DE60105523D1 - Antireflektionsbeschichtungszusammensetzung - Google Patents

Antireflektionsbeschichtungszusammensetzung

Info

Publication number
DE60105523D1
DE60105523D1 DE60105523T DE60105523T DE60105523D1 DE 60105523 D1 DE60105523 D1 DE 60105523D1 DE 60105523 T DE60105523 T DE 60105523T DE 60105523 T DE60105523 T DE 60105523T DE 60105523 D1 DE60105523 D1 DE 60105523D1
Authority
DE
Germany
Prior art keywords
coating composition
reflective coating
reflective
composition
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60105523T
Other languages
English (en)
Other versions
DE60105523T2 (de
Inventor
Kazuo Kawaguchi
Masato Tanaka
Tsutomu Shimokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Publication of DE60105523D1 publication Critical patent/DE60105523D1/de
Application granted granted Critical
Publication of DE60105523T2 publication Critical patent/DE60105523T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60105523T 2000-11-14 2001-11-13 Antireflektionsbeschichtungszusammensetzung Expired - Lifetime DE60105523T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000347188 2000-11-14
JP2000347188 2000-11-14

Publications (2)

Publication Number Publication Date
DE60105523D1 true DE60105523D1 (de) 2004-10-21
DE60105523T2 DE60105523T2 (de) 2005-09-29

Family

ID=18820959

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60105523T Expired - Lifetime DE60105523T2 (de) 2000-11-14 2001-11-13 Antireflektionsbeschichtungszusammensetzung

Country Status (5)

Country Link
US (1) US6852791B2 (de)
EP (1) EP1205805B1 (de)
KR (1) KR100772303B1 (de)
DE (1) DE60105523T2 (de)
TW (1) TWI278496B (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3894477B2 (ja) * 2002-02-27 2007-03-22 Ａｚエレクトロニックマテリアルズ株式会社 感光性樹脂組成物
TWI317365B (en) 2002-07-31 2009-11-21 Jsr Corp Acenaphthylene derivative, polymer, and antireflection film-forming composition
JP4105036B2 (ja) * 2003-05-28 2008-06-18 信越化学工業株式会社 レジスト下層膜材料ならびにパターン形成方法
JP4069025B2 (ja) * 2003-06-18 2008-03-26 信越化学工業株式会社 レジスト下層膜材料ならびにパターン形成方法
TWI360565B (en) * 2003-07-09 2012-03-21 Toray Industries Photosensitive resin precursor composition
US7303855B2 (en) * 2003-10-03 2007-12-04 Shin-Etsu Chemical Co., Ltd. Photoresist undercoat-forming material and patterning process
US7427464B2 (en) * 2004-06-22 2008-09-23 Shin-Etsu Chemical Co., Ltd. Patterning process and undercoat-forming material
KR100971842B1 (ko) * 2004-07-15 2010-07-22 신에쓰 가가꾸 고교 가부시끼가이샤 포토레지스트 하층막 형성 재료 및 패턴 형성 방법
TWI288827B (en) * 2004-08-31 2007-10-21 Ind Tech Res Inst Three-dimensional nano-porous film and fabrication method thereof
TWI323728B (en) * 2004-08-31 2010-04-21 Ind Tech Res Inst Polymer film with three-dimensional nanopores and fabrication method thereof
JP2006154570A (ja) * 2004-11-30 2006-06-15 Tokyo Ohka Kogyo Co Ltd レジストパターンおよび導体パターンの製造方法
EP1691238A3 (de) * 2005-02-05 2009-01-21 Rohm and Haas Electronic Materials, L.L.C. Beschichtungszusammensetzungen zur Verwendung mit einem beschichteten Fotolack
TWI338816B (en) * 2005-03-11 2011-03-11 Shinetsu Chemical Co Photoresist undercoat-forming material and patterning process
JP4575220B2 (ja) * 2005-04-14 2010-11-04 信越化学工業株式会社 レジスト下層膜材料およびパターン形成方法
JP4666166B2 (ja) * 2005-11-28 2011-04-06 信越化学工業株式会社 レジスト下層膜材料及びパターン形成方法
JP4662063B2 (ja) * 2006-05-25 2011-03-30 信越化学工業株式会社 フォトレジスト下層膜形成材料及びパターン形成方法
KR100833212B1 (ko) 2006-12-01 2008-05-28 제일모직주식회사 반사방지 하드마스크 조성물
WO2007139268A1 (en) * 2006-05-30 2007-12-06 Cheil Industries Inc. Antireflective hardmask composition
KR100826103B1 (ko) * 2006-05-30 2008-04-29 제일모직주식회사 반사방지 하드마스크 조성물
US7816069B2 (en) * 2006-06-23 2010-10-19 International Business Machines Corporation Graded spin-on organic antireflective coating for photolithography
KR100865684B1 (ko) * 2006-12-21 2008-10-29 제일모직주식회사 고 내에칭성 반사방지 하드마스크 조성물, 패턴화된 재료형상의　제조방법 및 그 제조방법으로 제조되는 반도체집적회로 디바이스
KR100955567B1 (ko) * 2007-07-12 2010-04-30 주식회사 엘지화학 복합층, 이를 포함하는 복합필름 및 전자소자
KR20090035970A (ko) * 2007-10-08 2009-04-13 주식회사 동진쎄미켐 고 굴절률을 갖는 유기반사방지막 형성용 중합체 및 이를포함하는 조성물
KR101397354B1 (ko) 2007-12-07 2014-05-19 미츠비시 가스 가가쿠 가부시키가이샤 리소그라피용 하층막 형성 조성물 및 다층 레지스트 패턴 형성 방법
JP5336306B2 (ja) 2008-10-20 2013-11-06 信越化学工業株式会社 レジスト下層膜形成方法、これを用いたパターン形成方法、及びレジスト下層膜材料
TWI400575B (zh) * 2008-10-28 2013-07-01 Shinetsu Chemical Co 光阻劑下層膜形成材料及圖案形成方法
KR101344794B1 (ko) 2009-12-31 2014-01-16 제일모직주식회사 레지스트 하층막용 방향족 고리 함유 중합체　및　이를 포함하는 레지스트 하층막 조성물
JP5229278B2 (ja) 2010-06-21 2013-07-03 信越化学工業株式会社 ナフタレン誘導体、レジスト下層膜材料、レジスト下層膜形成方法及びパターン形成方法
JP5556773B2 (ja) 2010-09-10 2014-07-23 信越化学工業株式会社 ナフタレン誘導体及びその製造方法、レジスト下層膜材料、レジスト下層膜形成方法及びパターン形成方法
JP5598489B2 (ja) 2011-03-28 2014-10-01 信越化学工業株式会社 ビフェニル誘導体、レジスト下層膜材料、レジスト下層膜形成方法及びパターン形成方法
JP5653880B2 (ja) 2011-10-11 2015-01-14 信越化学工業株式会社 レジスト下層膜形成材料及びパターン形成方法
CN115873176B (zh) * 2021-09-28 2023-09-26 上海新阳半导体材料股份有限公司 一种duv光刻用底部抗反射涂层及其制备方法和应用

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0612452B2 (ja) 1982-09-30 1994-02-16 ブリュ−ワ−・サイエンス・インコ−ポレイテッド 集積回路素子の製造方法
JP2694097B2 (ja) * 1992-03-03 1997-12-24 インターナショナル・ビジネス・マシーンズ・コーポレイション 反射防止コーティング組成物
JP3928278B2 (ja) * 1998-11-16 2007-06-13 Ｊｓｒ株式会社 反射防止膜形成組成物
JP4288776B2 (ja) * 1999-08-03 2009-07-01 Ｊｓｒ株式会社 反射防止膜形成組成物
JP2001192539A (ja) * 2000-01-13 2001-07-17 Jsr Corp 熱硬化性樹脂組成物、その硬化物およびその硬化物を含む回路基板

Also Published As

Publication number Publication date
US20020086934A1 (en) 2002-07-04
KR20020037442A (ko) 2002-05-21
EP1205805B1 (de) 2004-09-15
TWI278496B (en) 2007-04-11
EP1205805A1 (de) 2002-05-15
KR100772303B1 (ko) 2007-11-02
DE60105523T2 (de) 2005-09-29
US6852791B2 (en) 2005-02-08

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