JP2010192559A - 基板処理システム - Google Patents
基板処理システム Download PDFInfo
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- JP2010192559A JP2010192559A JP2009033548A JP2009033548A JP2010192559A JP 2010192559 A JP2010192559 A JP 2010192559A JP 2009033548 A JP2009033548 A JP 2009033548A JP 2009033548 A JP2009033548 A JP 2009033548A JP 2010192559 A JP2010192559 A JP 2010192559A
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- transfer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/0052—Gripping heads and other end effectors multiple gripper units or multiple end effectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67754—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a batch of workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
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- Engineering & Computer Science (AREA)
- Robotics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
【解決手段】塗布現像処理システム1には、複数の処理装置を鉛直方向に多段に積層し、かつ水平方向に直列に配置した第1のブロックG1と第2のブロックG2が配置されている。第1のブロックG1と第2のブロックG2との間には、搬送領域Rが設けられている。搬送領域Rには、ウェハを搬送するメイン搬送装置130、131が配置されている。メイン搬送装置130、131は、ウェハを保持する複数の搬送アームと、複数の搬送アームを鉛直方向に並べて支持する支持部と、各搬送アームを水平方向に独立して移動させ、かつ支持部を中心として各搬送アームを独立して回転させるアーム移動機構と、支持部を第1のブロックG1と第2のブロックG2に沿って鉛直方向及び水平方向に移動させる支持部移動機構と、を有している。
【選択図】図1
Description
3 処理ステーション
31、141 ウェハ搬送装置
120 搬入出口
121 シャッタ
130、131 メイン搬送装置
160a〜160d 搬送アーム
164 アーム移動機構
170 支持部
173 支持部移動機構
G1 第1のブロック
G2 第2のブロック
R 搬送領域
W ウェハ
Claims (8)
- 基板に所定の処理を行う複数の処理装置を、鉛直方向に多段に積層し、かつ水平方向に直列に配置した基板の処理システムであって、
前記複数の処理装置と対向する位置には、当該複数の処理装置に基板を搬送するための搬送領域が、前記複数の処理装置の鉛直方向及び水平方向に沿って形成され、
前記搬送領域には、前記各処理装置に基板を搬送する搬送装置が配置され、
前記搬送装置は、
基板を保持する複数の搬送アームと、
前記複数の搬送アームを鉛直方向に並べて支持する支持部と、
前記各搬送アームを水平方向に独立して移動させ、かつ前記支持部を中心として前記各搬送アームを独立して回転させるアーム移動機構と、
前記支持部を前記複数の処理装置に沿って鉛直方向及び水平方向に移動させる支持部移動機構と、を有することを特徴とする、基板処理システム。 - 前記搬送領域には、前記搬送装置が複数配置され、
前記複数の搬送装置は、平面視において、前記複数の処理装置の水平方向に沿った基板の搬送経路が重なるように配置されていることを特徴とする、請求項1に記載の基板処理システム。 - 前記搬送装置は、水平方向に隣り合う前記処理装置に基板を同時に搬送することを特徴とする、請求項1又は2に記載の基板処理システム。
- 前記処理装置の前記搬送領域側の側面には、基板の搬入出口が形成され、
前記隣り合う処理装置の前記搬入出口は、一のシャッタで開閉されることを特徴とする、請求項3のいずれかに記載の基板処理システム。 - 前記隣り合う処理装置では、基板に同じ処理が行われることを特徴とする、請求項3又は4に記載の基板処理システム。
- 前記搬送装置は、一の前記処理装置に対する基板の搬入及び搬出を同時に行うことを特徴とする、請求項1〜5のいずれかに記載の基板処理システム。
- 前記複数の処理装置は、水平方向に2列に配置され、
前記搬送領域は、前記2列の処理装置の間に形成され、
前記搬送装置は、前記2列に配置された各処理装置に基板を搬送することを特徴とする、請求項1〜6のいずれかに記載の基板処理システム。 - 前記搬送領域の外部から前記搬送装置に基板を搬送する他の搬送装置を有し、
前記他の搬送装置は、複数の基板を保持可能であることを特徴とする、請求項1〜7のいずれかに記載の基板処理システム。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009033548A JP2010192559A (ja) | 2009-02-17 | 2009-02-17 | 基板処理システム |
KR1020100011527A KR20100094361A (ko) | 2009-02-17 | 2010-02-08 | 기판 처리 시스템 |
Applications Claiming Priority (1)
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---|---|---|---|
JP2009033548A JP2010192559A (ja) | 2009-02-17 | 2009-02-17 | 基板処理システム |
Publications (1)
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JP2010192559A true JP2010192559A (ja) | 2010-09-02 |
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JP2009033548A Pending JP2010192559A (ja) | 2009-02-17 | 2009-02-17 | 基板処理システム |
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JP (1) | JP2010192559A (ja) |
KR (1) | KR20100094361A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150058255A (ko) | 2012-09-26 | 2015-05-28 | 가부시키가이샤 스크린 홀딩스 | 기판 처리 장치 |
CN114512431A (zh) * | 2022-02-16 | 2022-05-17 | 上海普达特半导体设备有限公司 | 一种多腔体集成式半导体设备 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001057336A (ja) * | 1999-06-11 | 2001-02-27 | Tokyo Electron Ltd | 基板処理装置 |
JP2004288718A (ja) * | 2003-03-19 | 2004-10-14 | Tokyo Electron Ltd | 基板搬送装置及び基板処理装置 |
JP2005203635A (ja) * | 2004-01-16 | 2005-07-28 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
JP2008016815A (ja) * | 2006-07-04 | 2008-01-24 | Psk Inc | 基板搬送装置及びこの基板搬送装置を用いた基板処理設備 |
JP2009010287A (ja) * | 2007-06-29 | 2009-01-15 | Tokyo Electron Ltd | 基板の処理システム |
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2009
- 2009-02-17 JP JP2009033548A patent/JP2010192559A/ja active Pending
-
2010
- 2010-02-08 KR KR1020100011527A patent/KR20100094361A/ko not_active Application Discontinuation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001057336A (ja) * | 1999-06-11 | 2001-02-27 | Tokyo Electron Ltd | 基板処理装置 |
JP2004288718A (ja) * | 2003-03-19 | 2004-10-14 | Tokyo Electron Ltd | 基板搬送装置及び基板処理装置 |
JP2005203635A (ja) * | 2004-01-16 | 2005-07-28 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
JP2008016815A (ja) * | 2006-07-04 | 2008-01-24 | Psk Inc | 基板搬送装置及びこの基板搬送装置を用いた基板処理設備 |
JP2009010287A (ja) * | 2007-06-29 | 2009-01-15 | Tokyo Electron Ltd | 基板の処理システム |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150058255A (ko) | 2012-09-26 | 2015-05-28 | 가부시키가이샤 스크린 홀딩스 | 기판 처리 장치 |
US20150287624A1 (en) * | 2012-09-26 | 2015-10-08 | SCREEN Holdings Co., Ltd. | Substrate processing apparatus |
US9449861B2 (en) | 2012-09-26 | 2016-09-20 | SCREEN Holdings Co., Ltd. | Substrate processing apparatus |
CN114512431A (zh) * | 2022-02-16 | 2022-05-17 | 上海普达特半导体设备有限公司 | 一种多腔体集成式半导体设备 |
CN114512431B (zh) * | 2022-02-16 | 2024-03-05 | 上海普达特半导体设备有限公司 | 一种多腔体集成式半导体设备 |
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KR20100094361A (ko) | 2010-08-26 |
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