KR20110104084A - 액침 리소그래피 유체 제어 시스템 - Google Patents

액침 리소그래피 유체 제어 시스템 Download PDF

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Publication number
KR20110104084A
KR20110104084A KR1020117018017A KR20117018017A KR20110104084A KR 20110104084 A KR20110104084 A KR 20110104084A KR 1020117018017 A KR1020117018017 A KR 1020117018017A KR 20117018017 A KR20117018017 A KR 20117018017A KR 20110104084 A KR20110104084 A KR 20110104084A
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KR
South Korea
Prior art keywords
compressed gas
fluid
exposure area
nozzles
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020117018017A
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English (en)
Korean (ko)
Inventor
데릭 쿤
앤드류 제이 헤이즐턴
Original Assignee
가부시키가이샤 니콘
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Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20110104084A publication Critical patent/KR20110104084A/ko
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/522—Projection optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR1020117018017A 2003-04-09 2004-03-29 액침 리소그래피 유체 제어 시스템 Ceased KR20110104084A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46214203P 2003-04-09 2003-04-09
US60/462,142 2003-04-09

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020057019188A Division KR101177331B1 (ko) 2003-04-09 2004-03-29 액침 리소그래피 유체 제어 시스템

Publications (1)

Publication Number Publication Date
KR20110104084A true KR20110104084A (ko) 2011-09-21

Family

ID=33299914

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020117018017A Ceased KR20110104084A (ko) 2003-04-09 2004-03-29 액침 리소그래피 유체 제어 시스템
KR1020057019188A Expired - Fee Related KR101177331B1 (ko) 2003-04-09 2004-03-29 액침 리소그래피 유체 제어 시스템

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020057019188A Expired - Fee Related KR101177331B1 (ko) 2003-04-09 2004-03-29 액침 리소그래피 유체 제어 시스템

Country Status (5)

Country Link
US (6) US7339650B2 (enExample)
JP (3) JP4488004B2 (enExample)
KR (2) KR20110104084A (enExample)
TW (2) TW200801847A (enExample)
WO (1) WO2004093159A2 (enExample)

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* Cited by examiner, † Cited by third party
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JP2006523026A (ja) 2006-10-05
TWI372412B (en) 2012-09-11
WO2004093159A3 (en) 2005-03-17
US7339650B2 (en) 2008-03-04
JP2014013939A (ja) 2014-01-23
TW200507014A (en) 2005-02-16
US20090075211A1 (en) 2009-03-19
US8497973B2 (en) 2013-07-30
KR101177331B1 (ko) 2012-08-30
US20070268468A1 (en) 2007-11-22
US20070263184A1 (en) 2007-11-15
US8797500B2 (en) 2014-08-05
US20070115453A1 (en) 2007-05-24
US20090075212A1 (en) 2009-03-19
US8102501B2 (en) 2012-01-24
US20060023184A1 (en) 2006-02-02
JP5428909B2 (ja) 2014-02-26
JP5679023B2 (ja) 2015-03-04
US9618852B2 (en) 2017-04-11
JP2010161383A (ja) 2010-07-22
WO2004093159A2 (en) 2004-10-28

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