KR101832664B1 - 광학 필름 및 광학 필름을 이용한 광학 부재 - Google Patents
광학 필름 및 광학 필름을 이용한 광학 부재 Download PDFInfo
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- KR101832664B1 KR101832664B1 KR1020170057552A KR20170057552A KR101832664B1 KR 101832664 B1 KR101832664 B1 KR 101832664B1 KR 1020170057552 A KR1020170057552 A KR 1020170057552A KR 20170057552 A KR20170057552 A KR 20170057552A KR 101832664 B1 KR101832664 B1 KR 101832664B1
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- Prior art keywords
- optical film
- film
- polyimide
- based polymer
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- 239000012788 optical film Substances 0.000 title claims abstract description 68
- 230000003287 optical effect Effects 0.000 title claims description 9
- 229920001721 polyimide Polymers 0.000 claims description 63
- 239000004952 Polyamide Substances 0.000 claims description 14
- 229920002647 polyamide Polymers 0.000 claims description 14
- 238000002834 transmittance Methods 0.000 claims description 7
- 230000014509 gene expression Effects 0.000 claims 2
- 238000004383 yellowing Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 56
- -1 polyethylene terephthalate Polymers 0.000 description 46
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 27
- 239000002966 varnish Substances 0.000 description 26
- 239000000758 substrate Substances 0.000 description 21
- 150000002430 hydrocarbons Chemical group 0.000 description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- 229920005989 resin Polymers 0.000 description 16
- 239000011347 resin Substances 0.000 description 16
- 239000004642 Polyimide Substances 0.000 description 14
- 150000004985 diamines Chemical class 0.000 description 11
- 238000001035 drying Methods 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 10
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 10
- 229920002799 BoPET Polymers 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 150000004984 aromatic diamines Chemical class 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- 125000000962 organic group Chemical group 0.000 description 8
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 125000001931 aliphatic group Chemical group 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 description 6
- 239000005020 polyethylene terephthalate Substances 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 229910010272 inorganic material Inorganic materials 0.000 description 5
- 239000011147 inorganic material Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- NVKGJHAQGWCWDI-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F NVKGJHAQGWCWDI-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
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- 229910052731 fluorine Inorganic materials 0.000 description 4
- 125000001153 fluoro group Chemical group F* 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 239000011164 primary particle Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 3
- MXPYJVUYLVNEBB-UHFFFAOYSA-N 2-[2-(2-carboxybenzoyl)oxycarbonylbenzoyl]oxycarbonylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OC(=O)C1=CC=CC=C1C(=O)OC(=O)C1=CC=CC=C1C(O)=O MXPYJVUYLVNEBB-UHFFFAOYSA-N 0.000 description 3
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 3
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical compound CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 2
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical group C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
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- 125000004122 cyclic group Chemical group 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
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- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 125000005462 imide group Chemical group 0.000 description 2
- 239000010954 inorganic particle Substances 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
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- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
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- 150000003628 tricarboxylic acids Chemical class 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- XNFGDDFDPXGEGL-UHFFFAOYSA-N 1,3-dioxobenzo[f][2]benzofuran-6-carboxylic acid Chemical compound C1=C2C(=O)OC(=O)C2=CC2=CC(C(=O)O)=CC=C21 XNFGDDFDPXGEGL-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
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- RLHGFJMGWQXPBW-UHFFFAOYSA-N 2-hydroxy-3-(1h-imidazol-5-ylmethyl)benzamide Chemical compound NC(=O)C1=CC=CC(CC=2NC=NC=2)=C1O RLHGFJMGWQXPBW-UHFFFAOYSA-N 0.000 description 1
- GWHLJVMSZRKEAQ-UHFFFAOYSA-N 3-(2,3-dicarboxyphenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O GWHLJVMSZRKEAQ-UHFFFAOYSA-N 0.000 description 1
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 1
- KHZYMPDILLAIQY-UHFFFAOYSA-N 3-(3-carboxyphenyl)benzoic acid Chemical compound OC(=O)C1=CC=CC(C=2C=C(C=CC=2)C(O)=O)=C1 KHZYMPDILLAIQY-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- ZMPZWXKBGSQATE-UHFFFAOYSA-N 3-(4-aminophenyl)sulfonylaniline Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=CC(N)=C1 ZMPZWXKBGSQATE-UHFFFAOYSA-N 0.000 description 1
- UCFMKTNJZCYBBJ-UHFFFAOYSA-N 3-[1-(2,3-dicarboxyphenyl)ethyl]phthalic acid Chemical compound C=1C=CC(C(O)=O)=C(C(O)=O)C=1C(C)C1=CC=CC(C(O)=O)=C1C(O)=O UCFMKTNJZCYBBJ-UHFFFAOYSA-N 0.000 description 1
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- LJMPOXUWPWEILS-UHFFFAOYSA-N 3a,4,4a,7a,8,8a-hexahydrofuro[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1C2C(=O)OC(=O)C2CC2C(=O)OC(=O)C21 LJMPOXUWPWEILS-UHFFFAOYSA-N 0.000 description 1
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- APXJLYIVOFARRM-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(C(O)=O)C(C(O)=O)=C1 APXJLYIVOFARRM-UHFFFAOYSA-N 0.000 description 1
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- JYZPDAUOQGFBKT-UHFFFAOYSA-N 4-[2-[2-[2-(3,4-dicarboxyphenoxy)phenyl]propan-2-yl]phenoxy]phthalic acid Chemical compound C=1C=CC=C(OC=2C=C(C(C(O)=O)=CC=2)C(O)=O)C=1C(C)(C)C1=CC=CC=C1OC1=CC=C(C(O)=O)C(C(O)=O)=C1 JYZPDAUOQGFBKT-UHFFFAOYSA-N 0.000 description 1
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- 238000006243 chemical reaction Methods 0.000 description 1
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- 239000007859 condensation product Substances 0.000 description 1
- CURBACXRQKTCKZ-UHFFFAOYSA-N cyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1C(C(O)=O)C(C(O)=O)C1C(O)=O CURBACXRQKTCKZ-UHFFFAOYSA-N 0.000 description 1
- WOSVXXBNNCUXMT-UHFFFAOYSA-N cyclopentane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)C1C(O)=O WOSVXXBNNCUXMT-UHFFFAOYSA-N 0.000 description 1
- KEIQPMUPONZJJH-UHFFFAOYSA-N dicyclohexylmethanediamine Chemical compound C1CCCCC1C(N)(N)C1CCCCC1 KEIQPMUPONZJJH-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
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- 239000012535 impurity Substances 0.000 description 1
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- 239000000314 lubricant Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- HVNWRBWNOPYOER-UHFFFAOYSA-N pentane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C(C)C(C(O)=O)C(C(O)=O)CC(O)=O HVNWRBWNOPYOER-UHFFFAOYSA-N 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 150000003873 salicylate salts Chemical class 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0215—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having a regular structure
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polarising Elements (AREA)
- Laminated Bodies (AREA)
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| TWI769157B (zh) * | 2016-05-10 | 2022-07-01 | 日商住友化學股份有限公司 | 光學膜、具備該光學膜之可撓性裝置構件、及樹脂組成物 |
| JP7220025B2 (ja) * | 2017-06-09 | 2023-02-09 | 三星電子株式会社 | ポリイミドまたはポリ(アミド-イミド)コポリマーを含むフィルム、該フィルムを含む表示装置、および該フィルムの製造方法 |
| WO2019107365A1 (ja) * | 2017-11-30 | 2019-06-06 | 住友化学株式会社 | 光学異方性フィルム |
| JP6628859B2 (ja) * | 2017-12-08 | 2020-01-15 | 住友化学株式会社 | 光学積層体 |
| US10995237B2 (en) | 2017-12-29 | 2021-05-04 | Industrial Technology Research Institute | Polyimide hybrid material, precursor solution and manufacture method thereof |
| JP6530125B1 (ja) * | 2018-04-27 | 2019-06-12 | 住友化学株式会社 | 光学フィルム |
| JP6952735B2 (ja) * | 2018-04-27 | 2021-10-20 | 住友化学株式会社 | 光学フィルム、光学積層体及びフレキシブル画像表示装置 |
| JP6896787B2 (ja) * | 2018-04-27 | 2021-06-30 | 住友化学株式会社 | 光学フィルム、光学積層体及びフレキシブル画像表示装置 |
| TWI839397B (zh) * | 2018-10-23 | 2024-04-21 | 美商杜邦電子股份有限公司 | 低霧度聚合物膜及電子裝置 |
| JP7279392B2 (ja) * | 2019-02-14 | 2023-05-23 | 日本ゼオン株式会社 | 積層体 |
| CN116075752A (zh) * | 2020-07-02 | 2023-05-05 | 住友化学株式会社 | 光学膜 |
| JP2022022728A (ja) * | 2020-07-02 | 2022-02-07 | 住友化学株式会社 | ポリイミド系樹脂を含む光学フィルムの製造方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4046599B2 (ja) | 2002-12-02 | 2008-02-13 | 日東電工株式会社 | 凹部形成方法 |
| KR101080397B1 (ko) | 2009-02-23 | 2011-11-04 | 정종구 | 광학 시트 |
| JP2013041086A (ja) * | 2011-08-15 | 2013-02-28 | Asahi Kasei E-Materials Corp | 光学素子 |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0634816A (ja) * | 1992-07-17 | 1994-02-10 | Mitsui Toatsu Chem Inc | 偏光子および保護フィルムを積層するに用いる偏光フィルム用接着剤組成物、ならびに該接着剤組成物を利用した偏光子および保護フィルムの積層方法 |
| WO2003029899A1 (fr) * | 2001-09-26 | 2003-04-10 | Nissan Chemical Industries, Ltd. | Composition de resine polyimide photosensible positive |
| JP2006168222A (ja) * | 2004-12-16 | 2006-06-29 | Toyobo Co Ltd | ポリイミドフィルム製膜方法 |
| JP4771412B2 (ja) * | 2005-02-14 | 2011-09-14 | 信越化学工業株式会社 | 感光性樹脂及びその製造方法 |
| JP4498949B2 (ja) * | 2005-02-24 | 2010-07-07 | 大日本印刷株式会社 | ガスバリア性フィルム、並びにこれを用いたディスプレイ用基板及びディスプレイ |
| JP5109657B2 (ja) * | 2005-04-07 | 2012-12-26 | 宇部興産株式会社 | ポリイミドフィルムの製造方法およびポリイミドフィルム |
| JP2007125833A (ja) * | 2005-11-07 | 2007-05-24 | Kaneka Corp | フィルム成形方法、及びフィルム成形装置 |
| JP2007211073A (ja) * | 2006-02-08 | 2007-08-23 | Toray Ind Inc | 離型用ポリエステルフィルム |
| JP5578759B2 (ja) * | 2007-08-10 | 2014-08-27 | 日東電工株式会社 | フィルム及びその製造方法 |
| JP4957592B2 (ja) * | 2008-03-10 | 2012-06-20 | 新日本理化株式会社 | ポリイミド樹脂組成物及びその成形体 |
| JP5137890B2 (ja) * | 2008-03-31 | 2013-02-06 | 富士フイルム株式会社 | 光学フィルム、及びその製造方法、ならびにそれを有する偏光板、及び画像表示装置 |
| JP2012016924A (ja) * | 2010-07-09 | 2012-01-26 | Unitika Ltd | 延伸ポリエステルフィルムおよびその製造方法 |
| JP5910236B2 (ja) * | 2011-04-12 | 2016-04-27 | 東洋紡株式会社 | ポリアミドイミドフィルムの製造方法 |
| JP2013006372A (ja) * | 2011-06-24 | 2013-01-10 | Inoac Corp | 透明樹脂成形体及び当該透明樹脂成形体の製造方法、並びに、当該透明樹脂成形体を用いた導光体 |
| US9403947B2 (en) * | 2012-06-19 | 2016-08-02 | Nippon Steel & Sumikin Chemical Co., Ltd. | Display device, method for manufacturing same, polyimide film for display device supporting bases, and method for producing polyimide film for display device supporting bases |
| JP6457168B2 (ja) * | 2012-06-19 | 2019-01-23 | 日鉄ケミカル&マテリアル株式会社 | 表示装置支持基材用ポリイミドフィルム、及びその積層体、並びその製造方法 |
| WO2014034760A1 (ja) * | 2012-08-31 | 2014-03-06 | Jx日鉱日石エネルギー株式会社 | ポリイミド及びその製造に用いる脂環式テトラカルボン酸二無水物 |
| JP6030918B2 (ja) * | 2012-10-24 | 2016-11-24 | 株式会社日本触媒 | 凹凸パターン形成用フィルム、そのフィルムを形成するための樹脂組成物、そのフィルムを有する成形体及びそのフィルムを有する成形体の製造方法 |
| WO2014103759A1 (ja) * | 2012-12-28 | 2014-07-03 | 三菱瓦斯化学株式会社 | 樹脂組成物、プリプレグ及びフィルム |
| JP5809182B2 (ja) * | 2013-03-26 | 2015-11-10 | 株式会社タムラ製作所 | 感光性樹脂組成物 |
| JP2015030222A (ja) * | 2013-08-05 | 2015-02-16 | 王子ホールディングス株式会社 | バリアフィルムおよび有機エレクトロニクスデバイス |
| JP6631515B2 (ja) * | 2014-06-02 | 2020-01-15 | 東洋紡株式会社 | ポリイミド系フィルムの製造方法 |
| WO2015198970A1 (ja) * | 2014-06-25 | 2015-12-30 | 旭化成イーマテリアルズ株式会社 | 空隙を有するポリイミドフィルム及びその製造方法 |
| US11236208B2 (en) * | 2014-07-03 | 2022-02-01 | Daikin Industries, Ltd. | Film |
| JP2016018094A (ja) * | 2014-07-09 | 2016-02-01 | セイコーエプソン株式会社 | 電気光学装置用基板の製造方法、電気光学装置用基板、電気光学装置、電子機器 |
| TWI719851B (zh) * | 2014-07-18 | 2021-02-21 | 日商大日本印刷股份有限公司 | 光學膜及附觸控面板之顯示裝置 |
| CN105445820A (zh) * | 2014-08-21 | 2016-03-30 | 宸鸿科技(厦门)有限公司 | 光学膜组件 |
| JP6646352B2 (ja) * | 2014-08-29 | 2020-02-14 | 住友化学株式会社 | 有機エレクトロルミネッセンス素子 |
| JP6086139B2 (ja) * | 2015-10-05 | 2017-03-01 | 宇部興産株式会社 | ポリイミド前駆体及びポリイミド |
| KR102716992B1 (ko) * | 2016-01-20 | 2024-10-15 | 도쿄 오카 고교 가부시키가이샤 | 폴리이미드 필름의 제조 방법, 폴리이미드 필름, 폴리아미드산 용액 및 감광성 조성물 |
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2017
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- 2017-05-05 US US15/587,738 patent/US20170327654A1/en not_active Abandoned
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2018
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2019
- 2019-05-23 JP JP2019097014A patent/JP2019151856A/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4046599B2 (ja) | 2002-12-02 | 2008-02-13 | 日東電工株式会社 | 凹部形成方法 |
| KR101080397B1 (ko) | 2009-02-23 | 2011-11-04 | 정종구 | 광학 시트 |
| JP2013041086A (ja) * | 2011-08-15 | 2013-02-28 | Asahi Kasei E-Materials Corp | 光学素子 |
Also Published As
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|---|---|
| KR20190123817A (ko) | 2019-11-04 |
| CN107356990A (zh) | 2017-11-17 |
| KR20170126806A (ko) | 2017-11-20 |
| US20170327654A1 (en) | 2017-11-16 |
| JP2019151856A (ja) | 2019-09-12 |
| TWI728107B (zh) | 2021-05-21 |
| JP2017203986A (ja) | 2017-11-16 |
| CN112051628A (zh) | 2020-12-08 |
| KR102221744B1 (ko) | 2021-02-26 |
| TW201741688A (zh) | 2017-12-01 |
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