|
US5825470A
(en)
*
|
1995-03-14 |
1998-10-20 |
Nikon Corporation |
Exposure apparatus
|
|
JP3571471B2
(ja)
*
|
1996-09-03 |
2004-09-29 |
東京エレクトロン株式会社 |
処理方法,塗布現像処理システム及び処理システム
|
|
SG67433A1
(en)
*
|
1996-11-01 |
1999-09-21 |
Tokyo Electron Ltd |
Method and apparatus for processing substrate
|
|
TW353777B
(en)
*
|
1996-11-08 |
1999-03-01 |
Tokyo Electron Ltd |
Treatment device
|
|
JPH10144599A
(ja)
*
|
1996-11-11 |
1998-05-29 |
Tokyo Electron Ltd |
回転処理装置およびその洗浄方法
|
|
JP3774283B2
(ja)
*
|
1996-11-19 |
2006-05-10 |
東京エレクトロン株式会社 |
処理システム
|
|
TW353784B
(en)
|
1996-11-19 |
1999-03-01 |
Tokyo Electron Ltd |
Apparatus and method for washing substrate
|
|
JP3566475B2
(ja)
*
|
1996-12-03 |
2004-09-15 |
東京エレクトロン株式会社 |
処理装置
|
|
TW464944B
(en)
*
|
1997-01-16 |
2001-11-21 |
Tokyo Electron Ltd |
Baking apparatus and baking method
|
|
JP3579228B2
(ja)
*
|
1997-01-24 |
2004-10-20 |
大日本スクリーン製造株式会社 |
基板処理装置
|
|
TW389949B
(en)
|
1997-01-30 |
2000-05-11 |
Tokyo Electron Ltd |
Method and apparatus for coating and development of the photo-resist solution
|
|
EP0863538B1
(en)
*
|
1997-03-03 |
2003-05-21 |
Tokyo Electron Limited |
Coating apparatus and coating method
|
|
US6213708B1
(en)
*
|
1997-03-12 |
2001-04-10 |
Advanced Micro Devices, Inc. |
System for sorting multiple semiconductor wafers
|
|
US5796486A
(en)
*
|
1997-03-31 |
1998-08-18 |
Lam Research Corporation |
Apparatus method for determining the presence or absence of a wafer on a wafer holder
|
|
US6073366A
(en)
*
|
1997-07-11 |
2000-06-13 |
Asm America, Inc. |
Substrate cooling system and method
|
|
JP3700891B2
(ja)
*
|
1997-07-28 |
2005-09-28 |
東京エレクトロン株式会社 |
搬送装置,基板の処理システム及び基板処理方法
|
|
JPH11129184A
(ja)
|
1997-09-01 |
1999-05-18 |
Dainippon Screen Mfg Co Ltd |
基板処理装置および基板搬入搬出装置
|
|
US6089763A
(en)
*
|
1997-09-09 |
2000-07-18 |
Dns Korea Co., Ltd. |
Semiconductor wafer processing system
|
|
JP3310212B2
(ja)
*
|
1998-02-06 |
2002-08-05 |
東京エレクトロン株式会社 |
塗布・現像処理システムおよび液処理システム
|
|
US6065128A
(en)
*
|
1998-04-09 |
2000-05-16 |
Cypress Semiconductor Corp. |
Anti-wafer breakage detection system
|
|
US5952670A
(en)
*
|
1998-04-09 |
1999-09-14 |
Cypress Semiconductor Corp. |
Anti-wafer breakage detection system
|
|
WO1999066547A1
(en)
|
1998-06-19 |
1999-12-23 |
Matsushita Electric Industrial Co., Ltd. |
Method and device for forming bump
|
|
JP3445937B2
(ja)
|
1998-06-24 |
2003-09-16 |
東京エレクトロン株式会社 |
多段スピン型基板処理システム
|
|
US6450755B1
(en)
*
|
1998-07-10 |
2002-09-17 |
Equipe Technologies |
Dual arm substrate handling robot with a batch loader
|
|
JP2000040731A
(ja)
*
|
1998-07-24 |
2000-02-08 |
Tokyo Electron Ltd |
処理装置
|
|
JP2000094233A
(ja)
*
|
1998-09-28 |
2000-04-04 |
Tokyo Electron Ltd |
収容装置
|
|
JP3442669B2
(ja)
*
|
1998-10-20 |
2003-09-02 |
東京エレクトロン株式会社 |
基板処理装置
|
|
US6533531B1
(en)
|
1998-12-29 |
2003-03-18 |
Asml Us, Inc. |
Device for handling wafers in microelectronic manufacturing
|
|
US6616394B1
(en)
|
1998-12-30 |
2003-09-09 |
Silicon Valley Group |
Apparatus for processing wafers
|
|
US6322312B1
(en)
|
1999-03-18 |
2001-11-27 |
Applied Materials, Inc. |
Mechanical gripper for wafer handling robots
|
|
US6610150B1
(en)
*
|
1999-04-02 |
2003-08-26 |
Asml Us, Inc. |
Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
|
|
JP4021118B2
(ja)
|
1999-04-28 |
2007-12-12 |
東京エレクトロン株式会社 |
基板処理装置
|
|
JP3445757B2
(ja)
|
1999-05-06 |
2003-09-08 |
東京エレクトロン株式会社 |
基板処理装置及び基板処理方法
|
|
JP3616275B2
(ja)
|
1999-05-31 |
2005-02-02 |
東京エレクトロン株式会社 |
液処理装置、それに用いる処理液供給ノズル、および液処理方法
|
|
JP3442686B2
(ja)
|
1999-06-01 |
2003-09-02 |
東京エレクトロン株式会社 |
基板処理装置
|
|
JP3416078B2
(ja)
|
1999-06-09 |
2003-06-16 |
東京エレクトロン株式会社 |
基板処理装置
|
|
US6293713B1
(en)
|
1999-07-02 |
2001-09-25 |
Tokyo Electron Limited |
Substrate processing apparatus
|
|
JP3635214B2
(ja)
|
1999-07-05 |
2005-04-06 |
東京エレクトロン株式会社 |
基板処理装置
|
|
TW449802B
(en)
*
|
1999-07-19 |
2001-08-11 |
Tokyo Electron Ltd |
Method and apparatus of substrate treatment
|
|
US6634370B2
(en)
*
|
2000-05-08 |
2003-10-21 |
Tokyo Electron Limited |
Liquid treatment system and liquid treatment method
|
|
JP2001351848A
(ja)
*
|
2000-06-07 |
2001-12-21 |
Tokyo Electron Ltd |
基板処理システム及び基板処理方法
|
|
US6485248B1
(en)
*
|
2000-10-10 |
2002-11-26 |
Applied Materials, Inc. |
Multiple wafer lift apparatus and associated method
|
|
KR100412262B1
(ko)
*
|
2001-01-31 |
2003-12-31 |
삼성전자주식회사 |
베이크 장치
|
|
WO2003009347A2
(en)
|
2001-07-16 |
2003-01-30 |
Asyst Technologies, Inc. |
Integrated system for tool front-end workpiece handling
|
|
US6708701B2
(en)
|
2001-10-16 |
2004-03-23 |
Applied Materials Inc. |
Capillary ring
|
|
US6786996B2
(en)
|
2001-10-16 |
2004-09-07 |
Applied Materials Inc. |
Apparatus and method for edge bead removal
|
|
KR20030090948A
(ko)
*
|
2002-05-24 |
2003-12-01 |
아이램테크(주) |
반도체 제작공정에 사용되는 원형 스토커 로봇
|
|
US7930061B2
(en)
|
2002-08-31 |
2011-04-19 |
Applied Materials, Inc. |
Methods and apparatus for loading and unloading substrate carriers on moving conveyors using feedback
|
|
US7234584B2
(en)
|
2002-08-31 |
2007-06-26 |
Applied Materials, Inc. |
System for transporting substrate carriers
|
|
US20050095110A1
(en)
*
|
2002-08-31 |
2005-05-05 |
Lowrance Robert B. |
Method and apparatus for unloading substrate carriers from substrate carrier transport system
|
|
US7684895B2
(en)
|
2002-08-31 |
2010-03-23 |
Applied Materials, Inc. |
Wafer loading station that automatically retracts from a moving conveyor in response to an unscheduled event
|
|
US20040081546A1
(en)
|
2002-08-31 |
2004-04-29 |
Applied Materials, Inc. |
Method and apparatus for supplying substrates to a processing tool
|
|
US7243003B2
(en)
|
2002-08-31 |
2007-07-10 |
Applied Materials, Inc. |
Substrate carrier handler that unloads substrate carriers directly from a moving conveyor
|
|
US7506746B2
(en)
|
2002-08-31 |
2009-03-24 |
Applied Materials, Inc. |
System for transporting substrate carriers
|
|
US7077264B2
(en)
*
|
2003-01-27 |
2006-07-18 |
Applied Material, Inc. |
Methods and apparatus for transporting substrate carriers
|
|
US20040209123A1
(en)
*
|
2003-04-17 |
2004-10-21 |
Bajorek Christopher H. |
Method of fabricating a discrete track recording disk using a bilayer resist for metal lift-off
|
|
DE10348821B3
(de)
*
|
2003-10-13 |
2004-12-16 |
HAP Handhabungs-, Automatisierungs- und Präzisionstechnik GmbH |
Vorrichtung zum Transportieren und Ausrichten von scheibenförmigen Elementen
|
|
US20050151282A1
(en)
*
|
2004-01-13 |
2005-07-14 |
Harper Bruce M. |
Workpiece handler and alignment assembly
|
|
US7686606B2
(en)
*
|
2004-01-20 |
2010-03-30 |
Wd Media, Inc. |
Imprint embossing alignment system
|
|
US20050155554A1
(en)
*
|
2004-01-20 |
2005-07-21 |
Saito Toshiyuki M. |
Imprint embossing system
|
|
US7329114B2
(en)
|
2004-01-20 |
2008-02-12 |
Komag, Inc. |
Isothermal imprint embossing system
|
|
KR100542630B1
(ko)
*
|
2004-04-28 |
2006-01-11 |
세메스 주식회사 |
반도체 제조 설비
|
|
JP4907077B2
(ja)
*
|
2004-11-30 |
2012-03-28 |
株式会社Sen |
ウエハ処理装置及びウエハ処理方法並びにイオン注入装置
|
|
JP5154006B2
(ja)
*
|
2004-12-06 |
2013-02-27 |
株式会社Sokudo |
基板処理装置
|
|
US8099190B2
(en)
*
|
2007-06-22 |
2012-01-17 |
Asm International N.V. |
Apparatus and method for transferring two or more wafers whereby the positions of the wafers can be measured
|
|
JP5006122B2
(ja)
|
2007-06-29 |
2012-08-22 |
株式会社Sokudo |
基板処理装置
|
|
CN101835698B
(zh)
|
2007-10-22 |
2015-04-15 |
应用材料公司 |
运送基板承载件的方法与设备
|
|
JP5128918B2
(ja)
|
2007-11-30 |
2013-01-23 |
株式会社Sokudo |
基板処理装置
|
|
JP5318403B2
(ja)
*
|
2007-11-30 |
2013-10-16 |
株式会社Sokudo |
基板処理装置
|
|
JP4975605B2
(ja)
*
|
2007-12-26 |
2012-07-11 |
東京エレクトロン株式会社 |
処理システム、処理システムの制御方法およびソフトウェアのバージョンアップ方法
|
|
KR100892756B1
(ko)
*
|
2007-12-27 |
2009-04-15 |
세메스 주식회사 |
기판 처리 장치 및 이를 이용한 기판 이송 방법
|
|
JP5001828B2
(ja)
|
2007-12-28 |
2012-08-15 |
株式会社Sokudo |
基板処理装置
|
|
JP5179170B2
(ja)
*
|
2007-12-28 |
2013-04-10 |
株式会社Sokudo |
基板処理装置
|
|
KR20100070888A
(ko)
*
|
2008-12-18 |
2010-06-28 |
삼성전자주식회사 |
기판 처리 장치
|
|
JP2011003864A
(ja)
*
|
2009-06-22 |
2011-01-06 |
Tokyo Electron Ltd |
基板搬送装置、基板搬送方法、塗布、現像装置及び記憶媒体
|
|
US8402638B1
(en)
|
2009-11-06 |
2013-03-26 |
Wd Media, Inc. |
Press system with embossing foil free to expand for nano-imprinting of recording media
|
|
US9330685B1
(en)
|
2009-11-06 |
2016-05-03 |
WD Media, LLC |
Press system for nano-imprinting of recording media with a two step pressing method
|
|
US8496466B1
(en)
|
2009-11-06 |
2013-07-30 |
WD Media, LLC |
Press system with interleaved embossing foil holders for nano-imprinting of recording media
|
|
US8759084B2
(en)
*
|
2010-01-22 |
2014-06-24 |
Michael J. Nichols |
Self-sterilizing automated incubator
|
|
JP5639963B2
(ja)
*
|
2010-06-16 |
2014-12-10 |
東京エレクトロン株式会社 |
基板処理装置及び基板処理方法並びに基板処理プログラムを記録した記録媒体
|
|
DE102011010152A1
(de)
*
|
2011-02-02 |
2012-08-02 |
Grob-Werke Gmbh & Co. Kg |
Zuführ- und Ladeeinheit
|
|
US8874258B2
(en)
*
|
2011-09-13 |
2014-10-28 |
Persimmon Technologies Corporation |
Method for transporting a substrate with a substrate support
|
|
US20140361800A1
(en)
*
|
2013-06-05 |
2014-12-11 |
Qualcomm Incorporated |
Method and apparatus for high volume system level testing of logic devices with pop memory
|
|
JP6296164B2
(ja)
|
2014-09-08 |
2018-03-20 |
株式会社安川電機 |
ロボットシステムおよび搬送方法
|
|
JP6232164B2
(ja)
*
|
2015-03-25 |
2017-11-15 |
株式会社日立国際電気 |
基板処理装置および半導体装置の製造方法
|
|
KR102240155B1
(ko)
*
|
2017-03-29 |
2021-04-14 |
가부시키가이샤 코쿠사이 엘렉트릭 |
기판 이재 유닛, 기판 처리 장치 및 반도체 장치의 제조 방법
|
|
JP7114456B2
(ja)
|
2018-12-28 |
2022-08-08 |
株式会社Screenホールディングス |
基板処理装置および基板搬送方法
|
|
JP2021048322A
(ja)
*
|
2019-09-19 |
2021-03-25 |
株式会社Screenホールディングス |
基板搬送装置および基板搬送方法
|
|
JP7608106B2
(ja)
*
|
2020-10-05 |
2025-01-06 |
キオクシア株式会社 |
半導体製造装置
|
|
TW202249142A
(zh)
*
|
2021-02-25 |
2022-12-16 |
日商東京威力科創股份有限公司 |
基板搬送機構及基板搬送方法
|
|
CN114896940B
(zh)
|
2022-07-13 |
2022-09-20 |
之江实验室 |
一种软件定义的晶圆级交换系统设计方法及装置
|