CN102470660B - 制造围阻层的方法和材料以及由其制成的器件 - Google Patents

制造围阻层的方法和材料以及由其制成的器件 Download PDF

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Publication number
CN102470660B
CN102470660B CN200980160534.8A CN200980160534A CN102470660B CN 102470660 B CN102470660 B CN 102470660B CN 200980160534 A CN200980160534 A CN 200980160534A CN 102470660 B CN102470660 B CN 102470660B
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Prior art keywords
layer
priming coat
exposed region
organic active
pattern
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CN200980160534.8A
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Chinese (zh)
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CN102470660A (zh
Inventor
A·费尼莫尔
J·M·兹芭斯
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LG Chem Ltd
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EI Du Pont de Nemours and Co
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/02—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by a sequence of laminating steps, e.g. by adding new layers at consecutive laminating stations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/0076—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised in that the layers are not bonded on the totality of their surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/0076—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised in that the layers are not bonded on the totality of their surfaces
    • B32B37/0084—Point bonding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
    • B32B37/1284—Application of adhesive
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
    • B32B37/1284—Application of adhesive
    • B32B37/1292—Application of adhesive selectively, e.g. in stripes, in patterns
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B32B38/08—Impregnating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00—Ancillary operations in connection with laminating processes
    • B32B38/14—Printing or colouring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B39/00—Layout of apparatus or plants, e.g. modular laminating systems
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/191—Deposition of organic active material characterised by provisions for the orientation or alignment of the layer to be deposited
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
CN200980160534.8A 2009-07-27 2009-12-21 制造围阻层的方法和材料以及由其制成的器件 Active CN102470660B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US22868909P 2009-07-27 2009-07-27
US61/228,689 2009-07-27
PCT/US2009/068918 WO2011014216A1 (en) 2009-07-27 2009-12-21 Process and materials for making contained layers and devices made with same

Publications (2)

Publication Number Publication Date
CN102470660A CN102470660A (zh) 2012-05-23
CN102470660B true CN102470660B (zh) 2014-11-19

Family

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CN200980160534.8A Active CN102470660B (zh) 2009-07-27 2009-12-21 制造围阻层的方法和材料以及由其制成的器件

Country Status (7)

Country Link
US (2) US8592239B2 (https=)
EP (1) EP2459379A4 (https=)
JP (1) JP5727478B2 (https=)
KR (1) KR101675176B1 (https=)
CN (1) CN102470660B (https=)
TW (1) TW201104357A (https=)
WO (1) WO2011014216A1 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201200975A (en) * 2010-06-17 2012-01-01 Du Pont Process and materials for making contained layers and devices made with same
EP2656411A1 (en) 2010-12-21 2013-10-30 E.I. Du Pont De Nemours And Company Liquid composition for deposition of organic electroactive materials
TW201238113A (en) * 2011-02-10 2012-09-16 Du Pont Process and materials for making contained layers and devices made with same
WO2013096543A1 (en) * 2011-12-20 2013-06-27 E. I. Du Pont De Nemours And Company Process and materials for making contained layers and devices made with same
KR101927848B1 (ko) * 2012-09-17 2018-12-12 삼성디스플레이 주식회사 유기전계발광 표시장치 및 이의 제조 방법
US20140131684A1 (en) * 2012-11-14 2014-05-15 E I Du Pont De Nemours And Company Electronic device having radiation-produced containment regions and processes for making same
JP6371304B2 (ja) * 2012-12-13 2018-08-08 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 閉じ込め層およびそれを使って製造されるデバイスを製造するための方法および材料
DE102014103751A1 (de) * 2014-03-19 2015-09-24 Osram Opto Semiconductors Gmbh Organisches strahlungsemittierendes Bauelement
KR102387145B1 (ko) 2015-05-22 2022-04-15 삼성디스플레이 주식회사 발광 표시 장치의 제조 방법 및 이를 이용한 발광 표시 장치
WO2018211460A1 (en) * 2017-05-17 2018-11-22 Oti Lumionics Inc. Method for selectively depositing a conductive coating over a patterning coating and device including a conductive coating
KR102525822B1 (ko) 2017-07-06 2023-04-26 삼성디스플레이 주식회사 표시 소자 및 그 제조 방법
KR102486552B1 (ko) 2018-01-15 2023-01-10 삼성디스플레이 주식회사 표시 장치 및 표시 장치의 제조 방법
CN110229312B (zh) * 2018-03-05 2022-03-25 北京大学深圳研究生院 一种黑色聚合物材料及其制备方法与应用
EP3570329B1 (en) 2018-05-14 2022-12-14 Samsung Display Co., Ltd. Display device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009055628A1 (en) * 2007-10-26 2009-04-30 E. I. Du Pont De Nemours And Company Process and materials for making contained layers and devices made with same

Family Cites Families (152)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3282875A (en) * 1964-07-22 1966-11-01 Du Pont Fluorocarbon vinyl ether polymers
US3720515A (en) * 1971-10-20 1973-03-13 Trw Inc Microelectronic circuit production
JPS5416203A (en) 1977-07-07 1979-02-06 Nippon Paint Co Ltd Dry making method of photosensitive resin plate
US4358545A (en) * 1980-06-11 1982-11-09 The Dow Chemical Company Sulfonic acid electrolytic cell having flourinated polymer membrane with hydration product less than 22,000
US4433082A (en) * 1981-05-01 1984-02-21 E. I. Du Pont De Nemours And Company Process for making liquid composition of perfluorinated ion exchange polymer, and product thereof
JPS63104683A (ja) 1986-10-21 1988-05-10 Nec Corp 樹脂膜の塗布方法
US4940525A (en) * 1987-05-08 1990-07-10 The Dow Chemical Company Low equivalent weight sulfonic fluoropolymers
US5061569A (en) * 1990-07-26 1991-10-29 Eastman Kodak Company Electroluminescent device with organic electroluminescent medium
US5463005A (en) * 1992-01-03 1995-10-31 Gas Research Institute Copolymers of tetrafluoroethylene and perfluorinated sulfonyl monomers and membranes made therefrom
US5435887A (en) * 1993-11-03 1995-07-25 Massachusetts Institute Of Technology Methods for the fabrication of microstructure arrays
US5392980A (en) * 1993-12-29 1995-02-28 Dell Usa, L.P. Method and apparatus for reworking ball grid array packages to allow reuse of functional devices
DE19500912A1 (de) * 1995-01-13 1996-07-18 Basf Ag Elektrolumineszierende Anordnung
US5929194A (en) * 1996-02-23 1999-07-27 The Dow Chemical Company Crosslinkable or chain extendable polyarylpolyamines and films thereof
US5728801A (en) * 1996-08-13 1998-03-17 The Dow Chemical Company Poly (arylamines) and films thereof
WO1998016581A1 (en) * 1996-10-15 1998-04-23 E.I. Du Pont De Nemours And Company Compositions containing particles of highly fluorinated ion exchange polymer
DE69808241T2 (de) 1997-01-22 2003-08-07 E.I. Du Pont De Nemours And Co., Wilmington Mit fluorverbindungen aufgepfropften polymerisaten
US6495624B1 (en) * 1997-02-03 2002-12-17 Cytonix Corporation Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same
DE69835366T2 (de) 1997-03-31 2007-07-19 Daikin Industries, Ltd. Verfahren zur herstellung von perfluorvinylethersulfonsäure-derivaten
US6309763B1 (en) * 1997-05-21 2001-10-30 The Dow Chemical Company Fluorene-containing polymers and electroluminescent devices therefrom
JP4413035B2 (ja) 1997-08-08 2010-02-10 大日本印刷株式会社 パターン形成体およびパターン形成方法
US6303238B1 (en) * 1997-12-01 2001-10-16 The Trustees Of Princeton University OLEDs doped with phosphorescent compounds
US6087196A (en) * 1998-01-30 2000-07-11 The Trustees Of Princeton University Fabrication of organic semiconductor devices using ink jet printing
US6100324A (en) 1998-04-16 2000-08-08 E. I. Du Pont De Nemours And Company Ionomers and ionically conductive compositions
US6736985B1 (en) * 1999-05-05 2004-05-18 Agere Systems Inc. High-resolution method for patterning a substrate with micro-printing
CN101312235B (zh) 1999-05-13 2010-06-09 普林斯顿大学理事会 基于电致磷光的极高效有机发光器件
JP3980801B2 (ja) * 1999-09-16 2007-09-26 株式会社東芝 三次元構造体およびその製造方法
JP4357781B2 (ja) 1999-12-01 2009-11-04 ザ、トラスティーズ オブ プリンストン ユニバーシティ 有機ｌｅｄ用燐光性ドーパントとしての式ｌ２ｍｘの錯体
US6821645B2 (en) * 1999-12-27 2004-11-23 Fuji Photo Film Co., Ltd. Light-emitting material comprising orthometalated iridium complex, light-emitting device, high efficiency red light-emitting device, and novel iridium complex
JP2001237069A (ja) * 2000-02-23 2001-08-31 Dainippon Printing Co Ltd Ｅｌ素子およびその製造方法
KR20010085420A (ko) 2000-02-23 2001-09-07 기타지마 요시토시 전계발광소자와 그 제조방법
TW472503B (en) * 2000-04-26 2002-01-11 Ritdisplay Corp Manufacture method of photosensitive polyimide pattern definition layer for organic light-emitting diodes display
US7074640B2 (en) * 2000-06-06 2006-07-11 Simon Fraser University Method of making barrier layers
US6670645B2 (en) * 2000-06-30 2003-12-30 E. I. Du Pont De Nemours And Company Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds
US20020121638A1 (en) 2000-06-30 2002-09-05 Vladimir Grushin Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds
JP5241053B2 (ja) 2000-08-11 2013-07-17 ザ、トラスティーズ オブ プリンストン ユニバーシティ 有機金属化合物及び放射移行有機電気燐光体
JP4154140B2 (ja) 2000-09-26 2008-09-24 キヤノン株式会社 金属配位化合物
JP4154139B2 (ja) 2000-09-26 2008-09-24 キヤノン株式会社 発光素子
US6579630B2 (en) * 2000-12-07 2003-06-17 Canon Kabushiki Kaisha Deuterated semiconducting organic compounds used for opto-electronic devices
KR100898304B1 (ko) * 2001-03-02 2009-05-19 더 트러스티즈 오브 프린스턴 유니버시티 이중 도우프층, 인광 유기 발광 디바이스
US6875523B2 (en) 2001-07-05 2005-04-05 E. I. Du Pont De Nemours And Company Photoactive lanthanide complexes with phosphine oxides, phosphine oxide-sulfides, pyridine N-oxides, and phosphine oxide-pyridine N-oxides, and devices made with such complexes
DE60214418T2 (de) 2001-07-13 2007-05-03 E.I. Du Pont De Nemours And Co., Wilmington Verfahren zur auflösung von hochfluorierten ionenaustauscherpolymeren
KR20040018467A (ko) 2001-07-18 2004-03-03 이 아이 듀폰 디 네모아 앤드 캄파니 이민 리간드와의 발광 란탄족 착물 및 이러한 착물을사용하여 제조된 장치
US6656611B2 (en) * 2001-07-20 2003-12-02 Osram Opto Semiconductors Gmbh Structure-defining material for OLEDs
EP1411088B1 (en) * 2001-07-26 2013-08-21 Nissan Chemical Industries, Ltd. Polyamic acid resin composition
DE10140196A1 (de) 2001-08-16 2003-03-13 Bosch Gmbh Robert Hülsenförmiger Hohlkörper für ein Piezoaktormodul sowie Verfahren zu dessen Herstellung
US20060159838A1 (en) * 2005-01-14 2006-07-20 Cabot Corporation Controlling ink migration during the formation of printable electronic features
JP2003123967A (ja) 2001-10-10 2003-04-25 Matsushita Electric Ind Co Ltd 発光素子の製造方法
KR100577179B1 (ko) * 2001-10-30 2006-05-10 엘지전자 주식회사 유기 전계 발광 소자
US7166368B2 (en) 2001-11-07 2007-01-23 E. I. Du Pont De Nemours And Company Electroluminescent platinum compounds and devices made with such compounds
WO2003046225A1 (en) * 2001-11-26 2003-06-05 Mitokor Mitochondrial dna polymorphisms
JP4231645B2 (ja) * 2001-12-12 2009-03-04 大日本印刷株式会社 パターン形成体の製造方法
CA2455844A1 (en) 2001-12-26 2003-07-31 Viacheslav A. Petrov Electroluminescent iridium compounds wiht fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds
US6852249B2 (en) * 2002-01-24 2005-02-08 Academia Sinica Prismatic supramolecules
JP4363050B2 (ja) 2002-01-31 2009-11-11 住友化学株式会社 有機エレクトロルミネッセンス素子
US20040202863A1 (en) * 2002-02-26 2004-10-14 Konica Corporation Coating method, coated product and ink jet recording medium
US6955773B2 (en) * 2002-02-28 2005-10-18 E.I. Du Pont De Nemours And Company Polymer buffer layers and their use in light-emitting diodes
GB0207134D0 (en) * 2002-03-27 2002-05-08 Cambridge Display Tech Ltd Method of preparation of organic optoelectronic and electronic devices and devices thereby obtained
JP3917461B2 (ja) 2002-05-21 2007-05-23 株式会社東芝 有機ｅｌ正孔注入層用インクおよびその製造方法、有機ｅｌ表示装置の製造方法、ならびに有機ｅｌ表示装置
KR100946005B1 (ko) * 2002-05-10 2010-03-09 캠브리지 디스플레이 테크놀로지 리미티드 중합체, 그의 제조 및 용도
JP2004047176A (ja) 2002-07-09 2004-02-12 Sharp Corp 有機エレクトロルミネッセンス素子
TW200404054A (en) * 2002-07-26 2004-03-16 Wako Pure Chem Ind Ltd Method for deuteration of aromatic ring
JP4092261B2 (ja) * 2002-08-02 2008-05-28 三星エスディアイ株式会社 基板の製造方法及び有機エレクトロルミネッセンス素子の製造方法
JP4165692B2 (ja) * 2002-08-05 2008-10-15 大日本印刷株式会社 エレクトロルミネッセント素子の製造方法
US6963005B2 (en) 2002-08-15 2005-11-08 E. I. Du Pont De Nemours And Company Compounds comprising phosphorus-containing metal complexes
TWI280973B (en) * 2002-08-28 2007-05-11 Sumitomo Chemical Co Polymer compound and polymer light-emitting device using the same
US7098060B2 (en) * 2002-09-06 2006-08-29 E.I. Du Pont De Nemours And Company Methods for producing full-color organic electroluminescent devices
WO2004029128A2 (en) * 2002-09-24 2004-04-08 E.I. Du Pont De Nemours And Company Water dispersible polythiophenes made with polymeric acid colloids
CA2499364A1 (en) * 2002-09-24 2004-04-08 E. I. Du Pont De Nemours And Company Water dispersible polyanilines made with polymeric acid colloids for electronics applications
EP1560068B1 (en) * 2002-11-06 2008-01-23 Asahi Glass Company Ltd. Barrier rib and its method of preparation
CN1978586A (zh) * 2002-11-12 2007-06-13 出光兴产株式会社 用于有机电致发光器件的材料和使用该材料的有机电致发光器件
JP2004177793A (ja) 2002-11-28 2004-06-24 Seiko Epson Corp 微細構造物の製造方法およびこの微細構造物の製造方法を用いて製造された自発光素子、光学素子、デバイス並びにこのデバイスを備えた電子機器
US6872475B2 (en) * 2002-12-03 2005-03-29 Canon Kabushiki Kaisha Binaphthalene derivatives for organic electro-luminescent devices
JP2004235128A (ja) * 2002-12-04 2004-08-19 Dainippon Printing Co Ltd 有機ｅｌ素子およびその製造方法
JP2004234901A (ja) * 2003-01-28 2004-08-19 Seiko Epson Corp ディスプレイ基板、有機ｅｌ表示装置、ディスプレイ基板の製造方法および電子機器
US7651788B2 (en) 2003-03-05 2010-01-26 Lg Display Co., Ltd. Organic electroluminescent device
EP1464691B1 (en) * 2003-03-26 2013-10-02 Konica Minolta Holdings, Inc. Organic electroluminescent element, illuminator, and display
US7390438B2 (en) * 2003-04-22 2008-06-24 E.I. Du Pont De Nemours And Company Water dispersible substituted polydioxythiophenes made with fluorinated polymeric sulfonic acid colloids
US7098525B2 (en) * 2003-05-08 2006-08-29 3M Innovative Properties Company Organic polymers, electronic devices, and methods
JP4487587B2 (ja) * 2003-05-27 2010-06-23 株式会社デンソー 有機ｅｌ素子およびその製造方法
JP2004355949A (ja) 2003-05-29 2004-12-16 Tdk Corp 有機ｅｌ表示体の製造方法および有機ｅｌ製造装置
CN1574214A (zh) * 2003-06-03 2005-02-02 国际商业机器公司 用于制造电子器件的基于熔化的图案化工艺
JP3848307B2 (ja) * 2003-06-27 2006-11-22 キヤノン株式会社 アミノアントリル誘導基置換化合物およびそれを使用した有機発光素子
JP3840235B2 (ja) * 2003-06-27 2006-11-01 キヤノン株式会社 有機発光素子
JP3848306B2 (ja) * 2003-06-27 2006-11-22 キヤノン株式会社 アントリル誘導基置換化合物およびそれを使用した有機発光素子
JP4035482B2 (ja) * 2003-06-27 2008-01-23 キヤノン株式会社 置換アントリル誘導体およびそれを使用した有機発光素子
JP2005037496A (ja) * 2003-07-16 2005-02-10 Dainippon Printing Co Ltd 透過型スクリーン及び拡散シート
US6852429B1 (en) * 2003-08-06 2005-02-08 Canon Kabushiki Kaisha Organic electroluminescent device based on pyrene derivatives
US7102155B2 (en) * 2003-09-04 2006-09-05 Hitachi, Ltd. Electrode substrate, thin film transistor, display device and their production
US7482704B2 (en) 2003-09-08 2009-01-27 Cummins Power Generation Inc. Automatic generator starting protection
JP4632193B2 (ja) * 2003-09-18 2011-02-16 大日本印刷株式会社 パターニング用基板の製造方法
US7686978B2 (en) * 2003-09-24 2010-03-30 E. I. Du Pont De Nemours And Company Method for the application of active materials onto active surfaces and devices made with such methods
TWI365218B (en) 2003-11-17 2012-06-01 Sumitomo Chemical Co Conjugated oligomers or polymers based on crosslinkable arylamine compounds
US20050175861A1 (en) 2004-02-10 2005-08-11 H.C. Starck Gmbh Polythiophene compositions for improving organic light-emitting diodes
US7960587B2 (en) * 2004-02-19 2011-06-14 E.I. Du Pont De Nemours And Company Compositions comprising novel compounds and electronic devices made with such compositions
US7365230B2 (en) * 2004-02-20 2008-04-29 E.I. Du Pont De Nemours And Company Cross-linkable polymers and electronic devices made with such polymers
US7351358B2 (en) * 2004-03-17 2008-04-01 E.I. Du Pont De Nemours And Company Water dispersible polypyrroles made with polymeric acid colloids for electronics applications
US7250461B2 (en) * 2004-03-17 2007-07-31 E. I. Du Pont De Nemours And Company Organic formulations of conductive polymers made with polymeric acid colloids for electronics applications, and methods for making such formulations
US7067841B2 (en) * 2004-04-22 2006-06-27 E. I. Du Pont De Nemours And Company Organic electronic devices
US7402681B2 (en) * 2004-12-14 2008-07-22 Xerox Corporation Compound with indolocarbazole moieties and devices containing such compound
JP2006024535A (ja) * 2004-07-09 2006-01-26 Seiko Epson Corp 有機薄膜素子の製造方法、電気光学装置の製造方法及び電子機器の製造方法
US7569158B2 (en) 2004-10-13 2009-08-04 Air Products And Chemicals, Inc. Aqueous dispersions of polythienothiophenes with fluorinated ion exchange polymers as dopants
GB0423528D0 (en) 2004-10-22 2004-11-24 Cambridge Display Tech Ltd Monomer for making a crosslinked polymer
JP4599142B2 (ja) * 2004-11-26 2010-12-15 キヤノン株式会社 有機発光素子
JP4955971B2 (ja) * 2004-11-26 2012-06-20 キヤノン株式会社 アミノアントリル誘導基置換ピレン化合物および有機発光素子
JP4429149B2 (ja) * 2004-11-26 2010-03-10 キヤノン株式会社 フルオレン化合物及び有機発光素子
JP4677221B2 (ja) 2004-11-26 2011-04-27 キヤノン株式会社 有機発光素子
JP4560394B2 (ja) * 2004-12-13 2010-10-13 長州産業株式会社 薄膜形成用分子供給装置
EP1840990A1 (en) 2004-12-28 2007-10-03 Idemitsu Kosan Company Limited Organic electroluminescent device
KR20070103402A (ko) * 2004-12-30 2007-10-23 이 아이 듀폰 디 네모아 앤드 캄파니 격납 구조체 및 방법
US20080309221A1 (en) 2004-12-30 2008-12-18 E.I. Du Pont De Nemours And Company Containment Structure For an Electronic Device
TW200639230A (en) * 2004-12-30 2006-11-16 Du Pont Electrically conductive polymers
JP2006219392A (ja) 2005-02-09 2006-08-24 Canon Inc ビスアントリル誘導基置換化合物および有機発光素子
JP5098641B2 (ja) 2005-04-27 2012-12-12 コニカミノルタホールディングス株式会社 有機エレクトロルミネッセンス素子の製造方法
KR100739498B1 (ko) * 2005-05-07 2007-07-19 주식회사 두산 중수소화된 신규 아릴아민 유도체, 그 제조 방법 및 이를이용한 유기 전계 발광 소자
US20060275547A1 (en) * 2005-06-01 2006-12-07 Lee Chung J Vapor Phase Deposition System and Method
US20070020395A1 (en) * 2005-06-27 2007-01-25 Lang Charles D Process for making an electronic device
JP2007137837A (ja) * 2005-11-21 2007-06-07 Idemitsu Kosan Co Ltd 芳香族アミン誘導体及びそれを用いた有機エレクトロルミネッセンス素子
JP2007186449A (ja) 2006-01-13 2007-07-26 Canon Inc アミノビスアントリル誘導基置換化合物、及びそれを使用した有機発光素子
US8124172B2 (en) * 2006-03-02 2012-02-28 E.I. Du Pont De Nemours And Company Process for making contained layers and devices made with same
JP2007230960A (ja) 2006-03-03 2007-09-13 Idemitsu Kosan Co Ltd 芳香族アミン誘導体及びそれを用いた有機エレクトロルミネッセンス素子
KR100852328B1 (ko) 2006-03-15 2008-08-14 주식회사 엘지화학 신규한 안트라센 유도체, 이의 제조방법 및 이를 이용한유기 전기 발광 소자
JP5165671B2 (ja) 2006-03-23 2013-03-21 エルジー・ケム・リミテッド 新規なジアミン誘導体、その製造方法およびそれを用いた有機電気素子
US20070264155A1 (en) * 2006-05-09 2007-11-15 Brady Michael D Aerosol jet deposition method and system for creating a reference region/sample region on a biosensor
WO2007145977A1 (en) * 2006-06-05 2007-12-21 E. I. Du Pont De Nemours And Company Process for making an organic electronic device
WO2007145975A2 (en) * 2006-06-05 2007-12-21 E. I. Du Pont De Nemours And Company Process for forming an organic light-emitting diode and devices made by the process
US20080087882A1 (en) * 2006-06-05 2008-04-17 Lecloux Daniel D Process for making contained layers and devices made with same
WO2008024379A2 (en) 2006-08-24 2008-02-28 E. I. Du Pont De Nemours And Company Crosslinkable hole transport polymers
US8242223B2 (en) 2006-08-24 2012-08-14 E I Du Pont De Nemours And Company Hole transport polymers
JP2008270737A (ja) * 2007-03-23 2008-11-06 Fujifilm Corp 有機電界発光素子
JP5484690B2 (ja) * 2007-05-18 2014-05-07 ユー・ディー・シー アイルランド リミテッド 有機電界発光素子
US20080286487A1 (en) * 2007-05-18 2008-11-20 Lang Charles D Process for making contained layers
WO2008150940A1 (en) 2007-06-01 2008-12-11 E. I. Du Pont De Nemours And Company Chrysenes for green luminescent applications
TW200916434A (en) 2007-06-07 2009-04-16 Idemitsu Kosan Co Aromatic amine derivatives and organic electroluminescent device
CN101688052A (zh) 2007-07-27 2010-03-31 E.I.内穆尔杜邦公司 包含无机纳米颗粒的导电聚合物的含水分散体
JP2009076865A (ja) * 2007-08-29 2009-04-09 Fujifilm Corp 有機電界発光素子
KR100963378B1 (ko) 2007-08-31 2010-06-14 주식회사 엘지화학 유기 금속 착물 유도체 및 이를 이용하는 유기발광소자
CA2697403A1 (en) * 2007-08-31 2009-03-05 Evergreen Solar, Inc. Ribbon crystal string for increasing wafer yield
JP2009087760A (ja) * 2007-09-28 2009-04-23 Dainippon Printing Co Ltd エレクトロルミネッセンス素子の製造方法
US20090130296A1 (en) * 2007-11-15 2009-05-21 Universal Display Corporation Fabrication of Organic Electronic Devices by Ink-Jet Printing at Low Temperatures
KR100935356B1 (ko) 2007-11-19 2010-01-06 다우어드밴스드디스플레이머티리얼 유한회사 녹색 발광 화합물 및 이를 발광재료로서 채용하고 있는유기 전기 발광 소자
US8063399B2 (en) 2007-11-19 2011-11-22 E. I. Du Pont De Nemours And Company Electroactive materials
KR100940938B1 (ko) 2007-12-04 2010-02-08 다우어드밴스드디스플레이머티리얼 유한회사 신규한 유기 발광 화합물 및 이를 발광재료로서 채용하고있는 유기 전기 발광 소자
US8040048B2 (en) * 2007-12-12 2011-10-18 Lang Charles D Process for forming an organic electronic device including an organic device layer
JP4533942B2 (ja) * 2008-04-21 2010-09-01 大日本印刷株式会社 エレクトロルミネッセンス素子の製造方法
TW201011114A (en) * 2008-05-19 2010-03-16 Du Pont Apparatus and method of vapor coating in an electronic device
KR20090057254A (ko) 2008-09-25 2009-06-04 메타워터 가부시키가이샤 흡인식 여과농축장치
EP2202817B1 (en) * 2008-12-24 2016-06-29 LG Display Co., Ltd. Method for manufacturing an organic light emitting display device
KR101427457B1 (ko) 2009-02-27 2014-08-08 이 아이 듀폰 디 네모아 앤드 캄파니 전자적 응용을 위한 중수소화된 화합물
TW201200975A (en) * 2010-06-17 2012-01-01 Du Pont Process and materials for making contained layers and devices made with same
JP5871949B2 (ja) * 2010-12-20 2016-03-01 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 閉じ込め層およびそれを使って製造されるデバイスを製造するための方法および材料
TW201238113A (en) * 2011-02-10 2012-09-16 Du Pont Process and materials for making contained layers and devices made with same
WO2013096543A1 (en) * 2011-12-20 2013-06-27 E. I. Du Pont De Nemours And Company Process and materials for making contained layers and devices made with same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009055628A1 (en) * 2007-10-26 2009-04-30 E. I. Du Pont De Nemours And Company Process and materials for making contained layers and devices made with same

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