CN101522737B - 聚有机硅氧烷组合物 - Google Patents
聚有机硅氧烷组合物 Download PDFInfo
- Publication number
- CN101522737B CN101522737B CN2007800343137A CN200780034313A CN101522737B CN 101522737 B CN101522737 B CN 101522737B CN 2007800343137 A CN2007800343137 A CN 2007800343137A CN 200780034313 A CN200780034313 A CN 200780034313A CN 101522737 B CN101522737 B CN 101522737B
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- China
- Prior art keywords
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- polyorganosiloxane
- film
- composition
- mass
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
- C08F290/148—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/12—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/58—Metal-containing linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L51/08—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds
- C08L51/085—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds on to polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
- C09D151/08—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C09D151/085—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds on to polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Silicon Polymers (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP267045/2006 | 2006-09-29 | ||
| JP2006267045 | 2006-09-29 | ||
| JP2006298506 | 2006-11-02 | ||
| JP298506/2006 | 2006-11-02 | ||
| PCT/JP2007/068961 WO2008041630A1 (en) | 2006-09-29 | 2007-09-28 | Polyorganosiloxane composition |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011100091350A Division CN102174155B (zh) | 2006-09-29 | 2007-09-28 | 聚有机硅氧烷组合物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101522737A CN101522737A (zh) | 2009-09-02 |
| CN101522737B true CN101522737B (zh) | 2012-06-20 |
Family
ID=39268489
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011100091350A Expired - Fee Related CN102174155B (zh) | 2006-09-29 | 2007-09-28 | 聚有机硅氧烷组合物 |
| CN2007800343137A Expired - Fee Related CN101522737B (zh) | 2006-09-29 | 2007-09-28 | 聚有机硅氧烷组合物 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011100091350A Expired - Fee Related CN102174155B (zh) | 2006-09-29 | 2007-09-28 | 聚有机硅氧烷组合物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20100019399A1 (enExample) |
| EP (1) | EP2067800A4 (enExample) |
| JP (1) | JP5388331B2 (enExample) |
| KR (1) | KR101022994B1 (enExample) |
| CN (2) | CN102174155B (enExample) |
| TW (1) | TW200837087A (enExample) |
| WO (1) | WO2008041630A1 (enExample) |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009127022A (ja) * | 2007-11-28 | 2009-06-11 | Nitto Denko Corp | ポリアルミノシロキサンを含む光半導体素子封止用樹脂およびそれを用いて得られる光半導体装置 |
| JP5024878B2 (ja) * | 2007-11-28 | 2012-09-12 | 日東電工株式会社 | ポリボロシロキサンを含む光半導体素子封止用樹脂、およびそれを用いて得られる光半導体装置 |
| US8475996B2 (en) | 2007-12-14 | 2013-07-02 | Asahi Kasei E-Materials Corporation | Photosensitive resin composition |
| JP5179972B2 (ja) * | 2008-06-27 | 2013-04-10 | 旭化成イーマテリアルズ株式会社 | 感光性ポリオルガノシロキサン組成物、ポリオルガノシロキサン硬化レリーフパターン及びその形成方法、並びに半導体装置及びその製造方法 |
| JP5576622B2 (ja) * | 2008-07-01 | 2014-08-20 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物 |
| JP5607898B2 (ja) * | 2008-07-01 | 2014-10-15 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物 |
| KR100980270B1 (ko) * | 2008-07-31 | 2010-09-07 | 한국과학기술원 | Led 봉지용 실록산 수지 |
| JP4638550B2 (ja) | 2008-09-29 | 2011-02-23 | 東京エレクトロン株式会社 | マスクパターンの形成方法、微細パターンの形成方法及び成膜装置 |
| JP5188374B2 (ja) * | 2008-12-02 | 2013-04-24 | 日東電工株式会社 | マイクロレンズアレイ |
| CA2745075A1 (en) * | 2008-12-03 | 2010-06-10 | Soreq Nuclear Research Center | Uv-curable inorganic-organic hybrid resin and method for preparation thereof |
| US8372504B2 (en) * | 2009-01-13 | 2013-02-12 | Korea Advanced Institute Of Science And Technology | Transparent composite compound |
| WO2011013664A1 (ja) * | 2009-07-29 | 2011-02-03 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物、感光性樹脂積層体及びレジストパターン形成方法 |
| JP5581684B2 (ja) * | 2009-12-17 | 2014-09-03 | Jsr株式会社 | 感放射線性組成物及び硬化膜 |
| JP5646855B2 (ja) * | 2010-02-01 | 2014-12-24 | 日東電工株式会社 | シリコーン樹脂組成物 |
| WO2011145750A1 (ja) * | 2010-05-20 | 2011-11-24 | 日立化成工業株式会社 | 感光性樹脂組成物、感光性フィルム、リブパターンの形成方法、中空構造とその形成方法及び電子部品 |
| JP5691920B2 (ja) * | 2010-08-24 | 2015-04-01 | 日立化成株式会社 | 感光性樹脂組成物、感光性フィルム、リブパターンの形成方法、中空構造の形成方法及び電子部品 |
| US8513321B2 (en) | 2010-11-05 | 2013-08-20 | Ppg Industries Ohio, Inc. | Dual cure coating compositions, methods of coating a substrate, and related coated substrates |
| KR101320243B1 (ko) * | 2010-12-28 | 2013-10-23 | 롬엔드하스전자재료코리아유한회사 | 감광성 수지 조성물, 이를 이용한 보호막 및 전자부품 |
| WO2012097836A1 (en) | 2011-01-21 | 2012-07-26 | Fraunhofer-Gesellschaft Zur Förderung Der... | Polymerizable compositions, cured products obtained therewith, and use of these materials |
| TWI540644B (zh) * | 2011-07-01 | 2016-07-01 | 漢高智慧財產控股公司 | 斥性材料於半導體總成中保護製造區域之用途 |
| KR101865922B1 (ko) * | 2011-09-30 | 2018-06-11 | 롬엔드하스전자재료코리아유한회사 | 유기실록산 중합체를 포함하는 저온 경화성 수지 조성물 |
| US20140363683A1 (en) * | 2013-02-27 | 2014-12-11 | Tru Vue, Inc. | Scratch and abrasion resistant uv blocking glass coating |
| CN103232600B (zh) * | 2013-05-23 | 2015-01-28 | 汕头市骏码凯撒有限公司 | 一种高折射率苯基硅树脂的制备方法 |
| JPWO2015060190A1 (ja) * | 2013-10-21 | 2017-03-09 | 学校法人東海大学 | 光導波路の製造方法 |
| GB201323041D0 (en) * | 2013-12-23 | 2014-02-12 | Dow Corning | Curable coating compositions containing an unsaturated alkoxysilane |
| KR20250011249A (ko) * | 2014-05-13 | 2025-01-21 | 가부시끼가이샤 레조낙 | 감광성 수지 조성물, 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 프린트 배선판의 제조 방법 |
| JP6140764B2 (ja) * | 2014-05-21 | 2017-05-31 | 旭化成株式会社 | 水系コーティング剤組成物、塗膜、及び塗装製品 |
| CN109071731B (zh) * | 2016-04-11 | 2021-08-13 | 日产化学株式会社 | 含有反应性含菲环倍半硅氧烷化合物的聚合性组合物 |
| SG11201810722PA (en) * | 2016-05-30 | 2018-12-28 | Nissan Chemical Corp | Polymerizable silane compound |
| KR102314075B1 (ko) * | 2016-05-30 | 2021-10-18 | 닛산 가가쿠 가부시키가이샤 | 반응성 폴리실록산 및 이것을 포함하는 중합성 조성물 |
| FI129480B (en) * | 2018-08-10 | 2022-03-15 | Pibond Oy | Silanol-containing organic-inorganic hybrid coatings for high resolution patterning |
| EP3837305B1 (de) * | 2018-08-17 | 2021-11-03 | Wacker Chemie AG | Vernetzbare organopolysiloxan-zusammensetzungen |
| CN112295702B (zh) * | 2019-07-26 | 2022-06-17 | 长江大学 | 一种实验室快速制备微米级微塑料的方法 |
| CN113583038A (zh) * | 2021-07-27 | 2021-11-02 | 合盛硅业(鄯善)有限公司 | 八甲基环四硅氧烷提纯方法 |
| CN119361827B (zh) * | 2024-10-21 | 2025-10-10 | 蓝固(常州)新能源有限公司 | 一种电解液添加剂以及应用 |
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| JP2006156075A (ja) * | 2004-11-29 | 2006-06-15 | Seiko Epson Corp | 電気光学装置の製造方法及び画像形成装置 |
| JP4281678B2 (ja) * | 2004-11-29 | 2009-06-17 | セイコーエプソン株式会社 | 電気光学装置の製造方法及び画像形成装置 |
| GB2424382A (en) * | 2005-02-25 | 2006-09-27 | Asahi Chemical Ind | Antireflective coatings |
| WO2008001706A1 (en) * | 2006-06-29 | 2008-01-03 | Asahi Kasei Emd Corporation | Method for producing plastic lens |
-
2007
- 2007-09-28 JP JP2008537508A patent/JP5388331B2/ja not_active Expired - Fee Related
- 2007-09-28 WO PCT/JP2007/068961 patent/WO2008041630A1/ja not_active Ceased
- 2007-09-28 KR KR1020097005309A patent/KR101022994B1/ko not_active Expired - Fee Related
- 2007-09-28 EP EP07828702A patent/EP2067800A4/en not_active Withdrawn
- 2007-09-28 CN CN2011100091350A patent/CN102174155B/zh not_active Expired - Fee Related
- 2007-09-28 CN CN2007800343137A patent/CN101522737B/zh not_active Expired - Fee Related
- 2007-09-28 US US12/441,355 patent/US20100019399A1/en not_active Abandoned
- 2007-09-29 TW TW096136664A patent/TW200837087A/zh not_active IP Right Cessation
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US4201808A (en) * | 1978-06-12 | 1980-05-06 | Union Carbide Corporation | Radiation curable silicone release compositions |
| CN87101980A (zh) * | 1986-03-17 | 1988-03-23 | 信越化学工业株式会社 | 一种能光固化的有机多分子硅氧烷组合物 |
| EP1106653A2 (en) * | 1999-11-19 | 2001-06-13 | Dow Corning Asia, Ltd. | Method for photocuring polyorganosiloxane and polysiloxane composition for optical use |
| US20050212069A1 (en) * | 2004-03-26 | 2005-09-29 | Fuji Photo Film Co., Ltd. | Solid state imaging device |
| US20050244658A1 (en) * | 2004-04-12 | 2005-11-03 | Korea Advanced Institute Of Science And Technology | Inorganic/organic hybrid oligomer and nano hybrid polymer for use in optical devices and displays, and process for preparing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20090051097A (ko) | 2009-05-20 |
| EP2067800A1 (en) | 2009-06-10 |
| KR101022994B1 (ko) | 2011-03-22 |
| CN102174155A (zh) | 2011-09-07 |
| TW200837087A (en) | 2008-09-16 |
| JP5388331B2 (ja) | 2014-01-15 |
| EP2067800A4 (en) | 2010-02-24 |
| CN102174155B (zh) | 2013-07-24 |
| JPWO2008041630A1 (ja) | 2010-02-04 |
| WO2008041630A1 (en) | 2008-04-10 |
| US20100019399A1 (en) | 2010-01-28 |
| CN101522737A (zh) | 2009-09-02 |
| TWI363765B (enExample) | 2012-05-11 |
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