GB1154749A - Process for the Preparation of a Printing Plate - Google Patents

Process for the Preparation of a Printing Plate

Info

Publication number
GB1154749A
GB1154749A GB5247566A GB5247566A GB1154749A GB 1154749 A GB1154749 A GB 1154749A GB 5247566 A GB5247566 A GB 5247566A GB 5247566 A GB5247566 A GB 5247566A GB 1154749 A GB1154749 A GB 1154749A
Authority
GB
United Kingdom
Prior art keywords
cleaning
light
nov
heating
printing plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5247566A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of GB1154749A publication Critical patent/GB1154749A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

1,154,749. Photo-sensitive material and their use in producing printing plates. KALLE A.G. Nov.23, 1966 [Nov. 24, 1965], No.52475/66. Headings G2C and G2M. Printing plates are produced by imagewise exposing a positive-working light-sensitive material comprising a metal support coated with a naphthoquinone diazide sulphoric or carboxylic acid amide or ester, developing and cleaning (if necessary) to produce an oleophilic image on a hydrophilic metal background, heating in the presence of a novolak or a resole resin (such resin either being incorporated in the light-sensitive layer or is applied as a solution or an emulsion prior to heating) to at least 180‹C. and then cleaning the background areas to leave a printing plate. The metal support may be aluminium, stainless steel, or a bi- or tri-metallic support, which may be scrubbed with pumice powder before application of the light-sensitive layer. The lacquer may contain a dye or may be a two-phase composition. The cleaning solutions used may be trisodium phosphate, phosphoric acid or hydrofluoric acid. In the examples, diazides used in Specifications 706,028; 739,654; 932,452; 937,123; 937,121 and 941, 914 are used.
GB5247566A 1965-11-24 1966-11-23 Process for the Preparation of a Printing Plate Expired GB1154749A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1965K0057722 DE1447963B2 (en) 1965-11-24 1965-11-24 PROCESS FOR MANUFACTURING AN OFFSET PRINTING FORM FROM A PRESENSITIZED PRINTING PLATE MATERIAL

Publications (1)

Publication Number Publication Date
GB1154749A true GB1154749A (en) 1969-06-11

Family

ID=7228378

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5247566A Expired GB1154749A (en) 1965-11-24 1966-11-23 Process for the Preparation of a Printing Plate

Country Status (8)

Country Link
AT (1) AT297757B (en)
BE (1) BE680536A (en)
CH (1) CH463279A (en)
DE (1) DE1447963B2 (en)
ES (1) ES326362A1 (en)
GB (1) GB1154749A (en)
NL (1) NL149298C (en)
SE (1) SE340951B (en)

Cited By (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2530422A1 (en) * 1974-07-08 1976-01-29 Vickers Ltd METHOD FOR TREATMENT OF DISCS OR THE LIKE
FR2316636A1 (en) * 1975-06-30 1977-01-28 Hoechst Ag PROCESS FOR THE MANUFACTURE OF FLAT PRINTING FORMS
US4191570A (en) * 1978-10-10 1980-03-04 Polychrome Corporation Process for heat treating lithographic printing plates
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
US4487827A (en) * 1981-03-19 1984-12-11 Hoechst Aktiengesellschaft Process for the burning-in of light-sensitive layers during the preparation of printing forms
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
EP0070510B1 (en) * 1981-07-22 1985-10-23 BASF Aktiengesellschaft Process for the production of photopolymer intaglio printing forms
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
US4732840A (en) * 1985-03-22 1988-03-22 Fuji Photo Film Co., Ltd. Planographic printing plate method using light sensitive material including phenolic resol with dibenzylic ether groups
US4749639A (en) * 1985-02-12 1988-06-07 Hoechst Aktiengesellschaft Photosensitive composition and recording material with photosensitive polymeric diazonium salt and thermal cross-linkable copolymer binder
US4929534A (en) * 1987-08-31 1990-05-29 Hoechst Aktiengesellschaft Positive-working photosensitive mixture and photolithographic copying material produced therefrom with o-quinone dialide sulfonyl ester and azo coupler
US4983501A (en) * 1988-08-17 1991-01-08 Hoechst Aktiengesellschaft Positive-working radiation-sensitive composition and radiation-sensitive recording material prepared therewith
US5008175A (en) * 1982-12-09 1991-04-16 Hoechst Celanese Corporation Copying materials
US5015554A (en) * 1987-08-04 1991-05-14 Hoechst Aktiengesellschaft Positive radiation-sensitive mixture
US5068163A (en) * 1988-06-18 1991-11-26 Hoechst Aktiengesellschaft Radiation-sensitive positive working composition and copying material
US5084372A (en) * 1982-12-09 1992-01-28 Hoechst Celanese Corporation Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound
US5168813A (en) * 1988-09-30 1992-12-08 Horsell Plc Baking treatment of lithographic printing plate
US5227281A (en) * 1989-12-12 1993-07-13 Hoechst Aktiengesellschaft Process for producing negative copies
US5275908A (en) * 1990-01-27 1994-01-04 Hoechst Aktiengesellschaft Radiation-sensitive mixture and recording material comprising as a binder a copolymer having hydroxybenzyl(meth)acrylate groups or derivatives thereof
US5368975A (en) * 1990-02-15 1994-11-29 Hoechst Aktiengesellschaft Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility
EP0717317A2 (en) 1994-12-15 1996-06-19 Hoechst Aktiengesellschaft Radiation-sensitive composition
US5776652A (en) * 1994-04-28 1998-07-07 Agfa-Gevaert Ag Aromatic hexafluoropropanesulfonate diazonium salts and their use in radiation-sensitive mixtures
US6165685A (en) * 1997-09-08 2000-12-26 Agfa-Gevaert N.V. Thermally recordable material insensitive to white light
US6492093B2 (en) 1998-08-01 2002-12-10 Agfa-Gevaert Ag Radiation-sensitive mixtures comprising IR-absorbing cyanine dyes having a betaine structure or having a betaine structure and containing an anion, and recording materials prepared therewith
US6824947B2 (en) 2002-02-19 2004-11-30 Kodak Polychrome Graphics, Llc Photosensitive composition comprising a phenol resin having a urea bond in the main chain
US7195861B2 (en) 2004-07-08 2007-03-27 Agfa-Gevaert Method for making a negative working, heat-sensitive lithographic printing plate precursor
US7195859B2 (en) 2002-10-04 2007-03-27 Agfa-Gevaert Method of making a lithographic printing plate precursor
US7348126B2 (en) 2004-04-27 2008-03-25 Agfa Graphics N.V. Negative working, heat-sensitive lithographic printing plate precursor
US7354696B2 (en) 2004-07-08 2008-04-08 Agfa Graphics Nv Method for making a lithographic printing plate
US7425405B2 (en) 2004-07-08 2008-09-16 Agfa Graphics, N.V. Method for making a lithographic printing plate
EP2159049A1 (en) 2008-09-02 2010-03-03 Agfa Graphics N.V. A heat-sensitive positive-working lithographic printing plate precursor
EP2213690A1 (en) 2009-01-30 2010-08-04 Agfa Graphics N.V. A new alkali soluble resin
EP2263874A1 (en) 2009-06-18 2010-12-22 Agfa Graphics N.V. A lithographic printing plate precursor
WO2011067382A1 (en) 2009-12-04 2011-06-09 Agfa Graphics Nv A lithographic printing plate precursor
EP2366545A1 (en) 2010-03-19 2011-09-21 Agfa Graphics N.V. A lithographic printing plate precursor
WO2012101046A1 (en) 2011-01-25 2012-08-02 Agfa Graphics Nv A lithographic printing plate precursor
EP2489512A1 (en) 2011-02-18 2012-08-22 Agfa Graphics N.V. A lithographic printing plate precursor
WO2014106554A1 (en) 2013-01-01 2014-07-10 Agfa Graphics Nv (ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2933278A1 (en) 2014-04-17 2015-10-21 Agfa Graphics Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2944657A1 (en) 2014-05-15 2015-11-18 Agfa Graphics Nv (Ethylene, Vinyl Acetal) Copolymers and Their Use In Lithographic Printing Plate Precursors
EP2955198A1 (en) 2014-06-13 2015-12-16 Agfa Graphics Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2963496A1 (en) 2014-06-30 2016-01-06 Agfa Graphics Nv A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
EP3130465A1 (en) 2015-08-12 2017-02-15 Agfa Graphics Nv Heat-sensitive lithographic printing plate precursor
EP3170662A1 (en) 2015-11-20 2017-05-24 Agfa Graphics Nv A lithographic printing plate precursor

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2855393A1 (en) * 1978-12-21 1980-07-03 Hoechst Ag METHOD FOR PRODUCING FLAT PRINTING FORMS
DE4004511A1 (en) * 1990-02-14 1991-08-22 Hoechst Ag DEVICE FOR BURNING IN LIGHT SENSITIVE LAYERS DURING THE PRODUCTION OF PRINTING FORMS
DE19834745A1 (en) 1998-08-01 2000-02-03 Agfa Gevaert Ag Radiation-sensitive mixture with IR-absorbing, anionic cyanine dyes and recording material produced therewith

Cited By (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2530422A1 (en) * 1974-07-08 1976-01-29 Vickers Ltd METHOD FOR TREATMENT OF DISCS OR THE LIKE
FR2316636A1 (en) * 1975-06-30 1977-01-28 Hoechst Ag PROCESS FOR THE MANUFACTURE OF FLAT PRINTING FORMS
US4191570A (en) * 1978-10-10 1980-03-04 Polychrome Corporation Process for heat treating lithographic printing plates
US4487827A (en) * 1981-03-19 1984-12-11 Hoechst Aktiengesellschaft Process for the burning-in of light-sensitive layers during the preparation of printing forms
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
EP0070510B1 (en) * 1981-07-22 1985-10-23 BASF Aktiengesellschaft Process for the production of photopolymer intaglio printing forms
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
US5008175A (en) * 1982-12-09 1991-04-16 Hoechst Celanese Corporation Copying materials
US5084372A (en) * 1982-12-09 1992-01-28 Hoechst Celanese Corporation Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound
US4749639A (en) * 1985-02-12 1988-06-07 Hoechst Aktiengesellschaft Photosensitive composition and recording material with photosensitive polymeric diazonium salt and thermal cross-linkable copolymer binder
US4842983A (en) * 1985-03-22 1989-06-27 Fuji Photo Film Co., Ltd. Light-sensitive compositions and light-sensitive materials with phenolic resol having dibenzylic ether linkages
US4732840A (en) * 1985-03-22 1988-03-22 Fuji Photo Film Co., Ltd. Planographic printing plate method using light sensitive material including phenolic resol with dibenzylic ether groups
US5015554A (en) * 1987-08-04 1991-05-14 Hoechst Aktiengesellschaft Positive radiation-sensitive mixture
US4929534A (en) * 1987-08-31 1990-05-29 Hoechst Aktiengesellschaft Positive-working photosensitive mixture and photolithographic copying material produced therefrom with o-quinone dialide sulfonyl ester and azo coupler
US5068163A (en) * 1988-06-18 1991-11-26 Hoechst Aktiengesellschaft Radiation-sensitive positive working composition and copying material
US4983501A (en) * 1988-08-17 1991-01-08 Hoechst Aktiengesellschaft Positive-working radiation-sensitive composition and radiation-sensitive recording material prepared therewith
US5168813A (en) * 1988-09-30 1992-12-08 Horsell Plc Baking treatment of lithographic printing plate
US5227281A (en) * 1989-12-12 1993-07-13 Hoechst Aktiengesellschaft Process for producing negative copies
US5275908A (en) * 1990-01-27 1994-01-04 Hoechst Aktiengesellschaft Radiation-sensitive mixture and recording material comprising as a binder a copolymer having hydroxybenzyl(meth)acrylate groups or derivatives thereof
US5368975A (en) * 1990-02-15 1994-11-29 Hoechst Aktiengesellschaft Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility
US5776652A (en) * 1994-04-28 1998-07-07 Agfa-Gevaert Ag Aromatic hexafluoropropanesulfonate diazonium salts and their use in radiation-sensitive mixtures
EP0717317A2 (en) 1994-12-15 1996-06-19 Hoechst Aktiengesellschaft Radiation-sensitive composition
US6165685A (en) * 1997-09-08 2000-12-26 Agfa-Gevaert N.V. Thermally recordable material insensitive to white light
US6492093B2 (en) 1998-08-01 2002-12-10 Agfa-Gevaert Ag Radiation-sensitive mixtures comprising IR-absorbing cyanine dyes having a betaine structure or having a betaine structure and containing an anion, and recording materials prepared therewith
US6824947B2 (en) 2002-02-19 2004-11-30 Kodak Polychrome Graphics, Llc Photosensitive composition comprising a phenol resin having a urea bond in the main chain
US7195859B2 (en) 2002-10-04 2007-03-27 Agfa-Gevaert Method of making a lithographic printing plate precursor
US7348126B2 (en) 2004-04-27 2008-03-25 Agfa Graphics N.V. Negative working, heat-sensitive lithographic printing plate precursor
US7195861B2 (en) 2004-07-08 2007-03-27 Agfa-Gevaert Method for making a negative working, heat-sensitive lithographic printing plate precursor
US7354696B2 (en) 2004-07-08 2008-04-08 Agfa Graphics Nv Method for making a lithographic printing plate
US7425405B2 (en) 2004-07-08 2008-09-16 Agfa Graphics, N.V. Method for making a lithographic printing plate
EP2159049A1 (en) 2008-09-02 2010-03-03 Agfa Graphics N.V. A heat-sensitive positive-working lithographic printing plate precursor
EP2213690A1 (en) 2009-01-30 2010-08-04 Agfa Graphics N.V. A new alkali soluble resin
WO2010086211A1 (en) 2009-01-30 2010-08-05 Agfa Graphics Nv A new alkali soluble resin
US8978554B2 (en) 2009-01-30 2015-03-17 Agfa Graphics N.V. Alkali soluble resin
EP2263874A1 (en) 2009-06-18 2010-12-22 Agfa Graphics N.V. A lithographic printing plate precursor
US8771918B2 (en) 2009-06-18 2014-07-08 Agfa Graphics N.V. Lithographic printing plate precursor
US9738064B2 (en) 2009-12-04 2017-08-22 Agfa Graphics N.V. Lithographic printing plate precursor
WO2011067382A1 (en) 2009-12-04 2011-06-09 Agfa Graphics Nv A lithographic printing plate precursor
EP2366545A1 (en) 2010-03-19 2011-09-21 Agfa Graphics N.V. A lithographic printing plate precursor
WO2011113693A1 (en) 2010-03-19 2011-09-22 Agfa Graphics Nv A lithographic printing plate precursor
WO2012101046A1 (en) 2011-01-25 2012-08-02 Agfa Graphics Nv A lithographic printing plate precursor
WO2012110359A1 (en) 2011-02-18 2012-08-23 Agfa Graphics Nv A lithographic printing plate precursor
US9029066B2 (en) 2011-02-18 2015-05-12 Agfa Graphics Nv Lithographic printing plate precursor
EP2489512A1 (en) 2011-02-18 2012-08-22 Agfa Graphics N.V. A lithographic printing plate precursor
WO2014106554A1 (en) 2013-01-01 2014-07-10 Agfa Graphics Nv (ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2933278A1 (en) 2014-04-17 2015-10-21 Agfa Graphics Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2944657A1 (en) 2014-05-15 2015-11-18 Agfa Graphics Nv (Ethylene, Vinyl Acetal) Copolymers and Their Use In Lithographic Printing Plate Precursors
EP2955198A1 (en) 2014-06-13 2015-12-16 Agfa Graphics Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
WO2015189092A1 (en) 2014-06-13 2015-12-17 Agfa Graphics Nv (ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2963496A1 (en) 2014-06-30 2016-01-06 Agfa Graphics Nv A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
WO2016001023A1 (en) 2014-06-30 2016-01-07 Agfa Graphics Nv A lithographic printing plate precursor including (ethylene, vinyl acetal) copolymers
EP3130465A1 (en) 2015-08-12 2017-02-15 Agfa Graphics Nv Heat-sensitive lithographic printing plate precursor
EP3170662A1 (en) 2015-11-20 2017-05-24 Agfa Graphics Nv A lithographic printing plate precursor
WO2017085002A1 (en) 2015-11-20 2017-05-26 Agfa Graphics Nv A lithographic printing plate precursor

Also Published As

Publication number Publication date
DE1447963B2 (en) 1972-09-07
NL6606131A (en) 1967-05-25
ES326362A1 (en) 1967-03-01
NL149298B (en) 1976-04-15
DE1447963A1 (en) 1968-11-14
AT297757B (en) 1972-04-10
NL149298C (en) 1982-09-16
CH463279A (en) 1968-09-30
BE680536A (en) 1966-11-04
SE340951B (en) 1971-12-06

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