DE102006062029B4 - Verfahren zum Herstellen einer Halbleitervorrichtung - Google Patents

Verfahren zum Herstellen einer Halbleitervorrichtung Download PDF

Info

Publication number
DE102006062029B4
DE102006062029B4 DE102006062029A DE102006062029A DE102006062029B4 DE 102006062029 B4 DE102006062029 B4 DE 102006062029B4 DE 102006062029 A DE102006062029 A DE 102006062029A DE 102006062029 A DE102006062029 A DE 102006062029A DE 102006062029 B4 DE102006062029 B4 DE 102006062029B4
Authority
DE
Germany
Prior art keywords
metal layer
semiconductor wafer
thermal treatment
layer
back surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE102006062029A
Other languages
German (de)
English (en)
Other versions
DE102006062029A1 (de
Inventor
Tamio Matsumura
Tadashi Asagiri Tsujino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of DE102006062029A1 publication Critical patent/DE102006062029A1/de
Application granted granted Critical
Publication of DE102006062029B4 publication Critical patent/DE102006062029B4/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00—Bipolar junction transistors [BJT]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H10D64/0111—Manufacture or treatment of electrodes ohmically coupled to a semiconductor to Group IV semiconductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/30—Devices controlled by electric currents or voltages
    • H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H10D48/34—Bipolar devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/013—Manufacture or treatment of die-attach connectors
    • H10W72/01331—Manufacture or treatment of die-attach connectors using blanket deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/013—Manufacture or treatment of die-attach connectors
    • H10W72/01361—Chemical or physical modification, e.g. by sintering or anodisation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/073—Connecting or disconnecting of die-attach connectors
    • H10W72/07331—Connecting techniques
    • H10W72/07336—Soldering or alloying
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/59—Bond pads specially adapted therefor

Landscapes

  • Electrodes Of Semiconductors (AREA)
DE102006062029A 2006-01-23 2006-12-29 Verfahren zum Herstellen einer Halbleitervorrichtung Active DE102006062029B4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-013349 2006-01-23
JP2006013349A JP2007194514A (ja) 2006-01-23 2006-01-23 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
DE102006062029A1 DE102006062029A1 (de) 2007-08-09
DE102006062029B4 true DE102006062029B4 (de) 2010-04-08

Family

ID=38282344

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102006062029A Active DE102006062029B4 (de) 2006-01-23 2006-12-29 Verfahren zum Herstellen einer Halbleitervorrichtung

Country Status (7)

Country Link
US (1) US8183144B2 (https=)
JP (1) JP2007194514A (https=)
KR (1) KR100823648B1 (https=)
CN (1) CN100524632C (https=)
AT (1) AT503190B1 (https=)
DE (1) DE102006062029B4 (https=)
TW (1) TW200737382A (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4221012B2 (ja) * 2006-06-12 2009-02-12 トヨタ自動車株式会社 半導体装置とその製造方法
WO2009141740A2 (en) * 2008-05-23 2009-11-26 Florian Bieck Semiconductor wafer and method for producing the same
JP2010021171A (ja) * 2008-07-08 2010-01-28 Renesas Technology Corp 半導体装置の製造方法およびそれに用いる半導体製造装置
JPWO2010109572A1 (ja) * 2009-03-23 2012-09-20 トヨタ自動車株式会社 半導体装置
JP5545000B2 (ja) * 2010-04-14 2014-07-09 富士電機株式会社 半導体装置の製造方法
JP2012248572A (ja) * 2011-05-25 2012-12-13 Mitsubishi Electric Corp 半導体装置および半導体装置の製造方法
KR101923127B1 (ko) * 2011-09-08 2018-11-28 후지 덴키 가부시키가이샤 반도체 장치 및 반도체 장치의 제조방법
JP6289104B2 (ja) * 2014-01-08 2018-03-07 日東電工株式会社 フィルム状接着剤、フィルム状接着剤付きダイシングテープ、半導体装置の製造方法、及び半導体装置
CN108352298B (zh) * 2015-11-09 2023-04-18 应用材料公司 底部处理
JP2023073724A (ja) * 2021-11-16 2023-05-26 株式会社フルヤ金属 半導体デバイス及びそれに用いる酸化防止用金属材料並びに該金属材料のスパッタリングターゲット及び蒸着源

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1149606A (en) * 1967-02-27 1969-04-23 Motorola Inc Mounting for a semiconductor wafer which is resistant to fatigue caused by thermal stresses
EP0121605A2 (de) * 1983-01-20 1984-10-17 BROWN, BOVERI & CIE Aktiengesellschaft Verfahren zur Herstellung einer mehrschichtigen Kontaktmetallisierung auf einem Silizium-Halbleiterbauelement
DD277602A3 (de) * 1987-12-21 1990-04-11 Akad Wissenschaften Ddr Verfahren zur Herstellung eines weichlötfähigen Mehrschichtkontaktsystems für Halbleiterbauelemente
US5731635A (en) * 1995-07-27 1998-03-24 U.S. Philips Corporation Semiconductor device having a carrier and a multilayer metallization
US6309965B1 (en) * 1997-08-08 2001-10-30 Siemens Aktiengesellschaft Method of producing a semiconductor body with metallization on the back side that includes a titanium nitride layer to reduce warping

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5950090B2 (ja) * 1977-07-07 1984-12-06 三菱電機株式会社 半導体装置の製造方法
JPS55111140A (en) * 1979-02-20 1980-08-27 Nec Corp Metalizing method for back surface of silicon wafer
JPS58106825A (ja) * 1981-12-18 1983-06-25 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
DE3823347A1 (de) 1988-07-09 1990-01-11 Semikron Elektronik Gmbh Leistungs-halbleiterelement
US5342793A (en) * 1990-02-20 1994-08-30 Sgs-Thomson Microelectronics, S.R.L. Process for obtaining multi-layer metallization of the back of a semiconductor substrate
JPH0472764A (ja) 1990-07-13 1992-03-06 Sharp Corp 半導体装置の裏面電極
JP3127494B2 (ja) * 1991-07-17 2001-01-22 株式会社デンソー 半導体装置の電極形成方法
DE69223868T2 (de) 1991-07-17 1998-09-03 Denso Corp Verfahren zur Herstellung von Elektroden eines Halbleiterbauelements
KR930017092A (ko) * 1992-01-15 1993-08-30 김광호 반도체장치 및 그 제조방법
JPH0637301A (ja) * 1992-07-20 1994-02-10 Toyota Motor Corp 半導体装置及びその製造方法
US5924002A (en) * 1994-12-22 1999-07-13 Sony Corporation Method of manufacturing a semiconductor device having ohmic electrode
US6140703A (en) * 1996-08-05 2000-10-31 Motorola, Inc. Semiconductor metallization structure
KR100365436B1 (ko) * 1998-12-15 2003-04-10 주식회사 하이닉스반도체 반도체장치의배리어층형성방법
JP3960739B2 (ja) 2000-07-11 2007-08-15 シャープ株式会社 半導体装置とその製造方法
KR100724143B1 (ko) * 2001-01-17 2007-06-04 매그나칩 반도체 유한회사 반도체장치의 배리어층 형성방법
JP2003059860A (ja) * 2001-08-13 2003-02-28 Mitsubishi Electric Corp 半導体装置
JP2003282845A (ja) * 2002-03-20 2003-10-03 Mitsubishi Electric Corp 炭化ケイ素基板の製造方法およびその製造方法により製造された炭化ケイ素基板、ならびに、ショットキーバリアダイオードおよび炭化ケイ素薄膜の製造方法
JP2003338620A (ja) * 2002-05-22 2003-11-28 Mitsubishi Electric Corp 半導体装置およびその製造方法
CN100454492C (zh) 2002-06-13 2009-01-21 衡阳科晶微电子有限公司 共晶焊背面金属化工艺
JP2004153081A (ja) * 2002-10-31 2004-05-27 Shin Etsu Handotai Co Ltd Ｓｏｉウエーハ及びｓｏｉウエーハの製造方法
KR100477396B1 (ko) * 2002-09-04 2005-03-28 한국전기연구원 금속 게이트 전극을 갖는 탄화규소 모스펫 소자 및 그제조방법
AU2003275614A1 (en) * 2002-10-30 2004-05-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing semiconductor device
TWI247576B (en) * 2003-03-28 2006-01-11 Hon Hai Prec Ind Co Ltd Method of manufacturing electromagnetic interference shield
JP4049035B2 (ja) * 2003-06-27 2008-02-20 株式会社デンソー 半導体装置の製造方法
JP3767585B2 (ja) 2003-07-11 2006-04-19 株式会社デンソー 半導体装置
US7214620B2 (en) * 2003-10-28 2007-05-08 Samsung Electronics Co., Ltd. Methods of forming silicide films with metal films in semiconductor devices and contacts including the same
JP4792694B2 (ja) * 2003-11-13 2011-10-12 セイコーエプソン株式会社 電気光学装置用基板の製造方法、電気光学装置用基板、電気光学装置、電子機器
US20050268963A1 (en) * 2004-02-24 2005-12-08 David Jordan Process for manufacturing photovoltaic cells
JP4788390B2 (ja) * 2005-06-07 2011-10-05 株式会社デンソー 半導体装置の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1149606A (en) * 1967-02-27 1969-04-23 Motorola Inc Mounting for a semiconductor wafer which is resistant to fatigue caused by thermal stresses
EP0121605A2 (de) * 1983-01-20 1984-10-17 BROWN, BOVERI & CIE Aktiengesellschaft Verfahren zur Herstellung einer mehrschichtigen Kontaktmetallisierung auf einem Silizium-Halbleiterbauelement
DD277602A3 (de) * 1987-12-21 1990-04-11 Akad Wissenschaften Ddr Verfahren zur Herstellung eines weichlötfähigen Mehrschichtkontaktsystems für Halbleiterbauelemente
US5731635A (en) * 1995-07-27 1998-03-24 U.S. Philips Corporation Semiconductor device having a carrier and a multilayer metallization
US6309965B1 (en) * 1997-08-08 2001-10-30 Siemens Aktiengesellschaft Method of producing a semiconductor body with metallization on the back side that includes a titanium nitride layer to reduce warping

Also Published As

Publication number Publication date
CN101009221A (zh) 2007-08-01
AT503190A2 (de) 2007-08-15
AT503190B1 (de) 2010-03-15
US20070173045A1 (en) 2007-07-26
KR20070077450A (ko) 2007-07-26
AT503190A3 (de) 2008-05-15
KR100823648B1 (ko) 2008-04-21
CN100524632C (zh) 2009-08-05
DE102006062029A1 (de) 2007-08-09
US8183144B2 (en) 2012-05-22
JP2007194514A (ja) 2007-08-02
TW200737382A (en) 2007-10-01

Similar Documents

Publication Publication Date Title
DE69016626T2 (de) Direktverbundene Struktur.
AT503190B1 (de) Verfahren zur herstellung einer halbleitervorrichtung
DE10125323A1 (de) Elektronische Komponente, Verfahren zur Herstellung einer elektronischen Komponente sowie Leiterplatte
EP0950261B1 (de) Halbleiterkörper mit rückseitenmetallisierung
EP0024572A2 (de) Elektrisch leitender Kontakt- oder Metallisierungsaufbau für Halbleitersubstrate
DE112018000876T5 (de) Halbleiterelement und verfahren zur herstellung desselben
DE102012111654A1 (de) Elektronisches Bauelement und ein Verfahren zur Herstellung eines elektronischen Bauelements
DE1071847B (de) Verfahren zur Herstellung einer im wesentlichen nicht gleichrichtenden flächenhaften Elektrode an dem Halbleiterkörper einer Halbleiteranordnung durch Legierung
DE112018003432T5 (de) Halbleitervorrichtung und verfahren zur herstellung vonhalbleiterbauelementen
DE102017113515B4 (de) Verfahren zum Bilden eines elektrisch leitfähigen Kontakts und elektronische Vorrichtung
DE102012216546B4 (de) Verfahren zum verlöten eines halbleiterchips mit einem träger
DE69023745T2 (de) Oberflächenstruktur eines Keramiksubstrates und Verfahren zu deren Herstellung.
DE10350707B4 (de) Elektrischer Kontakt für optoelektronischen Halbleiterchip und Verfahren zu dessen Herstellung
DE1816748C3 (de) Halbleiteranordnung und Verfahren zu ihrer Herstellung
WO2008080467A1 (de) Anschlussdraht, verfahren zur herstellung eines solchen und baugruppe
DE102014103293B4 (de) Halbleitervorrichtung und Herstellungsverfahren dafür
DE69215956T2 (de) Verfahren zum Herstellen eines Kontakts auf einem Halbleiterbauelement
DE112016007388B4 (de) Halbleitervorrichtung und Verfahren zum Herstellen einer Halbleitervorrichtung
DE102007034651B4 (de) Halbleiterbauelement und Verfahren zu dessen Herstellung
DE102007029829A1 (de) Halbleiterbauelement mit einem ohmschen Kontakt
EP2517239B1 (de) Verfahren zur herstellung eines elektronischen bauteils und nach diesem verfahren hergestelltes elektronisches bauteil
DE19954319C1 (de) Verfahren zum Herstellen von mehrschichtigen Kontaktelektroden für Verbindungshalbeiter und Anordnung
DE102008043361A1 (de) Anschlussdraht und Verfahren zur Herstellung eines solchen
DE112020001854T5 (de) Halbleiterbauelement und Verfahren zu dessen Herstellung
CH648692A5 (en) Contact arrangement on a semiconductor component

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8364 No opposition during term of opposition
R084 Declaration of willingness to licence
R079 Amendment of ipc main class

Free format text: PREVIOUS MAIN CLASS: H01L0021283000

Ipc: H10D0064010000