WO2015067120A1 - 功能材料及其制备方法、显示结构形成材料、彩膜基板、显示装置 - Google Patents

功能材料及其制备方法、显示结构形成材料、彩膜基板、显示装置 Download PDF

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WO2015067120A1
WO2015067120A1 PCT/CN2014/088679 CN2014088679W WO2015067120A1 WO 2015067120 A1 WO2015067120 A1 WO 2015067120A1 CN 2014088679 W CN2014088679 W CN 2014088679W WO 2015067120 A1 WO2015067120 A1 WO 2015067120A1
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Prior art keywords
parts
oxide
functional material
mixed powder
display structure
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PCT/CN2014/088679
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English (en)
French (fr)
Inventor
杨久霞
白峰
刘建涛
Original Assignee
京东方科技集团股份有限公司
北京京东方光电科技有限公司
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Priority claimed from CN201310554220.4A external-priority patent/CN103555003A/zh
Application filed by 京东方科技集团股份有限公司, 北京京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/758,437 priority Critical patent/US9598308B2/en
Publication of WO2015067120A1 publication Critical patent/WO2015067120A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/12—Silica-free oxide glass compositions
    • C03C3/14—Silica-free oxide glass compositions containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/067—Polyurethanes; Polyureas
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Definitions

  • Embodiments of the present invention relate to a functional material, a method of fabricating the same, a display structure forming material, a color filter substrate, and a display device.
  • Display devices such as computer monitors and televisions are becoming more and more widely used. At the same time, people's awareness of environmental protection is also growing. Therefore, it is important to ensure the environmental friendliness of the display device to ensure that it does not affect the environment during preparation and use.
  • a display structure such as a color filter film (color film), a black matrix (BM, Black Matrix), a spacer (PS), and an overcoat layer (OC) is formed of a display structure forming material.
  • the display structure forming material usually includes a volatile organic solvent, so that a large amount of solvent is released into the air during the formation of the display structure, resulting in a decrease in air quality.
  • Embodiments of the present invention provide an environmentally friendly functional material comprising an inorganic mixed powder comprising a main ingredient and an auxiliary material;
  • the main material is composed of boron oxide, sodium oxide, lithium oxide or zirconium oxide;
  • the auxiliary materials include oxidation of alumina, zinc oxide, titanium dioxide, silicon dioxide, calcium oxide, silver complex, silver phosphate, silver nitrate, tourmaline, silver thiosulfate, carbon nanotubes, aluminum sulfate, manganese, manganese.
  • the inorganic mixed powder further includes an additive comprising: one or more of graphite, mica, blue sapphire, calcite, crystal fluorite, medical stone, mullite .
  • the amount of the additive is from 1 to 5% by weight based on the total weight of the main material and the auxiliary material.
  • the inorganic mixed powder has a particle diameter of between 20 and 300 nm.
  • the inorganic mixed powder has a surface-modifying layer which is a layer formed of a photocurable alkali-soluble resin having a molecular weight of 5,000 or more and 2,500 or more.
  • the surface modification layer is formed by copolymerizing a polymerizable ethylenically unsaturated monomer with an organic acid anhydride.
  • the polymerizable ethylenically unsaturated monomer is any one of styrene, vinyl toluene, p-chlorostyrene, methoxystyrene, ⁇ -methylstyrene, and isoamylene;
  • Maleic anhydride maleic anhydride, fumaric acid, itaconic anhydride, citraconic anhydride, pyromellitic dianhydride, biphenyltetracarboxylic dianhydride, benzophenone tetraacid dianhydride, oxybiphenyl tetra Any of formic acid dianhydride and isopropyl diphthalic anhydride.
  • the weight ratio of the inorganic mixed powder, the organic acid anhydride, and the polymerizable ethylenically unsaturated monomer is 1: (0.8 to 1.2): (0.85 to 1.15).
  • the inorganic mixed powder comprises, by weight:
  • Lithium oxide 0.2 to 20 parts
  • Alumina 5 to 40 parts
  • Titanium dioxide 0.5 to 8 parts.
  • the inorganic mixed powder comprises, by weight:
  • Lithium oxide 1.5 to 18 parts
  • Alumina 8 to 32 parts
  • Titanium dioxide 1.5 to 7 parts.
  • Embodiments of the present invention provide a display structure forming material comprising: an alkali soluble resin, an unsaturated monomer, an initiator, a solvent, and the above functional materials.
  • the display structure forming material is a photoresist material, and the photoresist material further contains a colorant.
  • the photoresist material comprises, by weight:
  • Colorant 2 to 15 parts
  • Alkali soluble resin 2 to 20 parts
  • Unsaturated monomer 2 to 20 parts;
  • the photoresist material is any one of a red photoresist material, a blue photoresist material, a green photoresist material, a yellow photoresist material, and a black photoresist material.
  • the display structure forming material is a spacer material.
  • the spacer material comprises, by weight:
  • Alkali soluble resin 5 to 20 parts
  • Unsaturated monomer 5 to 20 parts
  • the initiator is a photoinitiator or a thermal initiator.
  • Embodiments of the present invention provide a display structure forming material, which is a protective layer material, and the protective layer material comprises, by weight:
  • Acrylic resin 5 to 25 parts
  • Coupling agent 1 to 15 parts
  • Epoxy resin 1 to 20 parts
  • Solvent 70 to 80 parts.
  • Embodiments of the present invention provide a color filter substrate including a plurality of display structures, and at least one of the display structures is prepared from the above-described display structure forming material.
  • Embodiments of the present invention provide a display device including the above color film substrate.
  • the display device is a computer display, a television, a mobile phone, a tablet computer, a notebook computer Any of a brain, a digital camera, an electronic paper, or a navigator.
  • Embodiments of the present invention also provide a method of preparing the above functional material, comprising:
  • Each component was ground and mixed under the conditions of using a dispersing agent to obtain the inorganic mixed powder.
  • the grinding and mixing comprises: separately grinding the components together and then mixing them together; or, after mixing the components together, grinding.
  • the preparation method further includes forming the surface modification layer on the inorganic mixed powder after the inorganic mixed powder is obtained.
  • the forming the surface modification layer on the inorganic mixed powder includes:
  • Step S1 mixing the inorganic mixed powder, the organic acid anhydride, the polymerizable ethylenically unsaturated monomer with a solvent and an initiator, and reacting;
  • Step S2 The functional material is isolated after completion of the reaction.
  • the step S1 includes:
  • Step S11 The inorganic mixed powder is placed in a reaction vessel at room temperature and continuously stirred, and then a solvent, an organic acid anhydride, at least a partially polymerizable ethylenically unsaturated monomer is added to the reaction vessel and mixed;
  • Step S12 An initiator is added dropwise to the reaction vessel to carry out a reaction.
  • the polymerizable ethylenically unsaturated monomer added in the step S11 accounts for 2/3 to 3/4 of the total weight of the polymerizable ethylenically unsaturated monomer;
  • the initiator is mixed with the remaining polymerizable ethylenically unsaturated monomer and then added dropwise to the reaction vessel.
  • step S1 is divided into two phases, including:
  • the first stage is to react at a temperature of 35 to 40 ° C for 60 to 90 minutes;
  • the second stage is a reaction at a temperature of 60 to 70 ° C for 60 to 80 minutes.
  • reaction of the step S1 is carried out under the protection of an inert atmosphere.
  • the step S2 includes: cooling the reaction solution under constant stirring until the crystals in the reaction solution are completely precipitated, and drying the crystals under reduced pressure to obtain the functional material.
  • the cooling temperature is 0 to 10 °C.
  • the initiator is an azo-based initiator.
  • the weight of the inorganic mixed powder, the organic acid anhydride, and the polymerizable ethylenically unsaturated monomer The ratio is 1: (0.8 to 1.2): (0.85 to 1.15); and the mass ratio of the inorganic mixed powder, the initiator, and the solvent is 1: (0.25 to 0.4): (1 to 1.5).
  • FIG. 1 is a flow chart showing a method of preparing a functional material according to an embodiment of the present invention
  • FIG. 2 is a flow chart showing a method of preparing a display structure forming material according to an embodiment of the present invention
  • FIG. 3 is a flow chart of a method of preparing a color filter substrate according to an embodiment of the present invention.
  • Embodiments of the present invention provide a functional material comprising an inorganic mixed powder comprising a main ingredient and an auxiliary material;
  • the main material is composed of boron oxide, sodium oxide, lithium oxide or zirconium oxide;
  • the auxiliary materials include oxidation of alumina, zinc oxide, titanium dioxide, silicon dioxide, calcium oxide, silver complex, silver phosphate, silver nitrate, tourmaline, silver thiosulfate, carbon nanotubes, aluminum sulfate, manganese, manganese.
  • the functional material according to an embodiment of the present invention includes an inorganic mixed powder having a function of generating negative ions and emitting far infrared rays having a high emissivity. Therefore, when it is added to the display structure, the negative ions generated by it can purify the air and improve the air quality, and at the same time, the far infrared rays emitted by the infrared rays are beneficial to human health and can improve human immunity.
  • the inorganic mixed powder further includes an additive comprising: graphite, mica, bluestone, calcite, crystal fluorite, medical stone, mullite Or a variety.
  • the performance of the functional material can be further improved by adding the above-mentioned additive powder to the inorganic mixed powder.
  • the amount of the additive is from 1 to 5% by weight based on the total weight of the main material and the auxiliary material.
  • the inorganic mixed powder has a particle diameter of between 20 and 300 nm.
  • the inorganic mixed powder has a surface-modifying layer which is a layer formed of a photocurable alkali-soluble resin having a molecular weight of 5,000 or more and 2,500 or more.
  • the surface modification layer is formed by copolymerizing a polymerizable ethylenically unsaturated monomer with an organic acid anhydride.
  • the polymerizable ethylenically unsaturated monomer is any one of styrene, vinyl toluene, p-chlorostyrene, methoxystyrene, ⁇ -methylstyrene, and isoamylene, and most preferably Styrene;
  • the organic acid anhydride is maleic anhydride, maleic anhydride, fumaric acid, itaconic anhydride, citraconic anhydride, mesaconic anhydride, pyromellitic dianhydride, biphenyltetracarboxylic dianhydride, Any one of benzophenone tetracarboxylic dianhydride, oxybiphenyltetracarboxylic dianhydride, and isopropyl diphthalic anhydride.
  • the weight ratio of the inorganic mixed powder, the organic acid anhydride, and the polymerizable ethylenically unsaturated monomer is 1:
  • the inorganic mixed powder therein is an inorganic substance, and most of the display structures are organic substances, so that the inorganic mixed powder is difficult to be well integrated with the display structure matrix, so that the influence display may be affected.
  • the performance of the structure In order to avoid this problem, the embodiment of the present invention forms a surface-modified layer of a powder-coated surface on the surface of the inorganic mixed powder so that the inorganic mixed powder can be well dispersed and incorporated into the display structure.
  • the surface-modified layer may be a layer formed of a photocurable alkali-soluble resin having a molecular weight of 2,500 to 5,000, and is preferably a copolymer layer composed of a polymerizable ethylenically unsaturated monomer and an organic acid anhydride.
  • the main ingredient and the auxiliary material of the inorganic mixed powder have a composition according to parts by weight: boron oxide: 1.5 to 10 parts; sodium oxide: 0.5 to 5 parts; and lithium oxide: 0.2 to 20 parts.
  • the main materials and auxiliary materials of the inorganic mixed powder of the above composition (which may also contain other additives) have better electrical conductivity and thermal stability, thereby improving the electrical conductivity and thermal stability of the display structure.
  • Embodiments of the present invention provide a display structure forming material including the above functional material.
  • the “display structure” refers to a structure having a function of a color filter film, a black matrix, a spacer, a protective layer, and the like in the display device; and the “display structure forming material” is usually in a fluid or semi-fluid form. It can be coated on a substrate, and then the above display structure is formed by a curing, patterning process or the like.
  • the display structure forming material of the embodiment of the present invention includes the above functional material, so that it can generate negative ions during use, improve the production environment, purify the air, improve the air quality, and at the same time, the display structure prepared by the device can emit far infrared rays, which is beneficial to the human body. Healthy and beneficial, improve human immunity.
  • the display structure forming material of the embodiment of the present invention may include: an alkali soluble resin, an unsaturated monomer, an initiator, a solvent, and the above functional materials.
  • the display structure forming material is a photoresist material, and the photoresist material further contains a colorant.
  • the photoresist material is a material for forming a color filter film or a black matrix, and according to the color of the colorant, it can form a color filter film or black of different colors (such as red, blue, green, yellow). Matrix (black).
  • the photoresist material is any one of a red photoresist material, a blue photoresist material, a green photoresist material, a yellow photoresist material, and a black photoresist material.
  • the photoresist material of the above color corresponds to a relatively common color filter film and black matrix color, but it should be understood that the photoresist material also includes other colors such as cyan.
  • the photoresist material comprises, by weight: a functional material: 0.2 to 1.2 parts; a colorant: 2 to 15 parts; an alkali soluble resin: 2 to 20 parts; an unsaturated monomer; 2 to 20 parts; Initiator: 0.01 to 1 part; solvent: 30 to 90 parts; additive: 0.005 to 0.02 parts.
  • the colorant in the photoresist material can be selected according to the color of the photoresist material, for example:
  • the colorant material may be selected from one or more of an orange pigment, a red pigment, a yellow pigment, an orange dye, a red dye, and a yellow dye.
  • orange pigment is optional From PO5, PO13, PO16, PO34, PO36, PO48, PO49, PO71 or PO73
  • yellow pigment may be selected from PY1, PY12, PY3, PY13, PY83, PY93 , PY94, PY95, PY109, PY126, PY127, PY138, PY139, PY147, PY150, PY174 or PY180
  • the red pigment may be selected from PR122, PR123, PR177, PR179 , PR190, PR202, PR210, PR224, PR254, PR255, PR264, PR270, PR272 or PR122
  • the dye may be selected from CIBasic Yellow2, CISolvent Yellow34, CIBasic Orange2, Y-27 , Y-44, Y-50, Y-86,
  • the colorant material may be selected from one or more of a green pigment, a yellow pigment, a green dye, and a yellow dye.
  • the green pigment in the formula may be selected from: PG37, PG36, PG7; the yellow pigment may be selected from: PY1, PY12, PY3, PY13, PY83, PY93, PY94, PY95, PY 109, PY126, PY127, PY138, PY139, PY147, PY150, PY174, PY180; yellow, green dye can be selected from: CIBasic Yellow2, CISolvent Yellow34, CISolvent Green1, Y-27, Y-44, Y-50, Y-86, Y-106, Y-120, Y-132, Y-6, Y-11, Y-119, Y-23, Y-4, G-26, CIDirect G59, CIDirect G34.
  • the colorant material may be selected from one or more of a blue pigment, a violet pigment, and a blue dye.
  • the blue pigment may be selected from the group consisting of: PB1, PB2, PB15, PB15:3, PB15:4, PB15:6, PB16, PB22, PB60 or PB66;
  • the purple pigment may be selected from : PV32, PV36, PV38, PV39, PV23, PV9, PV1;
  • blue dye can be selected from: CIDirect Blue288, CIDirect Blue93, CIDirect Blue116, CIDirect Blue148, CIDirect Blue149, CI Direct Blue150, CIDirect Blue159, CIDirectBlue162 or CIDirect Blue163.
  • the colorant material may be selected from one or more of a yellow pigment, a yellow dye, an orange pigment, and an orange dye.
  • the orange pigment may be selected from the group consisting of: PO5, PO13, PO16, PO34, PO36, PO48, PO49, PO71, PO73;
  • the yellow pigment may be selected from the group consisting of PY1, PY12, PY3, PY13, PY83, PY93, PY94, PY95, PY109, PY126, PY127, PY138, PY139, PY147, PY150, PY174 or PY180;
  • yellow, orange dyes may be selected from: CIBasic Yellow2, CISolvent Yellow34, CIBasic Orange2, Y-27, Y-44, Y-50, Y-86, Y-106, Y-120, Y-132, Y-6, Y-11, Y- 119, Y-23, Y-4.
  • the colorant material may be selected from one or more of a carbon black pigment, an organic black pigment, and a black dye.
  • the carbon black pigment can be selected from Degussa carbon black P series: Printex L6, Printex25, Printex L, Printex55, Printex45, Printex60, Printex35, Printex200, special black series: special black 550, special black 350, special black 250, Special Black 100, H Series: Hiblack30, Hiblack30L, Columbia Carbon Black Series: Raven1255, Raven1200, Raven1170, Raven1100Ultra, Raven1060Ultra, Raven1040, Raven1035, Raven1020, Raven1000, Raven890, Raven860Ultra, Raven850, Raven820, Raven760Ultra, Raven460, Raven450, Raven410, RavenH2O, Raven825OB, Raven680OB; CABOT series: R99R, R250R, R330R, R400R, R660R, ML, DL430, organic black pigment can be
  • the alkali-soluble resin may be selected from an aromatic acid acrylate half ester, or a styrene and an organic acid anhydride copolymer or the like.
  • the unsaturated monomer may be selected from the group consisting of vinyl chloride, styrene, methyl methacrylate, maleimide, butadiene, methyl acrylate, epoxy acrylate, bisphenol A epoxy methyl acrylate, One or more of DPHA (dipentaerythritol pentaacrylate), EBE264, EBE350.
  • DPHA dipentaerythritol pentaacrylate
  • the initiator is preferably a photoinitiator or a thermal initiator.
  • the photoinitiator can be selected from the group consisting of alpha-amino ketone photoinitiators: Irgacure 907, Igracure 369, Irgacure 1300, acylphosphine oxide photoinitiators: Irgacure 819, Irgacure 819 DW, Irgacure 2010, Darocur TPO, Darocur 4265, alpha-hydroxy ketones.
  • Agent Darocur 1173, Irgacure 184, Irgacure 2959, Irgacure 500, Irgacure 1000, benzoylformate photoinitiator: Darocur mbf, Irgacure 754; oxyacyl oxime ester photoinitiator: OXE-01, OXE-02, Quanta cure PDO, benzoic acid Ester photoinitiators: ITX, MBF, Irgacure 754.
  • the thermal initiator may be selected from (2,5-dimethyl-2,5-di(tert-butylperoxy)-3-hexyne), (2,5-dimethyl-2,5-di ( Tert-butylperoxy)hexane, sodium peroxodisulfate, potassium peroxydisulfate, ammonium peroxodisulfate, 2,2'-azobis(2-amidinopropane) dihydrochloride and 2,2'- Azobis(2-(2-imidazolin-2-yl)propane) dihydrochloride.
  • the solvent may be selected from basic solvents: ketones, esters, ethers, certain aromatic hydrocarbon solvents; neutral solvents: aliphatic hydrocarbons, cycloalkane compounds, certain aromatic hydrocarbon solvents, and the like.
  • the solvent may be a fatty alcohol, a glycol ether, ethyl acetate, methyl ethyl ketone, methyl isobutyl ketone, monomethyl ether glycol ester, ⁇ -butyrolactone, Propionic acid 3-ethyl ether ethyl ester, butyl carbitol, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate (PGMEA), cyclohexane, xylene, isopropanol One or more of them.
  • basic solvents ketones, esters, ethers, certain aromatic hydrocarbon solvents
  • neutral solvents aliphatic hydrocarbons, cycloal
  • propylene glycol monomethyl ether propylene glycol monomethyl ether acetate, cyclohexane, butyl carbitol, butyl carbitol acetate, and ⁇ -butyrolactone are preferred.
  • the additive is a commonly used additive in the display structure forming material, and includes, but is not limited to, a wet adhesion promoter, a leveling agent, an antifoaming agent, a light stabilizer, and the like.
  • the display structure forming material is a spacer material.
  • the "spacer material” means a material for forming a “cushion”, and the “spacer” is used to support between two substrates opposed to each other in a display device such as a liquid crystal display device.
  • the spacer material comprises, in parts by weight: functional material: 0.2 to 1.2 parts; alkali soluble resin: 5 to 20 parts; unsaturated monomer; 5 to 20 parts; initiator: 0.01 to 1 part Solvent: 30 to 90 parts; additive: 0.005 to 0.02 parts.
  • the optional materials of the alkali soluble resin, the unsaturated monomer, the initiator, the solvent, the additive and the like are the same as above.
  • the display structure forming material is a protective layer material;
  • the protective layer material comprises, by weight: functional material: 0.2 to 1.2 parts; acrylic resin: 5 to 25 parts; coupling agent : 1 to 15 parts; epoxy resin: 1 to 20 parts; solvent: 70 to 80 parts.
  • the acrylic resin may be selected from the group consisting of methyl acrylate, ethyl acrylate, 2-methyl methacrylate, 2-ethyl methacrylate, polyester acrylate, urethane acrylate, epoxy acrylate; From silane, nitrogen silane, phenoxysilane, vinyl silane, amino silane, epoxy silane, mercapto silane, methacryloxy silane coupling agent, and the like.
  • the epoxy resin may be selected from the group consisting of an aliphatic epoxy resin, a bisphenol A epoxy resin, a glycidyl ester epoxy resin, a heterocyclic epoxy resin, and the like.
  • the solvent may be selected from solvents selected from the group consisting of basic solvents: ketones, esters, ethers, certain aromatic hydrocarbon solvents, neutral solvents: aliphatic hydrocarbons, cycloalkane compounds, certain aromatic hydrocarbon solvents.
  • the solvent may be a fatty alcohol, a glycol ether, ethyl acetate, methyl ethyl ketone, N-methyl pyrrolidone, methyl isobutyl ketone, monomethyl ether glycol ester, ⁇ -butyrolactone, propionic acid - One of 3-ethyl ether, butyl carbitol, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate (PGMEA), cyclohexane, xylene, isopropanol One or more of them, wherein propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate,
  • Embodiments of the present invention also provide a color filter substrate including a plurality of display structures, and at least One such display structure is prepared from the above-described display structure forming material.
  • the color filter substrate generally comprises a substrate (such as a glass substrate), a black matrix may be formed on the substrate, and color filter films of different colors may be formed at the gap of the black matrix, and the color filter film may be sequentially formed on the color filter film.
  • the protective layer and the electrode layer are formed with a spacer on the electrode layer.
  • the display structure may be a color filter film, a black matrix, a spacer, a protective layer, or the like, depending on the material used to form the display structure selected.
  • the display structure of the embodiment of the present invention is formed by the above-mentioned display structure forming material, so that negative ions can be generated during the preparation process, the production environment is improved, the air is purified, and the air quality is improved.
  • the display structure can also emit far infrared rays, which is beneficial to human health and enhances human immunity.
  • the display structure prepared by the display structure forming material according to the embodiment of the present invention is not limited to use on a color filter substrate, and for example, it can also be used to form other display structures on an array substrate or the like.
  • Embodiments of the present invention provide a display device including the above color film substrate.
  • the display device may further include other known structures such as an array substrate, and will not be described in detail herein.
  • the display device of the embodiment of the present invention includes the above color film substrate, so that negative ions can be generated during the preparation process, the production environment is improved, the air is purified, and the air quality is improved. At the same time, it can also emit far-infrared rays, which is beneficial to human health and enhances human immunity.
  • the display device is any one of a computer display, a television, a mobile phone, a tablet computer, a notebook computer, a digital camera, an electronic paper, and a navigator.
  • the display device may be of a different type such as a liquid crystal display device or an organic light emitting diode display device.
  • Embodiments of the present invention provide a method for preparing the above functional material, as shown in FIG. 1, which includes the following steps:
  • each component is ground and mixed under the condition of using a dispersing agent to obtain the inorganic mixed powder.
  • the inorganic mixed powder in order to make the functional material more compatible with the display structure, when the inorganic mixed powder is prepared, it is preferred that the inorganic mixed powder has a small particle diameter by grinding the raw material.
  • a dispersing agent is also used in this process to disperse the inorganic mixed powder without agglomeration. It should be noted that a small amount of the dispersing agent is used in order to disperse the inorganic mixed powder, but does not change the composition of the functional material product.
  • the dispersant selected in the embodiment of the present invention is preferably a neutral dispersant, and for example, it may be one or more of the wetting and dispersing agent BYK161, Lubrizol Solsperse 32500, and Solsperse 22000.
  • the above grinding and mixing may include separately grinding the components and grinding them together, or may include grinding the components after mixing them together.
  • the components in this step may be weighed in proportion and then uniformly ground and dispersed to directly obtain the above inorganic mixed powder.
  • the components may be separately ground and dispersed, and then the powders of different raw materials may be mixed together in proportion.
  • the grinding and mixing methods employed can be determined according to the difference in specific surface area of each component. If the specific surface area difference of each component is not large, a uniform dispersion grinding method may be used, but if the specific surface area of each component is different (such as a tourmaline, jade, bamboo carbon fiber, etc.), respectively Mix after grinding.
  • the preparation method should further include the step of forming the surface-modified layer on the surface of the inorganic mixed powder, which comprises:
  • the step of forming the surface modification layer may include mixing and reacting the inorganic mixed powder, the organic acid anhydride, the polymerizable ethylenically unsaturated monomer with a solvent, and an initiator.
  • each component of the above functional material, an organic acid anhydride, and a polymerizable ethylenically unsaturated monomer are mixed with a solvent and an initiator to form a reaction solution, thereby forming a surface-modified layer on the surface of the inorganic mixed powder.
  • the initiator is an azo initiator such as azobisisovaleronitrile, azobisisobutyronitrile, azobisisoheptanenitrile, and most preferably azobisisoheptanenitrile.
  • the weight ratio of the inorganic mixed powder, the initiator, and the solvent is 1: (0.25 to 0.4): (1 to 1.5).
  • the weight ratio of the inorganic mixed powder, the organic acid anhydride, and the polymerizable ethylenically unsaturated monomer is 1: (0.8 to 1.2): (0.85 to 1.15).
  • this step preferably includes:
  • the inorganic mixed powder is placed in a reaction vessel (such as a four-necked flask) at room temperature and continuously stirred, and then a solvent, an organic acid anhydride, an at least partially polymerizable ethylenically unsaturated monomer, and a mixture are added to the reaction vessel. uniform.
  • a reaction vessel such as a four-necked flask
  • room temperature means that in this step, it is not necessary to specialize the temperature of the reaction vessel Control, as long as it keeps the problem close to the ambient temperature.
  • room temperature can be considered to be 20 to 30 °C.
  • the reason why the inorganic mixed powder is stirred is to prevent the inorganic mixed powder from agglomerating and affecting the particle size range of the product.
  • At least partially polymerizable ethylenically unsaturated monomer means that the polymerizable ethylenically unsaturated monomer may not be added at one time in this step, but only a part is added, and the remaining polymerizable ethylenically unsaturated monomer is In the next step, the initiator is added together.
  • the polymerizable ethylenically unsaturated monomer added in this step accounts for 2/3 to 3/4 of the total amount of the polymerizable ethylenically unsaturated monomer.
  • an initiator is added dropwise to the reaction vessel to carry out a reaction.
  • the initiator is mixed with the remaining polymerizable ethylenically unsaturated monomer and added to the reaction vessel together.
  • the measure can better avoid the violent reaction of the reaction solution, prevent the catalyst from being added to the reaction vessel, and the partial solution is supersaturated due to the inability to diffuse to obtain the precipitate with poor purity.
  • the reaction in this step is divided into two stages, the first stage is a reaction at a temperature of 35 to 40 ° C for 60 to 90 minutes; and the second stage is a reaction of at least 60 to 80 at a temperature of 60 to 70 ° C. minute.
  • the catalyst In the first stage, the catalyst needs to be slowly added to the reaction solution under low temperature and constant stirring to avoid excessive reaction. When the catalyst is gradually reacted completely, the reaction proceeds to the second stage, at which point the reaction can be raised and continued. It will be understood that the reaction time of the second stage can be determined according to the molecular weight of the desired product. If the molecular weight of the desired product is large, the reaction time can be longer than 60 minutes.
  • the above reaction is carried out under the protection of an inert atmosphere to prevent oxygen from interfering with the reaction.
  • the inert atmosphere may be, for example, a nitrogen atmosphere or an atmosphere of another inert gas such as argon.
  • the inorganic mixed powder having the surface-modified layer is separated from the reaction solution as a functional material product.
  • this step may include: cooling the reaction solution under constant stirring until the crystals in the reaction solution are completely precipitated; and drying the crystals under reduced pressure to obtain the functional material.
  • the reaction solution of the reaction vessel is cooled and cooled, and purified by crystallization, so that the functional material in the reaction solution precipitates crystals due to a decrease in solubility, leaving the incompletely reacted substance or other components. In solution.
  • the crystals are then dried under reduced pressure to give a pure functional material.
  • the cooling operation is usually in the range of 0 to 10 °C.
  • the embodiment of the invention provides a preparation method of a functional material, wherein the raw materials used in the preparation method are widely used, the preparation process is simple, and the operation is easy, and the components of the functional material prepared by the preparation method are well mixed.
  • the embodiment of the present invention further provides a method for preparing a display structure forming material, as shown in FIG. 2, which includes the following steps:
  • the components of the structure forming material are scaled and weighed uniformly.
  • the content of each component can be determined according to the display structure to be prepared by the display structure forming material.
  • the display structure forming material as the photoresist material comprises: functional material: 0.2 to 1.2 parts; coloring agent: 2 to 15 parts; alkali soluble resin: 2 to 20 parts; unsaturated monomer: 2 to 20 parts; initiator: 0.01 to 1 part; solvent: 30 to 90 parts; additive: 0.005 to 0.02 parts.
  • the photoresist material comprises: functional material: 0.5 to 1.2 parts; coloring agent: 5 to 15 parts; alkali soluble resin: 5 to 20 parts; unsaturated monomer: 5 to 20 parts by weight. Initiator: 0.01 to 1 part; solvent: 40 to 90 parts; additive: 0.005 to 0.015 parts.
  • the photoresist material comprises, in parts by weight: functional material: 0.5 to 1.0 part; coloring agent: 5 to 10 parts; alkali soluble resin: 5 to 15 parts; unsaturated monomer: 5 to 15 Parts; initiator: 0.01 to 1 part; solvent: 45 to 90 parts; additive: 0.005 to 0.01 parts.
  • the spacer material comprises, in parts by weight: functional material: 0.2 to 1.2 parts; alkali soluble resin: 5 to 20 parts; unsaturated monomer; 5 to 20 parts; initiator : 0.01 to 1 part; solvent: 30 to 90 parts; additive: 0.005 to 0.02 parts.
  • the spacer material comprises, in parts by weight: functional material: 0.5 to 1.2 parts; alkali soluble resin: 10 to 20 parts; unsaturated monomer: 10 to 20 parts; initiator: 0.01 to 1 Parts; solvent: 40 to 90 parts; additive: 0.005 to 0.015 parts.
  • the partition The pad material comprises, by weight: functional material: 0.5 to 1.0 part; alkali soluble resin: 10 to 15 parts; unsaturated monomer: 10 to 15 parts; initiator: 0.01 to 1 part; solvent: 45 to 90 parts; Additive: 0.005 to 0.01 parts.
  • the protective layer material comprises, by weight: functional material: 0.2 to 1.2 parts; acrylic resin: 5 to 25 parts; coupling agent: 1 to 15 parts; epoxy resin: 1 to 20 parts; solvent: 70 to 80 parts.
  • the protective layer material comprises, in parts by weight: functional material: 0.5 to 1.2 parts; acrylic resin: 5 to 20 parts; coupling agent: 1 to 10 parts; epoxy resin: 1 to 15 parts.
  • the protective layer material comprises, in parts by weight: functional material: 0.5 to 1.0 part; acrylic resin: 5 to 15 parts; coupling agent: 1 to 8 parts; epoxy resin: 1 to 10 parts.
  • the uniformly mixed components are defoamed to obtain a mixture.
  • the components mixed in the previous step are defoamed to remove the bubbles in the raw materials, so that the raw materials are uniformly mixed and dispersed.
  • the number of defoaming is 2 to 3 times, and the defoaming time is 30 to 50 minutes each time.
  • the insoluble matter in the mixture is removed to make the display structure forming material as smooth and fine as a whole.
  • Embodiments of the present invention provide a method for preparing a display structure forming material, which is simple in steps and easy to operate.
  • an embodiment of the present invention provides a method for preparing a color filter substrate, which includes the following steps:
  • the color filter film is located at the interval of the black matrix, and includes a plurality of different colors (such as red, green, blue, yellow);
  • one or more of the black matrix, the color filter film, the protective layer and the spacer can be prepared by using the above display structure forming material.
  • Examples 1 to 9 are shown in Tables 1 to 5.
  • Example Boron oxide content Sodium oxide content Lithium oxide content Zirconia content 1 1.5 0.8 0.57 10 2 1.7 1.0 2.5 15 3 3.83 1.83 6.73 20 4 5.18 2.27 8.16 25 5 6.5 3.6 10.5 30 6 7.17 3.6 10.5 30 7 7.9 3.6 10.5 35 8 8.5 3.6 15.5 40 9 9.18 4.58 17.08 45
  • red photoresist material 1 comprising:
  • the preparation of the color filter substrate 1 includes:
  • a black photoresist material is coated on the substrate to form a black matrix. Then, in a region separated by a black matrix on the substrate, red, green, and blue color filter films are sequentially formed through a process such as pre-baking and curing, wherein the red color filter film is made of the red photoresist material 1 of the present embodiment. to make.
  • a protective layer and a transparent electrode layer are sequentially prepared on the color filter film, and a spacer is formed on the electrode layer.
  • red photoresist material 2 which includes:
  • the preparation of the color filter substrate 2 includes:
  • a black photoresist material is coated on the substrate to form a black matrix. Then, in the region separated by the black matrix on the substrate, red, green, and blue color filters are sequentially formed through processes such as pre-baking and solidification.
  • a protective layer and a transparent electrode layer are sequentially prepared on the color filter film, and a spacer is formed on the electrode layer.
  • the performance test of the color filter substrate 2 is as follows:
  • the preparation of the blue photoresist material 3 includes:
  • modified functional material (Example 2), 6 parts of PB15 and PV32 mixture, 12 parts of aromatic acid acrylate half ester SB401, 3 parts of aromatic acid acrylate half ester SB404, 10 parts of EBE350, 5 by weight DPHA, 29.938 parts of propylene glycol monomethyl ether acetate, 25 parts of ethyl 3-ethoxypropionate, 8.55 parts of n-butanol, 0.007 parts of Irgacure 369, 0.005 parts of OXE-02, 0.02 parts of adhesion promoter A-186 And 0.03 parts of leveling agent BYK333, stir and mix well. Thereafter, the uniformly mixed raw materials were defoamed twice for 30 minutes each time to obtain a mixture. The resulting mixture was filtered to remove impurities to obtain a blue photoresist material 3.
  • the preparation of the color filter substrate 3 includes:
  • a black photoresist material is coated on the substrate to form a black matrix. Then, in a region separated by a black matrix on the substrate, red, green, and blue color filter films are sequentially formed through a process such as pre-baking and solidification; wherein the blue color filter film is composed of the blue photoresist material 3 of the present embodiment. production.
  • a protective layer and a transparent electrode layer are sequentially prepared on the color filter film, and a spacer is formed on the electrode layer.
  • the performance test of the color filter substrate 3 is as follows:
  • the preparation of the color filter substrate 4 includes:
  • a black photoresist material is coated on the substrate to form a black matrix. Then, in a region separated by a black matrix on the substrate, red, green, and blue color filter films are sequentially formed through a process such as pre-baking and solidification; wherein the blue color filter film is composed of the blue photoresist material 4 of the present embodiment. production.
  • a protective layer and a transparent electrode layer are sequentially prepared on the color filter film, and a spacer is formed on the electrode layer.
  • the preparation of the green photoresist material 5 includes:
  • the uniformly mixed raw materials were defoamed twice for 35 minutes each time to obtain a mixture.
  • the resulting mixture was filtered to remove impurities to obtain a green photoresist material 5.
  • the preparation of the color filter substrate 5 includes:
  • a black photoresist material is coated on the substrate to form a black matrix. Then, in a region separated by a black matrix on the substrate, red, green, and blue color filter films are sequentially formed through a process such as pre-baking and curing; wherein the green color filter film is made of the green photoresist material 5 of the present embodiment. to make.
  • a protective layer and a transparent electrode layer are sequentially prepared on the color filter film, and a spacer is formed on the electrode layer.
  • the performance test of the color filter substrate 5 is as follows:
  • the preparation of the green photoresist material 6 includes:
  • the uniformly mixed raw materials were defoamed twice for 35 minutes each time to obtain a mixture.
  • the resulting mixture was filtered to remove impurities to obtain a green photoresist material 6.
  • the preparation of the color filter substrate 6 includes:
  • a black photoresist material is coated on the substrate to form a black matrix. Then, in a region separated by a black matrix on the substrate, red, green, and blue color filter films are sequentially formed through a process such as pre-baking and curing; wherein the green color filter film is made of the green photoresist material 6 of the present embodiment. to make.
  • a protective layer and a transparent electrode layer are sequentially prepared on the color filter film, and a spacer is formed on the electrode layer.
  • the performance test of the color filter substrate 6 is as follows:
  • the uniformly mixed raw materials were defoamed twice for 35 minutes each time to obtain a mixture.
  • the resulting mixture was filtered to remove impurities to obtain a yellow photoresist material 7.
  • the preparation of the color filter substrate 7 includes:
  • a black photoresist material is coated on the substrate to form a black matrix. Thereafter, in a region separated by a black matrix on the substrate, red, green, and blue color filter films are sequentially formed through a process such as pre-baking and curing; wherein the yellow color filter film is made of the yellow photoresist material 7 of the present embodiment. to make.
  • a protective layer and a transparent electrode layer are sequentially prepared on the color filter film, and a spacer is formed on the electrode layer.
  • Infrared specific emissivity% 75 Negative ions (pieces / cubic centimeter) 1700 Transmission rate 92 Color coordinates (x, y) (0.4380, 0.502) E value 2.0
  • the uniformly mixed raw materials were defoamed twice for 35 minutes each time to obtain a mixture.
  • the resulting mixture was filtered to remove impurities to obtain a yellow photoresist material 8.
  • the preparation of the color film substrate 8 includes:
  • a black photoresist material is coated on the substrate to form a black matrix. Then, in a region separated by a black matrix on the substrate, red, green, and blue color filter films are sequentially formed through a process such as pre-baking and curing; wherein the yellow color filter film is made of the yellow photoresist material 8 of the present embodiment. to make.
  • a protective layer and a transparent electrode layer are sequentially prepared on the color filter film, and a spacer is formed on the electrode layer.
  • the performance test of the color filter substrate 8 is as follows:
  • the preparation of the color filter substrate 9 includes:
  • the black photoresist material 9 of the present embodiment is coated on a substrate to form a black matrix; then, in a region separated by a black matrix on the substrate, red, green, and blue color filters are sequentially formed through processes such as pre-baking and curing.
  • a protective layer and a transparent electrode layer are sequentially prepared on the color filter film, and a spacer is formed on the electrode layer.
  • the preparation of the black photoresist material 10 includes:
  • the preparation of the color filter substrate 10 includes:
  • the black photoresist material 10 of the present embodiment is coated on a substrate to form a black matrix. Thereafter, in the region separated by the black matrix on the substrate, red, green, and blue color filter films are sequentially formed through processes such as pre-baking and curing. A protective layer and a transparent electrode layer are sequentially prepared on the color filter film, and a spacer is formed on the electrode layer.
  • the performance test of the color filter substrate 10 is as follows:
  • the preparation of the black photoresist material 11 includes:
  • the preparation of the color filter substrate 11 includes:
  • the black photoresist material 11 of the present embodiment is coated on a substrate to form a black matrix. Thereafter, in the region separated by the black matrix on the substrate, red, green, and blue color filter films are sequentially formed through processes such as pre-baking and curing. A protective layer and a transparent electrode layer are sequentially prepared on the color filter film, and a spacer is formed on the electrode layer.
  • the performance test of the color filter substrate 11 is as follows:
  • a black matrix and a filter layer are separately formed on the substrate. Thereafter, a protective layer and a transparent electrode layer are formed on the substrate on which the black matrix and the filter layer are formed. Finally, the spacer material 12 is coated on the substrate, and the spacer is formed by a process such as pre-baking and curing to obtain a color filter substrate 12.
  • the performance test of the color filter substrate 12 is as follows:
  • a black matrix and a filter layer are separately formed on the substrate. Thereafter, a protective layer and a transparent electrode layer are formed on the substrate on which the black matrix and the filter layer are formed. Finally, the spacer material 13 is coated on the substrate, and the spacer is formed by a process such as pre-baking and curing to obtain a color filter substrate 13.
  • the performance test of the color filter substrate 13 is as follows:
  • a protective layer material 14 comprising:
  • a black matrix and a filter layer are separately formed on the substrate. Thereafter, a protective layer and a transparent electrode layer are formed on the substrate on which the black matrix and the filter layer are formed. Finally, the protective layer material 14 is coated on the substrate, and a protective layer is formed by a process such as pre-baking and curing to obtain a color filter substrate 14.
  • the performance test of the color film substrate 14 is as follows:
  • the preparation of the protective layer material 15 includes:
  • a black matrix and a filter layer are separately formed on the substrate. Thereafter, a protective layer and a transparent electrode layer are formed on the substrate on which the black matrix and the filter layer are formed. Finally, the protective layer material 15 is applied onto the substrate, and a protective layer is formed by a process such as pre-baking and curing to obtain a color filter substrate 15.
  • the performance test of the color filter substrate 15 is as follows:
  • the color filter substrates prepared in the above Examples 10 to 24 were tested (actually, the color filter films, black matrices, spacers, protective layers were tested therein) to obtain their performance parameters.
  • the tests include:
  • the color filter substrates 1 to 15 (color filter substrates corresponding to the color filter film, the black matrix, the spacer, and the protective layer) prepared in the above Examples 10 to 24 were classified into test pieces of 5 ⁇ 5 cm 2 .
  • the infrared specific emissivity test is carried out according to the GB/T7287-2008 standard. The specific test steps are as follows:
  • the optical system meets the following requirements: 1 the detector is photosensitive from the modulation plane, the plane of the diaphragm and the radiation planes of the display structures are parallel and coaxial; 2 the area to be measured of each color film substrate determined by the optical system is relative to the detector As a "point source” approximation; and located in the isothermal zone and less than the isothermal zone area.
  • thermocouple thermocouple Weld or bond the thermocouple thermocouple to the vicinity of the surface to be tested (isothermal zone), and control the surface temperature to be tested at its operating temperature with a temperature controller (temperature control accuracy not less than ⁇ 0.5K).
  • a temperature controller temperature control accuracy not less than ⁇ 0.5K.
  • the scanning device of the monochromator is turned on to perform continuous scanning in the wavelength range of 0.38 to 25 ⁇ m, and the recorder is synchronized with the same, and the differential spectral signal voltage of the sample and the modulating disk outputted by the amplification system is measured.
  • U S ⁇ as a function of wavelength.
  • the infrared specific emissivity is the ratio of the apparent operating temperature of the isothermal region of each of the display structures described above to the apparent operating temperature of the isothermal region to which the reference coating is applied. The value is between 0% and 100%. The higher the better, the better the infrared radiation. It is generally believed that an infrared specific emissivity value of >40% can have a beneficial effect on human health.
  • the infrared radiance of the display structure of the embodiments of the present invention exceeds 40%, so that they can generate far infrared rays under normal temperature conditions, which can promote the metabolism of human tissues and improve the immunity of the body. To the role of health care.
  • the color filter substrates 1 to 15 (color filter substrates corresponding to the color filter film, the black matrix, the spacer, and the protective layer) prepared in the above Examples 10 to 24 were divided into test pieces of 5 ⁇ 5 cm 2 , each of which was The test piece was placed about 2 cm away from the air inlet of the air negative ion analyzer, and tested under shaking or rubbing conditions, and the negative ion concentration Da of each test piece was measured. Each test piece was measured 5 times, and the larger value measurement result was taken.
  • Negative ion concentration refers to the number of negative ions per unit volume of air. The higher the number of negative ions, the higher the negative ion concentration, and the stronger the ability to reduce pollution and improve air quality. It is generally considered that for the display structure production workshop, if the negative ion concentration is higher than 800/cm 3 , the purpose of purifying the air can be achieved.
  • the negative ion concentrations of the display structures of the embodiments of the present invention exceed 800/cm 3 , so that they can release sufficient negative ions to improve the production environment of the display structure.
  • the spacers were tested for chemical resistance as follows.
  • the color filter substrates 12 to 15 (corresponding to the spacer, the protective layer of the color filter substrate) prepared in the above Examples 21 to 24 were classified into test pieces of 10 ⁇ 10 cm 2 .
  • the test piece was placed in a 5% NaOH solution (or 5% isopropanol solution) at room temperature for 20 minutes, taken out, washed, and completely dried at 50 °C.
  • the treated test pieces were placed under a spectrophotometer, focus aligned, and the transmittance of each test piece was measured.
  • Transmittance is the ratio of the radiant energy transmitted through an object to the total radiant energy projected onto the object during the exit of the incident light flux from the illuminated surface or the dielectric incident surface to the other side. The higher the transmittance value, the higher the brightness. It is generally believed that a transmittance of >80% means that the transmittance of the display structure is up to standard.
  • the display structures (spacers) of the embodiments of the present invention all have a transmittance exceeding 80%, thus demonstrating that they can ensure good transmittance after undergoing corrosion. That is, the addition of the functional material does not adversely affect the chemical resistance and transmittance properties of the display structure.
  • heat resistance tests can be performed as follows:
  • the color filter substrates 1 to 10 (color film substrates corresponding to the color filter films) prepared in the above Examples 10 to 19 were divided into test pieces of 10 ⁇ 10 cm 2 , and the test pieces were placed at 100 ° C for 30 minutes. .
  • Heat resistance is the ability to show the structure against high temperature, and it is also one of its reliability requirements.
  • the evaluation criterion is taken as the color difference ⁇ E value, that is, the ratio of the color coordinate value of the processed display structure to the standard color coordinate value. It is generally considered that a ⁇ E value of ⁇ 3 indicates that the heat resistance performance conforms to the standard.
  • the display structures (color filter films) of the embodiments of the present invention all have a ⁇ E value of less than 3, thus demonstrating that they have good heat resistance. That is, the addition of the functional material does not adversely affect the heat resistance of the display structure.
  • the OP value test can be performed, including: dividing the color film substrates 9 to 11 (corresponding to the black matrix color film substrate) prepared in the above embodiments 18 to 20 into 5 ⁇ 5 cm 2 test pieces, which will be tested. The sheets were placed under an X-Rite 528 densitometer at room temperature, aligned, and the OD values of the respective test pieces were measured.
  • the OD value a common logarithm of the ratio of the transmittance of incident light to transmitted light. The higher the OD value, the better the color contrast of the black matrix. It is generally believed that an OD value of >4 means that the color contrast is up to standard.
  • the OD values of the black matrix of the embodiments of the present invention are all greater than 4, so that their color contrasts are all up to standard. This shows that the addition of functional materials of the embodiments of the invention does not affect the optical properties of the black matrix.

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Abstract

本发明实施方式提供一种环境友好的功能材料及其制备方法、显示结构形成材料、彩膜基板和显示装置。所述功能材料包括无机混合粉末，无机混合粉末包括主料和辅料，所述主料由氧化硼、氧化钠、氧化锂、氧化锆组成；所述辅料包括氧化铝、氧化锌、二氧化钛、二氧化硅、氧化钙、银络合物、磷酸银、硝酸银、电气石、硫代硫酸银、碳纳米管、硫酸铝、锰、锰的氧化物、铁、铁的氧化物、钴、钴的氧化物、镍、镍的氧化物、铬、铬的氧化物、铜、铜的氧化物、氧化镁、碳化硼、碳化硅、碳化钛、碳化锆、碳化钽、碳化钼、氮化硼、氮化铬、氮化钛、氮化锆、氮化铝、硼化铬、四硼化三铬、硼化钛、硼化锆、二硅化钨、二硅化钛中的任意一种或多种。

Description

功能材料及其制备方法、显示结构形成材料、彩膜基板、显示装置 技术领域
本发明实施方式涉及一种功能材料及其制备方法、显示结构形成材料、彩膜基板、显示装置。
背景技术
电脑显示器、电视等显示装置的应用越来越广泛。同时，人们的环保意识也在不断增强。因此，确保显示装置的环境友好度，保证其在制备和使用中都不会对环境造成影响是十分重要的。
在现有显示装置中，彩色滤光膜(彩膜)、黑矩阵(BM，Black Matrix)、隔垫物(PS)、保护层(OC，Over Coating)等显示结构是由显示结构形成材料制成的。显示结构形成材料通常包括挥发性有机溶剂，故在显示结构形成过程中会有大量溶剂释放到空气中，导致空气质量下降。
因此，在本领域对环境友好的功能材料存在需求。
发明内容
本发明实施方式提供一种环境友好的功能材料，其包括无机混合粉末，所述无机混合粉末包括主料和辅料；
所述主料由氧化硼、氧化钠、氧化锂、氧化锆组成；
所述辅料包括氧化铝、氧化锌、二氧化钛、二氧化硅、氧化钙、银络合物、磷酸银、硝酸银、电气石、硫代硫酸银、碳纳米管、硫酸铝、锰、锰的氧化物、铁、铁的氧化物、钴、钴的氧化物、镍、镍的氧化物、铬、铬的氧化物、铜、铜的氧化物、氧化镁、碳化硼、碳化硅、碳化钛、碳化锆、碳化钽、碳化钼、氮化硼、氮化铬、氮化钛、氮化锆、氮化铝、硼化铬、四硼化三铬、硼化钛、硼化锆、二硅化钨、二硅化钛中的任意一种或多种。
在一个实施方式中，所述无机混合粉末还包括添加料，所述添加料包括：石墨、云母、蓝青石、方解石、水晶萤石、麦饭石、莫来石中的任意一种或多种。
所述添加料的量为所述主料和辅料总重量的1～5％。
在一个实施方式中，所述无机混合粉末的粒径在20～300nm之间。
在一个实施方式中，所述无机混合粉末具有表面改性层，所述表面改性层为分子量小于等于5000且大于等于2500的光固化碱可溶树脂形成的层。
所述表面改性层由可聚合乙烯性不饱和单体与有机酸酐共聚形成。
所述可聚合乙烯性不饱和单体为苯乙烯、乙烯基甲苯、对氯苯乙烯、甲氧基苯乙烯、α-甲基苯乙烯、异戊烯中的任意一种；所述有机酸酐为马来酸酐、顺丁烯二酸酐、反丁烯二酸、衣康酸酐、柠康酸酐、均苯四甲酸二酐、联苯四酸二酐、二苯酮四酸二酐、氧联苯四甲酸二酐、异丙基二苯酐中的任意一种。
所述无机混合粉末、有机酸酐、可聚合乙烯性不饱和单体的重量比为1∶(0.8～1.2)∶(0.85～1.15)。
在一个实施方式中，所述无机混合粉末按照重量份数包括：
氧化硼：1.5～10份；
氧化钠：0.5～5份；
氧化锂：0.2～20份；
氧化锆：10～50份；
氧化铝：5～40份；
二氧化钛：0.5～8份。
在一个实施方式中，所述无机混合粉末按照重量份数包括：
氧化硼：3～8份；
氧化钠：1.5～4.5份；
氧化锂：1.5～18份；
氧化锆：15～45份；
氧化铝：8～32份；
二氧化钛：1.5～7份。
本发明实施方式提供一种显示结构形成材料，其包括：碱可溶树脂、不饱和单体、引发剂、溶剂，以及上述的功能材料。
在一个实施方式中，所述显示结构形成材料为光阻材料，所述光阻材料中还含有着色剂。
例如，所述光阻材料按重量份数计包括：
功能材料：0.2～1.2份；
着色剂：2～15份；
碱可溶树脂：2～20份；
不饱和单体：2～20份；
引发剂：0.01～1份；
溶剂：30～90份；
添加剂：0.005～0.02份。
例如，所述光阻材料为红色光阻材料、蓝色光阻材料、绿色光阻材料、黄色光阻材料、黑色光阻材料中的任意一种。
在一个实施方式中，所述显示结构形成材料为隔垫物材料。
例如，所述隔垫物材料按重量份数计包括：
功能材料：0.2～1.2份；
碱可溶树脂：5～20份；
不饱和单体：5～20份；
引发剂：0.01～1份；
溶剂：30～90份；
添加剂：0.005～0.02份。
例如，所述引发剂为光引发剂或热引发剂。
本发明实施方式提供一种显示结构形成材料，其为保护层材料，所述保护层材料按重量份数计包括：
功能材料：0.2～1.2份；
丙烯酸树脂：5～25份；
偶联剂：1～15份；
环氧树脂：1～20份；
溶剂：70～80份。
本发明实施方式提供一种彩膜基板，其包括多个显示结构，且至少有一种所述显示结构是上述的显示结构形成材料制备的。
本发明实施方式提供一种显示装置，其包括上述彩膜基板。
例如，所述显示装置为电脑显示器、电视、手机、平板电脑、笔记本电 脑、数码相机、电子纸、导航仪中的任意一种。
本发明实施方式还提供一种制备上述功能材料的方法，其包括：
在使用分散剂的条件下对各组分进行研磨、混合，得到所述无机混合粉末。
在一个实施方式中，所述研磨、混合包括：将各组分分别进行研磨后混合在一起；或，将各组分混合在一起之后进行研磨。
所述制备方法还包括：在得到所述无机混合粉末后，在所述无机混合粉末上形成所述表面改性层。
例如，所述在所述无机混合粉末上形成表面改性层包括：
步骤S1：将所述无机混合粉末、有机酸酐、可聚合乙烯性不饱和单体与溶剂、引发剂混合并进行反应；
步骤S2：反应完毕后分离得到所述功能材料。
例如，所述步骤S1包括：
步骤S11：在室温下，将所述无机混合粉末放入反应容器内并不断搅拌，随后向反应容器内加入溶剂、有机酸酐、至少部分可聚合乙烯性不饱和单体并混匀；
步骤S12：将引发剂滴加到所述反应容器内进行反应。
例如，所述步骤S11中加入的可聚合乙烯性不饱和单体占可聚合乙烯性不饱和单体总重量的2/3至3/4；
所述步骤S12中，所述引发剂是与剩余的可聚合乙烯性不饱和单体混合后滴加到所述反应容器内的。
例如，所述步骤S1的反应分为两个阶段，包括：
第一个阶段是在35～40℃的温度下反应60～90分钟；
第二个阶段是在60～70℃的温度下反应60～80分钟。
例如，所述步骤S1的反应在惰性气氛保护下进行。
例如，所述步骤S2包括：在不断搅拌下将反应溶液冷却，直至反应溶液中的结晶完全析出，对所述结晶进行减压干燥，得到所述功能材料。
例如，所述冷却的温度为0～10℃。
例如，所述引发剂为偶氮类引发剂。
例如，所述无机混合粉末、有机酸酐、可聚合乙烯性不饱和单体的重量 比为1∶(0.8～1.2)∶(0.85～1.15)；且所述无机混合粉末、引发剂、溶剂的质量比为1∶(0.25～0.4)∶(1～1.5)。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1为本发明实施方式的功能材料的制备方法的流程图；
图2为本发明实施方式的显示结构形成材料的制备方法的流程图；
图3为本发明实施方式的彩膜基板的制备方法的流程图。
具体实施方式
为使本领域技术人员更好地理解本发明的技术方案，下面结合附图和具体实施方式对本发明作进一步详细描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
本发明实施方式提供一种功能材料，其包括无机混合粉末，所述无机混合粉末包括主料和辅料；
所述主料由氧化硼、氧化钠、氧化锂、氧化锆组成；
所述辅料包括氧化铝、氧化锌、二氧化钛、二氧化硅、氧化钙、银络合物、磷酸银、硝酸银、电气石、硫代硫酸银、碳纳米管、硫酸铝、锰、锰的氧化物、铁、铁的氧化物、钴、钴的氧化物、镍、镍的氧化物、铬、铬的氧化物、铜、铜的氧化物、氧化镁、碳化硼、碳化硅、碳化钛、碳化锆、碳化钽、碳化钼、氮化硼、氮化铬、氮化钛、氮化锆、氮化铝、硼化铬、四硼化三铬、硼化钛、硼化锆、二硅化钨、二硅化钛中的任意一种或多种。
本发明实施方式所述的功能材料包括无机混合粉末，该无机混合粉末具有产生负离子和发射高辐射率的远红外线的作用。因此当把其添加到显示结构中时，其产生的负离子可净化空气、改善空气质量，同时其发射出的远红外线对人体健康有益，可提高人体免疫力。
根据本发明的一优选实施方式，所述无机混合粉末还包括添加料，所述添加料包括：石墨、云母、蓝青石、方解石、水晶萤石、麦饭石、莫来石中的任意一种或多种。
通过在无机混合粉末中加入上述的添加料粉末，可进一步改善功能材料的性能。
根据本发明的一优选实施方式，所述添加料的量为主料和辅料总重量的1～5％。
根据本发明的一优选实施方式，所述无机混合粉末的粒径在20～300nm之间。
根据本发明的一优选实施方式，所述无机混合粉末具有表面改性层，所述表面改性层为分子量小于等于5000且大于等于2500的光固化碱可溶树脂形成的层。例如，所述表面改性层由可聚合乙烯性不饱和单体与有机酸酐共聚形成。例如，所述可聚合乙烯性不饱和单体为苯乙烯、乙烯基甲苯、对氯苯乙烯、甲氧基苯乙烯、α-甲基苯乙烯、异戊烯中的任意一种，最优选为苯乙烯；所述有机酸酐为马来酸酐、顺丁烯二酸酐、反丁烯二酸、衣康酸酐、柠康酸酐、中康酸酐、均苯四甲酸二酐、联苯四酸二酐、二苯酮四酸二酐、氧联苯四甲酸二酐、异丙基二苯酐中的任意一种。在一个优选实施方式中，所述无机混合粉末、有机酸酐、可聚合乙烯性不饱和单体的重量比为1∶(0.8～1.2)∶(0.85～1.15)。
虽然本发明的功能材料具有以上的效果，但其中的无机混合粉末属无机物，而多数显示结构均为有机物，故无机混合粉末较难很好的与显示结构基体相融合，故可能影响影响显示结构的性能。为避免这一问题，故本发明实施方式在无机混合粉末表面形成包裹粉末的表面改性层，以使无机混合粉可很好地分散、融入显示结构中。其中，表面改性层可为分子量2500～5000的光固化碱可溶树脂形成的层，优选为由可聚合乙烯性不饱和单体与有机酸酐形成的共聚物层。
根据本发明的一优选实施方式，所述无机混合粉末的主料和辅料按照重量份数的组成为：氧化硼：1.5～10份；氧化钠：0.5～5份；氧化锂：0.2～20份；氧化锆：10～50份；氧化铝：5～40份；二氧化钛：0.5～8份。其更优选的组成为：氧化硼：3～8份；氧化钠：1.5～4.5份；氧化锂：1.5～18 份；氧化锆：15～45份；氧化铝：8～32份；二氧化钛：1.5～7份。
经研究发现，以上组成的无机混合粉末的主料和辅料(其中还可含有其他添加料)具有较好的导电性和热稳定性，从而可改善显示结构的导电性和热稳定性。
本发明实施方式提供一种显示结构形成材料，其包括上述功能材料。
其中，“显示结构”是指在显示装置中的彩色滤光膜、黑矩阵、隔垫物、保护层等具有一定功能的结构；而“显示结构形成材料”通常为流体或半流体的形态，其可被涂布在基底上，之后通过固化、构图工艺等形成上述的显示结构。
本发明实施方式的显示结构形成材料包括上述功能材料，因此其在使用过程中可产生负离子，改善生产环境，净化空气，提高空气质量，同时其所制备的显示结构可发射出远红外线，有益人体健康有益，提高人体免疫力。
具体的，本发明实施方式的显示结构形成材料可包括：碱可溶树脂、不饱和单体、引发剂、溶剂，以及上述的功能材料。
根据本发明的一个实施方式，所述显示结构形成材料为光阻材料，所述光阻材料还含有着色剂。
其中，光阻材料是用于形成彩色滤光膜或黑矩阵的材料，根据其中着色剂颜色的不同，其可形成不同颜色(如红色、蓝色、绿色、黄色)的彩色滤光膜或黑矩阵(黑色)。
例如，所述光阻材料为红色光阻材料、蓝色光阻材料、绿色光阻材料、黄色光阻材料、黑色光阻材料中的任意一种。以上颜色的光阻材料对应比较常见的彩色滤光膜和黑矩阵颜色，但应当理解，光阻材料还包括青色等其他颜色。
例如，所述光阻材料按重量份数计包括：功能材料：0.2～1.2份；着色剂：2～15份；碱可溶树脂：2～20份；不饱和单体；2～20份；引发剂：0.01～1份；溶剂：30～90份；添加剂：0.005～0.02份。
其中，光阻材料中的着色剂可根据光阻材料颜色的不同而选择，例如：
对于红色光阻材料，其着色剂材料可选自橙色颜料、红色颜料、黄色颜料、橙色染料、红色染料、黄色染料中的一种或几种。其中，橙色颜料可选 自P.O.5、P.O.13、P.O.16、P.O.34、P.O.36、P.O.48、P.O.49、P.O.71或P.O.73；黄色颜料可选自P.Y.1、P.Y.12、P.Y.3、P.Y.13、P.Y.83、P.Y.93、P.Y.94、P.Y.95、P.Y.109、P.Y.126、P.Y.127、P.Y.138、P.Y.139、P.Y.147、P.Y.150、P.Y.174或P.Y.180；红色颜料可选自P.R.122、P.R.123、P.R.177、P.R.179、P.R.190、P.R.202、P.R.210、P.R.224、P.R.254、P.R.255、P.R.264、P.R.270、P.R.272或P.R.122；染料可以选自C.I.Basic Yellow2、C.I.Solvent Yellow34、C.I.Basic Orange2、Y-27、Y-44、Y-50、Y-86、Y-106、Y-120、Y-132、Y-6、Y-11、Y-119、Y-23、Y-4、C.I.Direct R80、C.I.Direct R83、C.I.Solvent R49、C.I.Solvent R5B、C.I.Solvent R49、R-80、R-81、R-83、R-239、R-254、R-153、R-135、R-74。
对于绿色光阻材料，其着色剂材料可选自绿色颜料、黄色颜料、绿色染料、黄色染料中的一种或几种。其中配方中的绿色颜料可选自：P.G.37、P.G.36、P.G.7；黄色颜料可选自：P.Y.1、P.Y.12、P.Y.3、P.Y.13、P.Y.83、P.Y.93、P.Y.94、P.Y.95、P.Y.109、P.Y.126、P.Y.127、P.Y.138、P.Y.139、P.Y.147、P.Y.150、P.Y.174、P.Y.180；黄色、绿色染料可选自：C.I.Basic Yellow2、C.I.Solvent Yellow34、C.I.Solvent Green1、Y-27、Y-44、Y-50、Y-86、Y-106、Y-120、Y-132、Y-6、Y-11、Y-119、Y-23、Y-4、G-26、C.I.Direct G59、C.I.Direct G34。
对于蓝色光阻材料，其着色剂材料可选自蓝色颜料、紫色颜料和蓝色染料中的一种或几种。其中，蓝色颜料可选自：P.B.1、P.B.2、P.B.15、P.B.15：3、P.B.15：4、P.B.15：6、P.B.16、P.B.22、P.B.60或P.B.66；紫色颜料可选自：P.V.32、P.V.36、P.V.38、P.V.39、P.V.23、P.V.9、P.V.1；蓝色染料可选自：C.I.Direct Blue288、C.I.Direct Blue93、C.I.Direct Blue116、C.I.Direct Blue148、C.I.Direct Blue149、C.I.Direct Blue150、C.I.Direct Blue159、C.I.DirectBlue162或C.I.Direct Blue163。
对于黄色光阻材料，其着色剂材料可选自黄色颜料、黄色染料、橙色颜料和橙色染料中的一种或几种。其中，橙色颜料可选自：P.O.5、P.O.13、P.O.16、P.O.34、P.O.36、P.O.48、P.O.49、P.O.71、P.O.73；黄色颜料可选自：P.Y.1、P.Y.12、P.Y.3、P.Y.13、P.Y.83、P.Y.93、P.Y.94、P.Y.95、P.Y.109、P.Y.126、P.Y.127、P.Y.138、P.Y.139、P.Y.147、P.Y.150、P.Y.174或P.Y.180；黄色、橙色染料可选自：C.I.Basic Yellow2、C.I.Solvent Yellow34、C.I.Basic Orange2、Y-27、Y-44、Y-50、Y-86、Y-106、Y-120、Y-132、Y-6、Y-11、Y-119、Y-23、Y-4。
对于黑色光阻材料，其着色剂材料可选自炭黑颜料、有机黑颜料、黑色染料中的一种或几种。其中，炭黑颜料可选自德固赛炭黑P系列：Printex L6、Printex25、Printex L、Printex55、Printex45、Printex60、Printex35、Printex200，特黑系列：特黑550、特黑350、特黑250、特黑100，H系列：Hiblack30、Hiblack30L，哥伦比亚碳黑系列：Raven1255、Raven1200、Raven1170、Raven1100Ultra、Raven1060Ultra、Raven1040、Raven1035、Raven1020、Raven1000、Raven890、Raven860Ultra、Raven850、Raven820、Raven760Ultra、Raven460、Raven450、Raven410、RavenH2O、Raven825OB、Raven680OB；CABOT系列：R99R、R250R、R330R、R400R、R660R、ML、DL430，有机黑颜料可选自苝系黑颜料，巴斯夫黑系列：L0080、L0086，日本中央合成化学的CCA1、CCA2；黑色染料可选自直黑系列：19、22、154、168，染料11、染料12、染料13、染料14、染料15、染料16、染料17。
其中，碱可溶树脂可选自芳香酸丙烯酸半酯，或苯乙烯与有机酸酐共聚物等。
其中，不饱和单体可选自氯乙烯、苯乙烯、甲基丙烯酸甲酯、马来酰亚胺、丁二烯、丙烯酸甲酯、环氧丙烯酸酯、双酚A型环氧丙烯酸甲酯、DPHA(二季戊四醇五丙烯酸酯)、EBE264、EBE350中的一种或几种。
其中，引发剂优选为光引发剂或热引发剂。例如，光引发剂可以选自α-胺基酮类光引发剂：Irgacure907、Igracure369、Irgacure1300，酰基膦氧化物光引发剂：Irgacure819、Irgacure819DW、Irgacure2010、Darocur TPO、Darocur4265，α-羟基酮类光引发剂：Darocur1173、Irgacure184、Irgacure2959、Irgacure500、Irgacure1000，苯酰甲酸酯类光引发剂：Darocur mbf、Irgacure754；氧酰基肟酯类光引发剂：OXE-01、OXE-02，Quanta cure PDO，苯酰甲酸酯类光引发剂：ITX、MBF、Irgacure754。而热引发剂可选自(2,5-二甲基-2,5-二(叔丁基过氧)-3-己炔)、(2,5-二甲基-2,5-二(叔丁基过氧)己烷)、过二硫酸钠、过二硫酸钾、过二硫酸铵、2,2’-偶氮二(2-脒基丙烷)二盐酸盐和2,2’-偶氮二(2-(2-咪唑啉-2-基)丙烷)二盐酸盐。
其中，溶剂可选自碱性溶剂：酮、酯、醚、某些芳香烃溶剂；中性溶剂：脂肪烃、环烷烃类化合物、某些芳香烃溶剂等。例如，溶剂可为脂肪醇、乙二醇醚、乙酸乙酯、甲乙酮、甲基异丁基酮、单甲基醚乙二醇酯、γ-丁内酯、 丙酸－3－乙醚乙酯、丁基卡必醇、丁基卡必醇醋酸酯、丙二醇单甲基醚、丙二醇单甲基醚醋酸酯(PGMEA)、环己烷、二甲苯、异丙醇中的一种或多种。其中，丙二醇单甲基醚、丙二醇单甲基醚醋酸酯、环己烷、丁基卡必醇、丁基卡必醇醋酸酯、γ-丁内酯是优选的。
其中，添加剂是显示结构形成材料中常用的添加剂，其包括但不限于润湿附着力促进剂、流平剂，消泡剂、光稳定剂等。
根据本发明的一个实施方式，所述显示结构形成材料为隔垫物材料。
其中，“隔垫物材料”是指用于形成“隔垫物”的材料，“隔垫物”用于支撑显示装置(如液晶显示装置)中对置的两基板间。
例如，所述隔垫物材料按重量份数计包括：功能材料：0.2～1.2份；碱可溶树脂：5～20份；不饱和单体；5～20份；引发剂：0.01～1份；溶剂：30～90份；添加剂：0.005～0.02份。
其中，碱可溶树脂、不饱和单体、引发剂、溶剂、添加剂等的可选材料同上。
根据本发明的一个实施方式，所述显示结构形成材料为保护层材料；所述保护层材料按重量份数计包括：功能材料：0.2～1.2份；丙烯酸树脂：5～25份；偶联剂：1～15份；环氧树脂：1～20份；溶剂：70～80份。
其中，丙烯酸树脂可选自丙烯酸甲酯、丙烯酸乙酯、2-甲基丙烯酸甲酯、2-甲基丙烯酸乙酯、聚酯丙烯酸酯、聚氨酯丙烯酸酯、环氧丙烯酸酯；偶联剂可选自硅烷、氮硅烷、苯氧基硅烷、乙烯基硅烷、氨基硅烷、环氧基硅烷、巯基硅烷和甲基丙烯酰氧基硅烷偶联剂等。环氧树脂可选自脂肪族环氧树脂、双酚A型环氧树脂、缩水甘油基酯类环氧树脂、杂环环氧树脂等。溶剂可选自溶剂可选自碱性溶剂：酮、酯、醚、某些芳香烃溶剂，中性溶剂：脂肪烃、环烷烃类化合物、某些芳香烃溶剂。例如，溶剂可为脂肪醇、乙二醇醚、乙酸乙酯、甲乙酮、N-甲基吡咯烷酮、甲基异丁基酮、单甲基醚乙二醇酯、γ-丁内酯、丙酸－3－乙醚乙酯、丁基卡必醇、丁基卡必醇醋酸酯、丙二醇单甲基醚、丙二醇单甲基醚醋酸酯(PGMEA)、环己烷、二甲苯、异丙醇中的一种或多种，其中，丙二醇单甲基醚、丙二醇单甲基醚醋酸酯、环己烷、丁基卡必醇、丁基卡必醇醋酸酯、γ-丁内酯是优选的。
本发明实施方式还提供一种彩膜基板，其包括多个显示结构，且至少有 一种所述显示结构是由上述的显示结构形成材料制备的。
其中，彩膜基板通常包括一基底(如玻璃基底)，基底上可形成有黑矩阵，在黑矩阵的间隙处可形成有不同颜色的彩色滤光膜，在彩色滤光膜上可依次形成有保护层和电极层，在电极层上形成有隔垫物。
根据所选用的显示结构形成材料的不同，该显示结构可为彩色滤光膜、黑矩阵、隔垫物、保护层等。
本发明实施方式的显示结构是由上述显示结构形成材料形成的，因此其制备过程中可产生负离子，改善生产环境，净化空气，提高空气质量。同时该显示结构还可发射出远红外线，有益人体健康有益，提高人体免疫力。
当然，应当理解，本发明施方式所述的显示结构形成材料所制备的显示结构不限于用在彩膜基板上，例如其也可用于在阵列基板等上形成其他的显示结构。
本发明实施方式提供一种显示装置，其包括上述的彩膜基板。
当然，除了彩膜基板外，显示装置还可包括阵列基板等其他已知结构，在此不再详细描述。
本发明实施方式的显示装置包括上述彩膜基板，因此其制备过程中可产生负离子，改善生产环境，净化空气，提高空气质量。同时还可发射出远红外线，有益人体健康有益，提高人体免疫力。
根据本发明的一个实施方式，所述显示装置为电脑显示器、电视、手机、平板电脑、笔记本电脑、数码相机、电子纸、导航仪中的任意一种。
例如，上述显示装置可为液晶显示装置、有机发光二极管显示装置等不同的类型。
本发明实施方式提供一种上述功能材料的制备方法，如图1所示，其包括以下步骤：
A01、在使用分散剂的条件下对各组分进行研磨、混合，得到所述无机混合粉末。
其中，为了使功能材料更好地与显示结构相容，故制备无机混合粉末时，优选通过对原料的研磨使无机混合粉末具有较小的粒径。同时，在此过程中还使用分散剂，以使无机混合粉末分散而不发生团聚。需要说明的是，使用少量分散剂是为了使无机混合粉末分散，但并不会改变功能材料产品的成分。 其中，本发明实施方式中所选用的分散剂优选为中性分散剂，例如其可以为润湿分散剂BYK161、路博润Solsperse32500、Solsperse22000中的一种或几种。
根据本发明的一优选实施方式，上述研磨、混合可包括将各组分分别进行研磨后混合在一起，也可包括将各组分混合在一起之后进行研磨。
也就是说，本步骤中的各组分可以是按比例称取后进行统一研磨分散，直接得到上述无机混合粉末。或者，作为本实施方式的另一种方式，也可以是先将各组分分别进行研磨、分散后，再按比例将不同原料的粉末混合在一起。其中，采用的研磨、混合方法可根据各组分的比表面积差异性决定。如果各组分的比表面积差异性不大则可采用统一分散研磨的方法，但若各组分的比表面积差异性较大(如其中含有电气石、玉石、竹碳纤维等材料)，则可分别研磨后再混合。
优选地，当无机混合粉末设有上述表面改性层时，制备方法还应包括在无机混合粉末表面形成上述表面改性层的步骤，其包括：
A02、形成表面改性层的步骤可包括：将所述无机混合粉末、有机酸酐、可聚合乙烯性不饱和单体与溶剂、引发剂混合并进行反应。
也就是说，将上述功能材料的各组分、有机酸酐、可聚合乙烯性不饱和单体与溶剂、引发剂混合形成反应溶液，从而在无机混合粉末表面形成表面改性层。
例如，所述引发剂为偶氮类引发剂，如偶氮二异戊腈、偶氮二异丁腈、偶氮二异庚腈，最优选为偶氮二异庚腈。
例如，所述无机混合粉末、引发剂、溶剂的重量比为1∶(0.25～0.4)∶(1～1.5)。所述无机混合粉末、有机酸酐、可聚合乙烯性不饱和单体的重量比为1∶(0.8～1.2)∶(0.85～1.15)。
其中，可直接将各组分混合在一起。但为避免反应过于激烈，故本步骤优选包括：
A021、在室温下，将所述无机混合粉末放入反应容器(如四口瓶)内并不断搅拌，随后向反应容器内加入溶剂、有机酸酐、至少部分可聚合乙烯性不饱和单体并混匀。
其中，所述“室温”是指在本步骤中，不必对反应容器的温度进行特别 的控制，而只要使其保持与环境温度接近的问题即可。通常而言“室温”可认为是20～30℃。
其中，之所以要对无机混合粉末进行搅拌是为了防止无机混合粉末发生团聚而影响产品的粒径范围。
其中，“至少部分可聚合乙烯性不饱和单体”是指可聚合乙烯性不饱和单体可不在本步骤中一次性加入，而是只加入一部分，余下的可聚合乙烯性不饱和单体则在下一步骤中随引发剂一同加入。
例如，本步骤中加入的可聚合乙烯性不饱和单体占可聚合乙烯性不饱和单体总量的2/3至3/4。
A022、将引发剂滴加到所述反应容器内进行反应。
其中，若之前只加入了部分可聚合乙烯性不饱和单体，则此时引发剂是与剩余的可聚合乙烯性不饱和单体混合后一同滴加到反应容器内的。
其中，之所以将引发剂与可聚合乙烯性不饱和单体混合后再加入，且采取滴加的方式，是因为本步骤中引发剂的用量很少，其主要对反应起到催化作用，上述措施可以较好地避免反应溶液发生剧烈反应，防止催化剂加入到反应容器中由于来不及扩散而引起局部溶液过饱和而获得纯度较差的沉淀物。
优选的，本步骤的反应分为两个阶段，第一个阶段是在35～40℃的温度下反应60～90分钟；第二个阶段是在60～70℃的温度下反应至少60～80分钟。
在第一阶段中，催化剂需在低温且不断搅拌的条件下慢慢加入反应溶液中，以避免反应过于剧烈。当催化剂逐渐反应完全后反应进入第二阶段，此时可升高并继续反应。可以理解的是，第二阶段的反应时间则是可以根据所需产物的分子量来确定的，如若所需产物的分子量较大，则反应时间可长于60分钟。
例如，上述反应是在惰性气氛保护下进行的，以免氧气对反应产生干扰。其中，惰性气氛例如可为氮气气氛，也可为氩气等其他惰性气体的气氛。
A03、反应完毕后分离得到所述功能材料。
也就是说，从反应溶液中将带有表面改性层的无机混合粉末分离出来，作为功能材料产品。
例如，本步骤可包括：在不断搅拌下将反应溶液冷却，直至反应溶液中的结晶完全析出；对所述结晶进行减压干燥，得到所述功能材料。
本步骤中，当反应结束后对反应容器的反应溶液进行降温冷却，利用结晶法进行纯化，使反应溶液中的功能材料由于溶解度降低而析出结晶，而使未完全反应的物质或其它组分留在溶液中。随后对结晶进行减压干燥，以得到纯净的功能材料。其中，冷却操作通常在0～10℃的范围内即可。
本发明实施方式提供了一种功能材料的制备方法，该制备方法中所使用的原料来源广泛，且制备工艺简单，易操作，通过该制备方法制得功能材料的跟组分较好地混合。
与上述显示结构形成材料对应的，本发明实施方式还提供了一种显示结构形成材料的制备方法，如图2所示，其包括以下步骤：
B01、按比例称取显示结构形成材料的各组分，并将它们混合均匀。
其中，各组分的含量可根据显示结构形成材料所要制备的显示结构决定。
对于作为光阻材料的显示结构形成材料，其按重量份数计包括：功能材料：0.2～1.2份；着色剂：2～15份；碱可溶树脂：2～20份；不饱和单体：2～20份；引发剂：0.01～1份；溶剂：30～90份；添加剂：0.005～0.02份。优选地，所述光阻材料按重量份数计包括：功能材料：0.5～1.2份；着色剂：5～15份；碱可溶树脂：5～20份；不饱和单体：5～20份；引发剂：0.01～1份；溶剂：40～90份；添加剂：0.005～0.015份。更优选地，所述光阻材料按重量份数计包括：功能材料：0.5～1.0份；着色剂：5～10份；碱可溶树脂：5～15份；不饱和单体：5～15份；引发剂：0.01～1份；溶剂：45～90份；添加剂：0.005～0.01份。
对于作为隔垫物材料的显示结构形成材料，其按重量份数计包括：功能材料：0.2～1.2份；碱可溶树脂：5～20份；不饱和单体；5～20份；引发剂：0.01～1份；溶剂：30～90份；添加剂：0.005～0.02份。优选地，所述隔垫物材料按重量份数计包括：功能材料：0.5～1.2份；碱可溶树脂：10～20份；不饱和单体：10～20份；引发剂：0.01～1份；溶剂：40～90份；添加剂：0.005～0.015份。更优选地，所述隔 垫物材料按重量份数计包括：功能材料：0.5～1.0份；碱可溶树脂：10～15份；不饱和单体：10～15份；引发剂：0.01～1份；溶剂：45～90份；添加剂：0.005～0.01份。
对于作为保护层材料的显示结构形成材料，其按重量份数计包括：功能材料：0.2～1.2份；丙烯酸树脂：5～25份；偶联剂：1～15份；环氧树脂：1～20份；溶剂：70～80份。优选地，所述保护层材料按重量份数计包括：功能材料：0.5～1.2份；丙烯酸树脂：5～20份；偶联剂：1～10份；环氧树脂：1～15份。更优选地，所述保护层材料按重量份数计包括：功能材料：0.5～1.0份；丙烯酸树脂：5～15份；偶联剂：1～8份；环氧树脂：1～10份。
B02、将混合均匀后的组分进行脱泡，得到混合物。
本步骤中，将上步混匀的组分进行脱泡，以脱去原料中的气泡，使原料得到均匀的混合和分散。例如，脱泡次数为2～3次，脱泡时间为每次30～50分钟。
可以理解的是，本发明实施例并不限于此，本领域技术人员可根据本发明公开的内容及本领域公知常识或常用技术手段来确定或调整上述的脱泡的次数和时间。
B03、将所述混合物进行过滤，得到所述显示结构形成材料。
本步骤中除去混合物中的不溶物，以使显示结构形成材料整体上平滑细腻。
本发明实施方式提供了一种显示结构形成材料的制备方法，该方法步骤简单，易操作。
如图3所示，本发明实施方式提供一种制备彩膜基板的方法，其包括以下步骤：
C01、在基底上形成黑矩阵；
C02、在形成有黑矩阵的基底上形成彩色滤光膜，所述彩色滤光膜位于黑矩阵的间隔处，且包括多种不同的颜色(如红色、绿色、蓝色、黄色)；
C03、在形成有彩色滤光膜的基底上形成保护层；
C04、在形成有保护层的基底上形成透明电极层；
C05、在形成有透明电极层的基底上形成隔垫物，得到彩膜基板。
其中，黑矩阵、彩色滤光膜、保护层、隔垫物中的一种或多种可用上述显示结构形成材料制备。
为了更好地说明本发明，下面以具体实施例进行详细说明，其中，实施例1～9是对功能材料的详细说明，实施例10～24是对显示结构及其形成的详细说明。
实施例
其中，实施例1至9如表1至表5所示。
表1、实施例1～9的功能材料中主料的情况(含量单位为重量份数)
实施例 氧化硼含量 氧化钠含量 氧化锂含量 氧化锆含量
1 1.5 0.8 0.57 10
2 1.7 1.0 2.5 15
3 3.83 1.83 6.73 20
4 5.18 2.27 8.16 25
5 6.5 3.6 10.5 30
6 7.17 3.6 10.5 30
7 7.9 3.6 10.5 35
8 8.5 3.6 15.5 40
9 9.18 4.58 17.08 45
表2、实施例1～9的功能材料中辅料的情况(含量单位为重量份数)
Figure PCTCN2014088679-appb-000001
Figure PCTCN2014088679-appb-000002
表3、实施例1～9的功能材料中添加料的情况(含量为与主料与辅料总重量的百分比)
Figure PCTCN2014088679-appb-000003
表4、实施例1～9的功能材料中表面改性层的情况(单位为重量份)
Figure PCTCN2014088679-appb-000004
表5、实施例1～9的功能材料的制备过程的参数
Figure PCTCN2014088679-appb-000005
采用以上的表1至表5中的组分、含量、制备方法、制备参数等，制备了实施例1至9共9种不同的功能材料。在下面的实施例10至24中，将上述各功能材料用于不同的显示结构形成材料中，并用这些显示结构形成材料制成相应的显示结构，测试其性能。
实施例10：
红色光阻材料1的制备，其包括：
按重量份称取0.5份改性功能材料(实施例3)、6份P.R.254和P.Y.139(得自DIC)的混合物、11份芳香酸丙烯酸半酯SB401、4份芳香酸丙烯酸半酯SB404(得自Sartomer)、7份EBE350(得自氰特化工)、8份DPHA、29.868份丙二醇单甲基醚醋酸酯、25.22份3-乙氧基丙酸 乙酯、8.35份正丁醇、0.003份Irgacure369(得自Irgacure)、0.009份Darocur1173(得自Darocur)、0.02份附着力促进剂A-186(得自道康宁)和0.03份流平剂BYK333(得自BYK)，搅拌并混合均匀。之后，将混合均匀后的上述组分进行脱泡2次，每次35分钟，得到混合物。将得到的混合物过滤除杂，得到红色光阻材料1。
彩膜基板1的制备，其包括：
将黑色光阻材料涂布于基底上，形成黑矩阵。之后，在基底上被黑矩阵隔开的区域内，经过前烘、固化等工序依次形成红、绿、蓝彩色滤光膜，其中红色的彩色滤光膜由本实施例的红色光阻材料1制成。在彩色滤光膜上依次制备保护层和透明电极层，再于电极层上形成隔垫物。
对彩膜基板1进行性能测试，结果如下：
红外线比辐射率％ 50
负离子(个/立方厘米) 1045
透过率 92
色坐标(x,y) (0.635，0.328)
E值 1.2
其中，各项测试的具体方法和测试结果的分析在实施例后统一描述。
实施例11：
红色光阻材料2的制备，其包括：
首先，按重量份称取0.66份改性功能材料(实施例5)、6份P.R.254和P.Y.139的混合物、10份芳香酸丙烯酸半酯SB401、5份芳香酸丙烯酸半酯SB404、6份EBE350、9份DPHA、29.548份丙二醇单甲基醚醋酸酯、25.31份3-乙氧基丙酸乙酯、8.42份正丁醇、0.002份Irgacure369、0.01份ITX(引发剂，得自Ciba)、0.01份附着力促进剂A-186和0.04份流平剂BYK333，搅拌并混合均匀。之后，将混合均匀后的上述组分进行脱泡3次，每次45分钟，得到混合物。将得到的混合物过滤除杂，得到红色光阻材料2。
彩膜基板2的制备，其包括：
将黑色光阻材料涂布于基底上，形成黑矩阵。之后，在基底上被黑矩阵隔开的区域内，经过前烘、固化等工序依次形成红、绿、蓝彩色滤光 膜；其中红色的彩色滤光膜由本实施例的红色光阻材料2制成。在彩色滤光膜上依次制备保护层和透明电极层，再于电极层上形成隔垫物。
对彩膜基板2进行性能测试，结果如下：
红外线比辐射率％ 82
负离子(个/立方厘米) 1540
透过率 90.3
色坐标(x,y) (0.625，0.319)
E值 1.1
实施例12：
蓝色光阻材料3的制备，其包括：
按重量份称取0.45份改性功能材料(实施例2)、6份P.B.15和P.V.32的混合物、12份芳香酸丙烯酸半酯SB401、3份芳香酸丙烯酸半酯SB404、10份EBE350、5份DPHA、29.938份丙二醇单甲基醚醋酸酯、25份3-乙氧基丙酸乙酯、8.55份正丁醇、0.007份Irgacure369、0.005份OXE-02、0.02份附着力促进剂A-186和0.03份流平剂BYK333，搅拌并混合均匀。之后，将混合均匀后的原料进行脱泡2次，每次30分钟，得到混合物。将得到的混合物过滤除杂，得到蓝色光阻材料3。
彩膜基板3的制备，其包括：
将黑色光阻材料涂布于基底上，形成黑矩阵。之后，在基底上被黑矩阵隔开的区域内，经过前烘、固化等工序依次形成红、绿、蓝彩色滤光膜；其中蓝色的彩色滤光膜由本实施例的蓝色光阻材料3制成。在彩色滤光膜上依次制备保护层和透明电极层，再于电极层上形成隔垫物。
对彩膜基板3进行性能测试，结果如下：
红外线比辐射率％ 52
负离子(个/立方厘米) 801
透过率 85.6
色坐标(x,y) (0.144，0.786)
E值 2.2
实施例13：
蓝色光阻材料4的制备，其包括：
按重量份称取0.66份改性功能材料(实施例4)、6份P.B.15和P.V.32(得自Clariant)的混合物、10份芳香酸丙烯酸半酯SB401、5份芳香酸丙烯酸半酯SB404、6份EBE350、9份DPHA、29.548份丙二醇单甲基醚醋酸酯、25.31份3-乙氧基丙酸乙酯、8.42份正丁醇、0.002份Irgacure369、0.01份OXE-02、0.01份附着力促进剂A-186和0.04份流平剂BYK333，搅拌并混合均匀。之后，将混合均匀后的原料进行脱泡3次，每次45分钟，得到混合物。将得到的混合物过滤除杂，得到蓝色光阻材料4。
彩膜基板4的制备，其包括：
将黑色光阻材料涂布于基底上，形成黑矩阵。之后，在基底上被黑矩阵隔开的区域内，经过前烘、固化等工序依次形成红、绿、蓝彩色滤光膜；其中蓝色的彩色滤光膜由本实施例的蓝色光阻材料4制成。在彩色滤光膜上依次制备保护层和透明电极层，再于电极层上形成隔垫物。
对彩膜基板4进行性能测试，结果如下：
红外线比辐射率％ 81
负离子(个/立方厘米) 1222
透过率 82
色坐标(x,y) (0.149，0.789)
E值 2.1
实施例14：
绿色光阻材料5的制备，其包括：
按重量份数称取0.58份的功能材料(实施例5)，7.5份的P.G.36(得自DIC)和P.Y.139(着色剂)、7份的SB401(碱可溶树脂)、5份的SB404(碱可溶树脂)、8份的DPHA(不饱和单体)、5份的EBE264(不饱和单体，得自氰特化工)、0.005份的Irgacure369(引发剂，得自Irgacure)、0.01份的ITX(引发剂，得自Ciba)、0.02份的附着力促进剂A-186(得自道康宁)和0.03份的润湿流平剂BYK333(得自BYK)，并将它们溶解于50份的PGMEA(溶剂)中，搅拌并混合均匀。
将混合均匀后的原料进行脱泡2次，每次35分钟，得到混合物。将得到的混合物过滤除杂，得到绿色光阻材料5。
彩膜基板5的制备，其包括：
将黑色光阻材料涂布于基底上，形成黑矩阵。之后，在基底上被黑矩阵隔开的区域内，经过前烘、固化等工序依次形成红、绿、蓝彩色滤光膜；其中绿色的彩色滤光膜由本实施例的绿色光阻材料5制成。在彩色滤光膜上依次制备保护层和透明电极层，再于电极层上形成隔垫物。
对彩膜基板5进行性能测试，结果如下：
红外线比辐射率％ 88
负离子(个/立方厘米) 2790
透过率 90
色坐标(x,y) (0.310，0.578)
E值 1.8
实施例15：
绿色光阻材料6的制备，其包括：
按重量份数称取0.65份的功能材料(实施例3)，7.5份的P.G.36和P.Y.139的混合物(着色剂)、9份的SB401(碱可溶树脂)、4份的SB404(碱可溶树脂)、7.5份的EBE264(不饱和单体)、8份的DPHA(不饱和单体)、0.01份的Irgacure369(引发剂)、0.005份的ITX(引发剂)0.01份的附着力促进剂A-186、0.04份的润湿流平剂BYK333，并将它们溶解于50份的PGMEA(溶剂)中，搅拌并混合均匀。
将混合均匀后的原料进行脱泡2次，每次35分钟，得到混合物。将得到的混合物过滤除杂，得到绿色光阻材料6。
彩膜基板6的制备，其包括：
将黑色光阻材料涂布于基底上，形成黑矩阵。之后，在基底上被黑矩阵隔开的区域内，经过前烘、固化等工序依次形成红、绿、蓝彩色滤光膜；其中绿色的彩色滤光膜由本实施例的绿色光阻材料6制成。在彩色滤光膜上依次制备保护层和透明电极层，再于电极层上形成隔垫物。
对彩膜基板6进行性能测试，结果如下：
红外线比辐射率％ 81
负离子(个/立方厘米) 2270
透过率 92
色坐标(x,y) (0.310，0.578)
E值 1.5
实施例16：
黄色光阻材料7的制备，其包括：
按重量份数称取0.80份的功能材料(实施例7)，8份的P.Y.138(着色剂，得自DIC)、8份的SB401(碱可溶树脂)、4份的SB404(碱可溶树脂)、10份的DPHA(不饱和单体)、3份的EBE350(不饱和单体)、0.012份的Irgacure369(引发剂)、0.02份的附着力促进剂A-186、0.03份的润湿流平剂BYK333，并将它们溶解于50份的PGMEA(溶剂)中，搅拌并混合均匀。
将混合均匀后的原料进行脱泡2次，每次35分钟，得到混合物。将得到的混合物过滤除杂，得到黄色光阻材料7。
彩膜基板7的制备，其包括：
将黑色光阻材料涂布于基底上，形成黑矩阵。之后，在基底上被黑矩阵隔开的区域内，经过前烘、固化等工序依次形成红、绿、蓝彩色滤光膜；其中黄色的彩色滤光膜由本实施例的黄色光阻材料7制成。在彩色滤光膜上依次制备保护层和透明电极层，再于电极层上形成隔垫物。
对彩膜基板7进行性能测试，结果如下：
红外线比辐射率％ 75
负离子(个/立方厘米) 1700
透过率 92
色坐标(x,y) (0.4380，0.502)
E值 2.0
实施例17：
黄色光阻材料8的制备，其包括：
按重量份数称取0.78份的功能材料(实施例6)，8份的P.Y.138(着色剂)、7.5份的SB401(碱可溶树脂)、4.5份的SB404(碱可溶树脂)、8份的DPHA(不饱和单体)、6份的EBE350(不饱和单体)、0.12份的Irgacure369(引发剂)、0.03份的附着力促进剂A-186、0.02份的润湿流平剂BYK333，并将它们溶 解于50份的PGMEA(溶剂)中，搅拌并混合均匀。
将混合均匀后的原料进行脱泡2次，每次35分钟，得到混合物。将得到的混合物过滤除杂，得到黄色光阻材料8。
彩膜基板8的制备，其包括：
将黑色光阻材料涂布于基底上，形成黑矩阵。之后，在基底上被黑矩阵隔开的区域内，经过前烘、固化等工序依次形成红、绿、蓝彩色滤光膜；其中黄色的彩色滤光膜由本实施例的黄色光阻材料8制成。在彩色滤光膜上依次制备保护层和透明电极层，再于电极层上形成隔垫物。
对彩膜基板8进行性能测试，结果如下：
红外线比辐射率％ 98
负离子(个/立方厘米) 870
透过率 93.6
色坐标(x,y) (0.438，0.502)
E值 2.0
实施例18：
黑色光阻材料9的制备，其包括：
首先，按重量份称取0.5份改性功能材料(实施例1)、6份Raven760(着色剂，得自哥伦比亚)、11份芳香酸丙烯酸半酯SB401、4份芳香酸丙烯酸半酯SB404、7份EBE350、8份DPHA、29.868份丙二醇单甲基醚醋酸酯、25.22份3-乙氧基丙酸乙酯、8.35份正丁醇、0.003份Irgacure369、0.009份OXE-01、0.02份附着力促进剂A-186和0.03份流平剂BYK333，搅拌并混合均匀。之后，将混合均匀后的原料进行脱泡2次，每次35分钟，得到混合物。将得到的混合物过滤除杂，得到黑色光阻材料9。
彩膜基板9的制备，其包括：
将本实施例的黑色光阻材料9涂布于基底上，形成黑矩阵；之后，在基底上被黑矩阵隔开的区域内，经过前烘、固化等工序依次形成红、绿、蓝彩色滤光膜。在彩色滤光膜上依次制备保护层和透明电极层，再于电极层上形成隔垫物。
对彩膜基板9进行性能测试，结果如下：
红外线比辐射率％ 52
负离子(个/立方厘米) 801
OD值 4.7
实施例19：
黑色光阻材料10的制备，其包括：
首先，按重量份称取0.57份改性功能材料(实施例3)、6份Raven760、9份芳香酸丙烯酸半酯SB401、3份芳香酸丙烯酸半酯SB404、6份EBE350、9份DPHA、29.418份丙二醇单甲基醚醋酸酯、25.45份3-乙氧基丙酸乙酯、8.5份正丁醇、0.005份Irgacure369、0.007份OXE-01、0.03份附着力促进剂A-186和0.02份流平剂BYK333，搅拌并混合均匀。之后，将混合均匀后的原料进行脱泡3次，每次35分钟，得到混合物。将得到的混合物过滤除杂，得到黑色光阻材料10。
彩膜基板10的制备，其包括：
将本实施例的黑色光阻材料10涂布于基底上，形成黑矩阵。之后，在基底上被黑矩阵隔开的区域内，经过前烘、固化等工序依次形成红、绿、蓝彩色滤光膜。在彩色滤光膜上依次制备保护层和透明电极层，再于电极层上形成隔垫物。
对彩膜基板10进行性能测试，结果如下：
红外线比辐射率％ 66
负离子(个/立方厘米) 833
OD值 4.65
实施例20：
黑色光阻材料11的制备，其包括：
按质量份称取0.76份改性功能材料(实施例5)、6份Raven760、3份芳香酸丙烯酸半酯SB401、12份芳香酸丙烯酸半酯SB404、5份EBE350、10份DPHA、29.338份丙二醇单甲基醚醋酸酯、25.61份3-乙氧基丙酸乙酯、8.23份正丁醇、0.003份Irgacure369、0.009份OXE-02、0.01份附着力促进剂A-186和0.04份流平剂BYK333，搅拌并混合均匀。之后，将混合均匀后的原料进行脱泡3次，每次40分钟， 得到混合物。将得到的混合物过滤除杂，得到黑色光阻材料11。
彩膜基板11的制备，其包括：
将本实施例的黑色光阻材料11涂布于基底上，形成黑矩阵。之后，在基底上被黑矩阵隔开的区域内，经过前烘、固化等工序依次形成红、绿、蓝彩色滤光膜。在彩色滤光膜上依次制备保护层和透明电极层，再于电极层上形成隔垫物。
对彩膜基板11进行性能测试，结果如下：
红外线比辐射率％ 81
负离子(个/立方厘米) 1222
OD值 4.47
实施例21：
隔垫物材料12的制备，其包括：
按重量份称取0.76份改性功能材料(实施例3)、3份芳香酸丙烯酸半酯SB401、12份芳香酸丙烯酸半酯SB404、5份EBE350、10份DPHA、31.338份丙二醇单甲基醚醋酸酯、27.61份3-乙氧基丙酸乙酯、10.23份正丁醇、0.003份Irgacure369、0.009份OXE-02、0.01份附着力促进剂A-186和0.04份流平剂BYK333，搅拌并混合均匀。之后，将混合均匀后的原料进行脱泡3次，每次40分钟，得到混合物。将得到的混合物过滤除杂，得到隔垫物材料12。
彩膜基板12的制备
在基底上先分别形成黑矩阵和滤光层。之后，在形成有黑矩阵和滤光层的基底上形成保护层和透明电极层。最后，在基底上涂覆隔垫物材料12，经过前烘、固化等工序形成隔垫物，得到彩膜基板12。
对彩膜基板12进行性能测试，结果如下：
红外线比辐射率％ 92
负离子(个/立方厘米) 1664
透过率 89
实施例22：
隔垫物材料13的制备
首先，按重量份称取0.82份改性功能材料(实施例3)、11份芳香酸丙烯酸半酯SB401、4份芳香酸丙烯酸半酯SB404、6份EBE350、9份DPHA、31.348份丙二醇单甲基醚醋酸酯、27.75份3-乙氧基丙酸乙酯、10.02份正丁醇、0.004份Irgacure369、0.008份OXE-02、0.03份附着力促进剂A-186和0.02份流平剂BYK333，搅拌并混合均匀。之后，将混合均匀后的原料进行脱泡3次，每次45分钟，得到混合物。将得到的混合物过滤除杂，得到隔垫物材料13。
彩膜基板13的制备
在基底上先分别形成黑矩阵和滤光层。之后，在形成有黑矩阵和滤光层的基底上形成保护层和透明电极层。最后，在基底上涂覆隔垫物材料13，经过前烘、固化等工序形成隔垫物，得到彩膜基板13。
对彩膜基板13进行性能测试，结果如下：
红外线比辐射率％ 91
负离子(个/立方厘米) 2520
透过率 87
实施例23：
保护层材料14的制备，其包括：
按重量份称取0.75份改性功能材料3、12份聚氨酯丙烯酸酯EBE264、8份环氧树脂DEN438(得自陶氏化学)、45份PGMEA、25份N-甲基吡咯烷酮、5份偶联剂A-186，搅拌并混合均匀。之后，将混合均匀后的原料进行脱泡3次，每次40分钟，得到混合物。将得到的混合物过滤除杂，得到保护层材料14。
彩膜基板14的制备
在基底上先分别形成黑矩阵和滤光层。之后，在形成有黑矩阵和滤光层的基底上形成保护层和透明电极层。最后，在基底上涂覆保护层材料14，经过前烘、固化等工序形成保护层，得到彩膜基板14。
对彩膜基板14进行性能测试，结果如下：
红外线比辐射率％ 90
负离子(个/立方厘米) 2500
透过率 94
实施例24：
保护层材料15的制备，其包括：
按重量份称取0.50份改性功能材料(实施例4)、12份聚氨酯丙烯酸酯EBE350、10份环氧树脂DEN438、60份PGMEA、10份N-甲基吡咯烷酮、4份偶联剂A-186搅拌并混合均匀。之后，将混合均匀后的原料进行脱泡3次，每次40分钟，得到混合物。将得到的混合物过滤除杂，得到保护层材料15。
彩膜基板15的制备
在基底上先分别形成黑矩阵和滤光层。之后，在形成有黑矩阵和滤光层的基底上形成保护层和透明电极层。最后，在基底上涂覆保护层材料15，经过前烘、固化等工序形成保护层，得到彩膜基板15。
对彩膜基板15进行性能测试，结果如下：
红外线比辐射率％ 60
负离子(个/立方厘米) 810
透过率 97
性能测试
对以上实施例10至24制备的彩膜基板进行测试(实际为测试其中的彩色滤光膜、黑矩阵、隔垫物、保护层)，以获得其性能参数。测试包括：
(1)红外线比辐射率测试
将以上实施例10至24制备的彩膜基板1至15(对应彩色滤光膜、黑矩阵、隔垫物、保护层的彩膜基板)划分为5×5cm2的测试片。对各测试片参照GB/T7287-2008标准分别进行红外线比辐射率测试，具体测试步骤如下：
1)依次对各测试片施加额定工作电压，待温度稳定后，用辐射测温仪(精度不低于±1％)测定试样表面温度分布，并确定其中心部位的等温区的工作温度，然后断电冷却至室温。
2)将各测试片依次固定在试样支架(具有三维连续可调的功能)上，调整 光学系统达到下列要求：①探测器光敏免于调制平面、光栏平面及对各显示结构辐射面相互平行且共轴；②光学系统所决定的各彩膜基板的待测面积相对于探测器可作“点源”近似；且位于等温区内并小于等温区面积。
3)将控温仪热电偶焊接或粘接于待测面附近(等温区内)，用控温仪(控温精度不低于±0.5K)将待测表面温度控制在其工作温度。待温度稳定后，开启单色仪的扫描装置，使之在0.38～25μm的波长范围内进行连续扫描，同时使记录仪与之同步，测出放大系统输出的试样与调制盘差分光谱信号电压USλ随波长变化的关系曲线。
4)关闭控温仪，各测试片冷却至室温后，在等温区内均匀涂敷参比涂料，涂敷厚度为0.2mm，涂敷方法与获取其发射率数据的原测量方法中的一致。然后开启控温仪，待温度稳定后，按步骤3)中的方法测出放大系统输出的参比涂料与调制盘差分光谱信号电压Utλ随波长变化的关系曲线。
5)移开各测试片，测量放大系统输出的背景与调制盘差分光谱信号电压Uwλ随波长变化的关系曲线。
6)用辐射测温仪测量等温区的表观工作温度Tr。
7)在工作温度下根据GB/T7287-2008标准项下的计算公式计算出各测试片的红外线比辐射率。
红外线比辐射率即上述各显示结构等温区的表观工作温度与参比涂料涂覆的等温区的表观工作温度之比。其数值在0％～100％之间，越高越好表明红外线辐射越好。通常认为，红外线比辐射率值＞40％便可对人体的健康产生有益效果。
可见，本发明各实施例的显示结构的红外线比辐射率均超过了40％，故证明它们在常温条件下即可产生远红外线，有助于促进人体组织的新陈代谢、提高机体的免疫能力，起到保健的作用。
(2)负离子浓度测试
1)利用空气负离子测定仪测量出环境本底空气中的负离子浓度Db，空气负离子测定仪的分辨率为10个/cm3。
2)将以上实施例10至24制备的彩膜基板1至15(对应彩色滤光膜、黑矩阵、隔垫物、保护层的彩膜基板)划分为5×5cm2的测试片，将各测试片放在距空气负离子测定仪进风口约2cm处、在抖动或摩擦状态下进行测试，测 量出测各试片的负离子浓度Da。每个测试片测量5次，取较大值位测量结果。
3)计算各测试片的有效负离子浓度，即D＝Da－Db。
负离子浓度是指单位体积空气中的负离子的数目，负离子数目越多则代表负离子浓度越高，其降低污染、提高空气质量的能力越强。通常认为，对于显示结构生产车间而言，若负离子浓度高于800个/cm3即可达到净化空气的目的。
可见，本发明各实施例的显示结构的负离子浓度均超过了800个/cm3，故证明它们可释放足够的负离子，改善显示结构的生产环境。
(3)耐化性测试
如下对隔垫物进行耐化性测试。将以上实施例21至24制备的彩膜基板12至15(对应隔垫物、保护层的彩膜基板)划分为10×10cm2的测试片。将测试片在室温下放置在5％的NaOH溶液(或5％异丙醇溶液)中20分钟后取出，洗净，50℃下使之完全干燥。将经处理后的各测试片放置在分光光度计下，调焦对准，测量各测试片的透过率。
耐化性即显示结构在酸性、碱性或腐蚀溶剂条件下抵抗腐蚀的能力，是显示结构的可靠性要求之一。透过率是在入射光通量自被照面或介质入射面至另外一面离开的过程中，透过物体的辐射能与投射到物体上的总辐射能之比。透过率值越高，即亮度越高。通常认为，透过率值＞80％即认为显示结构的透过率达到标准。
可见，本发明各实施例的显示结构(隔垫物)的透过率均超过了80％，故证明它们在经历腐蚀后也可保证良好的透过率。即功能材料的加入没有对显示结构的耐化性和透过率性能产生不良影响。
(4)耐热性测试
对于彩色滤光膜等具有颜色且透光的显示结构，可对其进行耐热性测试，具体如下：
1)将以上实施例10至19制备的彩膜基板1至10(对应彩色滤光膜的彩膜基板)划分为10×10cm2的测试片，将测试片放置在100℃的条件下30分钟。
2)将经加热处理后的各测试片放置在分光光度计下分别测出色坐标，再与标准的色坐标进行对比，计算出⊿E值。
耐热性即显示结构抵御高温的能力，也是其可靠性要求之一，其评判标准取为色差⊿E值，即经处理后的显示结构的色坐标值与标准色坐标值的比值。通常认为，⊿E值＜3表示耐热性性能符合标准。
可见，本发明各实施例的显示结构(彩色滤光膜)的⊿E值均小于3，故证明它们在具有良好的耐热性。即功能材料的加入没有对显示结构的耐热性产生不良影响。
(5)OD值(Optical Density，光密度)测试
对于黑矩阵，可对其进行OP值测试，包括：将以上实施例18至20制备的彩膜基板9至11(对应黑矩阵的彩膜基板)划分为5×5cm2的测试片，将测试片在室温下置于X-Rite528型光密度仪下，调焦对准，测量各测试片的OD值。
OD值，即入射光和透射光的透过率之比的常用对数值。OD值越高即认为黑矩阵的色彩对比度越好。通常认为，OD值＞4即表示色彩对比度达到标准。
可见，本发明各实施例的黑矩阵的OD值均大于4，故证明它们的色彩对比度均达到了标准。这说明添加了本发明实施例的功能材料并未对黑矩阵的光学性能产生受到影响。
可以理解的是，以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式，然而本发明并不局限于此。对于本领域内的普通技术人员而言，在不脱离本发明的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本发明的保护范围。

Claims (33)

  1. 一种功能材料，包括无机混合粉末，所述无机混合粉末包括主料和辅料，
    所述主料由氧化硼、氧化钠、氧化锂、氧化锆组成；
    所述辅料包括氧化铝、氧化锌、二氧化钛、二氧化硅、氧化钙、银络合物、磷酸银、硝酸银、电气石、硫代硫酸银、碳纳米管、硫酸铝、锰、锰的氧化物、铁、铁的氧化物、钴、钴的氧化物、镍、镍的氧化物、铬、铬的氧化物、铜、铜的氧化物、氧化镁、碳化硼、碳化硅、碳化钛、碳化锆、碳化钽、碳化钼、氮化硼、氮化铬、氮化钛、氮化锆、氮化铝、硼化铬、四硼化三铬、硼化钛、硼化锆、二硅化钨、二硅化钛中的任意一种或多种。
  2. 根据权利要求1所述的功能材料，其中，所述无机混合粉末还包括添加料，所述添加料包括：
    石墨、云母、蓝青石、方解石、水晶萤石、麦饭石、莫来石中的任意一种或多种。
  3. 根据权利要求2所述的功能材料，其中，
    所述添加料的量为所述主料和辅料总重量的1～5％。
  4. 根据权利要求1所述的功能材料，其中，
    所述无机混合粉末的粒径在20～300nm之间。
  5. 根据权利要求1至4中任意一项所述的功能材料，其中，
    所述无机混合粉末具有表面改性层，所述表面改性层为分子量小于等于5000且大于等于2500的光固化碱可溶树脂形成的层。
  6. 根据权利要求5所述的功能材料，其中，
    所述表面改性层由可聚合乙烯性不饱和单体与有机酸酐共聚形成。
  7. 根据权利要求6所述的功能材料，其中，
    所述可聚合乙烯性不饱和单体为苯乙烯、乙烯基甲苯、对氯苯乙烯、甲氧基苯乙烯、α-甲基苯乙烯、异戊烯中的任意一种；
    所述有机酸酐为马来酸酐、顺丁烯二酸酐、反丁烯二酸、衣康酸酐、柠康酸酐、均苯四甲酸二酐、联苯四酸二酐、二苯酮四酸二酐、氧联苯四甲酸二酐、异丙基二苯酐中的任意一种。
  8. 根据权利要求6所述的功能材料，其中，
    所述无机混合粉末、有机酸酐、可聚合乙烯性不饱和单体的重量比为1∶(0.8～1.2)∶(0.85～1.15)。
  9. 根据权利要求6所述的功能材料，其中，所述无机混合粉末按重量份数计包括：
    氧化硼：1.5～10份；
    氧化钠：0.5～5份；
    氧化锂：0.2～20份；
    氧化锆：10～50份；
    氧化铝：5～40份；
    二氧化钛：0.5～8份。
  10. 根据权利要求9所述的功能材料，其中，所述无机混合粉末按重量份数包括：
    氧化硼：3～8份；
    氧化钠：1.5～4.5份；
    氧化锂：1.5～18份；
    氧化锆：15～45份；
    氧化铝：8～32份；
    二氧化钛：1.5～7份。
  11. 一种显示结构形成材料，包括：碱可溶树脂、不饱和单体、引发剂、 溶剂，以及权利要求1至10中任意一项所述的功能材料。
  12. 根据权利要求11所述的显示结构形成材料，其中，所述显示结构形成材料为光阻材料，所述光阻材料中还含有着色剂。
  13. 根据权利要求12所述的显示结构形成材料，其中，所述光阻材料按重量份数计包括：
    功能材料：0.2～1.2份；
    着色剂：2～15份；
    碱可溶树脂：2～20份；
    不饱和单体：2～20份；
    引发剂：0.01～1份；
    溶剂：30～90份；
    添加剂：0.005～0.02份。
  14. 根据权利要求13所述的显示结构形成材料，其中，
    所述光阻材料为红色光阻材料、蓝色光阻材料、绿色光阻材料、黄色光阻材料、黑色光阻材料中的任意一种。
  15. 根据权利要求11所述的显示结构形成材料，其中，所述显示结构形成材料为隔垫物材料。
  16. 根据权利要求15所述的显示结构形成材料，其中，所述隔垫物材料按重量份数计包括：
    功能材料：0.2～1.2份；
    碱可溶树脂：5～20份；
    不饱和单体：5～20份；
    引发剂：0.01～1份；
    溶剂：30～90份；
    添加剂：0.005～0.02份。
  17. 根据权利要求11至16中任意一项所述的显示结构形成材料，其中，
    所述引发剂为光引发剂或热引发剂。
  18. 一种显示结构形成材料，其中，所述显示结构形成材料为保护层材料，所述保护层材料按重量份数计包括：
    功能材料：0.2～1.2份；
    丙烯酸树脂：5～25份；
    偶联剂：1～15份；
    环氧树脂：1～20份；
    溶剂：70～80份。
  19. 一种彩膜基板，其包括多个显示结构，其中，至少有一种所述显示结构是由权利要求11至18中任意一项所述的显示结构形成材料制备的。
  20. 一种显示装置，包括权利要求19所述的彩膜基板。
  21. 根据权利要求20所述的显示装置，其中，所述显示装置为电脑显示器、电视、手机、平板电脑、笔记本电脑、数码相机、电子纸、导航仪中的任意一种。
  22. 一种权利要求1至10中任意一项所述的功能材料的制备方法，包括：
    在使用分散剂的条件下对所述主料、辅料以及任选的添加料进行研磨、混合，得到所述无机混合粉末。
  23. 根据权利要求22所述的方法，其中，所述研磨、混合包括：
    将所述主料、辅料以及任选的添加料分别进行研磨后混合在一起；或
    将所述主料、辅料以及任选的添加料混合在一起之后进行研磨。
  24. 根据权利要求22或23所述的方法，其中，所述功能材料为权利要 求5至10中任意一项所述的功能材料，且所述方法还包括：
    在得到所述无机混合粉末后，在所述无机混合粉末上形成所述表面改性层。
  25. 根据权利要求24所述的方法，其中，所述功能材料为权利要求6至10中任意一项所述的功能材料，且在所述无机混合粉末上形成所述表面改性层包括：
    步骤S1：将所述无机混合粉末、有机酸酐、可聚合乙烯性不饱和单体与溶剂、引发剂混合并进行反应；
    步骤S2：反应完毕后分离得到所述功能材料。
  26. 根据权利要求25所述的方法，其中，所述步骤S1包括：
    步骤S11：在室温下，将所述无机混合粉末放入反应容器内并不断搅拌，随后向反应容器内加入溶剂、有机酸酐、至少部分可聚合乙烯性不饱和单体并混匀；
    步骤S12：将引发剂滴加到所述反应容器内进行反应。
  27. 根据权利要求26所述的方法，其中，
    所述步骤S11中加入的可聚合乙烯性不饱和单体占参加反应的可聚合乙烯性不饱和单体总重量的2/3至3/4；
    所述步骤S12中，所述引发剂是与剩余的可聚合乙烯性不饱和单体混合后滴加到所述反应容器内的。
  28. 根据权利要求25所述的方法，其中，所述步骤S1的反应包括两个阶段，其中：
    第一个阶段是在35～40℃的温度下反应60～90分钟；
    第二个阶段是在60～70℃的温度下反应60～80分钟。
  29. 根据权利要求25所述的方法，其中，所述步骤S1的反应在惰性气氛保护下进行。
  30. 根据权利要求25所述的方法，其中，所述步骤S2包括：
    在不断搅拌下将反应溶液冷却，直至反应溶液中的结晶完全析出，对所述结晶进行减压干燥，得到所述功能材料。
  31. 根据权利要求30所述的方法，其中，所述冷却的温度为0～10℃。
  32. 根据权利要求25至31中任意一项所述的方法，其中，所述引发剂为偶氮类引发剂。
  33. 根据权利要求25至31中任意一项所述的方法，其中，
    所述无机混合粉末、有机酸酐、可聚合乙烯性不饱和单体的重量比为1∶(0.8～1.2)∶(0.85～1.15)；且
    所述无机混合粉末、引发剂、溶剂的重量比为1∶(0.25～0.4)∶(1～1.5)。
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