DE60045698D1 - Antireflexzusammensetzung einer Hartmaske - Google Patents
Antireflexzusammensetzung einer HartmaskeInfo
- Publication number
- DE60045698D1 DE60045698D1 DE60045698T DE60045698T DE60045698D1 DE 60045698 D1 DE60045698 D1 DE 60045698D1 DE 60045698 T DE60045698 T DE 60045698T DE 60045698 T DE60045698 T DE 60045698T DE 60045698 D1 DE60045698 D1 DE 60045698D1
- Authority
- DE
- Germany
- Prior art keywords
- hard mask
- antireflection composition
- antireflection
- composition
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Materials For Photolithography (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/330,417 US6890448B2 (en) | 1999-06-11 | 1999-06-11 | Antireflective hard mask compositions |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60045698D1 true DE60045698D1 (de) | 2011-04-21 |
Family
ID=23289686
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60045698T Expired - Lifetime DE60045698D1 (de) | 1999-06-11 | 2000-06-06 | Antireflexzusammensetzung einer Hartmaske |
Country Status (6)
Country | Link |
---|---|
US (2) | US6890448B2 (de) |
EP (1) | EP1061560B1 (de) |
JP (1) | JP4879384B2 (de) |
KR (1) | KR100696399B1 (de) |
DE (1) | DE60045698D1 (de) |
TW (1) | TW466581B (de) |
Families Citing this family (110)
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JP4381526B2 (ja) * | 1999-10-26 | 2009-12-09 | 東京エレクトロン株式会社 | プラズマエッチング方法 |
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KR100734249B1 (ko) * | 2000-09-07 | 2007-07-02 | 삼성전자주식회사 | 축합환의 방향족 환을 포함하는 보호기를 가지는 감광성폴리머 및 이를 포함하는 레지스트 조성물 |
US6737728B1 (en) * | 2000-10-12 | 2004-05-18 | Intel Corporation | On-chip decoupling capacitor and method of making same |
TW576859B (en) * | 2001-05-11 | 2004-02-21 | Shipley Co Llc | Antireflective coating compositions |
JP4381143B2 (ja) | 2001-11-15 | 2009-12-09 | ハネウェル・インターナショナル・インコーポレーテッド | フォトリソグラフィー用スピンオン反射防止膜 |
EA008379B1 (ru) | 2002-02-01 | 2007-04-27 | Ариад Джин Терапьютикс, Инк. | Фосфорсодержащие соединения и их применения |
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US6730454B2 (en) * | 2002-04-16 | 2004-05-04 | International Business Machines Corporation | Antireflective SiO-containing compositions for hardmask layer |
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JP4336310B2 (ja) * | 2002-07-11 | 2009-09-30 | インターナショナル・ビジネス・マシーンズ・コーポレーション | ハードマスク層としてのシリコン含有反射防止層及びその形成方法 |
US7501230B2 (en) * | 2002-11-04 | 2009-03-10 | Meagley Robert P | Photoactive adhesion promoter |
JP2004206082A (ja) * | 2002-11-20 | 2004-07-22 | Rohm & Haas Electronic Materials Llc | 多層フォトレジスト系 |
KR100639862B1 (ko) * | 2002-12-02 | 2006-10-31 | 토쿄오오카코교 가부시기가이샤 | 반사방지막형성용 조성물 |
KR100914198B1 (ko) * | 2002-12-27 | 2009-08-27 | 엘지디스플레이 주식회사 | 레지스트인쇄용 클리체의 제조방법 |
JP4369203B2 (ja) | 2003-03-24 | 2009-11-18 | 信越化学工業株式会社 | 反射防止膜材料、反射防止膜を有する基板及びパターン形成方法 |
US7368173B2 (en) * | 2003-05-23 | 2008-05-06 | Dow Corning Corporation | Siloxane resin-based anti-reflective coating composition having high wet etch rate |
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JP4700929B2 (ja) * | 2003-06-03 | 2011-06-15 | 信越化学工業株式会社 | 反射防止膜材料、これを用いた反射防止膜及びパターン形成方法 |
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DE10356668B4 (de) * | 2003-12-04 | 2005-11-03 | Infineon Technologies Ag | Herstellungsverfahren für eine Hartmaske auf einer Halbleiterstruktur |
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DE602005011394D1 (de) * | 2004-12-22 | 2009-01-15 | Rohm & Haas Elect Mat | Optische Trockenfilme und Verfahren zur Herstellung optischer Vorrichtungen mit Trockenfilmen |
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KR101366792B1 (ko) | 2005-05-24 | 2014-02-25 | 닛산 가가쿠 고교 가부시키 가이샤 | 폴리실란화합물을 포함하는 리소그래피용 하층막 형성 조성물 |
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-
1999
- 1999-06-11 US US09/330,417 patent/US6890448B2/en not_active Expired - Lifetime
-
2000
- 2000-06-06 EP EP20000304789 patent/EP1061560B1/de not_active Expired - Lifetime
- 2000-06-06 DE DE60045698T patent/DE60045698D1/de not_active Expired - Lifetime
- 2000-06-09 TW TW89111231A patent/TW466581B/zh not_active IP Right Cessation
- 2000-06-09 KR KR1020000031730A patent/KR100696399B1/ko active IP Right Grant
- 2000-06-12 JP JP2000174636A patent/JP4879384B2/ja not_active Expired - Lifetime
-
2003
- 2003-06-09 US US10/457,258 patent/US7018717B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR100696399B1 (ko) | 2007-03-20 |
US6890448B2 (en) | 2005-05-10 |
US7018717B2 (en) | 2006-03-28 |
TW466581B (en) | 2001-12-01 |
EP1061560A3 (de) | 2001-10-04 |
EP1061560A2 (de) | 2000-12-20 |
US20030209515A1 (en) | 2003-11-13 |
KR20010007323A (ko) | 2001-01-26 |
JP2001053068A (ja) | 2001-02-23 |
JP4879384B2 (ja) | 2012-02-22 |
US20020195419A1 (en) | 2002-12-26 |
EP1061560B1 (de) | 2011-03-09 |
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