NL6606131A - - Google Patents

Info

Publication number
NL6606131A
NL6606131A NL6606131A NL6606131A NL6606131A NL 6606131 A NL6606131 A NL 6606131A NL 6606131 A NL6606131 A NL 6606131A NL 6606131 A NL6606131 A NL 6606131A NL 6606131 A NL6606131 A NL 6606131A
Authority
NL
Netherlands
Prior art keywords
cleaning
light
nov
heating
printing plates
Prior art date
Application number
NL6606131A
Other versions
NL149298C (en
NL149298B (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6606131A publication Critical patent/NL6606131A/xx
Publication of NL149298B publication Critical patent/NL149298B/en
Application granted granted Critical
Publication of NL149298C publication Critical patent/NL149298C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Abstract

1,154,749. Photo-sensitive material and their use in producing printing plates. KALLE A.G. Nov.23, 1966 [Nov. 24, 1965], No.52475/66. Headings G2C and G2M. Printing plates are produced by imagewise exposing a positive-working light-sensitive material comprising a metal support coated with a naphthoquinone diazide sulphoric or carboxylic acid amide or ester, developing and cleaning (if necessary) to produce an oleophilic image on a hydrophilic metal background, heating in the presence of a novolak or a resole resin (such resin either being incorporated in the light-sensitive layer or is applied as a solution or an emulsion prior to heating) to at least 180‹C. and then cleaning the background areas to leave a printing plate. The metal support may be aluminium, stainless steel, or a bi- or tri-metallic support, which may be scrubbed with pumice powder before application of the light-sensitive layer. The lacquer may contain a dye or may be a two-phase composition. The cleaning solutions used may be trisodium phosphate, phosphoric acid or hydrofluoric acid. In the examples, diazides used in Specifications 706,028; 739,654; 932,452; 937,123; 937,121 and 941, 914 are used.
NL6606131A 1965-11-24 1966-05-05 METHOD FOR MANUFACTURING AN OFFSET PRINT FORM, AND METHOD FOR PRINTING A PLASTIC SURFACE WITH A PRINT FORM THEREFORE NL149298C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1965K0057722 DE1447963B2 (en) 1965-11-24 1965-11-24 PROCESS FOR MANUFACTURING AN OFFSET PRINTING FORM FROM A PRESENSITIZED PRINTING PLATE MATERIAL

Publications (3)

Publication Number Publication Date
NL6606131A true NL6606131A (en) 1967-05-25
NL149298B NL149298B (en) 1976-04-15
NL149298C NL149298C (en) 1982-09-16

Family

ID=7228378

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6606131A NL149298C (en) 1965-11-24 1966-05-05 METHOD FOR MANUFACTURING AN OFFSET PRINT FORM, AND METHOD FOR PRINTING A PLASTIC SURFACE WITH A PRINT FORM THEREFORE

Country Status (8)

Country Link
AT (1) AT297757B (en)
BE (1) BE680536A (en)
CH (1) CH463279A (en)
DE (1) DE1447963B2 (en)
ES (1) ES326362A1 (en)
GB (1) GB1154749A (en)
NL (1) NL149298C (en)
SE (1) SE340951B (en)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1513368A (en) * 1974-07-08 1978-06-07 Vickers Ltd Processing of radiation-sensitive members
CH613059A5 (en) * 1975-06-30 1979-08-31 Hoechst Ag Method for producing a flat-bed printing forme
US4191570A (en) * 1978-10-10 1980-03-04 Polychrome Corporation Process for heat treating lithographic printing plates
DE2855393A1 (en) * 1978-12-21 1980-07-03 Hoechst Ag METHOD FOR PRODUCING FLAT PRINTING FORMS
DE3110632A1 (en) * 1981-03-19 1982-09-30 Hoechst Ag, 6000 Frankfurt METHOD FOR BURNING IN LIGHT-SENSITIVE LAYERS IN THE PRODUCTION OF PRINTING FORMS
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
DE3128951A1 (en) * 1981-07-22 1983-02-10 Basf Ag, 6700 Ludwigshafen METHOD FOR PRODUCING PHOTOPOLYMER MOLDING MOLDS
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
US5084372A (en) * 1982-12-09 1992-01-28 Hoechst Celanese Corporation Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound
DE3246037A1 (en) * 1982-12-09 1984-06-14 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE, LIGHT SENSITIVE COPY MATERIAL MADE THEREOF, AND METHOD FOR PRODUCING A PRINT FORM FROM THE COPY MATERIAL
DE3504658A1 (en) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt LIGHT-SENSITIVE MIXTURE AND RECORDING MATERIAL MADE THEREFOR
EP0196031A3 (en) * 1985-03-22 1987-12-23 Fuji Photo Film Co., Ltd. Light-sensitive compositions and light-sensitive materials
DE3725741A1 (en) * 1987-08-04 1989-02-16 Hoechst Ag POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE
DE3729035A1 (en) * 1987-08-31 1989-03-09 Hoechst Ag POSITIVELY WORKING LIGHT-SENSITIVE MIXTURE AND PHOTOLITHOGRAPHIC RECORDING MATERIAL MADE THEREOF
DE3820699A1 (en) * 1988-06-18 1989-12-21 Hoechst Ag RADIATION-SENSITIVE MIXTURE AND RADIATION-SENSITIVE RECORDING MATERIAL MANUFACTURED THEREOF
DE3827901A1 (en) * 1988-08-17 1990-02-22 Hoechst Ag POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED THEREOF
GB8822956D0 (en) * 1988-09-30 1988-11-09 Cookson Graphics Plc Baking treatment of lithographic printing plate
DE3940911A1 (en) * 1989-12-12 1991-06-13 Hoechst Ag PROCESS FOR PRODUCING NEGATIVE COPIES
DE4002397A1 (en) * 1990-01-27 1991-08-01 Hoechst Ag Positive photosensitive mixt. contg. hydroxy-aralkyl acrylate polymer - and sensitiser, useful in printing plate mfr. and as photoresist
DE4004511A1 (en) * 1990-02-14 1991-08-22 Hoechst Ag DEVICE FOR BURNING IN LIGHT SENSITIVE LAYERS DURING THE PRODUCTION OF PRINTING FORMS
DE4004719A1 (en) * 1990-02-15 1991-08-22 Hoechst Ag RADIATION-SENSITIVE MIXTURE, RADIATION-RECESSED RECORDING MATERIAL PRODUCED HEREOF AND METHOD FOR PRODUCING CROSS-REFERENCES
DE4414897A1 (en) * 1994-04-28 1995-11-02 Hoechst Ag Aromatic diazonium salts and their use in radiation-sensitive mixtures
DE4444669A1 (en) 1994-12-15 1996-06-20 Hoechst Ag Radiation sensitive mixture
DE19739299A1 (en) * 1997-09-08 1999-03-11 Agfa Gevaert Ag White light-insensitive, thermally imageable material and process for the production of printing forms for offset printing
DE19834746A1 (en) 1998-08-01 2000-02-03 Agfa Gevaert Ag Radiation-sensitive mixture with IR-absorbing, betaine or betaine-anionic cyanine dyes and recording material produced therewith
DE19834745A1 (en) 1998-08-01 2000-02-03 Agfa Gevaert Ag Radiation-sensitive mixture with IR-absorbing, anionic cyanine dyes and recording material produced therewith
JP4184813B2 (en) 2002-02-19 2008-11-19 コダックグラフィックコミュニケーションズ株式会社 Photosensitive composition, photosensitive lithographic printing plate and method for producing lithographic printing plate using the same
US20060234161A1 (en) 2002-10-04 2006-10-19 Eric Verschueren Method of making a lithographic printing plate precursor
US7348126B2 (en) 2004-04-27 2008-03-25 Agfa Graphics N.V. Negative working, heat-sensitive lithographic printing plate precursor
US7425405B2 (en) 2004-07-08 2008-09-16 Agfa Graphics, N.V. Method for making a lithographic printing plate
US7195861B2 (en) 2004-07-08 2007-03-27 Agfa-Gevaert Method for making a negative working, heat-sensitive lithographic printing plate precursor
US7354696B2 (en) 2004-07-08 2008-04-08 Agfa Graphics Nv Method for making a lithographic printing plate
ATE552111T1 (en) 2008-09-02 2012-04-15 Agfa Graphics Nv HEAT SENSITIVE, POSITIVE WORKING LITHOGRAPHY PRINTING FORM PRECURSOR
EP2213690B1 (en) 2009-01-30 2015-11-11 Agfa Graphics N.V. A new alkali soluble resin
EP2263874B1 (en) 2009-06-18 2012-04-18 Agfa Graphics N.V. A lithographic printing plate precursor
EP2329951B1 (en) 2009-12-04 2012-06-20 AGFA Graphics NV A lithographic printing plate precursor
EP2366545B1 (en) 2010-03-19 2012-12-05 Agfa Graphics N.V. A lithographic printing plate precursor
CN103328214B (en) 2011-01-25 2015-06-17 爱克发印艺公司 A lithographic printing plate precursor
EP2489512B1 (en) 2011-02-18 2013-08-28 Agfa Graphics N.V. A lithographic printing plate precursor
EP2941349B1 (en) 2013-01-01 2017-07-19 AGFA Graphics NV (ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2944657B1 (en) 2014-05-15 2017-01-11 Agfa Graphics Nv (Ethylene, Vinyl Acetal) Copolymers and Their Use In Lithographic Printing Plate Precursors
ES2660063T3 (en) 2014-06-13 2018-03-20 Agfa Nv Copolymers (ethylene, vinyl acetal) and their use in lithographic printing plate precursors
EP2963496B1 (en) 2014-06-30 2017-04-05 Agfa Graphics NV A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
EP3130465B1 (en) 2015-08-12 2020-05-13 Agfa Nv Heat-sensitive lithographic printing plate precursor
EP3170662B1 (en) 2015-11-20 2019-08-14 Agfa Nv A lithographic printing plate precursor

Also Published As

Publication number Publication date
CH463279A (en) 1968-09-30
NL149298C (en) 1982-09-16
GB1154749A (en) 1969-06-11
SE340951B (en) 1971-12-06
DE1447963A1 (en) 1968-11-14
ES326362A1 (en) 1967-03-01
BE680536A (en) 1966-11-04
DE1447963B2 (en) 1972-09-07
AT297757B (en) 1972-04-10
NL149298B (en) 1976-04-15

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Legal Events

Date Code Title Description
NP1G Not automatically granted patents, but text of patent specification modified with respect to the text of examined patent application
V4 Lapsed because of reaching the maxim lifetime of a patent