltd. | Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray |