KR100917101B1 - 플렉시블 금속적층체 및 그 제조방법 - Google Patents
플렉시블 금속적층체 및 그 제조방법 Download PDFInfo
- Publication number
- KR100917101B1 KR100917101B1 KR1020010045826A KR20010045826A KR100917101B1 KR 100917101 B1 KR100917101 B1 KR 100917101B1 KR 1020010045826 A KR1020010045826 A KR 1020010045826A KR 20010045826 A KR20010045826 A KR 20010045826A KR 100917101 B1 KR100917101 B1 KR 100917101B1
- Authority
- KR
- South Korea
- Prior art keywords
- resistant resin
- flexible metal
- heat
- heat resistant
- resin film
- Prior art date
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 137
- 239000002184 metal Substances 0.000 title claims abstract description 136
- 238000004519 manufacturing process Methods 0.000 title claims description 28
- 229920006015 heat resistant resin Polymers 0.000 claims abstract description 67
- 239000011888 foil Substances 0.000 claims abstract description 60
- 229920005989 resin Polymers 0.000 claims abstract description 51
- 239000011347 resin Substances 0.000 claims abstract description 51
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims abstract description 41
- 238000001035 drying Methods 0.000 claims abstract description 39
- 229920000642 polymer Polymers 0.000 claims abstract description 30
- 238000010438 heat treatment Methods 0.000 claims abstract description 24
- 239000013557 residual solvent Substances 0.000 claims abstract description 21
- 238000009833 condensation Methods 0.000 claims abstract description 18
- 230000005494 condensation Effects 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims description 50
- 239000002904 solvent Substances 0.000 claims description 41
- 239000011248 coating agent Substances 0.000 claims description 26
- 238000000576 coating method Methods 0.000 claims description 26
- 230000008569 process Effects 0.000 claims description 25
- 125000003118 aryl group Chemical group 0.000 claims description 20
- 229920001721 polyimide Polymers 0.000 claims description 20
- 239000004642 Polyimide Substances 0.000 claims description 15
- 239000004962 Polyamide-imide Substances 0.000 claims description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 12
- 239000003960 organic solvent Substances 0.000 claims description 12
- 229920002312 polyamide-imide Polymers 0.000 claims description 12
- 230000003746 surface roughness Effects 0.000 claims description 11
- 239000000853 adhesive Substances 0.000 claims description 10
- 239000012298 atmosphere Substances 0.000 claims description 10
- 230000001070 adhesive effect Effects 0.000 claims description 9
- 239000011261 inert gas Substances 0.000 claims description 9
- 230000008859 change Effects 0.000 claims description 8
- 238000007654 immersion Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 238000009835 boiling Methods 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 230000014759 maintenance of location Effects 0.000 claims description 5
- 238000004804 winding Methods 0.000 claims description 5
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- 230000009467 reduction Effects 0.000 claims description 2
- 238000005219 brazing Methods 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 7
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- 239000000243 solution Substances 0.000 description 40
- 239000010410 layer Substances 0.000 description 34
- 230000015572 biosynthetic process Effects 0.000 description 15
- 238000003786 synthesis reaction Methods 0.000 description 13
- 230000009477 glass transition Effects 0.000 description 12
- 239000000758 substrate Substances 0.000 description 10
- 239000003513 alkali Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
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- 239000002253 acid Substances 0.000 description 7
- 239000011889 copper foil Substances 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 7
- 150000001412 amines Chemical class 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 6
- 238000005476 soldering Methods 0.000 description 6
- -1 alicyclic dicarboxylic acids Chemical class 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 4
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
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- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 125000005442 diisocyanate group Chemical group 0.000 description 3
- 239000012948 isocyanate Substances 0.000 description 3
- 239000011698 potassium fluoride Substances 0.000 description 3
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- 230000008961 swelling Effects 0.000 description 3
- DCTOHCCUXLBQMS-UHFFFAOYSA-N 1-undecene Chemical compound CCCCCCCCCC=C DCTOHCCUXLBQMS-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
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- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- IXQBIOPGDNZYNA-UHFFFAOYSA-N N=C=O.N=C=O.CC1=CC=CC=C1C1=CC=CC=C1C Chemical compound N=C=O.N=C=O.CC1=CC=CC=C1C1=CC=CC=C1C IXQBIOPGDNZYNA-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
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- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
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- 125000006267 biphenyl group Chemical group 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L calcium carbonate Substances [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
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- 238000004807 desolvation Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 125000006159 dianhydride group Chemical group 0.000 description 2
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- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
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- 229910010272 inorganic material Inorganic materials 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
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- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
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- 238000006116 polymerization reaction Methods 0.000 description 2
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- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 2
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- YKNMIGJJXKBHJE-UHFFFAOYSA-N (3-aminophenyl)-(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=CC(N)=C1 YKNMIGJJXKBHJE-UHFFFAOYSA-N 0.000 description 1
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- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
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- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
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- UCQABCHSIIXVOY-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]phenoxy]aniline Chemical group NC1=CC=CC(OC=2C=CC(=CC=2)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 UCQABCHSIIXVOY-UHFFFAOYSA-N 0.000 description 1
- WCXGOVYROJJXHA-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WCXGOVYROJJXHA-UHFFFAOYSA-N 0.000 description 1
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- 239000004215 Carbon black (E152) Substances 0.000 description 1
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- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
Description
Claims (18)
- 금속박으로 된 금속층 및 그 한쪽 면에 형성된, 유기용제에 가용(可溶)인 축합형 고분자를 포함하는 내열성 수지필름층을 갖추고 있으되, 상기 축합형 고분자가 방향족 폴리이미드 및 방향족 폴리아미드이미드로 이루어진 군으로부터 선택된 축합형 고분자이며; 상기 내열성 수지필름층이, 상기 축합형 고분자를 상기 유기용제에 용해시킨 용액을 금속박에 도포하여, 초기건조에 의해 잔존 용제율을 10~40중량%로 하는 초기건조 공정, 열처리·탈용제 공정을 행함으로써 형성되고, 이렇게 하여 형성된 내열성 수지필름층의 N-메틸-2-피롤리돈에 대한 불용률이 1%~99%인 것을 특징으로 하는, 플렉시블 금속적층체.
- 삭제
- 삭제
- 제1항에 있어서, 인열강도(필름두께 20 ㎛)가 15 Kg 이상, 200℃에서 30분간 가열했을 때의 치수 변화율이 0.1% 이하인 것을 특징으로 하는 내열성 수지필름층이 형성되어 된 플렉시블 금속적층체.
- 제1항에 있어서, 납땜내열이 350℃ 이상, 금속층과 내열성 수지필름층과의 접착강도가 80 g/mm 이상, 컬의 곡률반경이 15 cm 이상인 것을 특징으로 하는 플렉시블 금속적층체.
- 제1항에 있어서, 내열성 수지필름층의 수산화나트륨수용액(40%)에 25℃에서 100시간 침지 후의 탄성률 유지율이, 40% 이상인 것을 특징으로 하는 플렉시블 금속적층체.
- 하기 공정(A) 및 (C)를 포함하는 제1항 및 제4항 내지 제7항 중 어느 한 항의 플렉시블 금속적층체의 제조방법:(A) 금속박에, 방향족 폴리이미드 및 방향족 폴리아미드이미드로 이루어진 군으로부터 선택된 내열성 수지의 용액을 도포 ·초기건조시켜, 잔존 용제율을 10∼40중량%로 하는 공정 및(C) 상기 공정(A)에서 얻어진 초기건조 적층물을, 감압 및 불활성 가스 분위기로부터 선택된 하나 이상의 조건하에서, 초기건조시킨 내열성 수지필름층의 N-메틸-2-피롤리돈에 대한 불용률이 1%~99%가 되도록 탈용제하면서 열처리하는 공정
- 하기 공정(A) 내지 (C)를 포함하는 제1항 및 제4항 내지 제7항 중 어느 한 항의 플렉시블 금속적층체의 제조방법:(A) 금속박에, 방향족 폴리이미드 및 방향족 폴리아미드이미드로 이루어진 군으로부터 선택된 내열성 수지의 용액을 도포 ·초기건조시켜, 잔존 용제율을 10∼40중량%로 하는 공정;(B) 공정(A)에서 얻어진 초기건조 적층물을, 그 도포면과 비도포면이 접촉품용으로 권취(捲取)하여 두루마리 상태로 만드는 공정; 및(C) 상기 공정(B)에서 얻어진 생성물을, 감압 및 불활성 가스 분위기로부터 선택된 하나 이상의 조건하에서, 초기건조시킨 내열성 수지필름층의 N-메틸-2-피롤리돈에 대한 불용률이 1%~99%가 되도록 탈용제하면서 열처리하는 공정
- 제8항에 있어서, 상기 초기건조를, 내열성 수지용액에 사용하는 용제의 비점 보다 70℃∼130℃ 낮은 온도에서 행하는 것을 특징으로 하는 플렉시블 금속적층체의 제조방법.
- 삭제
- 제8항에 있어서, 공정(C)에 있어서, 감압 건조하여 잔존 용제율을 5중량% 이 하로 하는 것을 특징으로 하는 플렉시블 금속적층체의 제조방법.
- 제9항에 있어서, 공정(B)에 있어서, 상기 권취시에 도포면을 바깥쪽으로 하여, 적층물 양단의 도포면에 있어서의 수지용액의 미도공부분에 상기 적층물과는 다른 소재의 테이프로 끼워 넣는 것 및 적층물 양단부의 안과 밖을 테이프로 감싸는 것으로부터 선택되는 하나 이상을 특징으로 하는 플렉시블 금속적층체의 제조방법.
- 제8항에 있어서, 상기 내열성 수지가 유기용제에 가용인 폴리이미드 및 폴리아미드이미드로부터 선택되는 하나 이상인 것을 특징으로 하는 플렉시블 금속적층체의 제조방법.
- 제8항의 방법에 의해 제조되는 플렉시블 금속적층체.
- 제1항에 있어서, 내열성 수지필름층의 금속박에 접하는 면의 평균 표면거칠기가 0.4 ㎛ 이하인 것을 특징으로 하는 플렉시블 금속적층체.
- 제1항 및 제4항 내지 제7항 중 어느 한 항의 플렉시블 금속적층체로부터 얻어지는 플렉시블 프린트배선판.
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JP2000237389A JP4560697B2 (ja) | 1999-08-04 | 2000-08-04 | フレキシブル金属積層体及びその製造方法 |
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Also Published As
Publication number | Publication date |
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CN1337312A (zh) | 2002-02-27 |
US20070009710A1 (en) | 2007-01-11 |
US7468197B2 (en) | 2008-12-23 |
KR20020011875A (ko) | 2002-02-09 |
US20020160211A1 (en) | 2002-10-31 |
CN100484753C (zh) | 2009-05-06 |
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