JPS49127615A - - Google Patents

Info

Publication number
JPS49127615A
JPS49127615A JP3988073A JP3988073A JPS49127615A JP S49127615 A JPS49127615 A JP S49127615A JP 3988073 A JP3988073 A JP 3988073A JP 3988073 A JP3988073 A JP 3988073A JP S49127615 A JPS49127615 A JP S49127615A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3988073A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3988073A priority Critical patent/JPS49127615A/ja
Publication of JPS49127615A publication Critical patent/JPS49127615A/ja
Pending legal-status Critical Current

Links

JP3988073A 1973-04-07 1973-04-07 Pending JPS49127615A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3988073A JPS49127615A (en) 1973-04-07 1973-04-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3988073A JPS49127615A (en) 1973-04-07 1973-04-07

Publications (1)

Publication Number Publication Date
JPS49127615A true JPS49127615A (en) 1974-12-06

Family

ID=12565285

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3988073A Pending JPS49127615A (en) 1973-04-07 1973-04-07

Country Status (1)

Country Link
JP (1) JPS49127615A (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2547905A1 (en) * 1975-10-25 1977-04-28 Hoechst Ag LIGHT-SENSITIVE COPY MATERIAL
JPS5498244A (en) * 1978-01-20 1979-08-03 Toray Industries Method of forming positive photo resist image
JPS5532088A (en) * 1978-08-30 1980-03-06 Fuji Photo Film Co Ltd Photo mask forming method
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method
JPS56140345A (en) * 1980-04-02 1981-11-02 Hitachi Ltd Formation of pattern
JPS58114031A (en) * 1981-12-23 1983-07-07 ヘキスト・アクチエンゲゼルシヤフト Manufacture of relief image
JPS59181536A (en) * 1983-03-31 1984-10-16 Oki Electric Ind Co Ltd Resist pattern formation
JPS59202462A (en) * 1983-05-02 1984-11-16 Oki Electric Ind Co Ltd Formation of negative type resist pattern
JPS6039641A (en) * 1983-07-11 1985-03-01 ヘキスト・アクチエンゲゼルシヤフト Manufacture of negative relief copy
JPS6045243A (en) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd Formation of resist pattern
JPS6180246A (en) * 1984-09-28 1986-04-23 Nec Corp Positive resist material
JPS61241745A (en) * 1985-04-18 1986-10-28 Oki Electric Ind Co Ltd Negative type photoresist composition and formation of resist pattern
JPH01147453A (en) * 1987-10-21 1989-06-09 Samsung Semiconductor & Teleommun Co Ltd Negative pattern formation utilizing positive photosensitive resin
US5286609A (en) * 1988-11-01 1994-02-15 Yamatoya & Co., Ltd. Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2547905A1 (en) * 1975-10-25 1977-04-28 Hoechst Ag LIGHT-SENSITIVE COPY MATERIAL
JPS5498244A (en) * 1978-01-20 1979-08-03 Toray Industries Method of forming positive photo resist image
JPS5635860B2 (en) * 1978-01-20 1981-08-20
JPS5532088A (en) * 1978-08-30 1980-03-06 Fuji Photo Film Co Ltd Photo mask forming method
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method
JPS6029936B2 (en) * 1979-12-27 1985-07-13 富士通株式会社 Pattern formation method
JPS56140345A (en) * 1980-04-02 1981-11-02 Hitachi Ltd Formation of pattern
JPH0128374B2 (en) * 1980-04-02 1989-06-02 Hitachi Ltd
JPH0347493B2 (en) * 1981-12-23 1991-07-19 Hoechst Ag
JPS58114031A (en) * 1981-12-23 1983-07-07 ヘキスト・アクチエンゲゼルシヤフト Manufacture of relief image
JPS59181536A (en) * 1983-03-31 1984-10-16 Oki Electric Ind Co Ltd Resist pattern formation
JPH0334054B2 (en) * 1983-03-31 1991-05-21 Oki Electric Ind Co Ltd
JPS59202462A (en) * 1983-05-02 1984-11-16 Oki Electric Ind Co Ltd Formation of negative type resist pattern
JPH0334055B2 (en) * 1983-05-02 1991-05-21 Oki Electric Ind Co Ltd
JPH0455501B2 (en) * 1983-07-11 1992-09-03 Hoechst Ag
JPS6039641A (en) * 1983-07-11 1985-03-01 ヘキスト・アクチエンゲゼルシヤフト Manufacture of negative relief copy
JPS6045243A (en) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd Formation of resist pattern
JPS6180246A (en) * 1984-09-28 1986-04-23 Nec Corp Positive resist material
JPS61241745A (en) * 1985-04-18 1986-10-28 Oki Electric Ind Co Ltd Negative type photoresist composition and formation of resist pattern
JPH01147453A (en) * 1987-10-21 1989-06-09 Samsung Semiconductor & Teleommun Co Ltd Negative pattern formation utilizing positive photosensitive resin
US5286609A (en) * 1988-11-01 1994-02-15 Yamatoya & Co., Ltd. Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray

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