TWI381785B - 佈線板及其製造方法,暨半導體封裝及其製造方法 - Google Patents

佈線板及其製造方法,暨半導體封裝及其製造方法 Download PDF

Info

Publication number
TWI381785B
TWI381785B TW095131551A TW95131551A TWI381785B TW I381785 B TWI381785 B TW I381785B TW 095131551 A TW095131551 A TW 095131551A TW 95131551 A TW95131551 A TW 95131551A TW I381785 B TWI381785 B TW I381785B
Authority
TW
Taiwan
Prior art keywords
insulating layer
multilayer wiring
wiring board
wiring structure
layer
Prior art date
Application number
TW095131551A
Other languages
English (en)
Chinese (zh)
Other versions
TW200735742A (en
Inventor
中村順一
小林祐治
山際幹夫
Original Assignee
新光電氣工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 新光電氣工業股份有限公司 filed Critical 新光電氣工業股份有限公司
Publication of TW200735742A publication Critical patent/TW200735742A/zh
Application granted granted Critical
Publication of TWI381785B publication Critical patent/TWI381785B/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0313—Organic insulating material
    • H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/0366—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0313—Organic insulating material
    • H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/036—Multilayers with layers of different types
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4602—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
    • H05K3/4655—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern by using a laminate characterized by the insulating layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4682—Manufacture of core-less build-up multilayer circuits on a temporary carrier or on a metal foil
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4688—Composite multilayer circuits, i.e. comprising insulating layers having different properties
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0147—Carriers and holders
    • H05K2203/0152—Temporary metallic carrier, e.g. for transferring material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/0733—Method for plating stud vias, i.e. massive vias formed by plating the bottom of a hole without plating on the walls
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15—Position of the PCB during processing
    • H05K2203/1536—Temporarily stacked PCBs
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • H05K3/205—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using a pattern electroplated or electroformed on a metallic carrier
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7424—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used as a support during the manufacture of self-supporting substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/65—Shapes or dispositions of interconnections
    • H10W70/654—Top-view layouts
    • H10W70/655—Fan-out layouts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68—Shapes or dispositions thereof
    • H10W70/682—Shapes or dispositions thereof comprising holes having chips therein
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68—Shapes or dispositions thereof
    • H10W70/685—Shapes or dispositions thereof comprising multiple insulating layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/072—Connecting or disconnecting of bump connectors
    • H10W72/07251—Connecting or disconnecting of bump connectors characterised by changes in properties of the bump connectors during connecting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/15—Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49126—Assembling bases
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
TW095131551A 2005-08-29 2006-08-28 佈線板及其製造方法,暨半導體封裝及其製造方法 TWI381785B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005247862 2005-08-29
JP2006122115A JP4072176B2 (ja) 2005-08-29 2006-04-26 多層配線基板の製造方法

Publications (2)

Publication Number Publication Date
TW200735742A TW200735742A (en) 2007-09-16
TWI381785B true TWI381785B (zh) 2013-01-01

Family

ID=37981535

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095131551A TWI381785B (zh) 2005-08-29 2006-08-28 佈線板及其製造方法,暨半導體封裝及其製造方法

Country Status (4)

Country Link
US (2) US8222527B2 (enExample)
JP (1) JP4072176B2 (enExample)
KR (2) KR101342031B1 (enExample)
TW (1) TWI381785B (enExample)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200906263A (en) * 2007-05-29 2009-02-01 Matsushita Electric Industrial Co Ltd Circuit board and method for manufacturing the same
JP5114130B2 (ja) * 2007-08-24 2013-01-09 新光電気工業株式会社 配線基板及びその製造方法、及び半導体装置
JP5092662B2 (ja) * 2007-10-03 2012-12-05 凸版印刷株式会社 印刷配線板の製造方法
KR101489798B1 (ko) * 2007-10-12 2015-02-04 신꼬오덴기 고교 가부시키가이샤 배선 기판
JP5289880B2 (ja) * 2007-10-12 2013-09-11 新光電気工業株式会社 配線基板
CN101822132B (zh) 2007-10-16 2012-12-26 住友电木株式会社 搭载半导体元件的基板
JP2009135184A (ja) * 2007-11-29 2009-06-18 Shinko Electric Ind Co Ltd 配線基板及びその製造方法
JP5295596B2 (ja) * 2008-03-19 2013-09-18 新光電気工業株式会社 多層配線基板およびその製造方法
CN101983425B (zh) * 2008-03-31 2012-11-21 住友电木株式会社 多层电路板、绝缘片和使用多层电路板的半导体封装件
KR100956688B1 (ko) 2008-05-13 2010-05-10 삼성전기주식회사 인쇄회로기판 및 그 제조방법
US8598719B2 (en) 2008-06-12 2013-12-03 Sumitomo Bakelite Company Limited Semiconductor element mounting board
JP4974181B2 (ja) * 2008-07-29 2012-07-11 古河電気工業株式会社 キャリア付きプリント配線基板およびその製造方法
JP5057339B2 (ja) * 2008-07-31 2012-10-24 京セラSlcテクノロジー株式会社 配線基板の製造方法
US8207453B2 (en) 2009-12-17 2012-06-26 Intel Corporation Glass core substrate for integrated circuit devices and methods of making the same
US9420707B2 (en) * 2009-12-17 2016-08-16 Intel Corporation Substrate for integrated circuit devices including multi-layer glass core and methods of making the same
WO2011089936A1 (ja) * 2010-01-22 2011-07-28 日本電気株式会社 機能素子内蔵基板及び配線基板
JP5444136B2 (ja) * 2010-06-18 2014-03-19 新光電気工業株式会社 配線基板
JP5578962B2 (ja) * 2010-06-24 2014-08-27 新光電気工業株式会社 配線基板
JP5079059B2 (ja) 2010-08-02 2012-11-21 日本特殊陶業株式会社 多層配線基板
JP2012039033A (ja) * 2010-08-11 2012-02-23 Clarion Co Ltd 電子回路基板、ナビゲーション装置
EP2448378A1 (en) * 2010-10-26 2012-05-02 ATOTECH Deutschland GmbH Composite build-up materials for embedding of active components
EP2448380A1 (en) * 2010-10-26 2012-05-02 ATOTECH Deutschland GmbH Composite build-up material for embedding of circuitry
JP5587139B2 (ja) 2010-11-04 2014-09-10 日本特殊陶業株式会社 多層配線基板
JP5715835B2 (ja) * 2011-01-25 2015-05-13 新光電気工業株式会社 半導体パッケージ及びその製造方法
JP5848110B2 (ja) * 2011-02-15 2016-01-27 日本特殊陶業株式会社 多層配線基板の製造方法
JP6081693B2 (ja) 2011-09-12 2017-02-15 新光電気工業株式会社 配線基板及び配線基板の製造方法
US11127664B2 (en) * 2011-10-31 2021-09-21 Unimicron Technology Corp. Circuit board and manufacturing method thereof
JP2013123035A (ja) * 2011-11-09 2013-06-20 Ngk Spark Plug Co Ltd 多層配線基板の製造方法
JP2013149941A (ja) * 2011-12-22 2013-08-01 Ngk Spark Plug Co Ltd 多層配線基板及びその製造方法
JP2013135080A (ja) * 2011-12-26 2013-07-08 Ngk Spark Plug Co Ltd 多層配線基板の製造方法
US9445496B2 (en) 2012-03-07 2016-09-13 Intel Corporation Glass clad microelectronic substrate
US9001520B2 (en) 2012-09-24 2015-04-07 Intel Corporation Microelectronic structures having laminated or embedded glass routing structures for high density packaging
US20140151095A1 (en) * 2012-12-05 2014-06-05 Samsung Electro-Mechanics Co., Ltd. Printed circuit board and method for manufacturing the same
JP6041731B2 (ja) * 2013-03-27 2016-12-14 新光電気工業株式会社 インターポーザ、及び電子部品パッケージ
JP5647310B2 (ja) * 2013-08-16 2014-12-24 Jx日鉱日石金属株式会社 多層コアレス回路基板の製造方法、多層プリント配線板用の積層体の製造方法、多層プリント配線板の製造に用いられる積層体の製造方法、およびプリント基板の製造方法
KR20150064445A (ko) * 2013-12-03 2015-06-11 삼성전기주식회사 반도체 패키지용 코어리스 기판 및 그 제조 방법, 이를 이용한 반도체 패키지 제조 방법
JP6447075B2 (ja) * 2014-12-10 2019-01-09 凸版印刷株式会社 配線基板、半導体装置及び半導体装置の製造方法
US9837484B2 (en) 2015-05-27 2017-12-05 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming substrate including embedded component with symmetrical structure
JP2017050464A (ja) * 2015-09-03 2017-03-09 凸版印刷株式会社 配線基板積層体、その製造方法及び半導体装置の製造方法
US9711458B2 (en) * 2015-11-13 2017-07-18 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and formation method for chip package
US10993333B2 (en) * 2017-07-15 2021-04-27 Sanmina Corporation Methods of manufacturing ultra thin dielectric printed circuit boards with thin laminates
CN110446355A (zh) * 2019-08-23 2019-11-12 惠州中京电子科技有限公司 一种led灯珠封装板树脂塞孔工艺
JP7528502B2 (ja) * 2020-03-31 2024-08-06 三菱マテリアル株式会社 金属ベース基板
EP3964824B1 (en) 2020-09-02 2024-02-14 AT & S Austria Technologie & Systemtechnik Aktiengesellschaft Expansion coefficient determination with deformation measurement and simulation
US20240105575A1 (en) * 2022-09-26 2024-03-28 Intel Corporation Electrolytic surface finish architecture

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004186265A (ja) * 2002-11-29 2004-07-02 Ngk Spark Plug Co Ltd 多層配線基板の製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5906042A (en) * 1995-10-04 1999-05-25 Prolinx Labs Corporation Method and structure to interconnect traces of two conductive layers in a printed circuit board
JPH1174641A (ja) 1997-08-29 1999-03-16 Kyocera Corp 多層配線基板
US6207726B1 (en) * 1998-02-13 2001-03-27 Showa Denko Kabushiki Kaisha Photocurable prepreg composition and production method thereof
JP2001210919A (ja) * 1999-11-17 2001-08-03 Sharp Corp フレキシブル配線板およびそれを用いた電子機器
TWI228956B (en) * 1999-12-17 2005-03-01 Matsushita Electric Industrial Co Ltd Cleaning apparatus for substrate material
JP2001267747A (ja) * 2000-03-22 2001-09-28 Nitto Denko Corp 多層回路基板の製造方法
JP2001274556A (ja) * 2000-03-23 2001-10-05 Nec Corp プリント配線板
JP3760101B2 (ja) * 2001-02-13 2006-03-29 富士通株式会社 多層プリント配線板およびその製造方法
WO2003039219A1 (en) 2001-10-31 2003-05-08 Shinko Electric Industries Co., Ltd. Method for manufacturing multilayer circuit board for semiconductor device
JP4129166B2 (ja) 2002-10-29 2008-08-06 京セラ株式会社 電解銅箔、電解銅箔付きフィルム及び多層配線基板と、その製造方法
JP2004319888A (ja) 2003-04-18 2004-11-11 Mitsubishi Gas Chem Co Inc 多層プリント配線板。
JP2004343054A (ja) 2003-04-23 2004-12-02 Tdk Corp 電子部品とその製造方法
JP4143609B2 (ja) 2003-05-23 2008-09-03 富士通株式会社 配線基板の製造方法
JP2004356569A (ja) * 2003-05-30 2004-12-16 Shinko Electric Ind Co Ltd 半導体装置用パッケージ
JP2005109108A (ja) * 2003-09-30 2005-04-21 Ibiden Co Ltd ビルドアッププリント配線板及びその製造方法
TWI335195B (en) * 2003-12-16 2010-12-21 Ngk Spark Plug Co Multilayer wiring board

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004186265A (ja) * 2002-11-29 2004-07-02 Ngk Spark Plug Co Ltd 多層配線基板の製造方法

Also Published As

Publication number Publication date
KR20070026022A (ko) 2007-03-08
US9040836B2 (en) 2015-05-26
JP4072176B2 (ja) 2008-04-09
US8222527B2 (en) 2012-07-17
US20120293973A1 (en) 2012-11-22
KR101342031B1 (ko) 2013-12-16
KR20130018215A (ko) 2013-02-20
TW200735742A (en) 2007-09-16
JP2007096260A (ja) 2007-04-12
US20070119619A1 (en) 2007-05-31
KR101319358B1 (ko) 2013-10-16

Similar Documents

Publication Publication Date Title
JP4072176B2 (ja) 多層配線基板の製造方法
JP4452222B2 (ja) 多層配線基板及びその製造方法
CN102646628B (zh) 用于制造半导体装置的方法
JP4055717B2 (ja) 半導体装置およびその製造方法
JP4251421B2 (ja) 半導体装置の製造方法
CN103199078B (zh) 具有一体化结构组件的多层电子支撑结构
JP6170832B2 (ja) 配線基板、半導体装置及び配線基板の製造方法
US9054082B2 (en) Semiconductor package, semiconductor device, and method for manufacturing semiconductor package
JP4073945B1 (ja) 多層配線基板の製造方法
JP6661232B2 (ja) 配線基板、半導体装置、配線基板の製造方法及び半導体装置の製造方法
TWI505756B (zh) 印刷電路板及其製造方法
JP6029958B2 (ja) 配線基板の製造方法
WO2004103039A1 (ja) 両面配線基板および両面配線基板の製造方法並びに多層配線基板
JP7202785B2 (ja) 配線基板及び配線基板の製造方法
CN103369874B (zh) 布线基板的制造方法以及布线基板
US20170062370A1 (en) Electronic component device
JP2007227586A (ja) 半導体素子内蔵基板及びその製造方法
US20080185175A1 (en) Multilayer wiring board and method of manufacturing the same
JP2008078683A (ja) 多層配線基板
US6913814B2 (en) Lamination process and structure of high layout density substrate
US12482734B2 (en) Laminated wiring board
JP7721953B2 (ja) 多層配線基板
JP7589574B2 (ja) 多層配線基板
JP2007123578A (ja) 半導体装置及びその製造方法
JP2023142048A (ja) 配線基板の製造方法