TWD197321S - 物理氣相沉積室靶 - Google Patents

物理氣相沉積室靶

Info

Publication number
TWD197321S
TWD197321S TW107303086F TW107303086F TWD197321S TW D197321 S TWD197321 S TW D197321S TW 107303086 F TW107303086 F TW 107303086F TW 107303086 F TW107303086 F TW 107303086F TW D197321 S TWD197321 S TW D197321S
Authority
TW
Taiwan
Prior art keywords
target
vapor deposition
physical vapor
deposition chamber
profile
Prior art date
Application number
TW107303086F
Other languages
English (en)
Inventor
Martin Lee Riker
Fuhong Zhang
Zheng Wang
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD197321S publication Critical patent/TWD197321S/zh

Links

Abstract

【物品用途】;本設計係應用於物理氣相沉積室靶。;【設計說明】;圖式第8頁，係圖示出沿著第2頁俯視圖中的8-8線的剖面圖。
TW107303086F 2017-12-11 2018-06-01 物理氣相沉積室靶 TWD197321S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/629,062 USD868124S1 (en) 2017-12-11 2017-12-11 Target profile for a physical vapor deposition chamber target

Publications (1)

Publication Number Publication Date
TWD197321S true TWD197321S (zh) 2019-05-01

Family

ID=67390873

Family Applications (2)

Application Number Title Priority Date Filing Date
TW107303086F TWD197321S (zh) 2017-12-11 2018-06-01 物理氣相沉積室靶
TW107303087F TWD197322S (zh) 2017-12-11 2018-06-01 物理氣相沉積室靶

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW107303087F TWD197322S (zh) 2017-12-11 2018-06-01 物理氣相沉積室靶

Country Status (3)

Country Link
US (2) USD868124S1 (zh)
JP (2) JP1651698S (zh)
TW (2) TWD197321S (zh)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD966357S1 (en) 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

Also Published As

Publication number Publication date
TWD197322S (zh) 2019-05-01
JP1651698S (zh) 2020-01-27
USD946638S1 (en) 2022-03-22
JP1637543S (zh) 2019-07-29
USD868124S1 (en) 2019-11-26

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