SG158142A1 - A sulfuric acid recycling type cleaning system and a sulfuric acid recycling type persulfuric acid supply apparatus - Google Patents

A sulfuric acid recycling type cleaning system and a sulfuric acid recycling type persulfuric acid supply apparatus

Info

Publication number
SG158142A1
SG158142A1 SG200908350-2A SG2009083502A SG158142A1 SG 158142 A1 SG158142 A1 SG 158142A1 SG 2009083502 A SG2009083502 A SG 2009083502A SG 158142 A1 SG158142 A1 SG 158142A1
Authority
SG
Singapore
Prior art keywords
cleaning
persulfuric acid
sulfuric acid
recycling type
cleaning system
Prior art date
Application number
SG200908350-2A
Other languages
English (en)
Inventor
Tatsuo Nagai
Norihito Ikemiya
Haruyoshi Yamakawa
Hideki Kobayashi
Hiroshi Morita
Original Assignee
Kurita Water Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurita Water Ind Ltd filed Critical Kurita Water Ind Ltd
Publication of SG158142A1 publication Critical patent/SG158142A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/28—Per-compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Electrochemistry (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Detergent Compositions (AREA)
SG200908350-2A 2004-09-17 2005-09-14 A sulfuric acid recycling type cleaning system and a sulfuric acid recycling type persulfuric acid supply apparatus SG158142A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004271604 2004-09-17
JP2005232825A JP4462146B2 (ja) 2004-09-17 2005-08-11 硫酸リサイクル型洗浄システムおよび硫酸リサイクル型過硫酸供給装置

Publications (1)

Publication Number Publication Date
SG158142A1 true SG158142A1 (en) 2010-01-29

Family

ID=36060067

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200908350-2A SG158142A1 (en) 2004-09-17 2005-09-14 A sulfuric acid recycling type cleaning system and a sulfuric acid recycling type persulfuric acid supply apparatus

Country Status (9)

Country Link
US (1) US9593424B2 (de)
EP (1) EP1801265B1 (de)
JP (1) JP4462146B2 (de)
KR (1) KR101222880B1 (de)
CN (1) CN101061261B (de)
AT (1) ATE510048T1 (de)
SG (1) SG158142A1 (de)
TW (1) TWI366611B (de)
WO (1) WO2006030816A1 (de)

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JP2011192779A (ja) * 2010-03-15 2011-09-29 Kurita Water Ind Ltd 電子材料の洗浄方法および洗浄システム
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JP5668914B2 (ja) * 2010-08-27 2015-02-12 栗田工業株式会社 洗浄方法および洗浄システム
JP5773132B2 (ja) * 2011-02-23 2015-09-02 栗田工業株式会社 過硫酸濃度の測定方法、過硫酸濃度測定装置、及び過硫酸供給装置
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Also Published As

Publication number Publication date
KR101222880B1 (ko) 2013-01-17
TWI366611B (en) 2012-06-21
ATE510048T1 (de) 2011-06-15
TW200610841A (en) 2006-04-01
US9593424B2 (en) 2017-03-14
WO2006030816A1 (ja) 2006-03-23
EP1801265A1 (de) 2007-06-27
CN101061261B (zh) 2010-09-01
JP2006114880A (ja) 2006-04-27
US20080251108A1 (en) 2008-10-16
EP1801265A4 (de) 2009-06-17
EP1801265B1 (de) 2011-05-18
KR20070101219A (ko) 2007-10-16
CN101061261A (zh) 2007-10-24
JP4462146B2 (ja) 2010-05-12

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