TW201233662A - Process and materials for making contained layers and devices made with same - Google Patents

Abstract

There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. The priming material has In Formula I: Ar1 through Ar4 are the same or different and are aryl groups; L is a spiro group, an adamantyl group, bicyclic cyclohexyl, deuterated analogs thereof, or substituted derivatives thereof; R1 is the same or different at each occurrence and is D, F, alkyl, aryl, alkoxy, silyl, or a crosslinkable group, where adjacent R1 groups can be joined together to form an aromatic ring; R2 is the same or different at each occurrence and is H, D, or halogen; a is the same or different at each occurrence and in an integer from 0-4; and n is an integer greater than 0.

Description

201233662 VI. Description of invention: [Related application materials] This special account request is based on 35 usc § ιΐ9(4). The provisional patent application filed on the 20th is No. 4,848 I: First right, which is complete by reference. In the forest manual. TECHNICAL FIELD OF THE INVENTION The present invention generally relates to a method of manufacturing an electronic device. It is further related to the device made by the method. [Prior Art] Among many different kinds of electronic devices, there are electronic devices using organic active materials. In such a device, an organic active layer is interposed between the two electrodes. One type of electronic device is an organic light emitting diode (OLED). Due to the high power conversion efficiency and low processing cost of the organic light-emitting diode, there is considerable prospect for application to displays. Especially for battery-powered, portable electronic devices, including mobile phones, personal digital assistants (PDAs), handheld personal computers (PDAs), and a variety of digital compact disc (DVD) playback devices, such displays are more promising. These applications require displays to display high volume of information content, full color and fast video response time, and low power consumption. At present, the research on manufacturing full-color organic light-emitting diodes is toward the development of color-pixel manufacturing methods with cost-effectiveness and high yield. For the production of monochrome displays using liquid processes, spin coating methods have been widely used (see, for example, David Braun and Alan J. Hee§er, Journal of Physical Applications, No. 201233662, Issue 58 (Year)), and 'Manufacturing Orders' Does the program used by the color display make some repairs? In order to manufacture a display with full-color image, each change, for example, into three sub-pixels, each sub-pixel emits a display of ^=3 color separation, green and blue... because the full-color pixel is divided into three elements Need to modify the current processing method to prevent the dispersion of colored liquid = ink) and color mixing. (Some methods for providing an ink containment body C〇ntainment have been described in the literature). This is based on a containmem structure, surface tension discontinuity (su run = tension discontinuity), and a combination of the two. Enclosure structure: Pixels: (10) 丨丨), pixel banks, etc. are used to prevent the spread of geometrical obstacles. In order for these structures to be efficient, the structures must be large and conform to the wet film thickness of the deposited material. When the ink is printed on these structures, the surface of the structure is wetted so that the thickness in the vicinity of the structure is reduced. As used herein, the terms r emission and illuminating are used interchangeably. Therefore, the structure must be moved outside the emission "pixel" area so that non-uniformity is not seen in the operation. This reduces the available emission area of the pixel due to the limited space available for the display (especially for high resolution displays). The achievable containment structure often has a negative impact on quality when depositing a continuous layer of charge injection layer and charge transport layer. As a result, all layers must be printed. In addition, when there is a printing zone or a vapor deposition zone of a material having a low surface tension, the surface tension may be discontinuous. These low surface tension materials must be printed or coated with the first organic activity in the pixel region

6 201233662 Before the layer, apply it first. Usually, when the non-emissive layer of #coating_ is used, these processes will affect the quality, so all layers must be printed as two ink containment technologies - a combination of examples of light barrier banks (pixel wells, channels) of PTFE Carbon (CF4) plasma treatment. Typically, all active layers must be printed in the pixel area. All of the above H resistance methods have the disadvantage of hindering continuous coating. There is a need for continuous coating of one or more layers because of its high yield and low equipment cost. Therefore, there is a need for an improved method of forming an electronic device. SUMMARY OF THE INVENTION - The present invention provides a method for forming a first layer in a layer - the method includes: forming the first layer having a first surface energy; Treating the first layer to form an undercoat layer; patterning the undercoat layer to radiation to produce an exposed area and an unexposed area; developing the undercoat layer to effectively remove the bottom layer from the unexposed areas The coating 'generates - a layer having a - undercoat pattern, wherein the undercoat pattern has a second surface energy, and the second surface energy is greater than the first surface energy; and performing on the first layer Liquid deposition to form the second layer on the undercoat pattern;

Wherein the primer material has the formula I 201233662

among them:

Ar1 to Ar4 are the same or different and are aryl; L is selected from the group consisting of a spiro group, an adamantyl group, a bicyclocyclohexyl group, a deuterated analog thereof, and a substituted derivative thereof; R1 is Each occurrence is the same or different and is selected from the group consisting of D, F, alkyl, aryl, alkoxy, thiol and a crosslinkable group, wherein adjacent R1 groups Can be joined together to form an aromatic ring; R2 is the same or different at each occurrence, and is selected from the group consisting of Η, D, and i; a is the same or different at each occurrence And is an integer from 0 to 4; and η is an integer greater than zero. The present invention also provides a method for fabricating an organic electronic device comprising an electrode having a first organic active layer and a second organic active layer disposed thereon, the method comprising: at the electrode Forming a first organic active layer having a first surface energy; treating the first organic active layer with a primer material to form an undercoat layer; 201233662 exposing the undercoat layer to radiation in a patterned manner to cause exposure a region and an unexposed region; developing the undercoat layer to effectively remove the undercoat layer from the unexposed regions to produce a first active organic layer having an undercoating pattern, wherein the undercoating pattern has a first Two surface energy, and the second surface energy is greater than the first surface energy; and performing liquid deposition on the first organic active layer to form the second organic active layer on the undercoat layer pattern;

Wherein the primer material has the formula I

Where =

Ar1 to Ar4 are the same or different and are aryl; L is selected from the group consisting of a spiro group, an adamantyl group, a bicyclocyclohexyl group, a deuterated analog thereof, and a substituted derivative thereof; R1 is Each occurrence is the same or different and is selected from the group consisting of D, F, alkyl, aryl, alkoxy, dream base and a crosslinkable group 201233662, wherein adjacent R1 groups The lumps may be joined together to form an aromatic ring; R2 is the same or different at each occurrence and is selected from the group consisting of Η, D, and dentate; a is the same at each occurrence or Different and are integers from 0 to 4; η is an integer greater than zero. An organic electronic device includes a first organic active layer and a second organic active layer on an electrode and further comprising a patterned undercoat layer interposed between the first and second organic active layers, wherein The second organic active layer only exists in a region where the undercoat layer exists, and wherein the undercoat layer comprises a material having the formula I

among them:

Ar1 to Ar4 are the same or different and are aryl; L is selected from the group consisting of a spiro group, an adamantyl group, a bicyclocyclohexyl group, a deuterated analog thereof, and a substituted derivative thereof; R1 is Each occurrence is the same or different and is selected from the group consisting of D, F, alkyl, aryl, alkoxy, thiol and a crosslinkable group, wherein adjacent R1 groups May be combined to form an aromatic ring; 10 201233662 R2 is the same or different at each occurrence and is selected from the group consisting of ruthenium, D and halogen; a is the same at each occurrence or Different and are integers from 0 to 4; and η is an integer greater than zero. The above general description and the following detailed description are to be considered as illustrative and not restrict [Embodiment] The present invention provides a method for forming a second layer on a first layer, the method comprising: forming the first layer having a first surface energy; treating the substrate with a primer material a first layer to form an undercoat layer; the primer layer is exposed to radiation in a patterned manner to produce an exposed area and an unexposed area; and the undercoat layer is developed to effectively remove the undercoat layer from the unexposed areas Forming a first layer having an undercoating pattern, wherein the undercoating pattern has a second surface energy, and the second surface energy is greater than the first surface energy; and performing a liquid phase on the first layer Depositing to form the second layer on the undercoat layer pattern;

Wherein the primer material has the formula I 201233662

among them:

Ar to Ar are the same or different and are a square group; L is selected from the group consisting of a spiro group, an adamantyl group, a bicyclocyclohexyl group, a deuterated analog thereof, and a substituted derivative thereof; R1 is Each occurrence is the same or different and is selected from the group consisting of D, F, alkyl, aryl, alkoxy, thiol and a crosslinkable group, wherein adjacent groups are Combining together to form an aromatic ring; R2 is the same or different at each occurrence, and is selected from the group consisting of Η, D, and a pheromone; a is the same or different when the mother appears An integer of 〇4; and η is an integer greater than 〇. The various aspects and embodiments described above are illustrative only and not limiting. After reading this specification, those skilled in the art will appreciate that other aspects and embodiments may be made without departing from the scope of the invention. Other features and benefits of one or more of the embodiments will be apparent from the following detailed description and claims. The following detailed description first describes the definition and clarification of terms, followed by methods, primer materials, organic electronic devices, and finally examples.

S 12 201233662 1 • Definitions and clarification of terms Certain terms are defined or clarified before the details of the following examples are presented. When the term "active" refers to a layer or material, the term "active" refers to a layer or material having electronic or electrical radiation properties. In an electronic device, an active material is electrically contributing to the operation of the device. Examples of active materials include, but are not limited to, materials that conduct, inject, transport, or block charge (where the charge can be electrons or holes), or emit radiation, or exhibit electron-hole pair concentrations upon receipt of radiation. Changing materials. Examples of inactive materials include, but are not limited to, planarizing materials, insulating materials, and environmentally insulating materials. When the term "contained" refers to a layer, it means that the printing does not significantly extend beyond the area deposited by the layer, although generally not in the case of inclusion, the printing tends to extend beyond the deposition area. "chemical containment" means that the layer is limited by surface energy effects. "Physieal containment" means that the layer is limited by the physical barrier structure. One layer can be limited by a combination of chemical containment and physical containment. The term "developing and development" refers to the physical difference between the exposure of a material to the area of the II shot and the area not exposed to radiation and the removal of the exposed area or the unexposed area. The term "electrode" means a component or structure that is assembled to transport a carrier within an electronic component. For example, an electrode can be an anode, a cathode, a capacitor electrode, a gate electrode, or the like. The electrode may comprise a transistor, a capacitor, a resistor, an inductor, a two-electron assembly, a portion of a power supply, or any combination thereof. 13 201233662 When the term "fluorinated" refers to an organic compound, the term "fluorinated" and the bond to carbon in the compound towel are replaced by fluorine. The above terms include partially and fully fluorinated materials. The method of "I" can be used interchangeably with "film", which means that the term "coating 1 - covering the desired area" is not subject to size. This area can be combined with an entire device - or with - a specific functional area (for example, The actual visual display is not as small as 'or as small as a single sub-pixel. The layer and film layer can be formed by any conventional technique, including vapor deposition, liquid deposition (continuous and discontinuous techniques) and heat transfer, or can be a whole and unpatterned terminology. "Liquid composition" means "the material has been transferred to the solution-solution medium,- (iv) the liquid medium that has been dispersed in the towel-like dispersion or the material has been suspended therein and the form floats or emulsifies Liquid medium for liquids. The term "liquid medium" means a liquid material comprising a liquid, a combination of -(iv), a solution, a dispersion, a suspension, and an emulsion. The term "organic electronic device" means a device comprising one or more semiconductor layers or semiconductor materials, whether or not a solvent is present. An organic electronic device is packaged but not limited to: (1) a device that converts electrical energy into radiant energy (for example, a diode, a light-emitting diode display, a diode laser or a lighting panel), and utilizes electronic program detection. A device for measuring signals (such as a photodetector, a photoconductive battery, a photoresistor, a photoswitch, a photocell, a photocell, an infrared ("IR") detector or a biosensor), (3) a radiant energy a device (for example, a photovoltaic device or a solar cell) that converts to electrical energy and (4) a device (eg, a transistor or a diode) that includes two or more electronic components of 201233662 or higher (including one or more organic semiconductor layers), or Any combination of devices (丨) to (4). The term "radiating and radiation" refers to the addition of any form of energy, including any form of heat, all electromagnetic spectra or subatomic particles, whether or not such radiation is in the form of rays, waves or particles. The term "surface energy" is the energy required to create a unit surface area from a material. Surface energy is characterized in that a liquid material having a given surface energy does not wet a surface having a sufficiently low surface energy. It is more difficult to wet a layer having a lower surface energy than a layer having a higher surface energy. The term "over" as used herein does not necessarily mean that a layer, member or structure is in the singular, or in contact with another layer, member or structure. There may be additional or intermediate layers, components or structures. As used herein, 5# "including", "including", "having" or any other variation thereof is intended to cover non-exclusive inclusions. For example, a process, method, article, or device that comprises the plurality of elements listed in the list is not necessarily limited to the elements listed in the list, but may include the process, method, article or Set other components inherent in the device. The other embodiments of the subject matter disclosed herein are intended to be illustrative of a certain feature or element, and there are no features or elements that would substantially alter the operational principles or distinct features of the embodiments. Still another embodiment of the subject matter described herein is described as being comprised of certain features or elements. In this embodiment or its non-substantial variations, there are only those features or elements that are pointed out or described. 15 201233662 In addition, unless otherwise stated to the contrary, “or” means an inclusive “or” rather than an exclusive “or”. For example, any of the following cases satisfies condition A or B: A is true (or existing) and b is false (or non-existent), A is pseudo (or nonexistent) and b is true (or exists) 'And A and B are both true (or existing). Also, the use of "a" or "an" This is done for convenience only and provides a general sense of the scope of the invention. This description should be understood to include one or at least one, and the singular also includes the plural. The family number corresponding to the line in the element period $ is used as

The "new symbol" idioms described in the 81st edition of Handbook of Chemistry and Physics (200Q-200V). Unless otherwise defined, all technical and scientific terms used herein have the same meaning meaning Although methods or materials similar or equivalent to those described herein can be used in the practice or testing of embodiments of the present invention, suitable methods and materials are still described below. All publications, patent applications, patents, and other references herein are hereby incorporated by reference in their entirety in their entirety in their entirety. In the event of a conflict, the present specification, including definitions, will control. Moreover, the materials, methods, and examples are merely illustrative of the nature and are not intended to be limiting. Many details regarding specific materials, processing activities, and circuits are well within the scope not described herein, and can be found in organic light-emitting diode displays, photodetectors, photovoltaic devices, and semi-conductive members. Found in textbooks and other sources in the field of technology.

S 16 201233662 2. Method In the method provided herein, a first layer is formed, an undercoat layer is formed on the first layer, and the undercoat layer is exposed to radiation in a pattern to develop the undercoat layer. The undercoat layer is effectively removed from the unexposed regions to form a first layer having a patterned undercoat thereon. The term "effectively removed" means that the undercoat layer is substantially completely removed from the unexposed area. The undercoat layer in the exposed area may also be partially removed to make the remaining undercoat layer pattern thinner than the original undercoat layer. The undercoat pattern has a surface energy that is still at the surface energy of the first layer. The first layer is formed on the undercoat pattern of the first layer of shai by liquid deposition. One way to determine the relative surface energy is to compare the contact angle of a known liquid on the first organic layer with the contact angle of the same liquid on the undercoat (hereinafter referred to as "developing undercoat") after the exposure and development. . As used herein, the term "contact angle" means the angle φ shown in FIG. In the case of a droplet of a liquid medium, the angle φ is defined by the intersection of the plane of the surface and the line from the outer edge of the droplet to one of the surfaces. Further, after the application, the droplet reaches an equilibrium position on the surface, and the angle 〇 ′, that is, the "static contact angle" is measured. This contact angle increases as the surface energy decreases. Several manufacturers manufacture equipment that can measure contact angles. In certain embodiments, the contact angle between the first layer and the anisole is greater than 40. In some embodiments, it is greater than 5 Å. In some embodiments it is greater than 60. In some embodiments, it is greater than 70. . In some embodiments, the contact angle of the developed undercoat layer to anisole is less than 3 Å. In some embodiments, less than 2 〇. In some embodiments, less than 1 〇. . In some embodiments, the contact angle of a known solvent with the developed undercoat layer is at least 20 degrees less than the contact angle with the first layer. In some embodiments, the contact angle of a known solvent with the developed undercoat layer is less than 30 with respect to the contact angle of the first layer. In some embodiments, a known agent has a contact angle with the developed undercoat layer that is at least 40 less than the first reed angle. . θ. In one embodiment, the first layer is an organic layer deposited on a substrate. The first layer can be patterned or unpatterned. In one embodiment, the first layer is an organic active layer in an electronic device. In one embodiment, the first layer comprises a fluorinated material. The first layer can be formed by any deposition technique (e.g., vapor deposition technique, liquid deposition technique, and thermal transfer technique). In one embodiment, the first layer is deposited by a liquid deposition technique and then dried. In this case, a first material is dissolved or dispersed in a liquid medium. The liquid deposition method can be continuous or discontinuous. Continuous liquid deposition techniques include, but are not limited to, spin coating, roller coating, curtain coating, dip coating, slot die coating, spray coating, and continuous nozzle coating. Discontinuous liquid deposition techniques include, but are not limited to, ink jet printing, gravure printing, flexographic printing, and screen printing. In one embodiment, the first layer is deposited by continuous liquid deposition techniques. The drying step can be carried out at room temperature or elevated temperature as long as the first material and any underlying material are not damaged. The first layer is then treated with an undercoat. This means that a primer material is applied to the first layer and is in direct contact with the first layer to form the undercoat layer. The undercoat layer comprises a composition that reacts when exposed to radiation to form a material that is less susceptible to removal from the underlying first layer than the unexposed primer 201233662. This change must be sufficient to achieve physical differentiation and development of the exposed and non-exposed areas. In an embodiment, the primer material is polymerizable or crosslinkable. In one embodiment, the primer material reacts with the underlying regions when exposed to radiation. The exact mechanism of this reaction depends on the materials used. After exposure to radiation, the undercoat layer is effectively removed in the unexposed areas by a suitable development process. In some embodiments, only the undercoat layer in the unexposed area is removed. In some embodiments, the undercoat layer in the = exposed area is also partially removed, leaving a layer of layers in the areas. In certain embodiments, the thickness of the primer layer remaining in the exposed area is less than 50 Å. In some embodiments, the thickness of the undercoat remaining in the exposed areas is primarily the thickness of a single layer. In certain embodiments, the primer material is deuterated. The term "deuterated" means that at least one H has been replaced by D. The term "deuterated analog j" refers to a structural analog of a compound or group in which one or more available hydrogens have been replaced by deuterium. In a deuterated compound or deuterated analog, the rhodium is present in a natural abundance. The content is at least 1 times higher. In some embodiments, the primer material is at least 10 〇 / 〇氘. The so-called "% 氘" or "% 氘" means 氘 与 and proton 氘The ratio of the sum of the cores, expressed as a percentage. In certain embodiments, the primer material is at least 2 〇〇 / 0 氘; in some embodiments, at least 3 〇 % 氘; in some embodiments, at least 40% 氘; In certain embodiments, at least 5%% deuterated; in certain embodiments, at least 60% deuterated; in certain embodiments, at least 70% deuterated; in some embodiments, at least 8% In some embodiments, at least 9% by weight; in some embodiments, 1% by weight. 201233662 People's deuterated primer materials are less susceptible to degradation by holes, electrons, excitons or groups thereof. Deuteration has the potential to inhibit the inferiority of the undercoat during operation of the device, thereby improving device life. In general, this modification does not require sacrificing other device properties. In addition, aerosolized compounds often have higher air tolerance than non-vaporized analogs. This can result in greater process tolerances in the preparation and purification of the material, as well as in the process of forming electronic devices in (4). The undercoat layer can be applied by any known deposition method. In one embodiment, the undercoat layer is not added to the solvent when it is formed. In one embodiment, the undercoat layer is formed by vapor deposition. In one embodiment, the undercoat layer is formed by a coagulation process. If the undercoat layer is applied by condensation from the vapor phase and the surface layer temperature is too high during vapor condensation, the undercoat layer is transferred to a hole or free volume of the surface of the machine. In some embodiments, the organic substrate is maintained at a temperature below the glass transition temperature or melting temperature of the substrate material. This temperature maintenance can be achieved by any known technique, such as placing the first layer on a surface that is cooled by a flowing liquid or gas. In one embodiment, the primer layer is applied to the temporary support prior to the coagulation step to form a uniform primer coating, which can be achieved by any deposition method, including liquid deposition, vapor deposition, and thermal transfer. . In one embodiment, the choice of the undercoat layer for the liquid medium deposited by the continuous liquid phase deposition technique on the temporary support layer depends on the actual nature of the undercoat layer itself. In one embodiment, the material is deposited by spin coating. The coated temporary support is attached to a heated heat source to form a vapor for the condensation step.

S 20 201233662 The application of the β-coating can be accomplished by continuous or batch processing. For example, in batch processing, one or more devices may be simultaneously coated with the primer layer and then exposed to the radiation source at the same time. In a continuous process, a device that is transported on a conveyor or other transfer device will pass through a station at which the substrates are sequentially applied to the undercoat and then continue through a station at which the station is The devices are sequentially exposed to a source of radiation. This process can be partially continuous and the other parts are secondary. In one embodiment, the undercoat layer is deposited from a second liquid composition. As described above, the liquid phase deposition method may be continuous or discontinuous. In one embodiment, the primer liquid composition is deposited using a continuous liquid deposition process. The liquid medium used to deposit the undercoat layer depends on the exact nature of the undercoat material itself. After the undercoat layer is formed, it is exposed to radiation. As mentioned above, the type of radiation used depends on the sensitivity of the undercoat. The exposure is in a graphical manner. As used herein, the term "patternwise" means that only a selected portion of a material or layer is exposed. Patterned exposure can be performed using any known imaging technique. In one embodiment, the pattern is formed by exposure through a mask. In one embodiment, the pattern is completed by exposing the selected portion to a rasterized laser. The exposure time can range from a few seconds to a few minutes, depending on the particular chemistry of the undercoat layer used. When using a laser, the exposure time is shorter for each individual area, and the exposure time depends on the power of the laser. The exposure step can be performed in air or in an inert atmosphere. It depends on the sensitivity of the material. 201233662 In one embodiment, the radiation is selected from the group consisting of ultraviolet radiation (1 〇 to 390 nm), visible radiation (39 〇 to 77 〇 nm), infrared radiation (770 to 1 〇 nm), and combinations thereof. Groups, including simultaneous processing and 1 column processing. In one embodiment, the radiation is selected from the group consisting of visible radiation and ultraviolet radiation. In one embodiment, the radiation wavelength ranges from 3 至 to 450 nm. In one embodiment, the radiation is deep uv (2 〇〇 to 3 〇〇 nm). In another embodiment, the ultraviolet radiation has a wavelength between 3 Å and 4 〇〇 nm. In another embodiment, the radiation wavelength ranges from 4 (9) to 450 nm. In an embodiment, the radiation is thermal radiation. In one embodiment, the manner of exposing the radiation is heating. The temperature and duration of the heating step changes at least one physical property of the undercoat layer without damaging any underlying layers of the luminescent region. In one embodiment, the heating temperature is below 250 °C. In one embodiment, the undercoating is developed after the heating temperature is below 15 Å and after patterning exposure in the radiation. Development can be achieved by any known technique. "These technologies have been widely used in the field of photoresist and printing. Examples of development techniques include, but are not limited to, heating (evaporation), liquid medium treatment (cleaning), absorbent material treatment (ink absorption), viscous material treatment, and the like. The development step effectively removes the undercoat layer in the unexposed areas. The undercoat layer is then only present in the exposed area. The undercoat in the exposed area can also be partially removed, but still be left in sufficient amount to allow for differences in wettability between the exposed and unexposed areas. In one embodiment, the radiant exposure of the undercoat layer causes a change in the solubility or dispersibility of the undercoat layer in the solvent. Here, development is achieved by a wet development process. This treatment typically involves cleaning with a solvent that will dissolve, disperse or lift-off the type of zone. In an embodiment, the step of being exposed to radiation in a patterning manner results in the undercoat layer

S 22 201233662 埶戎 单 单 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生 生For example, the temperature at which the temperature can be aggregated in the thermal reaction of the village material and is lower than the thermal polymerization temperature. It should be known that the anti-reverse or H-induced smear, the step of exposing the undercoating silk, and the soft m (four) temperature change. In this case, the development can be achieved by a dry development process. A dry development process can include contacting the outermost soft portion of the component with an absorbent surface. This dry type of shirt can be carried out under temperature-raising conditions or if it does not affect the nature of the remaining area. The area of the undercoat layer and the area where the first layer f of the bottom layer is covered. In some embodiments, the pattern has a difference in contact angle between the undercoat layer and the un-region and a given solvent to "is at least 3" in some embodiments. In some embodiments, The second layer is applied by liquid deposition at least on the first layer of the undercoat material. In the case of the second layer-electronic device, the second organic active layer can be used. The second layer is applied by a liquid deposition technique. The material comprises - a second material, dissolved or dispersed in a liquid medium; and the two liquid composition is applied to the pattern of the developed undercoat layer to dry = 23 201233662 —layer. The WEB composition has a -* greater than the surface energy of the first layer, but is substantially the same as the surface energy of the developed undercoat layer. 1 The liquid composition of the castor m wets the developed undercoat layer. Rejected. ^6 The area to be removed will still be rejected for the first layer. The liquid can be dispersed to the pattern of the undercoat layer of the second layer of the second layer = the continuous liquid deposition technique coated on the second - The method provided in the method embodiment, the first layer and the first: active layer. The first organic active layer Forming a --, - undercoat layer formed on the first-organic active layer, exposing the bismuth and developing to form a developed undercoat pattern; and the second organic is a-line, forming an organic-side The developed undercoat on the active layer is such that the second organic active layer is only present on the undercoat layer and has the same pattern as the undercoat layer. In the embodiment, the first organic active layer The storage is formed by liquid phase deposition of a first liquid composition, the first composition and the - (4) medium. The composition of the body is deposited on the first electrode layer, and then dried. To form a layer. In an embodiment, the first organic active layer is formed by a continuous liquid deposition method. This method can have higher yield and lower cost. In an embodiment, the The undercoat layer is formed by liquid phase deposition of a second liquid composition. The second liquid composition comprises a primer material in a second liquid medium. The second liquid medium can be associated with the first liquid ; the same or different 'as long as it does not destroy the first layer. As mentioned above, The liquid deposition method may be continuous or discontinuous. In one embodiment, the primer composition is deposited using a continuous liquid deposition method.

S 24 201233662 In one embodiment, the second organic active layer is formed by liquid phase deposition of a third liquid composition comprising a second organic active material and a third liquid medium. The third liquid medium may be the same as or different from the first liquid medium and the second liquid medium as long as it does not damage the first layer or the developed undercoat layer. In some embodiments, the second organic active layer is formed by printing. In some embodiments, a third layer is applied over the second layer such that the third layer is only present on the second layer and has the same pattern as the second layer. The third layer can be applied by any of the methods described above for the second layer. In some embodiments, the third layer is applied by a liquid deposition technique. In some embodiments, the third organic active layer is formed by a printing process and the printing process is selected from the group consisting of ink jet printing and continuous nozzle printing. In certain embodiments, the primer material is the same as the second organic active material. The thickness of the developed undercoat layer depends on the end use of the material. In certain embodiments, the developed undercoat layer has a thickness of less than 100 Å. In certain embodiments, the thickness ranges from 1 to 50 A; in certain embodiments, from 5 to 30 A. 3. Primer materials

Primer material has the formula I

25 201233662 Where:

Ar to Ar4 are the same or different and are aryl; L is selected from the group consisting of a spiro group, an adamantyl group, a bicyclocyclohexyl group, an condensed analog thereof, and a substituted derivative thereof; Each occurrence is the same or different and is selected from the group consisting of D, F, alkyl, aryl 'alkoxy, thiol and a crosslinkable group, wherein adjacent R1 groups Can be combined to form an aromatic ring; R2 is the same or different at each occurrence and is selected from the group consisting of Η, D, and aglycon; a is the same at each occurrence or Different and are integers from 0 to 4; and η is an integer greater than 〇. The compound of formula I can be a small molecule, oligomer or polymer with η = =1. In certain embodiments, the compound is a polymer of Mn > 20,000, and in certain embodiments, the compound is a polymer of Mn > 50,000. In certain Formula I embodiments, η = 1 and R2 is a halogen. These compounds can be used as monomers for forming a polymerizable compound. In certain embodiments, the halogen is C1 or Br; in certain embodiments, the halogen is Br. In certain Formula I embodiments, n = 1 and R2 is Η or D. In certain embodiments, the compound of Formula I is via a paw. The term "deuterated" means that at least one H has been replaced by D. The term "deuterated analog" means that one or more of the available hydrogens have been replaced by deuterium.

S 26 201233662 Structural analogue of a compound or group. In a deuterated compound or deuterated analog, the rhodium present is at least 1 times more abundant than the natural abundance. In certain embodiments, the compound is at least 10〇/〇氘. The so-called "% Jilized" or "A chaotic" means the ratio of the sum of the nucleus and the proton plus the nucleus, expressed as a percentage. ▲ In certain embodiments, the compound is at least 10% precipitated, in some embodiments, at least 20% saturated; in some embodiments, at least 30% is disordered; in certain embodiments, To 40% deuteration; in some embodiments, at least 5% deuterated; in some embodiments, at least 60% deuterated, in some embodiments, at least 7 % deuterated; In certain embodiments, at least 80% is deuterated; in certain embodiments, at least 90% is vaporized; in certain embodiments, vaporized. Deuterated materials are less likely to be degraded by holes, electrons, excitons, or combinations thereof, and have the potential to inhibit compound degradation during device operation, which can improve device life. - Generally speaking, the improvement does not require sacrificing other equipment, nature. In addition, the occluded compound often has a more air stability than the non-inhibited analog. This can result in greater process tolerances in the preparation and characterization of the material, as well as in the use of the material to form an electronic device. In Formula 1, the linking group [the conjugation phenomenon between the two arylamine groups] is broken. In some implementations, L· provides linearity such that the angle α shown below is greater than the tetrahedral angle of 109·5〇.

27 201233662 In certain embodiments, a is greater than 12 〇. In some embodiments, greater than 140. In some embodiments, greater than 16 〇. . A spiro group is a bicyclic organic compound having a ring attached through a single atom. The nature of the rings may be the same or different. This connecting atom is called a spiro atom. In certain embodiments, the spiro atomic system is selected from the group consisting of C and Si. In certain embodiments of Formula I, the compound having L has the following non-nuclear structure

Wherein the asterisk represents the point of attachment to the nitrogen atom of the arylamine group, and R is the same or different and appears to be Η or R1 at each occurrence. In certain embodiments of Formula I, Ar1 and Ar2 are aryl oximes without a fused ring. In certain embodiments, Ar1 and Ar2 have the formula a.

S 28 201233662

Wherein: R1G is the same or different at each occurrence and is selected from the group consisting of D, alkyl, alkoxy, oxazepine and dream base; c is the same at each occurrence Or different and is an integer of 〇-4; d is an integer from 0 to 5; and m is an integer from 1 to 5. In certain embodiments, Ar1 and Ar2 have formula b

Wherein: R10 is the same or different at each occurrence and is selected from the group consisting of D, alkyl, alkoxy, decane, and decyl; c is the same or different at each occurrence and An integer from 0 to 4; d is an integer from 0 to 5; and m is an integer from 1 to 5. In some embodiments of formulas a and b, at least one of c and d is not zero. In some embodiments, m = 1 -3. 29 201233662 In certain embodiments of Formula I, Ar1 and Ar2 are selected from the group consisting of phenyl, biphenyl, terphenyl, its deuterated derivatives, and substituted derivatives thereof, which are substituted The substance has one or more substituents selected from the group consisting of an alkyl group, an alkoxy group, a thiol group, and a substituent having a crosslinking group. In some Formula I embodiments, 3 = 〇. In certain embodiments of Formula I, R1 is D or C^o alkyl. In certain embodiments, the alkyl group is deuterated. In some embodiments, a = 4 and R1 = D. In certain embodiments of Formula I, any one of the following combinations may be present: (1) deuteration; (ii) angle α greater than 109.5°; (iii) L is selected from the group defined above.

(iv) Ar1 and Ar2 are selected from the group consisting of phenyl, biphenyl, terphenyl, and deuterated derivatives thereof, and having a group selected from the group consisting of a pyridyl group, an alkoxy group, a ceramide group, and a

S 30 201233662 A group consisting of one or more substituents of a group consisting of a substituent of a crosslinking group, a group having a group of formula a, and a group having a group of formula b; (v) a = 0 Or a is not 0 and R1 is D, Ci-io dad or deuterated Cl.10 yard. In certain embodiments, the compound of Formula I is further defined by Formula II

among them:

Ar1 and Ar2 are the same or different and are aryl; L is selected from the group consisting of a spiro group, an adamantyl group, a bicyclocyclohexyl group, a deuterated analog thereof, and a substituted derivative thereof; Each occurrence is the same or different ^ and is selected from a single bond, C (R3) 2, C (R4) 2 C (R4) 2, Ο, Si (R3) 2, Ge (R3) 2 a group; R1 is the same or different at each occurrence, and is selected from the group consisting of D, F, an alkyl group, an aryl group, an alkoxy group, a thiol group, and a crosslinkable group. Wherein adjacent R1 groups may be joined together to form an aromatic ring; 201233662 R2 is the same or different at each occurrence and is selected from the group consisting of ruthenium, D and halogen; When present, the same or different, and selected from the group consisting of alkyl and aryl groups, wherein adjacent R3 groups can be joined together to form an aliphatic ring; R4 is the same at each occurrence or Not identical, and is selected from the group consisting of Η, D, and alkyl; a is the same or different at each occurrence and is an integer from 0-4; and η is an integer greater than zero. The compound of formula II can be a small molecule, oligomer or polymer of η = 1. In certain embodiments, the compound is a polymer of Mn >20,000; in certain embodiments, the compound is a polymer of Mn > 50,000. In certain embodiments, n = 1 and R2 is halogen. These compounds can be used as monomers for forming a polymerizable compound. In certain embodiments, the halogen is C1 or Br; in certain embodiments, the halogen is Br. In certain Formula II embodiments, n = 1 and R2 is deuterium or D. In certain embodiments, the compound of Formula II is deuterated. In certain embodiments of Formula II, L is selected from the group shown below.

S 32 201233662

Wherein the asterisk represents the point of attachment to the nitrogen atom of the arylamine group, and R is the same or different and appears to be Η or R1 at each occurrence. In certain embodiments of Formula II, Ar1 and Ar2 are aryl groups having no fused ring. In certain embodiments, Ari and Ar2 have the formula a or formula b as defined above. In some embodiments of the formulas & b, at least one of () and d is not a defect. In some embodiments, m = U. In some embodiments of Formula 11, Ar1 and Ar2 are selected from the group consisting of phenyl, biphenyl, biphenyl, an astringent derivative, and substituted derivatives thereof, the substituted derivative having One or more substituents selected from the group consisting of alkyl, alkoxy, and substituents having a crosslinking group. In some Formula I embodiments, a == 〇. In this embodiment, Rl4l^Cl·10 is burned. In a certain: 彳中' the burning base is scented. In certain embodiments, a = 4 33 201233662 In certain Formula II embodiments, the E is selected from the group consisting of C(R3)2 and C(R4)2C(R4)2. In certain embodiments, R3 is selected from the group consisting of phenyl, biphenyl, and fluoroalkyl. In certain embodiments, R4 is selected from the group consisting of hydrazine and D. In certain Formula II embodiments, any one of the following combinations may be present: (1) deuteration; (ii) angle a greater than 109.5. (iii) L is selected from the group defined above

(iv) Ar1 and Ar2 are selected from the group consisting of phenyl, biphenyl, terphenyl, a gasified derivative thereof, and having a substituent selected from an alkyl group, an alkoxy group, a fluorenyl group and a crosslinking group. a group consisting of one or more substituents of a group, a group having a formula a, and a group having a group of formula b; (v) a = 〇 or a is not 〇 and Ri is d, Cmg alkyl or deuterated Ci-io alkyl; (vi) E is selected from the group consisting of C(R3)2 and C(R4)2C(R4)2; (vii) R3 is selected From phenyl, biphenyl and fluoroalkyl

A group consisting of S 34 201233662; (viii) R4 is selected from the group consisting of Η and D. In certain embodiments, the compound of Formula I is further defined by Formula III

among them:

Ar1 is the same as or different from Ar2 and is an aryl group; L is selected from the group consisting of a spiro group, an adamantyl group, a bicyclocyclohexyl group, a deuterated analog thereof, and a substituted derivative thereof; R1 is Each occurrence is the same or different and is selected from the group consisting of D, F, alkyl, aryl, alkoxy, thiol and a crosslinkable group, wherein adjacent R1 groups May be combined to form an aromatic ring; R2 is the same or different at each occurrence and is selected from the group consisting of ruthenium, D and halogen; R5 is the same or different at each occurrence, And selected from the group consisting of D, F, alkyl, aryl, alkoxy, fluorenyl and a crosslinkable group; 35 201233662 R6 to R9 are the same or different at each occurrence, And is selected from the group consisting of ruthenium, D, F, alkyl, aryl, alkoxy, dream base and a crosslinkable group, provided that at least one of R6 and R7 is an alkyl group Or a fluorenyl group, and at least one of R8 and R9 is a burnt group or a wonderful base; a is the same or different at each occurrence and is an integer of 0-4. b is the same or different at each occurrence and is an integer from 0 to 2; η is an integer greater than zero. The compound of formula III can be a small molecule, oligomer or polymer of η = 1. In certain embodiments, the compound is a polymer of Mn >20,000; in certain embodiments, the compound is a polymer of Mn > 50,000. In certain embodiments of Formula III, n = 1 and R2 is a halogen. These compounds can be used as monomers for forming a polymerizable compound. In certain embodiments, the halogen is C1 or Br; in certain embodiments, the halogen is Br. In certain Formula III embodiments, n = 1 and R2 is η or D. In certain embodiments, the compound having the formula is deuterated. In certain embodiments, the L is selected from the group shown below.

S 36 201233662 f?4

Wherein the asterisk represents the point of attachment to the nitrogen atom of the arylamine group, and R is the same or different and appears to be Η or R1 at each occurrence. In certain embodiments of Formula III, Ar1 and Ar2 are aryl groups having no fused ring. In certain embodiments, Ar1 and Ar2 have the formula a or formulae as defined above. In some embodiments of formulas a and b, at least one of c and d is not zero. In certain embodiments, m = 1-3. In certain embodiments of Formula III, Ar1 and Ar2 are selected from the group consisting of phenyl, biphenyl, terphenyl, a deuterated derivative thereof, and substituted derivatives thereof, the substituted derivative having One or more substituents selected from the group consisting of an alkyl group, an alkoxy group, a fluorenyl group, and a substituent having a crosslinking group. In some Formula III embodiments, all a = 0. In certain embodiments of Formula III, a is not 0 and R1 is D or Cuh) alkyl. In certain embodiments, the alkyl group is deuterated. In some embodiments 'all a = 4 and R1 = D. In some Formula III embodiments, all b = 0. In certain embodiments of Formula III, b is not 0 and R2 is D or CM0 alkyl. In certain embodiments, the alkyl group is deuterated. In some embodiments, all b = 2 and R2 = D. In certain embodiments of Formula III, R6 = R8 = alkyl or alkylated alkyl. In certain embodiments, R7 = R9 = alkyl or deuterated alkyl. 37 201233662 In some Formula III embodiments, any of the following combinations may be present: (1) scented; (ii) angle α is greater than 109.5. (iii) L is selected from the group defined above.

(iv) Ar1 and Ar2 are selected from the group consisting of phenyl, biphenyl, terphenyl, a deuterated derivative thereof, and having a substituent selected from an alkyl group, an alkoxy group, a fluorenyl group and a crosslinking group. a group consisting of one or more substituents of a group, a group having a formula a, and a group having a group of formula b; (v) a = 0 or a is not 0 and R1 is D, Cwo, or cystized Ci-i oxime; (vi) b = 0 or b is not 0 and R2 is D, Ci-κ) alkyl or deuterated C^o alkyl; (vii) R6 = R8 = alkyl or deuterated alkyl; (viii) r7 = r9 = alkyl or deuterated alkyl. Some non-limiting examples of compounds having Formula I are shown below

Compound A

S 38 2〇1233662

201233662

Compound D

The disaster-using drink Ml is c_c or (: seven-button novel compound. It is well known that various such technologies such as Suz II, Ya, a, o^, can be used in a similar way to laugh with the precursor material. The solvent (for example, the team tit ί D exchange catalyst (for example, three gas (four) or two gas two dice is prepared by treating the non-inflated compound under the treatment. The exemplary preparation process is illustrated in the example. The compound is formed into a layer. The term "layer" is used interchangeably to refer to a coating that covers a desired area. Language = limited by size. This area can be as large as a whole device or a specific functional area (eg, actual vision) Displayed as small, or as small as a single sub-pixel. Layers and films can be formed by any conventional deposition technique, including vapor deposition, liquid deposition (continuous and discontinuous techniques), and heat transfer. Including but not limited to spin coating, gravure coating, curtain coating, dip coating, slot die coating, spraying. 201233662 Coating and continuous nozzle coating. Discontinuous deposition techniques include, but are not limited to, spraying Ink printing, gravure printing and screen printing 4. Organic electronic devices further illustrate the method of the method in an electronic device, but the method is not limited to such applications. Figure 2 is an exemplary electronic device , which is an organic light emitting diode (OLED) display, comprising at least two organic active layers disposed between two electrical contact layers. The electronic device 1 〇〇 includes one or more layers 12 〇 and 130 ′ to facilitate A hole is injected from the anode layer 110 to the emissive layer 140. In general, when two layers are present, the layer 12 adjacent to the anode is referred to as a hole injection layer, sometimes referred to as a buffer layer. Layers beside the emissive layer 130 is referred to as a hole transport layer. A selective electron transport layer 15 is sandwiched between the emissive layer 140 and a cathode layer 16A. The organic layers 12 to 15 are individually and collectively referred to as organic devices. The active layer. Depending on the application of the device, the emissive layer 14G may be a light-emitting layer (for example, a m-rich or illuminating battery cell) activated by an applied voltage, or - with or without Underneath, a material layer that responds to the energy and generates a signal (For example, in a photodetector.) The device is not limited in terms of system, driving method and functional mode. The primer tray is not shown in the figure. For the colorful device, the emission layer is The method described in the U.S. Patent Application Serial No. 2004-0094768, the disclosure of which is incorporated herein by reference. In some embodiments, the novel methods described herein can be used with any pair of continuous organic layers in the device, wherein the second layer is contained within a particular region. For use in fabricating an organic electronic device (including an electrode) The method of the electrode having a first organic active layer and a second organic active layer disposed thereon includes: forming a first organic active layer having a first surface energy on the electrode; Treating the first organic active layer with a coating material to form an undercoat layer; exposing the undercoat layer to radiation in a patterned manner to produce an exposed area and an unexposed area; developing the undercoat layer from the unexposed The region effectively removes the undercoat layer to produce a first active organic layer having an undercoating pattern, wherein the undercoating pattern has a second surface energy, and the second surface energy is greater than the first surface energy; Liquid-depositing is performed on the undercoat layer pattern on the first organic active layer to form the second organic active layer; wherein the undercoat material has Formula I, as described above. In one embodiment of the novel method, the second organic active layer is an emissive layer 140, and the first organic active layer is a device layer applied prior to layer 14〇. In many cases, the construction of the device begins with the anode layer. If the hole transport layer 130 is present, the undercoat layer can be applied to the layer 130 and developed prior to application of the emissive layer 14". If layer 13 is absent, the undercoat layer can be applied to layer 120. The construction of the device begins with the yin

In the case of S 201233662, the undercoat layer may be applied to the electron transport layer 150 before the emissive layer 140 is applied. In one embodiment of the novel method, the first organic active layer is a hole injection layer 120, and the second organic active layer is a hole transport layer 130. In the embodiment in which the device is constructed from the anode layer, The undercoat layer may be applied to the hole injection layer 120 and developed before the hole transport layer 130 is applied. In one embodiment, the hole injection layer comprises a fluorinated material. In one embodiment, the hole injection layer comprises a conductive polymer doped with a fluorinated acid polymer. In one embodiment, the hole injection layer is primarily comprised of a conductive polymer doped with a fluorinated acid polymer. In some embodiments, the undercoat layer is primarily comprised of a hole transport material. In one embodiment, the undercoat layer consists essentially of the same hole transport material as the hole transport layer. The layer in the device can utilize any of the materials known to be useful for the layer. The device can include a support or substrate (not shown) that can be adjacent to the anode layer 11 (or the cathode anode). The support member is adjacent to the layer 110, which is the most common. The support can be flexible or rigid organic or inorganic. In general, glass or flexibility can be used to efficiently support the support. The anode layer 110 is more electrode-positive than the cathode layer 160. The anode may comprise a material comprising a metal, a mixed f, an alloy, a metal oxide or a mixed oxide. Suitable mixed two includes a Group 2 element (i.e., ' Be, Mg, Ca, Sr, Ba) vapor, an element in the Group u element group, an element in the group, and a flute < ^ element. If the element in the group 6 and the transition from the group 8 to the first group are light-transmissive, the mixed oxide of the group 12, group and group 14 elements, such as indium oxide, may be used. tin. The term "mixed oxide" as used herein refers to an oxide having two or more different cations which is selected from a Group 2 or a Group 12, Group 13, or Group 14. Non-limiting specific examples of materials for the anode layer 11 include, but are not limited to, indium tin oxide (sodium), aluminum tin oxide, aluminum zinc oxide, gold, silver, copper, and nickel. The anode may also comprise an organic material such as polyaniline, polybenzazole or polytonol. The anode layer 110 can be formed by chemical vapor deposition or physical vapor deposition, or by spin molding. Chemical vapor deposition can be performed as follows: plasma enhanced chemical vapor deposition (PECVD) or metal organic chemical vapor deposition (MOCVD). Physical vapor deposition can include all forms of sputtering, including ion beam sputtering, electron beam (e_beam) evaporation, and resistance evaporation. Special forms of physical vapor deposition include radio frequency (RF) magnetron sputtering and inductively coupled plasma physical vapor deposition (IMP_PVD). These deposition techniques are well known in the art of semiconductor fabrication. Typically, the anode layer 110 is patterned during a lithography operation. The pattern can be changed as needed. The pattern layer can be formed by, for example, placing a patterned mask or photoresist prior to applying the first electrical contact layer material over the first flexible composite barrier structure. Alternatively, the layers can be applied as a unitary layer (also known as blanket deposition) followed by patterning using, for example, a patterned photoresist layer and wet chemical or dry chemical etching techniques. Other patterning methods well known in the art can also be used. When the electronic devices are disposed in an array, the anode layer 110 is typically formed in substantially parallel strips having lengths that extend in substantially the same direction. 201233662 The hole injection layer 120 is used to facilitate the injection of holes into the emissive layer and planarize the surface of the anode to prevent shorting of the device. The hole injecting material may be a polymer, an oligomer or a small molecule, and may be in the form of a solution, a dispersion, a suspension, an emulsion, a colloidal mixture or other composition. The hole injection layer may be formed of a polymeric material such as polyaniline (PANI) or polyethylene oxydioxide (PEDOT), which is often doped with a protonic acid. The protic acids may be, for example, poly(styrenesulfonic acid), poly(2-acrylamido-2-methyl-1-propanesulfonic acid) (poly(2-acrylamido-2-methyl-). L-propanesulf〇nic acid)) and the like. The hole injection layer 12A may include a charge transport compound and the like 'copper phthalocyanine and tetrathiafulvalene-tetracyanoquinodimethane (TFF-TCNQ) . In one embodiment, the hole injection layer 12 is made of a conductive polymer and a colloid to form a dispersion of a polymeric acid. Such materials are described in, for example, the published U.S. Patent Application Serial Nos. 2004/0102577, 2004/0127637, 2005/0205860, and PCT Application WO 2009/018009. The hole injection layer 120 can be applied by any deposition technique. As described above, in one embodiment, the hole injection layer is applied by a solution deposition method. In one embodiment, the hole injection layer is applied by a continuous solution deposition process. Layer 130 includes a hole transport material. Examples of hole transport materials for the hole transport layer have been incorporated, for example, in Kirk-Othmer Encyclopedia of Chemical Technology, Fourth Edition, Volume 18, pages 837 to 45 201233662, page 860, 1996, Y. Wang. The hole can be used to transfer both small molecules and polymers. Commonly used hole transport molecules include, but are not limited to: 4, 4, 4, '-three (1^, :^-diphenylamine)-triphenylamine (but 0 octet 8); 4, 4, 4, -Tris(N-3-methylbenzene-N-aniline)-triphenylamine (MTDATA); N,N,diphenyl-N,N,·bis(3-mercaptobenzene)-[1,1,- Biphenyl]_4,4,diamine (TPD); 4,4,·bis(pyrazol-9-yl)biphenyl (CBP); 1,3-bis(isoxyl-9-yl)benzene (3)); U-bis[(di-4-indolyl)phenyl]cyclohexane (TAPC); Ν, Ν, - bis(4-mercaptobenzene)-Ν, Ν'-double (4_B Benzo)-[1,Γ-(3,3·-dimethyl)biphenyl]-4,4'-diamine (ETPD); tetra-(3-methylphenyl)-N,N,N ,,N,-2,5j: amine (PDA); α-phenyl-4-N,N-diphenylamine benzene (TPS); p-(diethylamine) benzaldehyde diphenyl hydrazine (DEH); Aniline (TPA); bis[4-(N,N-diethylamine)-2-methylbenzene](4.methylphenyl)methane (MPMP); 1-phenyl-3·[p--(2-B Amine) phenethyl]-5-[p-(diethylamine)phenyl]pyrene than salicin (ppR or DEASP); 1,2-trans bis(9H-carbazol-9-yl)cyclobutane Alkane (DCZB); N,N,N',N'-tetrakis(4-methylphenyl)-(1,1,-biphenyl)·4,4,-diamine (N,N,N',N '-tetrakis(4-me Thylphenyl)-( 1,1 '-biphenyl)-4,4'-diamine, TTB); N,N,-bis(naphthalen-1-yl)-N,N'-bis(phenyl)benzidine ( Ν, Ν-bis(naphthalen-1 -yl)-N, N5-bis-(phenyl)benzidine, α-ΝΡΒ); and p〇rphyrinic compounds such as ugly bronze. Commonly used hole transport polymers include, but are not limited to, polyvinyl carbazole, (phenylmethyl) polydecane, poly(dioxythiophene), polyaniline, and polypyrrole. It is also possible to obtain a hole transporting polymer by doping a hole transporting molecule such as those described above into a polymer such as polystyrene and polycarbonate. In some embodiments, the hole transport layer comprises a hole transporting polymer. In some embodiments, the hole transport layer consists essentially of a hole transport polymer. In some embodiments, the hole transmission gathers

S 46 201233662 The compound is a distyryl aryl compound. In certain embodiments, the group has two or more aromatic rings. In certain embodiments, the aryl group is a polyacene. The term "polyacene" as used herein means that the parent component of the hydrocarbon group contains two or more ortho-fused benzene rings present in a straight chain configuration. In certain embodiments, the hole transporting polymer is an aromatic amine polymer. In certain embodiments, it is a co-polymer of a first and an arylamine monomer. In certain embodiments, the polymer has a crosslinkable group. In some embodiments, the crosslinking can be effected by a heat treatment and/or exposure to ultraviolet or visible radiation. Examples of crosslinkable groups include, but are not limited to, ethylene, propionate, perfluorovinyl, 1 -benzocyclobutane, decane, and decyl esters. Crosslinkable polymers have advantages in the preparation of solution process OLEDs. The use of a soluble polymeric material to form a layer which can be converted to an insoluble film after deposition allows for the problem of layer dissolution to occur when fabricating a multi-layer solution treated organic light-emitting diode device. Examples of crosslinkable polymers can be found in U.S. Patent Application Serial No. 2005-0184287, the disclosure of which is hereby incorporated by reference. ^ In certain embodiments, the hole transport layer comprises a polymer which is a co-polymer of 9,9-dialkylfluorene and triphenylamine. In certain embodiments, the hole transport layer consists essentially of a polymer and is a copolymer of 9,9-dione and triphenylamine. In certain embodiments, the polymer & 9,9·dialkylfluorene and 4,4'-di(diphenylamine) are combined with 201233662 benzene (4,4'-bis(diphenylamino) a common polymer of biphenyl). In certain embodiments, the polymer is a copolymer of 9,9-dialkylfluorene and TPB. In certain embodiments, the polymer is a co-polymer of 9,9-dimorphyl and NPB. In certain embodiments, the copolymer is made from a third comonomer. The third copolymer system is selected from the group consisting of (ethylene-based) amines and 9,9-one daughters. The first or 9,9-double (Ethylene base). In certain embodiments, the hole transport layer comprises a material comprising a diarylamine having conjugated moieties that are coupled in a non-planar configuration. Such materials can be monomeric or polymeric. Examples of such materials are described in, for example, PCT Application No. WO 2009/067419. In some embodiments, the hole transport layer is doped with a p-dopant such as tetrafluorotetracyanoquinodimethane and xenon-3, 4, 9 , 10-tetracarboxy-3,4,9,l〇-two needles (perylene-354,9,10-tetracarboxylic.3,4,9,10. (lianhydride) 〇 In some embodiments, the hole The transport layer comprises a material having a workmanship, as described above. In some embodiments, the hole transport layer consists essentially of a material having Formula I. The hole can be coated by any deposition technique. The transport layer 13 is as described above. In one embodiment, the hole transport layer is applied by a solution deposition method. In one embodiment, the hole transport layer is applied by a continuous solution deposition method. Depending on the application of the device, the emissive layer 140 can be a light-emitting layer (for example, in a light-emitting diode or in a light-emitting electrochemical cell) activated by an applied voltage, or one with or without an external application. Under bias, right

S 48 201233662 A layer of material that responds to and produces a signal (eg, in a light detector). In one embodiment, the emissive material is an organic electroluminescent ("EL") material. Any organic electroluminescent material can be used in such devices. 'The organic electroluminescent materials include, but are not limited to, small molecule organic fluorescent compounds, fluorescent and phosphorescent metal complexes, co-polymers and their mixture. Examples of fluorescent compounds include, but are not limited to, [#+快] (chrysenes), pyrenes, perylenes, rubrenes, coumarins, anthracenes, thiazepines. Thiadiazoles, derivatives of the above, and mixtures of the foregoing. Examples of metal complexes include, but are not limited to, metalchelated oxinoid compounds, for example, tris(8-hydroxyquinolato)aluminuin, Alq3); % metallization Cyclone-like iridium and platinum electroluminescent compounds, for example, as disclosed in U.S. Patent No. 6,670,645, the disclosure of which is incorporated by reference to the entire disclosure of the disclosures of (phenylpyridine), phenylquinoline or phenylpyrimidine ligands, and organometallics such as those disclosed in PCT Application Publication Nos. W003/008424, W003/091688, and W003/040257 The complex and a mixture of the above. In some cases, the small molecule fluorescent or organometallic material is deposited as a dopant in the host material to improve processing and/or electronic properties. Examples of conjugated polymers include, but are not limited to, poly(benzene). (pene) (pene) (polyphenylenes), polyfluorenes, p〇iy (spirobifluorenes), poly 49 201233662 polythiophenes, poly (p-butene) (p〇iy (p-phenylenes)), a copolymer of the above substances and a mixture of the above. The emissive layer 14 can be applied by any deposition technique. As described above, in one embodiment, the emissive layer is applied by a solution deposition method. In one embodiment, the emissive layer is applied by a continuous solution deposition process. The selection layer 150 can be used to facilitate electron transport or as a buffer layer or a condensation layer to prevent exciton quenching of the layer interface. Preferably, this layer enhances electron mobility and reduces exciton quenching. Examples of the electron transporting material used in the selective electron transporting layer 150 include a metal-clamping oxin-like compound containing a metal quinoline derivative such as tris(8-hydroxyquinolato)aluminum (tris(8-hydroxyquinolato)) Aluminum, A1Q), bis(2-methyl-8-quinolinolato) (p-phenylphenolato) aluminum, BAlq), tetra-(8_ (tetrakis-(8-hydroxyquinolato)hafnium, HfQ) and tetrakis_(8-hydroxyquinolato)zirconium, ZrQ); and azole compounds such as 2-(4) -biphenyl)-5-(4-tris-butylphenyl)·1,3,4-[oral + No.] 2-s 4-biphenylyl-5-(4-t-butylphenyl )-l,3,4-oxadiazole, ?6〇), 3-(4-biphenyl)-4-phenyl-5-(4-'1-butylphenyl)-1,2,4- 3-(4-biphenylyl)-4-phenyl-5-(4-t-butylphenyl)-l,2,4-tria zole, TAZ) and 1,3,5-tris(phenyl-2- Benzoimidazole benzene (TPBI); 啥 [mouth + 咢] porphyrin derivative, such as 2,3-bis(4.fluorophenyl) quinolin [ Methyl porphyrin

S 50 201233662 (2,3-bis(4-fluorophenyl)quinoxaline); phenanthroline, such as 47_diphenyl-1,1 〇 phenanthroline (4,7-diphenyl-l, l〇-phenanthroline, DPA) and 2,9-Dimethyl-4,7-diphenyl-u- phenanthroline (ddpa); and mixtures thereof. In some embodiments, the electron transport layer further comprises an n-type dopant. The n-type dopant material is a known technique. The n-type dopant includes, but is not limited to, metals of Groups 2 and 2; metal salts of Groups 1 and 2, such as LiF, CsF and Cs2C03; metal organic compounds of Groups 1 and 2, such as Li quinoline; An n-type dopant molecule, such as a colorless dye, a metal complex such as w2(hpp)4, wherein hpp=l,3,4,6,7,8-hexa-2H-mouth pyridine-[ 1,2 screaming bite and dicobalt, tetrathia condensed tetraphenyl, bis(ethylene disulfide) tetrathiafulvalene, heterocyclic or diradical and heterodimer radical or diradical dimerization , oligomers, polymers, snail compounds and polycyclic rings. The electron transport layer 150 is usually formed by chemical or physical vapor deposition. The cathode 160 is an electrode that is particularly effective for injecting electrons or negative charge carriers. The cathode can be any metal or non-metal having a lower work function than the anode. The material for the cathode may be selected from the group consisting of alkali metals of the steroid family (for example, Li, C 〇, Group 2 (alkaline earth) metals, Group 12 metals (including rare earth elements and lanthanum elements), and lanthanides. Materials containing indium, calcium, strontium, barium, and magnesium, and combinations thereof. The organometallic compound containing u, LiF, Li20, organometallic compounds containing Cs, cSF, Cse, and CsAO3 may also be deposited prior to deposition of the cathode layer to lower the operating voltage. This layer may be referred to as an electron injecting layer. — 201233662 The cathode layer 160 is typically formed by a chemical or physical vapor deposition process. In some embodiments, additional layers may be present in the organic electronic device. The layer may be composed of more than one layer. In one embodiment, the different layers have a thickness range as follows: The anode 110 is 100-5000 A, in one embodiment 1 〇〇 2 〇〇〇 A; The hole injection layer 120 is 50-2500 A, in one embodiment 2〇〇_1〇〇〇A; the hole transport layer 130 is 50-2500 A, in one embodiment 200-1000 A; the emission layer 140 is 10-2000 A, in one embodiment 100-1000 A; electron transport layer 15〇 5〇·2〇〇〇a, in one embodiment 100-1000 A; cathode 160 is 200-10000 A, in one embodiment 300-5000 A. If an electron injecting layer is present, the material deposition amount is usually 1 Within the range of -100 A, in one embodiment m〇a. The desired ratio of layer thickness will depend on the actual properties of the materials used. In certain embodiments, an organic electronic device is provided, including on an electrode a first organic active layer and a second organic package=layer, and further comprising a patterned undercoat layer interposed between the first and second organic active layers, wherein the second organic active layer only has the primer The region in which the layer is present, and wherein the undercoat layer comprises a material having the formula: as described above. In some embodiments, the undercoat layer consists essentially of a material having Formula I. In an embodiment, the first organic active layer comprises a conductive polymer and a fluorinated acid polymer. In some embodiments, the second organic active layer comprises a hole transport material. In some embodiments, the The first organic active layer comprises a doped fluorinated acid polymer Ferroelectric polymer, the second organic active layer is mainly a hole transport material is set to 0,

S 52 201233662 In some embodiments, a method for fabricating an organic electronic device includes an anode having a hole injection layer and a hole transport layer on the anode, the method comprising Forming the hole injection layer on the anode, the hole injection layer comprising a fluorinated material and having a first surface energy; forming an undercoat layer directly on the hole injection layer; The undercoat layer is exposed to radiation to produce an exposed area and an unexposed area; the undercoat layer is developed to effectively remove the undercoat layer from the unexposed areas, resulting in a developed primer on the hole injection layer a layer pattern having a second surface energy higher than the first surface energy; and performing liquid deposition on the developed pattern of the undercoat layer to form a hole transport layer; The undercoat layer comprises a material having the formula I as described above. The above is shown in Figure 3. Apparatus 200 has an anode 210 on a substrate (not shown). Located on the anode is a hole injection layer 220. The developed undercoat layer is shown as 225. The surface energy of the hole injection layer 220 is less than the surface energy of the undercoat layer 225. When the hole transport layer 230 is deposited over the undercoat layer and the hole injection layer, it does not wet the low energy surface of the hole injection layer and remains only on the pattern of the undercoat layer. In some embodiments, the hole injection layer comprises a conductive polymer doped with a fluorinated acid polymer. In some embodiments, the hole injection layer consists essentially of a conductive polymer doped with a fluorinated acid polymer. In some embodiments, the hole injection layer consists essentially of a conductive polymer doped with a fluorinated acid polymer and inorganic nanoparticles. In certain embodiments 53 201233662, the inorganic nanoparticles are selected from the group consisting of cerium oxide, titanium oxide, cerium oxide, molybdenum trioxide, vanadium oxide, aluminum oxide, zinc oxide, cerium oxide, cerium oxide, and oxidized planing. a group consisting of copper (II) oxide, tin (IV) oxide, cerium oxide, and combinations thereof. Such materials are described in, for example, the published U.S. Patent Application Serial No. 2004/0102577, No. 2004/0127637, No. In some embodiments, the undercoat layer consists essentially of a material having a workmanship. In certain embodiments, the hole transport layer is selected from the group consisting of triarylamines, carbazoles, polymeric analogs thereof, and combinations thereof. In certain embodiments, the hole transport layer is selected from the group consisting of a polymeric triarylamine, a polymeric triarylamine having a conjugated moiety attached to a non-planar configuration, and a copolymer of a polytriarylamine and a triarylamine. Group. In some implementations, the method further comprises forming an emissive layer by liquid deposition on the transport layer of the hole. In some embodiments the emissive layer comprises an electroluminescent dopant and one or more: bulk materials. In some embodiments the emissive layer is formed by a liquid phase deposition technique selected from the group consisting of ink jet printing and continuous nozzle printing. EXAMPLES The concepts described herein will be further illustrated by the following examples, which are not limited to the invention described in the scope of the patent. Example 1

S 54 201233662 This example illustrates the preparation of compounds c and D. These compounds were prepared according to the procedure shown below:

-PS JDH HO*

Snail-Double 酴 1 is Chen, W. -F.; Lin, Η. Dai S a

The process described by Le"ea2004, A 2341 is synthesized. The diol 1 (10.0 g, 32.4 mmol) was dissolved in 300 mL of methylene chloride and cooled to 0C. Trifluoromethanesulfonic anhydride (13.1 mL, 77.8 mmol) was slowly added and the reaction was slowly warmed to room temperature overnight. The resulting mixture was quenched with 0.5 Μ HC1. The layers were separated and the organic layer was washed sequentially with sodium carbonate solution, water and brine. Evaporation of the volatile material gave a pale pink solid with a yield of 81% (15 g). 55 201233662 Under a nitrogen atmosphere, pour bistrifluoromethanesulfonate 2 (3.07 g, 5.36 mmol), 4-aminobiphenyl (i.9〇4 g, 11.3 _〇1) into a small glass vial. Pd2(dba)3 (0·246 g, 〇268 _〇1), u, bis(diphenylphosphino)ferrocene (〇·297 g, 0.536 mmol) and toluene (40 mL). The resulting solution was stirred for ίο min, then Na〇tBu (1 248 g, 13 4 mmol) was added. The reaction was stirred at room temperature overnight and then heated to 18 hours. After cooling to room temperature, the resulting thick solution was diluted with toluene (~100 mL) and filtered thru a pad. The volatile matter was evaporated and purified with alumina, and a mixture of di-methane and hexane (????/0) was used as a solvent to obtain compound 3 in a yield of 22% (0.73 g). Under a nitrogen atmosphere, diamine 3 (0.73 g, 1-20 mmol), 4,4 iobrobromobiphenyl (0.902 g, 2.51 mmol), PcJ2 (dba) 3 (0.044 g, pour into a small glass vial, 0.048 mmol), 1,1'-bis(diphenylphosphino)ferrocene (〇·〇53 g, 0.096 mmol) and toluene (40 mL). The resulting solution was dropped for 1 min. After that, NaC^Bu (0.242 g, 2.51 mmol) was added. The reaction was heated to 90 ° C for 22 hours. After cooling to room temperature, the resulting thick solution was diluted with toluene (~100 mL) and filtered over a pad of alumina to evaporate volatiles and purified with alumina, using a mixture of di-methane and hexane (40%). The extract was taken to obtain Compound C in a yield of 37% (0.479 g, 99% purity). Compound C was polymerized using Yamamoto conditions to obtain compound d (GPC: Μn = 2781, Mw = 23, 325). Example 2 This example illustrates the preparation of Compound B. The compounds were prepared according to the procedure shown below.

S 56 201233662

Compound B was poured into bistrifluoromethanesulfonate 2 (1.875 g, 3-27 mmol), 3-methylbiphenyl-4-amine (1.26 g, 6.88 mmol), Pd2 in a small glass vial under a nitrogen atmosphere. (dba) 3 (0150 g, 0.164 mmol), 1, bis(diphenylphosphino)ferrocene (0.182 g, 0.327 mmol) and toluene (30 mL). The resulting solution was stirred for 10 minutes, then NaC^Bu (0.762 g, 8.19 mmol). The reaction was heated to 90 ° C for 18 hours. After cooling to room temperature, the resulting thick solution was diluted with toluene (~100 mL) and filtered thru a pad. The volatiles were evaporated and purified with alumina, using a mixture of dichloromethane and hexanes (0-40%) as a solvent to obtain compound 6 in a yield of 61% (1.28 g).

S 57 201233662 Under the milk, diamine 6 (ι.28 g, 2.00 mmol), 4-strong 〇晏·3·decyl-3'-phenyl-biphenyl (1.943 g, 6.00) was poured into a small glass vial. Mm〇1), Pd2(dba)3 (0.044 g, 0.048 mmol), 1,1,-bis(diphenylphosphino)-ferrocene (〇〇19 g, 〇狮面.丨) and toluene (IV) ring. The obtained mixture was heated for 1 hour in 1 hour, and then NaQtBu (G.560 g, 6.0 mmol) was added to heat the hydrazine reaction to the thief for μ hours. After cooling to room temperature, 'five the concentrated amount of _ solution toluene (~100 mL) and dilute it; ε 土 整 整 ^ 并 并 并 并 并 并 并 并 并 并 并 并 并 并 并 并 并 并 并 湘 湘 湘 湘 湘 湘 湘 湘 湘 湘) ° wide. As the extract to obtain the compound B, the yield action ^ ^ ' is not part of the general description or the == described in the example above, but, = 2: one by one =::== The foregoing has been described with respect to the benefits and solutions of a particular embodiment. However, it is not possible to interpret the advantages and solutions of the problem and any features that can make these advantages and problems solve the problem as a concern or a solution to the problem. For purposes of explanation, some of the features of the various embodiments described herein may also be combined in a separate embodiment. Conversely, many of the features described herein may be provided separately or in any sub-combination. In addition, when referring to a range of values, it includes all and every value within the range. BRIEF DESCRIPTION OF THE DRAWINGS The embodiments are described in the accompanying drawings to improve the understanding of the concepts presented herein. Figure 1 includes a diagram of a contact angle. Figure 2 includes an illustration of an organic electronic device. Figure 3 includes a partial illustration of an organic electronic device with a bottomcoat. Those skilled in the art should be aware of the single and clear purpose of the drawings, and not necessarily by Bisaki. = In these figures, the dimensions of some of the objects are relative to them to facilitate understanding of the embodiments. Objects can be targeted 59 201233662 [Main component symbol description]

S 100. .. electronic device 110. anode layer 120.. hole injection layer 130. . . hole transmission layer 140. .. emission layer 150. .. electron transport layer 160.. cathode layer 200. Device 210. .. anode 220.. hole injection layer 225. . . . undercoat 230 . . . hole transport layer 60

Claims (1)

201233662 VII. Patent Application Range: 1. A method for forming a second layer of _ _ _, the method comprising: forming the first layer having a first surface energy; treating the material with a primer material Forming a first layer to form an undercoat layer; patterning the undercoat layer to radiation to produce an exposed area and an unexposed area; developing the undercoat layer to effectively remove the underlayer from the unexposed areas, resulting in a first layer having an undercoating pattern, wherein the undercoating pattern has a second surface energy, and the second surface energy is greater than the first surface energy; and the primer layer on the first layer Performing liquid deposition on the layer pattern to form the second layer; wherein the primer material has the formula Wherein: Ar1 to Ar4 are the same or different and are aryl; L is selected from the group consisting of a spiro group, an adamantyl group, a bicyclocyclohexyl group, an condensed analog thereof, and a substituted derivative thereof; Rl is the same or different at each occurrence, and is selected from the group consisting of D, F, alkyl, aryl, alkoxy, thiol and a crosslinkable group 61 201233662, wherein the phase The adjacent R1 groups may be joined together to form an aromatic ring; R2 is the same or different at each occurrence and is selected from the group consisting of ruthenium, D and halogen; a is present at each occurrence The same or different and are integers from 0 to 4; and η is an integer greater than zero. 2. The method of claim 1, wherein the primer material has the formula II Wherein: Ar1 and Ar2 are the same or different and are aryl; L is selected from the group consisting of a spiro group, an adamantyl group, a bicyclocyclohexyl group, a deuterated analog thereof, and a substituted derivative thereof; E is the same or different at each occurrence, and is selected from a single bond, C(R3)2, C(R4)2C(R4)2, Ο, Si(R3)2, Ge(R3)2 a group consisting of; R1 is the same or different at each occurrence, and is selected from the group consisting of D, F, alkyl, aryl, alkoxy, thiol and a crosslinkable group a group wherein adjacent R1 groups may be joined together to form an aromatic ring; S 62 201233662 R2 is the same or different at each occurrence and is selected from the group consisting of ruthenium, D • and halogen R3 is the same or different at each occurrence and is selected from the group consisting of an alkyl group and an aryl group, wherein adjacent R3 groups may be bonded together to form an aliphatic ring; When present, the same or different, and selected from the group consisting of Η, D, and alkyl; a is the same or different at each occurrence and is an integer from 0-4; and η is greater than 0. . 3. The method of claim 1, wherein the primer material has the formula III Wherein = Ar1 is the same as or different from Ar2 and is an aryl group; L is selected from the group consisting of a spiro group, an adamantyl group, a bicyclocyclohexyl group, a deuterated analog thereof, and a substituted derivative thereof; R1 is the same or different at each occurrence, and is selected from the group consisting of D, F, alkyl, aryl, alkoxy, fragment and a crosslinkable group 63 201233662, wherein the phase The adjacent R1 groups may be joined together to form an aromatic ring; R2 is the same or different at each occurrence, and is selected from the group consisting of ruthenium, D, and halogen; R5 is present at each occurrence The same or different, and selected from the group consisting of D, F, alkyl, aryl, alkoxy, fluorenyl and a crosslinkable group; R6 to R9 are the same at each occurrence or Different from, and selected from the group consisting of ruthenium, D, F, alkyl, aryl, alkoxy, fluorenyl and a crosslinkable group, provided that at least one of R6 and R7 is An alkyl or fluorenyl group, and at least one of R8 and R9 is an alkyl group or a fragment; a is the same or different at each occurrence and is an integer from 0 to 4. b is the same or different and is an integer from 0 to 2 at each occurrence; and η is an integer greater than zero. 4. The method of any of claims 1-3, wherein Ar1 and Ar2 have Wherein: S 64 201233662 R 〇 is the same or different at each occurrence and is selected from the group consisting of D, alkyl, alkoxy, decane and sulfhydryl; c is present at each occurrence The same or different and integers; d is an integer from 0 to 5; and m is an integer from 1 to 5. The method of any one of claims 1 to 3, wherein Ari and Ar2 are selected from the group consisting of phenyl, biphenyl, terphenyl, a deuterated derivative thereof, and substituted derivatives thereof. In the group, the substituted derivative has one or more substituents selected from the group consisting of an alkyl group, an alkoxy group, a thiol group, and a substituent having a crosslinking group. 6. The method of any one of clauses 1-5, wherein a = 〇. 7. The method of claim 2, wherein the E is selected from the group consisting of c(r3)2 and C(R4)2C(R4)2. 8. The method of claim 2, wherein R3 is selected from the group consisting of phenyl, biphenyl, and fluoroalkyl. 9. The method of claim 2, 7 or 8, wherein R4 is selected from the group consisting of η and D. 10. The method of claim 3, wherein R6 = R8 = alkyl group. 11. The method of claim 3, wherein R7 = R9 = alkyl. 65 201233662 12. A method for manufacturing an organic electronic device, the organic electronic device comprising an electrode having a first organic active layer and a second organic active layer disposed thereon, the method comprising: Forming an active layer having a first surface energy on the electrode; treating the first organic active layer with a primer material to form an undercoat layer; and applying a region and a pattern to the undercoat (4) to cause exposure to develop the undercoat layer Effectively removing the coating from the unexposed regions to produce a first active organic layer having an undercoating pattern, wherein the undercoating pattern has a second surface energy, and the second surface energy is greater than the a first surface energy; and performing liquid deposition on the undercoat layer pattern on the first organic active layer to form the second organic active layer; wherein the undercoat material has the formula j R2 Wherein: Ar to Ar4 are the same or different and are aryl; L-system: a group selected from the group consisting of a spiro group, a diamond substrate, a bicyclocyclohexyl group, an condensed analog thereof, and a substituted derivative thereof ; S 66 201233662 R1 is the same or different at each occurrence, and is selected from the group consisting of D, F, alkyl, aryl, alkoxy, Shi Xiji and a crosslinkable group; Wherein adjacent R1 groups may be joined together to form an aromatic ring; R2 is the same or different at each occurrence and is selected from the group consisting of H, D and halogen; When present, are the same or different and are integers from 0 to 4; and η is an integer greater than zero. 13. The method of claim 12, wherein the first active layer is a hole transport layer and the second active layer is an emitter layer. 14. The method of claim 12, wherein the first active layer is a hole injection layer and the second active layer is a hole transport layer. 15. The method of claim 14, wherein the hole injection layer comprises a conductive polymer and a fluorinated acid polymer. 16. The method of claim 14, wherein the hole injection layer consists essentially of a conductive polymer doped with a fluorinated acid polymer and inorganic nanoparticles. 17. The method of claim 14, further comprising forming an emissive layer by liquid deposition on the hole transport layer. 67 201233662 18. An organic electronic device comprising a first organic active layer and a second organic active layer on an electrode, and further comprising a patterned bottom between the first and second organic active layers a coating wherein the second organic active layer is only present in the region where the undercoat layer is present, and wherein the undercoat layer comprises a material having the formula I Wherein: Ar1 to Ar4 are the same or different and are aryl; L is selected from the group consisting of a spiro group, an adamantyl group, a bicyclocyclohexyl group, a deuterated analog thereof, and a substituted derivative thereof; R1 is the same or different at each occurrence, and is selected from the group consisting of D, F, alkyl, aryl, alkoxy, thiol and a crosslinkable group, wherein adjacent R1 The groups may be joined together to form an aromatic ring; R2 is the same or different at each occurrence and is selected from the group consisting of H, D and halogen; a is the same at each occurrence or Different and are integers from 0 to 4; and η is an integer greater than zero. S 68