CN101916051B - 形成微电子结构的方法 - Google Patents
形成微电子结构的方法 Download PDFInfo
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- CN101916051B CN101916051B CN201010110135.5A CN201010110135A CN101916051B CN 101916051 B CN101916051 B CN 101916051B CN 201010110135 A CN201010110135 A CN 201010110135A CN 101916051 B CN101916051 B CN 101916051B
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Classifications
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- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
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- C—CHEMISTRY; METALLURGY
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- C07C43/166—Unsaturated ethers containing six-membered aromatic rings having unsaturation outside the aromatic rings
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- G03F7/26—Processing photosensitive materials; Apparatus therefor
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- G—PHYSICS
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/948—Radiation resist
- Y10S438/952—Utilizing antireflective layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
- Y10T428/31692—Next to addition polymer from unsaturated monomers
- Y10T428/31699—Ester, halide or nitrile of addition polymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/31935—Ester, halide or nitrile of addition polymer
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- Architecture (AREA)
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- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
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| US56632904P | 2004-04-29 | 2004-04-29 | |
| US60/566,329 | 2004-04-29 | ||
| US11/105,862 | 2005-04-14 | ||
| US11/105,862 US20050255410A1 (en) | 2004-04-29 | 2005-04-14 | Anti-reflective coatings using vinyl ether crosslinkers |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2005800132461A Division CN1981240B (zh) | 2004-04-29 | 2005-04-15 | 使用乙烯基醚交联剂的减反射涂层 |
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| CN101916051A CN101916051A (zh) | 2010-12-15 |
| CN101916051B true CN101916051B (zh) | 2014-07-23 |
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| CN201010110135.5A Expired - Lifetime CN101916051B (zh) | 2004-04-29 | 2005-04-15 | 形成微电子结构的方法 |
| CN2005800132461A Expired - Lifetime CN1981240B (zh) | 2004-04-29 | 2005-04-15 | 使用乙烯基醚交联剂的减反射涂层 |
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| CN2005800132461A Expired - Lifetime CN1981240B (zh) | 2004-04-29 | 2005-04-15 | 使用乙烯基醚交联剂的减反射涂层 |
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| EP (1) | EP1743219B1 (https=) |
| JP (2) | JP5972510B2 (https=) |
| KR (2) | KR101308191B1 (https=) |
| CN (2) | CN101916051B (https=) |
| TW (1) | TWI387612B (https=) |
| WO (1) | WO2005111719A2 (https=) |
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Also Published As
| Publication number | Publication date |
|---|---|
| WO2005111719A2 (en) | 2005-11-24 |
| JP5972510B2 (ja) | 2016-08-17 |
| US20050255410A1 (en) | 2005-11-17 |
| US20070117049A1 (en) | 2007-05-24 |
| KR101308191B1 (ko) | 2013-09-13 |
| KR20070012812A (ko) | 2007-01-29 |
| WO2005111719A3 (en) | 2006-11-09 |
| CN1981240A (zh) | 2007-06-13 |
| CN101916051A (zh) | 2010-12-15 |
| EP1743219A4 (en) | 2010-04-28 |
| US20120156613A1 (en) | 2012-06-21 |
| EP1743219B1 (en) | 2015-12-09 |
| EP1743219A2 (en) | 2007-01-17 |
| JP2007536389A (ja) | 2007-12-13 |
| KR101308281B1 (ko) | 2013-09-13 |
| TW200615312A (en) | 2006-05-16 |
| KR20120015360A (ko) | 2012-02-21 |
| TWI387612B (zh) | 2013-03-01 |
| CN1981240B (zh) | 2012-09-26 |
| US9110372B2 (en) | 2015-08-18 |
| JP5511887B2 (ja) | 2014-06-04 |
| US20090317747A1 (en) | 2009-12-24 |
| US7601483B2 (en) | 2009-10-13 |
| JP2012188671A (ja) | 2012-10-04 |
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