CN100411099C - 基板处理设备和基板处理方法 - Google Patents
基板处理设备和基板处理方法 Download PDFInfo
- Publication number
- CN100411099C CN100411099C CNB2005100810902A CN200510081090A CN100411099C CN 100411099 C CN100411099 C CN 100411099C CN B2005100810902 A CNB2005100810902 A CN B2005100810902A CN 200510081090 A CN200510081090 A CN 200510081090A CN 100411099 C CN100411099 C CN 100411099C
- Authority
- CN
- China
- Prior art keywords
- substrate
- processing unit
- pressure
- control valve
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67178—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers vertical arrangement
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
Claims (20)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004199616A JP4381909B2 (ja) | 2004-07-06 | 2004-07-06 | 基板処理装置および基板処理方法 |
JP2004199616 | 2004-07-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1719579A CN1719579A (zh) | 2006-01-11 |
CN100411099C true CN100411099C (zh) | 2008-08-13 |
Family
ID=35732582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005100810902A Expired - Fee Related CN100411099C (zh) | 2004-07-06 | 2005-06-30 | 基板处理设备和基板处理方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20060024446A1 (zh) |
JP (1) | JP4381909B2 (zh) |
KR (1) | KR100855777B1 (zh) |
CN (1) | CN100411099C (zh) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100868288B1 (ko) * | 2007-05-11 | 2008-11-11 | 세메스 주식회사 | 인라인 타입의 기판 처리 장치 및 상기 장치의 베이크 유닛에서 기판 억세스 방법 |
KR100897850B1 (ko) * | 2007-06-18 | 2009-05-15 | 세메스 주식회사 | 기판 처리 장치 |
JP5006122B2 (ja) | 2007-06-29 | 2012-08-22 | 株式会社Sokudo | 基板処理装置 |
JP5128918B2 (ja) | 2007-11-30 | 2013-01-23 | 株式会社Sokudo | 基板処理装置 |
JP5160204B2 (ja) * | 2007-11-30 | 2013-03-13 | 株式会社Sokudo | 基板処理装置 |
JP5001828B2 (ja) * | 2007-12-28 | 2012-08-15 | 株式会社Sokudo | 基板処理装置 |
JP5179170B2 (ja) | 2007-12-28 | 2013-04-10 | 株式会社Sokudo | 基板処理装置 |
JP5736687B2 (ja) * | 2009-10-06 | 2015-06-17 | 東京エレクトロン株式会社 | 基板処理装置 |
JP6026241B2 (ja) * | 2012-11-20 | 2016-11-16 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
JP6058999B2 (ja) * | 2012-12-11 | 2017-01-11 | 株式会社Screenセミコンダクターソリューションズ | 基板処理装置および基板処理方法 |
KR20150020757A (ko) * | 2013-08-19 | 2015-02-27 | 삼성전자주식회사 | 기판 처리 시스템 및 이의 제어 방법 |
JP6503281B2 (ja) | 2015-11-13 | 2019-04-17 | 株式会社Screenホールディングス | 基板処理装置 |
JP6049929B2 (ja) * | 2016-03-11 | 2016-12-21 | 株式会社Screenセミコンダクターソリューションズ | 基板処理方法 |
JP6844263B2 (ja) * | 2017-01-05 | 2021-03-17 | 東京エレクトロン株式会社 | 基板処理装置 |
KR102123482B1 (ko) * | 2017-02-24 | 2020-06-16 | 어플라이드 머티어리얼스, 인코포레이티드 | 진공 시스템에서 사용하기 위한 캐리어, 진공 프로세싱을 위한 시스템, 및 기판의 진공 프로세싱을 위한 방법 |
JP6925196B2 (ja) | 2017-07-31 | 2021-08-25 | 東京エレクトロン株式会社 | 処理装置及び処理方法 |
CN111868883A (zh) * | 2018-03-26 | 2020-10-30 | 东京毅力科创株式会社 | 基片处理装置、空气调节方法和存储介质 |
KR102225957B1 (ko) * | 2018-09-12 | 2021-03-11 | 세메스 주식회사 | 기판 처리 장치 |
US11047050B2 (en) | 2018-10-30 | 2021-06-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor tool having controllable ambient environment processing zones |
JP7292159B2 (ja) | 2019-09-12 | 2023-06-16 | 東京エレクトロン株式会社 | 基板処理装置及び空気供給方法 |
KR102351341B1 (ko) * | 2019-12-09 | 2022-01-18 | 무진전자 주식회사 | 팬 필터 유닛 및 이를 포함하는 기판 처리 장치 |
KR102388390B1 (ko) * | 2020-01-06 | 2022-04-21 | 세메스 주식회사 | 로드 포트 유닛, 이를 포함하는 저장 장치 및 배기 방법 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0936195A (ja) * | 1995-07-14 | 1997-02-07 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JPH09153539A (ja) * | 1995-12-01 | 1997-06-10 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2001044183A (ja) * | 1999-05-24 | 2001-02-16 | Tokyo Electron Ltd | 基板処理装置 |
JP2001085416A (ja) * | 1999-09-14 | 2001-03-30 | Tokyo Electron Ltd | 基板処理装置 |
CN1448799A (zh) * | 2002-03-08 | 2003-10-15 | 东京毅力科创株式会社 | 衬底处理装置和衬底处理方法 |
CN1491431A (zh) * | 2001-06-25 | 2004-04-21 | ���������ƴ���ʽ���� | 衬底处理装置及衬底处理方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3401121B2 (ja) * | 1995-04-21 | 2003-04-28 | 大日本スクリーン製造株式会社 | 基板への回転式塗布装置 |
JP3967618B2 (ja) * | 2001-04-17 | 2007-08-29 | 東京エレクトロン株式会社 | 基板の処理方法及び基板の処理システム |
JP3725051B2 (ja) * | 2001-07-27 | 2005-12-07 | 大日本スクリーン製造株式会社 | 基板処理装置 |
US6861371B2 (en) * | 2001-11-05 | 2005-03-01 | Tokyo Electron Limited | Substrate processing system and substrate processing method |
-
2004
- 2004-07-06 JP JP2004199616A patent/JP4381909B2/ja not_active Expired - Fee Related
-
2005
- 2005-06-02 US US11/144,530 patent/US20060024446A1/en not_active Abandoned
- 2005-06-30 CN CNB2005100810902A patent/CN100411099C/zh not_active Expired - Fee Related
- 2005-07-06 KR KR1020050060901A patent/KR100855777B1/ko active IP Right Grant
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0936195A (ja) * | 1995-07-14 | 1997-02-07 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JPH09153539A (ja) * | 1995-12-01 | 1997-06-10 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2001044183A (ja) * | 1999-05-24 | 2001-02-16 | Tokyo Electron Ltd | 基板処理装置 |
JP2001085416A (ja) * | 1999-09-14 | 2001-03-30 | Tokyo Electron Ltd | 基板処理装置 |
CN1491431A (zh) * | 2001-06-25 | 2004-04-21 | ���������ƴ���ʽ���� | 衬底处理装置及衬底处理方法 |
CN1448799A (zh) * | 2002-03-08 | 2003-10-15 | 东京毅力科创株式会社 | 衬底处理装置和衬底处理方法 |
Also Published As
Publication number | Publication date |
---|---|
JP4381909B2 (ja) | 2009-12-09 |
KR100855777B1 (ko) | 2008-09-01 |
US20060024446A1 (en) | 2006-02-02 |
JP2006024638A (ja) | 2006-01-26 |
KR20060049902A (ko) | 2006-05-19 |
CN1719579A (zh) | 2006-01-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: DAINIPPON SCREEN MFG. CO., LTD. Free format text: FORMER NAME: DAINIPPON MESH PLATE MFR. CO., LTD. Owner name: SCREEN GROUP CO., LTD. Free format text: FORMER NAME: DAINIPPON SCREEN MFG. CO., LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Kyoto Japan Patentee after: Skilling Group Address before: Kyoto Japan Patentee before: DAINIPPON SCREEN MFG Co.,Ltd. Address after: Kyoto Japan Patentee after: DAINIPPON SCREEN MFG Co.,Ltd. Address before: Kyoto Japan Patentee before: Dainippon Screen Mfg. Co.,Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20080813 Termination date: 20210630 |