KR890009953A - 티타노센, 그의 용도 및 n-치환된 플루오로아닐린 - Google Patents
티타노센, 그의 용도 및 n-치환된 플루오로아닐린 Download PDFInfo
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- KR890009953A KR890009953A KR1019880016123A KR880016123A KR890009953A KR 890009953 A KR890009953 A KR 890009953A KR 1019880016123 A KR1019880016123 A KR 1019880016123A KR 880016123 A KR880016123 A KR 880016123A KR 890009953 A KR890009953 A KR 890009953A
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- South Korea
- Prior art keywords
- substituted
- alkyl
- compound
- formula
- titanocene
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- KOMDZQSPRDYARS-UHFFFAOYSA-N cyclopenta-1,3-diene titanium Chemical compound [Ti].C1C=CC=C1.C1C=CC=C1 KOMDZQSPRDYARS-UHFFFAOYSA-N 0.000 title claims 15
- -1 N-Substituted Fluoroanilines Chemical class 0.000 title claims 10
- 150000001875 compounds Chemical class 0.000 claims abstract 21
- 125000003118 aryl group Chemical group 0.000 claims abstract 8
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract 8
- 229910052731 fluorine Inorganic materials 0.000 claims abstract 7
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 claims abstract 4
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 claims abstract 4
- 125000001424 substituent group Chemical group 0.000 claims abstract 4
- 125000002373 5 membered heterocyclic group Chemical group 0.000 claims abstract 2
- 125000004008 6 membered carbocyclic group Chemical group 0.000 claims abstract 2
- 125000004070 6 membered heterocyclic group Chemical group 0.000 claims abstract 2
- 238000006116 polymerization reaction Methods 0.000 claims abstract 2
- 125000000217 alkyl group Chemical group 0.000 claims 17
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 8
- 239000000203 mixture Substances 0.000 claims 8
- 125000003710 aryl alkyl group Chemical group 0.000 claims 6
- 229910052739 hydrogen Inorganic materials 0.000 claims 6
- 239000001257 hydrogen Substances 0.000 claims 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 6
- 125000002947 alkylene group Chemical group 0.000 claims 4
- 125000004432 carbon atom Chemical group C* 0.000 claims 4
- 229910052736 halogen Chemical group 0.000 claims 4
- 150000002367 halogens Chemical group 0.000 claims 4
- 125000003342 alkenyl group Chemical group 0.000 claims 3
- 125000002877 alkyl aryl group Chemical group 0.000 claims 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 244000028419 Styrax benzoin Species 0.000 claims 2
- 235000000126 Styrax benzoin Nutrition 0.000 claims 2
- 235000008411 Sumatra benzointree Nutrition 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 125000005120 alkyl cycloalkyl alkyl group Chemical group 0.000 claims 2
- 125000001118 alkylidene group Chemical group 0.000 claims 2
- 229960002130 benzoin Drugs 0.000 claims 2
- 239000012965 benzophenone Substances 0.000 claims 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims 2
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 claims 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 claims 2
- 235000019382 gum benzoic Nutrition 0.000 claims 2
- 125000001188 haloalkyl group Chemical group 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 125000000027 (C1-C10) alkoxy group Chemical group 0.000 claims 1
- 125000006729 (C2-C5) alkenyl group Chemical group 0.000 claims 1
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 claims 1
- XTFIVUDBNACUBN-UHFFFAOYSA-N 1,3,5-trinitro-1,3,5-triazinane Chemical compound [O-][N+](=O)N1CN([N+]([O-])=O)CN([N+]([O-])=O)C1 XTFIVUDBNACUBN-UHFFFAOYSA-N 0.000 claims 1
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 claims 1
- HEQOJEGTZCTHCF-UHFFFAOYSA-N 2-amino-1-phenylethanone Chemical compound NCC(=O)C1=CC=CC=C1 HEQOJEGTZCTHCF-UHFFFAOYSA-N 0.000 claims 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 1
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims 1
- 125000005119 alkyl cycloalkyl group Chemical group 0.000 claims 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims 1
- 125000004414 alkyl thio group Chemical group 0.000 claims 1
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims 1
- 125000004104 aryloxy group Chemical group 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- 125000001589 carboacyl group Chemical group 0.000 claims 1
- 125000002837 carbocyclic group Chemical group 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 239000003999 initiator Substances 0.000 claims 1
- 239000000976 ink Substances 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- 239000003973 paint Substances 0.000 claims 1
- GJVFBWCTGUSGDD-UHFFFAOYSA-L pentamethonium bromide Chemical compound [Br-].[Br-].C[N+](C)(C)CCCCC[N+](C)(C)C GJVFBWCTGUSGDD-UHFFFAOYSA-L 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 238000006467 substitution reaction Methods 0.000 claims 1
- 125000004665 trialkylsilyl group Chemical group 0.000 claims 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims 1
- GBXQPDCOMJJCMJ-UHFFFAOYSA-M trimethyl-[6-(trimethylazaniumyl)hexyl]azanium;bromide Chemical compound [Br-].C[N+](C)(C)CCCCCC[N+](C)(C)C GBXQPDCOMJJCMJ-UHFFFAOYSA-M 0.000 claims 1
- MDFFNEOEWAXZRQ-UHFFFAOYSA-N aminyl Chemical class [NH2] MDFFNEOEWAXZRQ-UHFFFAOYSA-N 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/34—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/36—Oxygen or sulfur atoms
- C07D207/40—2,5-Pyrrolidine-diones
- C07D207/404—2,5-Pyrrolidine-diones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. succinimide
-
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- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/28—Titanium compounds
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/43—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton
- C07C211/44—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring
- C07C211/52—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton having amino groups bound to only one six-membered aromatic ring the carbon skeleton being further substituted by halogen atoms or by nitro or nitroso groups
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C217/00—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton
- C07C217/02—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C217/04—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C217/06—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one etherified hydroxy group and one amino group bound to the carbon skeleton, which is not further substituted
- C07C217/08—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one etherified hydroxy group and one amino group bound to the carbon skeleton, which is not further substituted the oxygen atom of the etherified hydroxy group being further bound to an acyclic carbon atom
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- C—CHEMISTRY; METALLURGY
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/01—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C233/12—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/01—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C233/12—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups
- C07C233/15—Carboxylic acid amides having carbon atoms of carboxamide groups bound to hydrogen atoms or to acyclic carbon atoms having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups with the substituted hydrocarbon radical bound to the nitrogen atom of the carboxamide group by a carbon atom of a six-membered aromatic ring
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/64—Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings
- C07C233/66—Carboxylic acid amides having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a hydrocarbon radical substituted by halogen atoms or by nitro or nitroso groups
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- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C233/00—Carboxylic acid amides
- C07C233/88—Carboxylic acid amides having nitrogen atoms of carboxamide groups bound to an acyclic carbon atom and to a carbon atom of a six-membered aromatic ring wherein at least one ortho-hydrogen atom has been replaced
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- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/15—Sulfonamides having sulfur atoms of sulfonamide groups bound to carbon atoms of six-membered aromatic rings
- C07C311/21—Sulfonamides having sulfur atoms of sulfonamide groups bound to carbon atoms of six-membered aromatic rings having the nitrogen atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring
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- C07D205/00—Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom
- C07D205/02—Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings
- C07D205/06—Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D205/08—Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with one oxygen atom directly attached in position 2, e.g. beta-lactams
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- C—CHEMISTRY; METALLURGY
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- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/34—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/36—Oxygen or sulfur atoms
- C07D207/40—2,5-Pyrrolidine-diones
- C07D207/404—2,5-Pyrrolidine-diones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. succinimide
- C07D207/408—Radicals containing only hydrogen and carbon atoms attached to ring carbon atoms
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- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/44—Iso-indoles; Hydrogenated iso-indoles
- C07D209/48—Iso-indoles; Hydrogenated iso-indoles with oxygen atoms in positions 1 and 3, e.g. phthalimide
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- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/58—[b]- or [c]-condensed
- C07D209/72—4,7-Endo-alkylene-iso-indoles
- C07D209/76—4,7-Endo-alkylene-iso-indoles with oxygen atoms in positions 1 and 3
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- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/04—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D307/10—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/14—Radicals substituted by nitrogen atoms not forming part of a nitro radical
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- C07F17/00—Metallocenes
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- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
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- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/148—Light sensitive titanium compound containing
Abstract
내용 없음
Description
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Claims (30)
- 하기 일반식(Ⅰ)의 티타노센.상기식에서, R1라디칼 모두는 서로 독립헤서 시클로렌타디엔일,인덴일또는 4,5,6,7-테트라히드로인덴일이며 이들의 각각은 비치환되거나 또는 C1-C18알킬, C1-C18알콕시,C2-C18알켄일, C5-C8시클로알킬, C6-C16아릴, C7-C16아르알킬,시아노 또는 할로겐에 의하여 치환되며, 또는 R1모두가 합쳐져서 상기와 같이 비치환되거나 또는 치환된 하기 일반식(Ⅱ)의 라디칼(X는 n이 1,2 또는 3인 -(-CH2-)n2내지 12개 탄소원자를 갖는 비치환되거나 또는 페닐치환된 알킬리덴, 5 내지 7개 고리탄소원자를 갖는 시클로알킬리덴,이고; 또 R4는 C1-C12알킬,C5-C12시클로알킬, C6-C16아릴 또는 C7-C17아르알킬임)을 형성하고; R2는 6-윈 카르보시클릭 또는 티탄-탄소 결합에 대한 2개의 오르토 위치중 적어도 1개에서 플루오로 원자에 의하여 치환된 5- 또는 6-윈 헤테로시클릭 방향족 라디칼이며, 이 방향족 라디칼은 다른 치환계를 함유할 수 있고; R3은 R2에 주어진 정의중의 하나를 가지거나, 또는 R2및 R3가 합쳐져서 하기 일반식(Ⅲ)의 라디칼-Q-Y-Q- (Ⅲ)(이때, Q는 2개 결합이 Y기에 대해 오르토 위치에 존재하고 티탄-탄소 결합에 대한 둘재 오르토 위치가 플루오르 원자에 의하여 치환되며 또 Q가 다른 치환체를 함유할 수 있는 카르보시클릭 방향족 라디칼이며, 또 Y는 CH2, 2 내지 12개 탄소원자를 갖는 알킬리덴, 5 내지 7개 고리탄소원자를 갖는 시클로알킬리덴, NR⁴,이고; 또 R4는 상기 티타노센에서 정의한 바와 같다)이고, R2및 R3또는 일반식(Ⅲ)의 라디칼은 하기 일반식(Ⅲ), (IVa) 또는 (IVb)의 라디칼에 의하여 치환되며,이때, R5는 수소, 직쇄 또는 측쇄의 C1-C20알킬, C2-C20알켄일, C3-C8시클로알킬, C4-C20시클로알킬알킬 또는 C4-C20알킬시클로알킬,C5-C20알킬시클로알킬알킬, C6-C20시클로알켄일알킬, C6-C14아릴, C7-C20아르알킬 또는 C7-C20알크아릴,C8-C20알크아르알킬 또는 C3-C12트리알킬실릴이고, 이들 라디칼은 비치환되거나 또는 C1-C18알콕시, C1-C18알킬티오, C1-C18알킬술포닐, C6-C10아릴술포닐, C7-C20알크아릴술포닐, 2-테트라히드로푸릴 또는 시아노에 의해 치환되고; R6는 R5에 주어진 정의중의 하나를 갖거나 또는 C1-C20할로게노알킬이거나, -COOH 또는 -COOR6에 의하여 치환된 -CO- 또는 C1-C12알킬을 중간에 포함하는 C2-C20알킬이고, Y1이 -CO-, -CSo- 또는 -SO2-이면 -NR7R8(이때, R7및 R8이 독립해서 R5에 주어진 정의중의 하나를 갖거나 또는 R7및 R8이 합쳐져서 -O-,-S- 또는 N(R9)-를 중간에 포함하는 C3-C7알킬렌이고, R9는 수소, C1-C12알킬, C3-C12알켄일, C7-C12아르알킬 또는 C2-C20알카노일임)이며; 또는 R5및 R6가 합쳐져서 직쇄 또는 측쇄 C2-C8알킬렌이거나, 또는 할로겐, C1-C4알콕시, 아릴옥시 또는 -NR7R8에 의하여 치환된 C2-C8알킬렌이거나 또는의 2가 라디칼이며; Y1는 -CO-, -CS-, -COO-, -SO2-- 또는(R4는 상기 정의한 바와 같다)이고; R10은 R에서 주어진 정의중의 하나를 갖거나, 또는 R10및 R이 합쳐져서 C1-C6알킨디일, C2-C6알켄디일, C6-C14아렌디일, C4-C12시클로알칸디일, C5-C12시클로알켄디일, C6-C14시클로알카디엔디일, C7-C20비시클로알칸디일, C7-C20비시클로알켄디일, 또는 -O-,-S- 또는 -N(R9)-에 의하여 치환된 C2-C4알칸디일이며, 이들 라디칼들은 비치환되거나 또는 1개 이상의 할로겐, C1-C10알콕시, C1-C20알킬, C3-C20알켄일 또는 C6-C14아릴의 치환체에 의하여 치환된다.
- 제1항에 있어서, R1이 시클로펜타디엔일또는 메틸시클로펜타디엔일인 티타노센.
- 제1항에 있어서, R1이 시클로펜타디엔일인 티나노센.
- 제1항에 있어서, R2및 R3이 동일한 티나노센.
- 제1항에 있어서, R2라디칼이 오르토-위치 모두에서 플루오르에 의하여 치환인 티타노센.
- 제1항에 있어서, R2및 R3이 일반식(Ⅳ),(IVa) 또는 (IVb)의 라디칼이 결합된 2,6-디플루오로펜-1-일이고 또 동일하거나 상이한 치환체를 1또는 2개 함유할 수 있는 티타노센.
- 제6항에 있어서, 일반식(Ⅰ)에서 R1이 시클로펜타디엔일이고 또 R2및 R3이 하기 일반식(Ⅴ)의 라디칼인 티타노센.상기식에서, A는 일반식(Ⅳ),(IVa) 또는 (IVb)의 기임.
- 제7항에 있어서, 일반식(Ⅴ)에서 기 A가 F원자에 대한 오르토위치에서 결합된 타타노센.
- 제7항에 있어서, A가 일반식(Ⅳ)의 기인 티타노센.
- 제1항에 있어서, R5가 수소, 비치환되거나 또는 C1-C12알콕시-또는 테트라히드로푸란-치환된 C1-C12알킬, C2-C5알켄일, C5-C7시클로알킬, C6-C18시클로알킬알킬 또는 -알킬시클로알킬, C7-C18알킬시클로알킬알킬, C7-C16아르알킬 또는 C8-C16알크아르알킬이고, R6은 R5에 주어진 정의중의 하나를 갖거나 또는 C6-C10아릴, C7-C18알크아릴, C1-C12할로게노알킬 또는 -NR7R8(이때 R7및 R8은 서로 독립해서 수소, C1-C12알킬, 페닐, 벤질 또는 시클로헥실이거나 또는 R7및 R8이 합쳐져서 C4-C5알킬렌 또는 3-옥사렌타메틸렌임)이거나, 또는 R5및 R6이 합쳐져서 C2-C8알킬렌이고, 또 Y1은 -CO-,-CS-, -COO- 또는 -SO2-인 일반식(Ⅳ)의 기에 의하여 R2및 R3이 치환된 티타노센.
- 제1항에 있어서, R5는 수소, C1-C12알킬, 시클로헥실, 시클로헥실메틸, 2-테트라히드로푸릴메틸, C2-C8알콕시알킬, 알릴 또는 C7-C9아르알킬이고, R6이 C1-C18알킬, C1-C4할로게노알킬, 시클로헥실, C6-C10아릴 또는 -할로게노아릴 또는 C7-C18알크아릴이거나, 또는 R5및 R6이 합쳐져서, C2-C6알킬렌이고 또 Y1는 -CO-, -COO-또는 -SO2-이거나, 또는 -Y1-R(라디칼이 -CO--NHR7, -CS-NHR7, -CO-NR7R8또는 -SO2-NR7R8기(이때, R7은 C1-C12알킬 또는 페닐이고, Rx는 C1-C12알킬이거나, 또는 RO및 R8이 합쳐져서 C4-C5알킬렌 또는 3-옥사펜타메틸렌인 일반식(Ⅳ)의 기에 의하여 R2및 R3이 치환된 티타노센.
- 제11항에 있어서, R5는 수소, C1-C8알킬 또는 C7-C9아르알킬이고; R6가 C1-C18알킬, 트리플루오로메틸, 페닐 또는 할로겐- 또는 C1-C12알킬 치환된 페닐이거나, 또는 R5및 R6이 합쳐져서 C2-C6알킬렌이고; 또 Y1이 -CO- 또는 -SO2인 티타노센.
- 제1항에 있어서, R(및 R10이 합쳐져서 C2-C8알칸디일, C2-C8알켄디일, C6-C1알켄디일 또는 C7-C12시클로알켄디일이고 또 Y1이 -CO-인 일반식(IVa)의 기에 의하여 R2및 R3이 치환된 타타노센.
- 하기 일반식(Ⅳ)의 화합물 1몰을 LiR2또는 LiR3중의 1몰과 반응시킨다음 LiR3또는 LiR2중의 1몰과 반응시키거나, 또는 LiR22몰과 반응시키거나 또는 Li2QYQ 1몰과 반응시킨다음 공지된 방법으로 일반식(Ⅰ)의 화합물을 분리하는 것을 포함하는 제1항에 따른 일반식(Ⅰ)의 티타노센의 제조방법.상기식에서, R1,R2,R3및 QYQ는 상기 정의한 바와 같고 또 Z는 할로겐, 특히 염소이다.
- (a) 1개 이상의 중합성, 에틸렌성 불포화 이중결합을 함유하는 1개 이상의 비휘발성, 단량체, 올리고머 또는 중합체 화합물 및 (b) 광개시제로서 1개 이상의 일반식(Ⅰ)의 티타노센을 함유하는 조사중합 조성물.
- 제15항에 있어서, (b) 이외의 추가로 1개 이상의 광개시제(c)가 존재하는 조성물.
- 제16항에 있어서, 광개시제(c)인 벤조페논, 벤조인 알킬에테르, 벤질 케탈, 4-아로일-1,3-디옥솔란, 디알콕시아세토페논,-히드록시- 또는-아미노아세토페논 또는-히드록시클로알킬 페닐 케톤형, 또는 이들의 혼합물을 추가적인 광개시제로 함유하는 조성물.
- 도료, 인쇄 잉크, 인쇄판, 내식막 재료 및 기록 재료로서의 제15항에 따른 조성물의 용도.
- 적어도 1개 표면상에 제15항에 따른 조성물로 피복된 피복 기재.
- 제19항에 따른 피복 기재를 상형성 방향으로 노출시킨다음 비노출 영역을 용매를 사용하여 제거하는 것을 포함하는 안정한 사진상의 제조방법.
- 적어도 1개의 중합성, 에틸렌성 불포화 이중 결합을 함유하는 비휘발성의 단량체, 올리고머 또는 중합체 화합물을 광중합 하기 위한 광개시제로서 단독으로 또는 기타 개시제와 함께 사용될 수 있는 제1항에 따른 일반식(Ⅰ)의 티타노센의 용도.
- 벤조페논, 벤조인 알킬 에테르, 벤질 케탈, 4-아로일-1,3-디옥솔란, 디알콕시아세토페논, -히드록시아세토페논, -히드록시 시클로알킬 페닐 케톤 또는 -아미노아세토페논형, 또는 이들의 혼합물과 같은 광개시제 및 제1항에 따른 일반식(Ⅰ)의 티타노센을 함유하는 광개시제 혼합물.
- 하기 일반식(Ⅶ)의 화합물.상기 식에서, Ar은 6-원 카르보시클릭 또는 오르토 위치에서 적어도 1개의 플루오르원자, 수소원자 또는 할로겐 원자를 함유하고 필요에 따라 기타 치환체를 함유하는 5- 또는 6-원 헤테로시클릭 방향족 라디칼이거나, 또는 Ar은 하기 일반식(이때, D는 Y에 대한 오르토 위치에 결합된 수소원자 또는 할로겐 원자이고, Q는 D기에 대한 오르토 위치에서 플루오르 원자에 의하여 치환된 카르보시클릭 방향족 라디칼이고 또 Q는 기타 치환체를 함유할 수 있다)의 라디칼이고, 또 Y,Y1,R5및 R6은 제1항에서 정의된 바와 같다.
- 제23항에 있어서, 방향족 Ar이 치환된 페닐 고리인 화합물.
- 제23항에 있어서, 일반식(Ⅶa)에 상응하는 화합물.상기식에서, R5,R6및 Y1은 제 1항에서 정의한 바와 같다.
- 제25항에 있어서, -N(R5)-Y1R6기가 플루오르 원자에 대하여 오르토 위치에서 결합된 일반식(Ⅶa)의 화합물.
- 하기 일반식(Ⅷ)의 화합물.상기식에서 Ar은 23항에 기재된 바와 같고, 또 Y1,R(및 R10은 제1항에 기재된 바와 같다.
- 제27항에 있어서, 일반식(Ⅷa)의 화합물.상기식에서, Y1,R6및 R10는 제1항에 기재된 바와 같다.
- 제28항에 있어서, -N(Y1R10)-Y1R6기가 플루오르 원자에 대한 오르토 위치에서 결합된 일반식(Ⅷa)의 화합물.
- 제28항에 있어서, Y1이 -CO-기이고, 또 R6및 R10이 합쳐져서, C2-C8알칸디일,C2-C8알켄디일, C6-C10아렌디일, 또는 C6-C12시클로알칸디일, C6-C12시클로알켄디일, C7-C12비시클로알칸디일 또는 C7-C12-C6-C12시클로알켄디일 C7-C12비시클로알킨디일 또는 비시클로알켄디일인 일반식(Ⅷa)의 화합물.※참고사항 : 최초출원 내용에 의하여 공개하는 것임.
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---|---|---|---|---|
US4857654A (en) * | 1986-08-01 | 1989-08-15 | Ciba-Geigy Corporation | Titanocenes and their use |
US5075467A (en) * | 1989-06-01 | 1991-12-24 | Ciba-Geigy Corporation | Process for the preparation of titanocenes containing o,o'-difluoroaryl ligands |
US5192642A (en) * | 1989-06-01 | 1993-03-09 | Ciba-Geigy Corporation | Oxygen-containing titanocenes, and the use thereof |
EP0401166B1 (de) * | 1989-06-01 | 1995-02-22 | Ciba-Geigy Ag | Neue, stickstoffhaltige Titanocene und deren Verwendung |
JP2551232B2 (ja) * | 1990-11-22 | 1996-11-06 | 日立化成工業株式会社 | 新規な光開始剤系及びこれを用いた光重合性組成物 |
GB9105561D0 (en) * | 1991-03-15 | 1991-05-01 | Coates Brothers Plc | Image formation |
TW237456B (ko) * | 1992-04-09 | 1995-01-01 | Ciba Geigy | |
EP0602552A1 (de) * | 1992-12-18 | 1994-06-22 | Hoechst Aktiengesellschaft | 2,3,4-Trifluor-N-ethylanilin und Verfahren zu seiner Herstellung |
ATE188967T1 (de) | 1994-06-13 | 2000-02-15 | Targor Gmbh | Übergangsmetallverbindungen |
US5563284A (en) * | 1994-09-09 | 1996-10-08 | Phillips Petroleum Company | Cyclopentadienyl-type ligands, metallocenes, catalyst systems, preparation, and use |
JP3442176B2 (ja) | 1995-02-10 | 2003-09-02 | 富士写真フイルム株式会社 | 光重合性組成物 |
DE19624581C2 (de) | 1996-06-20 | 1999-02-04 | Targor Gmbh | Übergangsmetallverbindung und ein Verfahren zu ihrer Herstellung, sowie ihre Verwendung |
US5939148A (en) * | 1996-09-13 | 1999-08-17 | Kansai Paint Co., Ltd. | Visible laser-curable composition |
KR20010012992A (ko) * | 1997-05-27 | 2001-02-26 | 유니버시티오브서던미시시피 | 방향족 말레이미드 및 광개시제로서 이들의 용도 |
CN1052487C (zh) * | 1997-09-03 | 2000-05-17 | 中国石油化工总公司 | 茂钛化合物 |
US6555593B1 (en) | 1998-01-30 | 2003-04-29 | Albemarle Corporation | Photopolymerization compositions including maleimides and processes for using the same |
JP4130030B2 (ja) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物 |
US6586617B1 (en) | 1999-04-28 | 2003-07-01 | Sumitomo Chemical Takeda Agro Company, Limited | Sulfonamide derivatives |
JP2001026506A (ja) * | 1999-04-28 | 2001-01-30 | Takeda Chem Ind Ltd | スルホンアミド誘導体 |
DE19961355A1 (de) | 1999-12-17 | 2001-06-21 | S & C Polymer Silicon & Compos | Photoinitiatorsystem mit Titanocen-Initiatoren |
JP5247959B2 (ja) * | 2000-08-31 | 2013-07-24 | 北興化学工業株式会社 | 2,4−ジフルオロ−n−イソプロピルアニリンの製造方法 |
AR032230A1 (es) * | 2001-01-16 | 2003-10-29 | Sumitomo Chem Takeda Agro Co | Derivado sulfonamida conteniendo una composicion agricola y horticola |
KR20040045903A (ko) * | 2001-10-22 | 2004-06-02 | 미쓰이 가가쿠 가부시키가이샤 | 이미드 화합물 및 그 화합물을 사용하는 광기록 매체 |
US6936384B2 (en) | 2002-08-01 | 2005-08-30 | Kodak Polychrome Graphics Llc | Infrared-sensitive composition containing a metallocene derivative |
JP4291638B2 (ja) | 2003-07-29 | 2009-07-08 | 富士フイルム株式会社 | アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版 |
US20050153239A1 (en) | 2004-01-09 | 2005-07-14 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method using the same |
DE102004016694B4 (de) * | 2004-03-31 | 2012-05-16 | Siemens Ag | Verfahren zur Gewinnung medizinisch relevanter Daten aus dem Gastrointestinaltrakt eines Menschen oder eines Tieres sowie eine dafür geeignete Darreichungsform |
EP2246741A1 (en) | 2004-05-19 | 2010-11-03 | Fujifilm Corporation | Image recording method |
US20050263021A1 (en) | 2004-05-31 | 2005-12-01 | Fuji Photo Film Co., Ltd. | Platemaking method for lithographic printing plate precursor and planographic printing method |
JP4452572B2 (ja) | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物およびそれを用いた画像記録方法 |
JP2006021396A (ja) | 2004-07-07 | 2006-01-26 | Fuji Photo Film Co Ltd | 平版印刷版原版および平版印刷方法 |
ATE398298T1 (de) | 2004-07-20 | 2008-07-15 | Fujifilm Corp | Bilderzeugendes material |
US7425406B2 (en) | 2004-07-27 | 2008-09-16 | Fujifilm Corporation | Lithographic printing plate precursor and lithographic printing method |
US20060032390A1 (en) | 2004-07-30 | 2006-02-16 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method |
EP1630618B1 (en) | 2004-08-24 | 2008-03-19 | FUJIFILM Corporation | Method for producing a lithographic printing plate |
JP2006062188A (ja) | 2004-08-26 | 2006-03-09 | Fuji Photo Film Co Ltd | 色画像形成材料及び平版印刷版原版 |
JP2006068963A (ja) | 2004-08-31 | 2006-03-16 | Fuji Photo Film Co Ltd | 重合性組成物、それを用いた親水性膜、及び、平版印刷版原版 |
JP5089866B2 (ja) | 2004-09-10 | 2012-12-05 | 富士フイルム株式会社 | 平版印刷方法 |
US20060150846A1 (en) | 2004-12-13 | 2006-07-13 | Fuji Photo Film Co. Ltd | Lithographic printing method |
JP2006181838A (ja) | 2004-12-27 | 2006-07-13 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
EP1798031A3 (en) | 2005-01-26 | 2007-07-04 | FUJIFILM Corporation | Lithographic printing plate precursor and lithographic printing method |
EP3086176A1 (en) | 2005-02-28 | 2016-10-26 | Fujifilm Corporation | A lithographic printing method |
JP4474317B2 (ja) | 2005-03-31 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
JP2006335826A (ja) | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法 |
JP4815270B2 (ja) | 2005-08-18 | 2011-11-16 | 富士フイルム株式会社 | 平版印刷版の作製方法及び作製装置 |
JP4759343B2 (ja) | 2005-08-19 | 2011-08-31 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷方法 |
JP2007230105A (ja) | 2006-03-01 | 2007-09-13 | Fujifilm Corp | 機上現像印刷方法および印刷装置 |
JP5102454B2 (ja) | 2006-03-03 | 2012-12-19 | 富士フイルム株式会社 | チタノセン系化合物、感光性組成物、及び感光性転写シート |
JP2007241144A (ja) | 2006-03-10 | 2007-09-20 | Fujifilm Corp | 感光性組成物、並びに光記録媒体及びその製造方法、光記録方法、光記録装置 |
JP5171005B2 (ja) | 2006-03-17 | 2013-03-27 | 富士フイルム株式会社 | 高分子化合物およびその製造方法、並びに顔料分散剤 |
JP4698470B2 (ja) | 2006-03-31 | 2011-06-08 | 富士フイルム株式会社 | 光記録媒体の処理方法及び処理装置、並びに光記録再生装置 |
JP5276264B2 (ja) | 2006-07-03 | 2013-08-28 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法 |
JP4777226B2 (ja) | 2006-12-07 | 2011-09-21 | 富士フイルム株式会社 | 画像記録材料、及び新規化合物 |
US8771924B2 (en) | 2006-12-26 | 2014-07-08 | Fujifilm Corporation | Polymerizable composition, lithographic printing plate precursor and lithographic printing method |
JP2008163081A (ja) | 2006-12-27 | 2008-07-17 | Fujifilm Corp | レーザー分解性樹脂組成物およびそれを用いるパターン形成材料ならびにレーザー彫刻型フレキソ印刷版原版 |
JP4881756B2 (ja) | 2007-02-06 | 2012-02-22 | 富士フイルム株式会社 | 感光性組成物、平版印刷版原版、平版印刷方法、及び新規シアニン色素 |
EP1955858B1 (en) | 2007-02-06 | 2014-06-18 | FUJIFILM Corporation | Ink-jet recording method and device |
US8240808B2 (en) | 2007-02-07 | 2012-08-14 | Fujifilm Corporation | Ink-jet head maintenance device, ink-jet recording device and ink-jet head maintenance method |
JP5227521B2 (ja) | 2007-02-26 | 2013-07-03 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、インクセット |
JP5224699B2 (ja) | 2007-03-01 | 2013-07-03 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版 |
JP2008233660A (ja) | 2007-03-22 | 2008-10-02 | Fujifilm Corp | 浸漬型平版印刷版用自動現像装置およびその方法 |
JP5238292B2 (ja) | 2007-03-23 | 2013-07-17 | 三菱製紙株式会社 | 水現像可能な感光性平版印刷版材料 |
EP1972440B1 (en) | 2007-03-23 | 2010-06-23 | FUJIFILM Corporation | Negative lithographic printing plate precursor and lithographic printing method using the same |
JP4860525B2 (ja) | 2007-03-27 | 2012-01-25 | 富士フイルム株式会社 | 硬化性組成物及び平版印刷版原版 |
EP1974914B1 (en) | 2007-03-29 | 2014-02-26 | FUJIFILM Corporation | Method of preparing lithographic printing plate |
JP5030638B2 (ja) | 2007-03-29 | 2012-09-19 | 富士フイルム株式会社 | カラーフィルタ及びその製造方法 |
EP1975702B1 (en) | 2007-03-29 | 2013-07-24 | FUJIFILM Corporation | Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device |
EP1975706A3 (en) | 2007-03-30 | 2010-03-03 | FUJIFILM Corporation | Lithographic printing plate precursor |
JP5306681B2 (ja) | 2007-03-30 | 2013-10-02 | 富士フイルム株式会社 | 重合性化合物、重合体、インク組成物、印刷物及びインクジェット記録方法 |
JP5243072B2 (ja) | 2007-03-30 | 2013-07-24 | 富士フイルム株式会社 | インク組成物、並びに、それを用いた画像記録方法及び画像記録物 |
EP1975710B1 (en) | 2007-03-30 | 2013-10-23 | FUJIFILM Corporation | Plate-making method of lithographic printing plate precursor |
JP5046744B2 (ja) | 2007-05-18 | 2012-10-10 | 富士フイルム株式会社 | 平版印刷版原版、及びそれを用いた印刷方法 |
EP2006738B1 (en) | 2007-06-21 | 2017-09-06 | Fujifilm Corporation | Lithographic printing plate precursor |
EP2006091B1 (en) | 2007-06-22 | 2010-12-08 | FUJIFILM Corporation | Lithographic printing plate precursor and plate making method |
DE602008002963D1 (de) | 2007-07-02 | 2010-11-25 | Fujifilm Corp | Flachdruckplattenvorläufer und Flachdruckverfahren damit |
JP5213375B2 (ja) | 2007-07-13 | 2013-06-19 | 富士フイルム株式会社 | 顔料分散液、硬化性組成物、それを用いるカラーフィルタ及び固体撮像素子 |
JP2009069761A (ja) | 2007-09-18 | 2009-04-02 | Fujifilm Corp | 平版印刷版の製版方法 |
JP2009091555A (ja) | 2007-09-18 | 2009-04-30 | Fujifilm Corp | 硬化性組成物、画像形成材料及び平版印刷版原版 |
JP5265165B2 (ja) | 2007-09-28 | 2013-08-14 | 富士フイルム株式会社 | 塗布装置及びこれを用いるインクジェット記録装置 |
JP4898618B2 (ja) | 2007-09-28 | 2012-03-21 | 富士フイルム株式会社 | インクジェット記録方法 |
JP5002399B2 (ja) | 2007-09-28 | 2012-08-15 | 富士フイルム株式会社 | 平版印刷版原版の処理方法 |
EP2042311A1 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Lithographic printing plate precursor, method of preparing lithographic printing plate and lithographic printing method |
ATE475906T1 (de) | 2007-09-28 | 2010-08-15 | Fujifilm Corp | Negatives lichtempfindliches material und negativer planographischer druckplattenvorläufer |
JP5227560B2 (ja) | 2007-09-28 | 2013-07-03 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法 |
JP4890408B2 (ja) | 2007-09-28 | 2012-03-07 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法 |
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JP5244518B2 (ja) | 2007-09-28 | 2013-07-24 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷版の作製方法 |
JP5055077B2 (ja) | 2007-09-28 | 2012-10-24 | 富士フイルム株式会社 | 画像形成方法および平版印刷版原版 |
JP5322537B2 (ja) | 2007-10-29 | 2013-10-23 | 富士フイルム株式会社 | 平版印刷版原版 |
EP2058123B1 (en) | 2007-11-08 | 2012-09-26 | FUJIFILM Corporation | Resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate |
JP2009139852A (ja) | 2007-12-10 | 2009-06-25 | Fujifilm Corp | 平版印刷版の作製方法及び平版印刷版原版 |
JP5066452B2 (ja) | 2008-01-09 | 2012-11-07 | 富士フイルム株式会社 | 平版印刷版用現像処理方法 |
JP2009186997A (ja) | 2008-01-11 | 2009-08-20 | Fujifilm Corp | 平版印刷版原版、平版印刷版の作製方法及び平版印刷版方法 |
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JP5254632B2 (ja) | 2008-02-07 | 2013-08-07 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物 |
US20090214797A1 (en) | 2008-02-25 | 2009-08-27 | Fujifilm Corporation | Inkjet ink composition, and inkjet recording method and printed material employing same |
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JP2009229771A (ja) | 2008-03-21 | 2009-10-08 | Fujifilm Corp | 平版印刷版用自動現像方法 |
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JP2009236942A (ja) | 2008-03-25 | 2009-10-15 | Fujifilm Corp | 平版印刷版原版及びその製版方法 |
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JP5322575B2 (ja) | 2008-03-28 | 2013-10-23 | 富士フイルム株式会社 | レーザー彫刻用樹脂組成物、画像形成材料、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版、及びレリーフ印刷版の製造方法 |
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US20090260531A1 (en) | 2008-04-18 | 2009-10-22 | Fujifilm Corporation | Aluminum alloy plate for lithographic printing plate, lithographic printing plate support, presensitized plate, method of manufacturing aluminum alloy plate for lithographic printing plate and method of manufacturing lithographic printing plate support |
KR101441998B1 (ko) | 2008-04-25 | 2014-09-18 | 후지필름 가부시키가이샤 | 중합성 조성물, 차광성 컬러필터, 흑색 경화성 조성물, 고체촬상소자용 차광성 컬러필터와 그 제조 방법, 및 고체촬상소자 |
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JP5449898B2 (ja) | 2008-09-22 | 2014-03-19 | 富士フイルム株式会社 | 平版印刷版原版、及びそれを用いた印刷方法 |
JP5408942B2 (ja) | 2008-09-22 | 2014-02-05 | 富士フイルム株式会社 | 平版印刷版原版および製版方法 |
EP2168767A1 (en) | 2008-09-24 | 2010-03-31 | Fujifilm Corporation | Method of preparing lithographic printing plate |
JP2010077228A (ja) | 2008-09-25 | 2010-04-08 | Fujifilm Corp | インク組成物、インクジェット記録方法、及び、印刷物 |
JP5171514B2 (ja) | 2008-09-29 | 2013-03-27 | 富士フイルム株式会社 | 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法 |
JP5660268B2 (ja) | 2008-09-30 | 2015-01-28 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の製版方法及び重合性モノマー |
JP5127651B2 (ja) | 2008-09-30 | 2013-01-23 | 富士フイルム株式会社 | 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子 |
JP5340102B2 (ja) | 2008-10-03 | 2013-11-13 | 富士フイルム株式会社 | 分散組成物、重合性組成物、遮光性カラーフィルタ、固体撮像素子、液晶表示装置、ウェハレベルレンズ、及び撮像ユニット |
JP2010180330A (ja) | 2009-02-05 | 2010-08-19 | Fujifilm Corp | 非水系インク、インクセット、画像記録方法、画像記録装置、および記録物 |
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JP5349097B2 (ja) | 2009-03-19 | 2013-11-20 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法 |
JP5383289B2 (ja) | 2009-03-31 | 2014-01-08 | 富士フイルム株式会社 | インク組成物、インクジェット用であるインク組成物、インクジェット記録方法、およびインクジェット法による印刷物 |
JP5572026B2 (ja) | 2009-09-18 | 2014-08-13 | 富士フイルム株式会社 | インク組成物、及び、インクジェット記録方法 |
JP5530141B2 (ja) | 2009-09-29 | 2014-06-25 | 富士フイルム株式会社 | インク組成物及びインクジェット記録方法 |
JP5692494B2 (ja) * | 2010-03-16 | 2015-04-01 | セイコーエプソン株式会社 | インク組成物および記録方法 |
DE112011101165T5 (de) | 2010-03-29 | 2013-03-28 | Mitsubishi Paper Mills Limited | Fotoempfindliche Zusammensetzung und fotoempfindliches lithographisches Druckplattenmaterial |
JP5791874B2 (ja) | 2010-03-31 | 2015-10-07 | 富士フイルム株式会社 | 着色組成物、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置 |
JP2012031388A (ja) | 2010-05-19 | 2012-02-16 | Fujifilm Corp | 印刷方法、オーバープリントの作製方法、ラミネート加工方法、発光ダイオード硬化性コーティング組成物、及び、発光ダイオード硬化性インク組成物 |
US8816211B2 (en) * | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
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EP2644664B1 (en) | 2012-03-29 | 2015-07-29 | Fujifilm Corporation | Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article |
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US11914293B2 (en) | 2017-01-31 | 2024-02-27 | Flint Group Germany Gmbh | Radiatioin-curable mixture containing low-functionalised, partially saponified polyvinyl acetate |
WO2018177500A1 (de) | 2017-03-27 | 2018-10-04 | Flint Group Germany Gmbh | Verfahren zur herstellung von bildhaften reliefstrukturen |
TWI766073B (zh) | 2017-07-21 | 2022-06-01 | 台橡股份有限公司 | 用於製備發泡體的組合物、發泡體以及包含該發泡體的鞋體 |
US11822246B2 (en) | 2017-10-10 | 2023-11-21 | Flint Group Germany Gmbh | Relief precursor having low cupping and fluting |
BR112020010637A2 (pt) | 2017-12-08 | 2020-11-10 | Flint Group Germany Gmbh | método para identificar um precursor de relevo ou um relevo, método para produzir um relevo a partir de um precursor de relevo, estrutura de relevo com código, e, uso de uma estrutura de relevo. |
NL2020109B1 (en) | 2017-12-18 | 2019-06-25 | Xeikon Prepress Nv | Method for fixing and treating a flexible plate on a drum, and flexible plate for use therein |
EP3629089A1 (en) | 2018-09-26 | 2020-04-01 | Flint Group Germany GmbH | Method for thermally developing relief precursors |
NL2027003B1 (en) | 2020-11-27 | 2022-07-04 | Flint Group Germany Gmbh | Photosensitive composition |
NL2027002B1 (en) | 2020-11-27 | 2022-07-04 | Flint Group Germany Gmbh | Photosensitive composition |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1193030B (de) * | 1961-11-11 | 1965-05-20 | Krewel Leuffen Gmbh | Verfahren zur Herstellung von substituierten Fettsaeureaniliden |
US3565934A (en) * | 1964-09-10 | 1971-02-23 | Monsanto Co | Diazadisiletidines and the preparation thereof |
US4120693A (en) * | 1976-07-29 | 1978-10-17 | E. I. Du Pont De Nemours And Company | Substituted isoindoles |
US4590287A (en) * | 1983-02-11 | 1986-05-20 | Ciba-Geigy Corporation | Fluorinated titanocenes and photopolymerizable composition containing same |
US4548891A (en) * | 1983-02-11 | 1985-10-22 | Ciba Geigy Corporation | Photopolymerizable compositions containing prepolymers with olefin double bonds and titanium metallocene photoinitiators |
EP0173284A1 (de) * | 1984-08-30 | 1986-03-05 | The Dow Chemical Company | Substituierte 1-Phenyl-3-methyl-pyrrolidindione, ihre Herstellung und Verwendung als Fungizide |
US4713401A (en) * | 1984-12-20 | 1987-12-15 | Martin Riediker | Titanocenes and a radiation-polymerizable composition containing these titanocenes |
GB8515475D0 (en) * | 1985-06-19 | 1985-07-24 | Ciba Geigy Ag | Forming images |
KR910000199B1 (ko) * | 1986-04-15 | 1991-01-23 | 시바-가이기 코오포레이숀 | 액체 광개시제 혼합물 |
CH678897A5 (ko) * | 1986-05-10 | 1991-11-15 | Ciba Geigy Ag | |
DE3784199D1 (de) * | 1986-08-01 | 1993-03-25 | Ciba Geigy Ag | Titanocene und deren verwendung. |
US4857654A (en) * | 1986-08-01 | 1989-08-15 | Ciba-Geigy Corporation | Titanocenes and their use |
EP0269573B1 (de) * | 1986-11-26 | 1991-03-27 | Ciba-Geigy Ag | Flüssige Photoinitiatorgemische |
-
1988
- 1988-11-21 US US07/273,526 patent/US5026625A/en not_active Expired - Lifetime
- 1988-11-28 EP EP88119798A patent/EP0318893B1/de not_active Expired - Lifetime
- 1988-11-28 AT AT88119798T patent/ATE100457T1/de not_active IP Right Cessation
- 1988-11-28 DE DE88119798T patent/DE3887294D1/de not_active Expired - Lifetime
- 1988-11-29 CA CA000584483A patent/CA1332951C/en not_active Expired - Fee Related
- 1988-11-30 BR BR888806308A patent/BR8806308A/pt unknown
- 1988-11-30 ZA ZA888960A patent/ZA888960B/xx unknown
- 1988-12-01 AU AU26463/88A patent/AU2646388A/en not_active Abandoned
- 1988-12-01 KR KR1019880016123A patent/KR0120390B1/ko not_active IP Right Cessation
- 1988-12-01 JP JP63305138A patent/JP2747831B2/ja not_active Expired - Lifetime
-
1998
- 1998-04-29 HK HK98103663A patent/HK1004553A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0318893A2 (de) | 1989-06-07 |
DE3887294D1 (de) | 1994-03-03 |
ZA888960B (en) | 1989-07-26 |
BR8806308A (pt) | 1989-08-15 |
HK1004553A1 (en) | 1998-11-27 |
JP2747831B2 (ja) | 1998-05-06 |
US5026625A (en) | 1991-06-25 |
ATE100457T1 (de) | 1994-02-15 |
EP0318893B1 (de) | 1994-01-19 |
EP0318893A3 (en) | 1990-05-23 |
CA1332951C (en) | 1994-11-08 |
KR0120390B1 (ko) | 1997-10-22 |
JPH02249A (ja) | 1990-01-05 |
AU2646388A (en) | 1989-06-01 |
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