CN102646698B - 半导体装置及电子设备 - Google Patents

半导体装置及电子设备 Download PDF

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Publication number
CN102646698B
CN102646698B CN201210130042.8A CN201210130042A CN102646698B CN 102646698 B CN102646698 B CN 102646698B CN 201210130042 A CN201210130042 A CN 201210130042A CN 102646698 B CN102646698 B CN 102646698B
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China
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layer
substrate
equal
semiconductor layer
semiconductor
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Expired - Fee Related
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CN201210130042.8A
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English (en)
Chinese (zh)
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CN102646698A (zh
Inventor
大沼英人
饭洼阳一
山本孔明
牧野贤一郎
下村明久
比嘉荣二
沟井达也
永野庸治
井坂史人
挂端哲弥
山崎舜平
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/674—Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6741—Group IV materials, e.g. germanium or silicon carbide
    • H10D30/6743—Silicon
    • H10D30/6744—Monocrystalline silicon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/031—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT]
    • H10D30/0321—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT] comprising silicon, e.g. amorphous silicon or polysilicon
    • H10D30/0323—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT] comprising silicon, e.g. amorphous silicon or polysilicon comprising monocrystalline silicon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
    • H10D30/6737—Thin-film transistors [TFT] characterised by the electrodes characterised by the electrode materials
    • H10D30/6739—Conductor-insulator-semiconductor electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6758—Thin-film transistors [TFT] characterised by the insulating substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/50—Physical imperfections
    • H10D62/57—Physical imperfections the imperfections being on the surface of the semiconductor body, e.g. the body having a roughened surface
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/021—Manufacture or treatment of multiple TFTs
    • H10D86/0214—Manufacture or treatment of multiple TFTs using temporary substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/19—Preparing inhomogeneous wafers
    • H10P90/1904—Preparing vertically inhomogeneous wafers
    • H10P90/1906—Preparing SOI wafers
    • H10P90/1914—Preparing SOI wafers using bonding
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/19—Preparing inhomogeneous wafers
    • H10P90/1904—Preparing vertically inhomogeneous wafers
    • H10P90/1906—Preparing SOI wafers
    • H10P90/1914—Preparing SOI wafers using bonding
    • H10P90/1916—Preparing SOI wafers using bonding with separation or delamination along an ion implanted layer, e.g. Smart-cut
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/10—Isolation regions comprising dielectric materials
    • H10W10/181—Semiconductor-on-insulator [SOI] isolation regions, e.g. buried oxide regions of SOI wafers

Landscapes

  • Thin Film Transistor (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
  • Element Separation (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Recrystallisation Techniques (AREA)
CN201210130042.8A 2007-09-14 2008-09-05 半导体装置及电子设备 Expired - Fee Related CN102646698B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007-240219 2007-09-14
JP2007240219 2007-09-14
CN2008801065237A CN101796613B (zh) 2007-09-14 2008-09-05 半导体装置及电子设备

Related Parent Applications (1)

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CN2008801065237A Division CN101796613B (zh) 2007-09-14 2008-09-05 半导体装置及电子设备

Publications (2)

Publication Number Publication Date
CN102646698A CN102646698A (zh) 2012-08-22
CN102646698B true CN102646698B (zh) 2015-09-16

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CN2008801065237A Expired - Fee Related CN101796613B (zh) 2007-09-14 2008-09-05 半导体装置及电子设备

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Country Status (6)

Country Link
US (1) US20090072343A1 (enExample)
JP (1) JP5577027B2 (enExample)
KR (1) KR20100065145A (enExample)
CN (2) CN102646698B (enExample)
TW (1) TWI469330B (enExample)
WO (1) WO2009035063A1 (enExample)

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JP5548351B2 (ja) * 2007-11-01 2014-07-16 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP5688203B2 (ja) * 2007-11-01 2015-03-25 株式会社半導体エネルギー研究所 半導体基板の作製方法
US8513090B2 (en) * 2009-07-16 2013-08-20 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor substrate, and semiconductor device
JP5549167B2 (ja) * 2009-09-18 2014-07-16 住友電気工業株式会社 Ｓａｗデバイス
WO2011034136A1 (ja) * 2009-09-18 2011-03-24 住友電気工業株式会社 基板、基板の製造方法、ｓａｗデバイスおよびデバイス
FR2952224B1 (fr) 2009-10-30 2012-04-20 Soitec Silicon On Insulator Procede de controle de la repartition des contraintes dans une structure de type semi-conducteur sur isolant et structure correspondante.
CN110718557B (zh) 2010-03-08 2023-12-26 株式会社半导体能源研究所 半导体装置及半导体装置的制造方法
KR101845480B1 (ko) 2010-06-25 2018-04-04 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치의 제작 방법
WO2012033125A1 (ja) 2010-09-07 2012-03-15 住友電気工業株式会社 基板、基板の製造方法およびｓａｗデバイス
US8987728B2 (en) 2011-03-25 2015-03-24 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of manufacturing semiconductor device
CN105931967B (zh) 2011-04-27 2019-05-03 株式会社半导体能源研究所 半导体装置的制造方法
WO2013057771A1 (ja) * 2011-10-21 2013-04-25 株式会社島津製作所 薄膜トランジスタの製造方法
JPWO2013057771A1 (ja) * 2011-10-21 2015-04-02 株式会社島津製作所 薄膜トランジスタの製造方法
FR2985369B1 (fr) * 2011-12-29 2014-01-10 Commissariat Energie Atomique Procede de fabrication d'une structure multicouche sur un support
CN103295878B (zh) * 2012-02-27 2016-05-25 中芯国际集成电路制造(上海)有限公司 一种多层纳米线结构的制造方法
JP6340205B2 (ja) * 2014-02-20 2018-06-06 株式会社荏原製作所 研磨パッドのコンディショニング方法及び装置
JP2015233130A (ja) 2014-05-16 2015-12-24 株式会社半導体エネルギー研究所 半導体基板および半導体装置の作製方法
CN114655953B (zh) * 2014-08-08 2024-07-23 住友电气工业株式会社 制造金刚石的方法、金刚石、金刚石复合基板、金刚石接合基板和工具
JP6822146B2 (ja) * 2015-01-16 2021-01-27 住友電気工業株式会社 半導体基板の製造方法及び複合半導体基板の製造方法
CN106249947B (zh) * 2016-07-22 2019-04-19 京东方科技集团股份有限公司 一种基板及显示装置
FR3062398B1 (fr) * 2017-02-02 2021-07-30 Soitec Silicon On Insulator Procede de fabrication d'un substrat pour la croissance d'un film bidimensionnel de structure cristalline hexagonale
CN112272920B (zh) * 2018-06-22 2021-11-16 日本碍子株式会社 接合体及弹性波元件
US10553474B1 (en) 2018-08-29 2020-02-04 Taiwan Semiconductor Manufacturing Co., Ltd. Method for forming a semiconductor-on-insulator (SOI) substrate
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Publication number Publication date
WO2009035063A1 (en) 2009-03-19
TWI469330B (zh) 2015-01-11
TW200935594A (en) 2009-08-16
CN102646698A (zh) 2012-08-22
CN101796613B (zh) 2012-06-27
KR20100065145A (ko) 2010-06-15
JP2009088497A (ja) 2009-04-23
CN101796613A (zh) 2010-08-04
US20090072343A1 (en) 2009-03-19
JP5577027B2 (ja) 2014-08-20

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