EP0565006B1 - Method for preparing PS plate - Google Patents

Method for preparing PS plate Download PDF

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Publication number
EP0565006B1
EP0565006B1 EP19930105536 EP93105536A EP0565006B1 EP 0565006 B1 EP0565006 B1 EP 0565006B1 EP 19930105536 EP19930105536 EP 19930105536 EP 93105536 A EP93105536 A EP 93105536A EP 0565006 B1 EP0565006 B1 EP 0565006B1
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EP
European Patent Office
Prior art keywords
group
sho
plate
acid
compounds
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EP19930105536
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German (de)
English (en)
French (fr)
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EP0565006A3 (enrdf_load_stackoverflow
EP0565006A2 (en
Inventor
Shuichi C/O Fuji Photo Film Co. Ltd. Takamiya
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Fujifilm Holdings Corp
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Fuji Photo Film Co Ltd
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer

Definitions

  • the present invention relates to a method for preparing a presensitized plate for use in making a lithographic printing plate.
  • a presensitized plate for use in making a lithographic printing plate (so-called PS plate) comprising an aluminum plate and a light-sensitive composition applied onto the plate in the form of a thin film is prepared by subjecting an aluminum plate to a surface-roughening treatment, for instance, a mechanical method such as brush graining or ball graining, an electrochemical method such as electrolytic graining, or a combination thereof to give a roughened surface; etching the surface with an aqueous solution of an acid or alkali; anodizing the aluminum plate; optionally hydrophilizing the plate; and then applying a light-sensitive layer to the surface of the plate.
  • This PS plate is in general imagewise exposed to light, developed, image-corrected and gummed up to give a lithographic printing plate which is then fitted to a printing press to carry out printing operations.
  • the anodization of the aluminum plate is carried out in such a manner that any current does not pass through the back face thereof.
  • the back face thereof is partially anodized since a part of the current passes therethrough.
  • the back face of the aluminum plate should be anodized to some extent from the viewpoint of facilities for the bath of the anodization treatment and as a preventive measure against formation of scratch marks on the surface of the aluminum plate. For this reason, the aluminum plate used in the PS plate described above has anodized layers on the surface and the back face.
  • the anodized layer is not soluble in a developer having a pH of less than 12.5, but soluble in a strong alkali developer having a pH of not less than 12.5. For this reason, the greater the quantity of the anodized layer formed on the surface and the back face of an aluminum plate, the greater the amount of the anodized layer dissolved in an alkali developer.
  • the dissolved anodized layer is accumulated in the developer and remains therein in the form of insoluble compounds or sludge. This in turn impairs the washing ability of an automatic developing machine and results in the deposition thereof on sensors for detecting, for instance, the activity of the developer through determination of an electric conductivity to thus interfere with the determination thereof.
  • the aluminum plate is treated with an aqueous solution of an alkali-metal silicate, the higher the molar ratio: SiO 2 /M 2 O(M represents an alkali-metal), the stronger the foregoing tendency.
  • the aluminum plate is dissolved in a developer through the side on which a light-sensitive layer is applied, but the back face thereof is first dissolved therein and, therefore, if the time required for the development is short, the back face is dissolved in a higher ratio.
  • J.P. KOKAI Japanese Patent Unexamined Publication
  • EP-A-0485958 Japanese Patent Unexamined Publication
  • the steam-treatment should be carried out so that the degree of sealing ranges from 40 to 95% for the surface and, as disclosed in EP-A-0485958 not less than 80% for the back face. If the PS plate prepared using the aluminum plate thus treated is developed with an alkali developer having a pH of not less than 12.5, the amounts of insoluble compounds or sludge formed in the developer can be substantially reduced, but if the developing treatment is performed over a long period of time, insoluble compounds or sludge are accumulated and adhered to the PS plates during processing.
  • the anodized layer is treated with an aqueous solution of an alkali silicate as disclosed in U.S. Patent No. 3,181,461, the anodized layer is only slightly dissolved in an alkali developer having a pH of not less than 12.5.
  • the adhesion of the anodized layer of the aluminum plate thus treated to a positive-working light-sensitive layer subsequently applied thereto is impaired and the printing durability of the resulting lithographic printing plate is substantially reduced, in particular, when a plate-cleaner is employed.
  • J.P. KOKAI No. Hei 2-185493 discloses a method for treating an anodized aluminum plate with an aqueous solution of an alkali metal silicate containing a hydroxide.
  • the anodized layer of an aluminum plate thus treated is scarcely dissolved in an alkaline developer having a pH of 12.5 or higher, but the adhesion of the anodized layer of the aluminum plate thus treated to a positive-working light-sensitive layer subsequently applied is likewise impaired and the printing durability of the resulting lithographic printing plate is substantially reduced, in particular, when a plate-cleaner is employed.
  • EP-A-0089510 discloses a method of preparing an offset PS plate comprising the steps of treating an anodized aluminum plate with an alkali metal silicate solution having a pH ranging from 8.0 to 10.5, then washing the aluminum plate with an aqueous solution of an acid depends on case, and subsequently applying a light-sensitive layer on top of the aluminum plate.
  • An object of the present invention is to provide a method for preparing a PS plate which permits the suppression of the dissolution of an anodized layer formed on an aluminum plate in an alkaline developer and in turn the reduction of the amounts of insoluble compounds or sludge formed in the developer and which can provide a lithographic printing plate exhibiting good adhesion between the aluminum substrate and a positive-working light-sensitive layer and satisfactory printing durability.
  • the present invention provides a method for preparing a presensitized plate for use in making a lithographic printing plate comprising the steps of treating an anodized aluminum plate with an aqueous solution of an alkali metal silicate having a pH ranging from 10 to 13 as determined at 25 °C, then treating the aluminum plate with an aqueous solution of an acid having a pH ranging from 1 to 6, then applying a hydrophilic underlying coating layer onto the aluminum plate thus treated, and then applying a light-sensitive layer on top of the hydrophilic underlying coating layer.
  • the aluminun plate used in the invention is a plate-like material of, for instance, pure aluminum or an aluminum alloy which comprises aluminum as a principal component and small amounts of trace elements.
  • Examples of the trace elements are silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel and titanium.
  • Aluminum alloys usable in the invention comprise these trace elements in an amount of not more than 10% by weight.
  • An aluminum material suitably used in the invention is pure aluminum, but the production of completely pure aluminum is difficult from the viewpoint of the aluminum refining technique and thus it is preferred to use those having contents of trace elements as low as possible.
  • Aluminum alloys having a content of trace elements on the order of that defined above can be used in the invention without any trouble.
  • the aluminum plate used in the invention is not restricted to those having specific compositions and any aluminum material known in the art and commonly used may appropriately be used in the invention. Examples of preferred aluminum materials are JIS A 1050, JIS A 1100, JIS A 1200, JIS A 3003, JIS A 3103 and JIS A 3005.
  • the thickness of the aluminum plate used in the invention ranges from 0.1 mm to 0.5 mm.
  • the aluminum plate is optionally degreased by treating it with an aqueous solution of a surfactant or an alkaline agent to remove rolling oils from the surface thereof and surface-grained prior to anodization.
  • Methods for surface-graining an aluminum plate include, for instance, a method for mechanically surface-roughening an aluminum plate, a method for electrochemically dissolving the surface of an aluminum plate and a method for selectively and chemically dissolving the surface of an aluminum plate.
  • the mechanical surface-graining method usable in the invention may be any known method such as ball graining, brush graining, blast graining and buff graining methods.
  • the electrochemical surface-graining methods include, for instance, those comprising electrolyzing the surface of an aluminum plate in an electrolyte such as a hydrochloric acid or nitric acid aqueous solution by passing an alternativeating or direct current through the aluminum plate. It is also possible to use a method comprising combination of these two kinds of methods as disclosed in J.P. KOKAI No. Sho 54-63902.
  • the aluminum plate thus surface-roughened is optionally etched with an alkali and neutralized.
  • electrolytes usable in general include aqueous solutions of, for instance, sulfuric acid, phosphoric acid, oxalic acid, chromic acid and mixture thereof and the concentrations of these electrolytes may be appropriately determined depending on the kinds of electrolytes.
  • Conditions for anodization cannot unconditionally be determined since they vary depending on each particular electrolyte selected, but the anodization is desirably performed at an electrolyte concentration ranging from 1 to 80% by weight, an electrolyte temperature ranging from 5 to 70°C, a current density ranging from 5 to 60 A/dm 2 , a voltage of from 1 to 100 V and an electrolyzation time of from 10 seconds to 50 minutes.
  • an electrolyte concentration ranging from 1 to 80% by weight
  • an electrolyte temperature ranging from 5 to 70°C
  • a current density ranging from 5 to 60 A/dm 2
  • a voltage of from 1 to 100 V a voltage of from 1 to 100 V
  • an electrolyzation time of from 10 seconds to 50 minutes.
  • 4,211,619 which comprises anodizing an aluminum plate in a sulfuric acid solution having a low concentration.
  • the most preferred method comprises anodizing an aluminum plate in an electrolyte which comprises 5 to 20% by weight sulfuric acid and 3 to 15% by weight aluminum ions and which is maintained at a temperature ranging from 25 to 50 °C, using a direct current at a current density of 5 to 20 A/dm 2 .
  • the quantity of the anodized layer to be formed may be in the range of from 0.1 to 10 g/m 2 .
  • the foregoing anodized layer formed on the aluminum plate is treated by immersing the plate in an aqueous solution comprising 1 to 30% by weight, preferably 2 to 15% by weight of an alkali metal silicate and having a pH ranging from 10 to 13 as determined at 25 °C, at a desired temperature and time (for instance, 15 to 80 °C for 0.5 to 120 seconds).
  • the solution causes gelation, while if it exceeds 13.0, the oxidized layer is dissolved in the silicate solution.
  • Alkalki metal silicates usable in the invention are, for instance, sodium silicate, potassium silicate and lithium silicate.
  • Hydroxides used for increasing the pH of the alkali metal silicate aqueous solution include, for instance, sodium hydroxide, potassium hydroxide and lithium hydroxide.
  • solutions used for the foregoing treatment may additionally contain alkaline earth metal salts or salts of Group IVB metals.
  • alkaline earth metal salts examples include water-soluble salts, for instance, nitrates such as calcium nitrate, strontium nitrate, magnesium nitrate and barium nitrate, sulfates, hydrochlorides, phosphates, acetates, oxalates and borates.
  • salts of Group IVB metals include titanium tetrachloride, titanium trichloride, potassium titanium fluoride, potassium titanium oxalate, titanium sulfate, titanium tetraiodide, zirconium oxide chloride, zirconium dioxide, zirconium oxychloride and zirconium tetrachloride.
  • alkaline earth metal silicates or salts of Group IVB metals may be used alone or in combination.
  • the amount of these metal salts to be added in the solution preferably ranges from 0.01 to 10% by weight and more preferably 0.05 to 5.0% by weight.
  • An acidic aqueous solution having a pH ranging from 1 to 6 as determined at 25°C and used in the treatment performed after the treatment with an alkali metal silicate is an aqueous solution of an acid such as sulfuric acid, nitric acid, hydrochloric acid, oxalic acid or phosphoric acid.
  • the pH of the treating solution is less than 1, the anodized layer is dissolved in the treating solution, while if it exceeds 6, any improvement of the adhesion between the aluminum plate and a light-sensitive layer subsequently applied cannot be anticipated.
  • This treatment is suitably performed by immersing the plate in the solution at a temperature ranging from 10 to 70 °C for 0.5 to 120 seconds, and more preferably at a temperature ranging from 20 to 70 °C for 5 to 60 seconds.
  • hydrophilic underlying coating layers used in the invention are a hydrophilic layer comprising a compound having at least one amino group and at least one member selected from the group consisting of carboxyl group and groups in the form of salts thereof as well as sulfo group and groups in the form of salts thereof as disclosed in J.P. KOKAI No. Sho 60-149491; a hydrophilic layer comprising a compound selected from the group consisting of those having at least one amino group and at least one hydroxyl group and salts thereof as disclosed in J.P. KOKAI No. Sho 60-232998; a phosphate-containing hydrophilic layer as disclosed in J.P. KOKAI No.
  • a hydrophilic layer comprising a polymeric compound having, in the molecule, repeating units derived from at least one monomer having a sulfo group as disclosed in J.P. KOKAI No. Sho 59-101651; and an organic layer comprising at least one compound selected from the group consisting of substituted or unsubstituted aliphatic or aromatic compounds represented by the general formula: R 1 (PO(OH) 2 ) n or R 1 (PO(OH)(R 2 )) n wherein n is 1 or 2; if n is 1, R 1 and R 2 each represents a substituted or unsubstituted alkyl, alkoxy, aryloxy, aryl, acyl or acyloxy group; and if n is 2, R 1 represents a substituted or unsubstituted alkylene or arylene group and R 2 is the same as that defined above as disclosed in EP-A-0503602.
  • a composition for the light-sensitive layer used in the invention may be any light-sensitive composition so far as it causes change in its solubility or swelling characteristics through exposure to light. Typical examples thereof will hereinafter be explained.
  • Light-sensitive compounds for positive-working light-sensitive compositions are, for instance, o-quinonediazide compounds and typical examples thereof include o-naphthoquinonediazide compounds.
  • Preferred examples of o-naphthoquinonediazide compounds include esters of 1,2-diazonaphthoquinonesulfonic acid chloride with pyrogallol-acetone resins as disclosed in Japanese Patent Publication for Opposition Purpose (hereinafter referred to as "J.P. KOKOKU") No. Sho 43-28403.
  • Preferred examples of o-quinonediazide compounds include an ester of 1,2-diazonaphthoquinonesulfonic acid chloride with phenolformaldehyde resin as disclosed in U.S. Patent Nos. 3,046,120 and 3,188,210.
  • o-naphthoquinonediazide compounds prepared through the reactions of polyhydroxyl compounds having molecular weights of not more than 1,000 with 1,2-diazonaphthoquinonesulfonic acid chloride.
  • specific examples of these compounds are those disclosed in, for instance, J.P. KOKAI Nos. Sho 51-139402, Sho 58-150948, Sho 58-203434, Sho 59-165053, Sho 60-121445, Sho 60-134235, Sho 60-163043, Sho 61-118744, Sho 62-10645, Sho 62-10646, Sho 62-153950, Sho 62-178562 and Sho 64-76047; U.S. Patent Nos. 3,102,809, 3,126,281, 3,130,047, 3,148,983, 3,184,310, 3,188,210 and 4,639,406.
  • o-naphthoquinonediazide compounds are synthesized by reacting polyhydroxyl compounds with 1,2-diazonaphthoquinonesulfonic acid chloride in an amount of preferably 0.2 to 1.2 eq. and more preferably 0.3 to 1.0 eq. per one hydroxyl group of the polyhydroxyl compound.
  • Preferred 1,2-diazonaphthoquinonesulfonic acid chloride is 1,2-diazonaphthoquinone-5-sulfonic acid chloride, but 1,2-diazonaphthoquinone-4-sulfonic acid chloride may also be used.
  • the o-naphthoquinonediazide compound thus prepared comprises a mixture of those which differ, from one another, in positions of 1,2-diazonaphthoquinonesulfonic acid ester groups and the number of the ester groups introduced therein, but preferred are those having a rate of the compound whose hydroxyl groups are completely substituted with 1,2-diazonaphthoquinonesulfonic acid ester groups based on the mixture (the content of the compound completely esterified) of not less than 5 mole%, more preferably 20 to 99 mole%.
  • Positive-working light-sensitive compounds other than o-naphthoquinonediazide compounds include, for instance, o-nitrocarbinol ester group-containing polymeric compounds as disclosed in J.P. KOKOKU No. Sho 56-2696 which may likewise be used in the invention.
  • Also usable in the invention include, for instance, systems comprising combinations of photolytically acid-generating compounds with compounds having groups capable of causing dissociation by the action of acids such as -C-O-C- and -C-O-Si groups.
  • Examples of such systems include combinations of photolytically acid-generating compounds with acetal or O,N-acetal compounds as disclosed in J.P. KOKAI No. Sho 48-89003, with orthoester or amidoacetal compounds as disclosed in J.P. KOKAI No. Sho 51-120714, with polymers having acetal or ketal groups in the main chains as disclosed in J.P. KOKAI No. Sho 53-133429, with enol ether compounds as disclosed in J.P. KOKAI No. Sho 55-12995, with N-acyliminocarbon compounds as disclosed in J.P. KOKAI No. Sho 55-126236, with polymers having orthoester groups in the main chains as disclosed in J.P. KOKAI No. Sho 56-17345, silyl ester compounds as disclosed in J.P. KOKAI No. Sho 60-10247 and with silyl ether compounds as disclosed in J.P. KOKAI Nos. Sho 60-37549 and Sho 60-121446.
  • the amount of these positive-working light-sensitive compounds (inclusive of the foregoing combinations) in the light-sensitive composition used in the invention suitably ranges from 10 to 50% by weight and more preferably 15 to 40% by weight on the basis of the total weight of the composition.
  • the o-quinonediazide compound by itself may form a light-sensitive layer, but the compound is preferably used in combination with an alkaline water-soluble resin as a binder.
  • the light-sensitive composition may comprise a variety of alkaline water-soluble polymeric compounds.
  • Such alkaline water-soluble resins are, for instance, novolak resins having the properties specified above and examples thereof include phenol-formaldehyde resins, cresol-formaldehyde resins such as m-cresol-formaldehyde resins, p-cresol-formaldehyde resins, m-/p-mixed cresol-formaldehyde resins and phenol-mixed cresol (m-, p- or m-/p-mixed cresol)-formaldehyde resins, phenol-modified xylene resins, polyhydroxystyrene, poly(halogenated hydroxystyrene), phenolic hydroxyl group-containing acrylic resins as disclosed in J.P.
  • cresol-formaldehyde resins such as m-cresol-formaldehyde resins, p-cresol-formaldehyde resins, m-/p-mixed cresol-formalde
  • KOKAI No. Sho 51-34711 sulfonamido group-containing acrylic resins as disclosed in J.P. KOKAI No. Hei 2-866, and urethane resins.
  • alkali-soluble polymeric compounds preferred are those having weight-average molecular weights ranging from 500 to 200,000 and number-average molecular weights ranging from 200 to 60,000.
  • the amount of these alkali-soluble polymeric compounds to be added to the composition is not more than 70% by weight on the basis of the total weight of the composition.
  • a condensate of a phenol carrying an alkyl group having 3 to 8 carbon atoms as a substituent with formaldehyde such as t-butylphenol-formaldehyde resin or octylphenol-formaldehyde resin or an o-naphthoquinone-diazidosulfonic acid ester of the condensate (such as those disclosed in J.P. KOKAI No. Sho 61-243446) as disclosed in U.S. Patent No. 4,123,279.
  • formaldehyde such as t-butylphenol-formaldehyde resin or octylphenol-formaldehyde resin or an o-naphthoquinone-diazidosulfonic acid ester of the condensate (such as those disclosed in J.P. KOKAI No. Sho 61-243446) as disclosed in U.S. Patent No. 4,123,279.
  • the light-sensitive composition used in the invention may further comprise cyclic acid anhydrides for improving the sensitivity of the composition, agents or compositions for obtaining visible images immediately after exposure to light, dyes for coloring images and/or other fillers.
  • cyclic acid anhydrides include, as disclosed in U.S. Patent No. 4,115,128, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, 3,6-endoxy- ⁇ 4 -tetrahydrophthalic anhydride, tetrachlorophthalic anhydride, maleic anhydride, chloromaleic anhydride, ⁇ -phenylmaleic anhydride, succinic anhydride and pyromellitic anhydride.
  • the sensitivity of the composition can be increased by a factor of at most about 3 if these cyclic acid anhydrides are incorporated into the composition in an amount ranging from 1 to 15% by weight on the basis of the total weight of the composition.
  • Typical examples of agents or compositions for obtaining visible images immediately after exposure to light are combinations of light-sensitive compounds capable of releasing acids through exposure to light with salt-forming organic dyes. Specific examples thereof are combinations of o-naphthoquinonediazido-4-sulfonic acid halides with salt-forming organic dyes as disclosed in J.P. KOKAI No. Sho 50-36209; and combinations of trihalomethyl compounds with salt-forming organic dyes as disclosed in J.P. KOKAI Nos.
  • Agents for coloring images may be the foregoing salt-forming organic dyes and other dyes.
  • Preferred dyes may be oil-soluble dyes and basic dyes.
  • Oil Yellow #101, Oil Yellow #130, Oil Pink #312, Oil Green BG, Oil Blue BOS, Oil Blue #603, Oil Black BY, Oil Black BS, Oil Black T-505 all of these are available from Orient Chemical Industries, Ltd.), Victoria Pure Blue, Crystal Violet (CI 42555), Ethyl Violet (CI 42600), Methyl Violet (CI 42535), Rhodamine B (CI 45170B), Malachite Green (CI 42000) and Methylene Blue (CI 52015).
  • the dyes disclosed in J.P. KOKAI No. Sho 62-293247 are particularly preferred.
  • the light-sensitive composition is dissolved in a solvent capable of dissolving the foregoing every components and then applied to the surface of a substrate.
  • Solvents usable herein include, for instance, ethylene dichloride, cyclohexanone, methyl ethyl ketone, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, 2-methoxyethyl acetate, 1-methoxy-2-propanol, 1-methoxy-2-propyl acetate, toluene, ethyl acetate, methyl lactate, ethyl lactate, dimethylsulfoxide, dimethylacetamide, dimethylformamide, water, N-methylpyrrolidone, tetrahydrofurfuryl alcohol, acetone, diacetone alcohol, methanol, ethanol, isopropanol, diethylene glycol and dimethyl ether, which may be used alone or in combination.
  • the concentration of the foregoing components (solid content) in the solution ranges from 2 to 50% by weight.
  • the amount of the composition to be applied varies depending on the applications of the composition, but in general it preferably ranges from 0.5 to 3.0 g/m 2 (as expressed in terms of solid content) for PS plates. The smaller the amount of the composition coated, the higher the sensitivity of the resulting light-sensitive film, but the lower the physical properties of the film.
  • the light-sensitive composition used in the invention may comprise surfactants for improving the coating properties thereof such as fluorine atom-containing surfactants as disclosed in J.P. KOKAI No. Sho 62-170950.
  • the amount of the surfactant preferably ranges from 0.01 to 1% by weight and more preferably 0.05 to 0.5% by weight on the basis of the total weight of the light-sensitive composition.
  • Negative-working light-sensitive diazo compounds preferably used are condensed products (so-called light-sensitive diazo resins) of diphenylamine-p-diazonium salts, which are reaction products of diazonium salts with reactive carbonyl salt-containing organic condensation agents such as aldol or acetal, with formaldehyde as disclosed in U.S. Patent Nos. 2,063,631 and 2,667,415.
  • Examples of other useful condensed diazo resins are disclosed in, for instance, J.P. KOKOKU Nos. Sho 49-48001, Sho 49-45322 and Sho 49-45323.
  • These light-sensitive diazo resins are in general used in the form of water-soluble inorganic salts and, therefore, they can be applied in the form of aqueous solutions.
  • these water-soluble diazo compounds can be reacted with aromatic or aliphatic compounds having at least one phenolic hydroxyl group or sulfonate residue or both of these groups according to the method disclosed in J.P. KOKOKU No. Sho 47-1167 to give substantially water-insoluble light-sensitive diazo resins as reaction products.
  • the products can likewise be used in the invention.
  • reactants having phenolic hydroxyl groups are hydroxybenzophenone, 4,4-bis(4'-hydroxyphenyl)pentanoic acid, resorcinol or diphenolic acids such as diresorcinol, which may have substituents.
  • hydroxybenzophenones include 2,4-dihydroxybenzophenone, 2-hydroxy-4-m ethoxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone and 2,2',4,4'-tetrahydroxybenzophenone.
  • sulfonic acids examples include aromatic sulfonic acids such as sulfonic acids of benzene, toluene, xylene, naphthalene, phenol, naphthol and benzophenone or soluble salts thereof such as ammonium and alkali metal salts.
  • aromatic sulfonic acids such as sulfonic acids of benzene, toluene, xylene, naphthalene, phenol, naphthol and benzophenone or soluble salts thereof such as ammonium and alkali metal salts.
  • sulfonic acid residue-containing compounds may in general be substituted with lower alkyl groups, nitro group and/or an additional sulfonic acid group.
  • Preferred examples thereof are benzenesulfonic acid, toluenesulfonic acid, naphthalenesulfonic acid, 2,5-dimethylbenzenesulfonic acid, sodium benzenesulfonate, naphthalene-2-sulfonic acid, 1-naphthol-2 (or 4)-sulfonic acid, 2,4-dinitro-1-naphthol-7-sulfonic acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, sodium m-(p'-anilinophenylazo)benzenesulfonate, alizarinsulfonic acid, o-toluidine-m-sulfonic acid and ethanesulfonic acid.
  • Sulfonic acids of alcohols and salts thereof are also useful in the invention.
  • such compounds can easily be available as anionic surfactants and specific examples thereof include ammonium salts or alkali metal salts of, for instance, lauryl sulfate, alkylaryl sulfate, p-nonylphenyl sulfate, 2-phenylethyl sulfate and isooctylphenoxydiethoxyethyl sulfate.
  • substantially water-insoluble light-sensitive diazo resins each is isolated by admixing an aqueous solution of a water-soluble diazo resin with an aqueous solution of the foregoing aromatic or aliphatic compound preferably in amounts approximately identical to one another in the form of precipitates.
  • diazo resins as disclosed in U.K. Patent No. 1,312,925 are likewise preferably used in the invention.
  • diazo resins having phosphorus atom-containing oxyacid groups as disclosed in J.P. KOKAI No. Hei 3-253857, diazo resins condensed with carboxyl group-containing aldehyde or acetal compounds thereof as disclosed in J.P. KOKAI No. Hei 4-18559, diazo resins co-condensed with carboxyl, group-containing aromatic compounds such as phenoxyacetic acid as disclosed in J.P.KOKAI. No. Hei 4-211253.
  • diazo resins are, for instance, 2-methoxy-4-hydroxy-5-benzoylbenzenesulfonate of condensates of p-diazodiphenylamine with formaldehyde.
  • the content of these diazo resins in the light-sensitive layer suitably ranges from 5 to 50% by weight.
  • the amount of the diazo resin most preferably ranges from 8 to 20% by weight.
  • binders may be various kinds of polymeric compounds, but preferably used in the present invention include those comprising groups selected from hydroxyl, amino, carboxyl, amido, sulfonamido, active methylene, thioalcohol and/or epoxy groups.
  • preferred binders include shellac as disclosed in U.K. Patent No. 1,350,521; polymers comprising, as main repeating units, those derived from hydroxyethyl acrylate or hydroxyethyl methacrylate as disclosed in U.K. Patent No. 1,460,973 and U.S. Patent No. 4,123,276; polyamide resins as disclosed in U.S. Patent No.
  • phenol resins and polyvinyl acetal resins such as polyvinl formal resins and polyvinyl butyral resins as disclosed in U.K. Patent No. 1,074,392; linear polyurethane resins as disclosed in U.S. Patent No. 3,660,097; phthalate-modified polyvinyl alcohol resins; epoxy resins obtained through condensation of bisphenol A and epichlorohydrin; amino group-containing polymers such as polyaminosulfone and polyalkylamino(meth)acrylate; and cellulose derivatives such as cellulose acetate, cellulose alkyl ether and cellulose acetate phthalate.
  • composition comprising a diazo resin and a binder may further comprise other additives such as pH indicators as disclosed in U.K. Patent No. 1,041,463 and phosphoric acid and dyes as disclosed in U.S. Patent No. 3,236,646.
  • Examples of light-sensitive compositions of this kind include those comprising aside compounds and water-soluble or alkali-soluble polymeric compounds as disclosed in U.K. Patent Nos. 1,235,281 and 1,495,861 and J.P. KOKAI Nos. Sho 51-32331 and Sho 51-36128; and those comprising azido group-containing polymers and polymeric compounds as binders as disclosed in J.P. KOKAI Nos. Sho 50-5102, Sho 50-84302, Sho 50-84303 and Sho 53-12984.
  • Examples of other light-sensitive resins are polyester compounds as disclosed in J.P. KOKAI No. Sho 52-96696; polyvinyl cinnamate resins as disclosed in U.K. Patent Nos. 1,112,277, 1,313,390, 1,341,004 and 1,377,747; photo-polymerizable photopolymer compositions as disclosed in U.S. Patent Nos. 4,072,528 and 4,072,527.
  • the electrophotographic light-sensitive layer mainly comprises a photoconductive compound and a binder, but may optionally comprise known dyes, pigments, chemical sensitizers and other additives for the improvement of the sensitivity and for imparting, to the layer, sensitivity to a desired wavelength range.
  • the light-sensitive layer may comprise a single layer or a plurality of layers comprising those having a charge-generating function and those having a charge-transfer function.
  • a lithographic printing plate can be obtained by forming a toner image on the light-sensitive layer according to the known electrophotographic process and then decoding the non-image areas while using the toner image as a resist layer.
  • the thickness of the light-sensitive layer preferably ranges from 0.1 to 30 ⁇ m and more preferably 0.5 to 10 ⁇ m.
  • the amount (solid content) of the light-sensitive layer to be applied to a substrate ranges from 0.1 to 7 g/m 2 and preferably 0.5 to 4 g/m 2 .
  • the surface of the light-sensitive layer thus applied is preferably matted in order to shorten the evacuation time required for the close contact exposure in a vacuum printing frame and prevent an image from becoming indistinct. More specifically, such a mat layer can be formed by a method as disclosed in J.P. KOKAI No. Sho 50-12580 and J.P. KOKOKU Nos. Sho 57-6582 and Sho 61-28986 or a method as disclosed in J.P. KOKOKU No. Sho 62-62337 which comprises heat-fusing solid powder on the light-sensitive layer.
  • the PS plate used in the present invention is imagewise exposed to light and then treated by the usual manner including development to give a lithographic printing plate.
  • a positive-working PS plate having a light-sensitive layer (A) is imagewise exposed to light and then developed with an alkaline aqueous solution such as those disclosed in U.S. Patent No. 4,259,434 and J.P. KOKAI No. Hei 3-90388 to remove the light-sensitive layer on the exposed area and to thus give a lithographic printing plate.
  • a negative-working PS plate having a light-sensitive layer (B) which comprises a diazo resin and a binder is imagewise exposed to light and then developed with a developer such as those disclosed in, for instance, U.S. Patent No. 4,186,006 to remove the light-sensitive layer on the unexposed area and to thus give a lithographic printing plate.
  • the PS plate used in the invention can of course be subjected to the plate-making methods as disclosed in J.P. KOKAI Nos. Sho 54-8002, Sho 55-115045 and Sho 59-58431. More specifically, after developing the imagewise exposed PS plate, it is washed with water and then desensitized; or directly desensitized without water-washing; or treated with an aqueous solution containing an acid; or desensitized after treating with an aqueous solution containing an acid.
  • the processing ability of an alkaline developer because the alkali concentration is reduced due to consumption thereof in proportion to the quantity of the PS plate processed or through absorption of air when an automatic developing machine is operated over a long time, but the processing ability of the alkaline developer can be recovered by the addition of a fresh developer (replenisher) or a replenisher having a high alkaline concentration as disclosed in J.P. KOKAI No. Sho 54-62004.
  • the supplementation of the replenisher is preferably carried out by a method in which the replenisher is added in an amount proportional to the length of one side of the PS plate to be processed or the method disclosed in U.S. Patent No. 4,882,246.
  • the foregoing plate-making process is preferably performed in an automatic developing machine as disclosed in J.P. KOKAI Nos. Hei 2-7054 and Hei 2-32357.
  • an erasing solution as disclosed in J.P. KOKOKU No. Hei 2-13293.
  • Desensitizing gums optionally applied to the resulting lithographic printing plate at the final step of the plate-making process are preferably those disclosed in J.P. KOKOKU Nos. Sho 62-16834, Sho 62-25118 and Sho 63-52600 and J.P. KOKAI Nos. Sho 62-7595, Sho 62-11693 and Sho 62-83194.
  • the PS plate used in the present invention when the PS plate used in the present invention is subjected to burning-in treatment after imagewise exposure, development, water-washing or rinsing, optional erasing and water-washing, it is preferred to treat the plate with a surface-conditioning solution as disclosed in J.P. KOKOKU Nos. Sho 61-2518 and Sho 55-28062 and J.P. KOKAI Nos. Sho 62-31859 and Sho 61-159655, prior to the burning-in treatment.
  • the aluminum substrate of the PS plate used in the present invention is only slightly dissolved in an alkaline developer and this accordingly prevents the formation of insoluble compounds or sludge effectively, during development.
  • a JIS 1050 aluminum sheet was surface-grained with an aqueous suspension of pumice stone as an abrasive and a rotary nylon brush. At this stage, the surface roughness of the aluminum sheet was determined and found to be 0.5 ⁇ m (expressed in terms of central line-average surface roughness).
  • the aluminum sheet was etched by immersing it in a 10% aqueous caustic soda solution heated up to 70°C to such an extent that the amount of dissolved aluminum was reached 6 g/m 2 . After water-washing, the sheet was neutralized by immersing in a 30% nitric acid aqueous solution for one minute and then sufficiently washed with water.
  • the sheet was electrolytically surface-roughened for 20 seconds in a 0.7% nitric acid aqueous solution using a rectangular alternating waved voltage having an anodic voltage of 13 V and a cathodic voltage of 6 V, then immersed in a 20% sulfuric acid solution maintained at 50°C to wash the surface thereof and washed with water.
  • porous anodized layer was formed on the sheet in a 20% aqueous sulfuric acid solution using a direct current.
  • the aluminum sheet was electrolyzed at a current density of 5 A/dm 2 while adjusting the electrolyzation time such that the weight of the anodized layer formed on the surface of the aluminum sheet was 2.5 g/m 2 and the weight of the anodized layer formed on the back face thereof was 0.5 g/m 2 , to thus give a substrate (I).
  • the substrate (I) was treated with a 10% aqueous sodium silicate solution (pH 11.2) at 70 °C for 12 seconds, washed with water and then treated with an aqueous sulfuric acid solution having a pH of 2 at 30 °C for 15 seconds.
  • a 10% aqueous sodium silicate solution pH 11.2
  • an aqueous sulfuric acid solution having a pH of 2 at 30 °C for 15 seconds.
  • the following light-sensitive composition was applied onto the substrate thus prepared so that the coated amount thereof was 2.5 g/m 2 (weighed after drying) and then dried to form a light-sensitive layer.
  • the PS plate thus prepared was exposed to light from a 3 KW metal halide lamp for 50 seconds at a distance of 1 m through a transparent positive film in a vacuum printing frame and then developed with a 3.5% aqueous solution of sodium silicate (pH 12.9) having a molar ratio, SiO 2 /Na 2 O, of 0.83.
  • the substrate (I) was treated with a 10% by weight aqueous solution of sodium silicate (pH 11.2) at 70°C for 12 seconds, then washed with water and treated with an aqueous sulfuric acid solution having a pH of 2 at 30 °C for 15 seconds.
  • the substrate (I) was treated with a 10% by weight aqueous solution of sodium silicate (pH 13.0), to which sodium hydroxide was added, at 70°C for 12 seconds, then washed with water and treated with an aqueous sulfuric acid solution having a pH of 2 at 30 °C for 15 seconds. Thereafter, the same procedures used in Reference Example 1 were repeated except that a solution comprising 1 g of phenylphosphonic acid, 39 g of water and 60 g of methanol was applied onto the substrate thus treated in an amount of 20 [mg/m 2 ] (weighed after drying) and then dried at 80°C for 30 seconds.
  • sodium silicate pH 13.0
  • Example 2 The same procedures used in Example 1 were repeated using the substrate (I) except that the treatment with an aqueous sulfuric acid solution were omitted.
  • Example 2 The same procedures used in Example 2 were repeated using the substrate (I) except that the treatment with an aqueous sulfuric acid solution were omitted.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
EP19930105536 1992-04-06 1993-04-02 Method for preparing PS plate Expired - Lifetime EP0565006B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP84181/92 1992-04-06
JP8418192A JP2944296B2 (ja) 1992-04-06 1992-04-06 感光性平版印刷版の製造方法

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EP0565006A2 EP0565006A2 (en) 1993-10-13
EP0565006A3 EP0565006A3 (enrdf_load_stackoverflow) 1994-02-23
EP0565006B1 true EP0565006B1 (en) 1998-07-29

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JP (1) JP2944296B2 (enrdf_load_stackoverflow)
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JPH03253857A (ja) 1990-03-05 1991-11-12 Fuji Photo Film Co Ltd 感光性組成物
US5254430A (en) * 1991-01-31 1993-10-19 Fuji Photo Film Co., Ltd. Presensitized plate having anodized aluminum substrate, hydrophilic layer containing phosphonic or phosphinic compound and photosensitive layer containing O-quinone diazide compound
US5230988A (en) 1991-03-12 1993-07-27 Fuji Photo Film Co., Ltd. Method of making lithographic printing plate
JP3718015B2 (ja) 1996-11-19 2005-11-16 株式会社ルネサステクノロジ メモリモジュールおよびプリント基板
JP3717162B2 (ja) 2002-11-13 2005-11-16 三興繊維協同組合 引き上げ式カーテン装置
US8059420B2 (en) 2003-07-22 2011-11-15 Murata Manufacturing Co., Ltd. Surface mountable device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6138568A (en) * 1997-02-07 2000-10-31 Kodak Polcyhrome Graphics Llc Planographic printing member and process for its manufacture
US6293197B1 (en) 1999-08-17 2001-09-25 Kodak Polychrome Graphics Hydrophilized substrate for planographic printing

Also Published As

Publication number Publication date
EP0565006A3 (enrdf_load_stackoverflow) 1994-02-23
DE69319954D1 (de) 1998-09-03
EP0565006A2 (en) 1993-10-13
JPH05278362A (ja) 1993-10-26
DE69319954T2 (de) 1998-12-10
JP2944296B2 (ja) 1999-08-30

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