KR100309029B1 - 세정처리장치 및 세정처리방법 - Google Patents

세정처리장치 및 세정처리방법 Download PDF

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Publication number
KR100309029B1
KR100309029B1 KR1019960024416A KR19960024416A KR100309029B1 KR 100309029 B1 KR100309029 B1 KR 100309029B1 KR 1019960024416 A KR1019960024416 A KR 1019960024416A KR 19960024416 A KR19960024416 A KR 19960024416A KR 100309029 B1 KR100309029 B1 KR 100309029B1
Authority
KR
South Korea
Prior art keywords
substrate
cleaning
temperature
cleaning liquid
spin chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1019960024416A
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English (en)
Korean (ko)
Other versions
KR970003595A (ko
Inventor
마사미 아키모토
Original Assignee
히가시 데쓰로
동경 엘렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 히가시 데쓰로, 동경 엘렉트론 주식회사 filed Critical 히가시 데쓰로
Publication of KR970003595A publication Critical patent/KR970003595A/ko
Application granted granted Critical
Publication of KR100309029B1 publication Critical patent/KR100309029B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/20—Cleaning during device manufacture
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
KR1019960024416A 1995-06-27 1996-06-27 세정처리장치 및 세정처리방법 Expired - Lifetime KR100309029B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP95-183537 1995-06-27
JP18353795A JP3250090B2 (ja) 1995-06-27 1995-06-27 洗浄処理装置及び洗浄処理方法

Publications (2)

Publication Number Publication Date
KR970003595A KR970003595A (ko) 1997-01-28
KR100309029B1 true KR100309029B1 (ko) 2001-12-17

Family

ID=16137567

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960024416A Expired - Lifetime KR100309029B1 (ko) 1995-06-27 1996-06-27 세정처리장치 및 세정처리방법

Country Status (6)

Country Link
US (1) US5868865A (enExample)
EP (1) EP0753884B1 (enExample)
JP (1) JP3250090B2 (enExample)
KR (1) KR100309029B1 (enExample)
DE (1) DE69631566T2 (enExample)
TW (1) TW300177B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980087206A (ko) * 1997-05-23 1998-12-05 프란쯔 숨니취 웨이퍼형 물품, 특히 실리콘 웨이퍼의 처리용 장치
KR20020092864A (ko) * 2002-11-01 2002-12-12 주식회사 엠오에이 피세정체의 표면 세정장치
KR101668139B1 (ko) 2011-07-12 2016-10-20 도쿄엘렉트론가부시키가이샤 액처리 장치 및 액처리 방법

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10321580A (ja) * 1997-05-15 1998-12-04 Tokyo Electron Ltd 基板の洗浄ユニット及び洗浄システム
AT407586B (de) 1997-05-23 2001-04-25 Sez Semiconduct Equip Zubehoer Anordnung zum behandeln scheibenförmiger gegenstände, insbesondere von siliziumwafern
US5974681A (en) * 1997-09-10 1999-11-02 Speedfam-Ipec Corp. Apparatus for spin drying a workpiece
JP3788855B2 (ja) * 1997-09-11 2006-06-21 大日本スクリーン製造株式会社 基板処理ユニットおよびそれを用いた基板処理装置
FR2772290B1 (fr) 1997-12-12 2000-03-17 Sgs Thomson Microelectronics Procede de nettoyage d'un polymere brome sur une plaquette de silicium
FR2772291B1 (fr) 1997-12-12 2000-03-17 Sgs Thomson Microelectronics Procede de nettoyage d'un polymere contenant de l'aluminium sur une plaquette de silicium
TW409191B (en) * 1997-12-26 2000-10-21 Hitachi Electr Eng Method of treating the substrate liquid
JP4213790B2 (ja) * 1998-08-26 2009-01-21 コバレントマテリアル株式会社 耐プラズマ部材およびそれを用いたプラズマ処理装置
US6350316B1 (en) * 1998-11-04 2002-02-26 Tokyo Electron Limited Apparatus for forming coating film
JP3352418B2 (ja) * 1999-01-28 2002-12-03 キヤノン株式会社 減圧処理方法及び減圧処理装置
JP2000334397A (ja) 1999-05-31 2000-12-05 Kokusai Electric Co Ltd 板状試料の流体処理装置及び板状試料の流体処理方法
US6405399B1 (en) * 1999-06-25 2002-06-18 Lam Research Corporation Method and system of cleaning a wafer after chemical mechanical polishing or plasma processing
KR20010027028A (ko) * 1999-09-10 2001-04-06 이계안 공작물의 세정용 로보트 시스템
US6318389B1 (en) 1999-10-29 2001-11-20 Memc Electronic Materials, Inc. Apparatus for cleaning semiconductor wafers
JP3688976B2 (ja) * 2000-05-24 2005-08-31 東京エレクトロン株式会社 処理液吐出装置
DE10030431A1 (de) * 2000-06-21 2002-01-10 Karl Suess Kg Praez Sgeraete F Verfahren und Vorrichtung zum Reinigen und/oder Bonden von Substraten
US6951221B2 (en) * 2000-09-22 2005-10-04 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
JP3955724B2 (ja) * 2000-10-12 2007-08-08 株式会社ルネサステクノロジ 半導体集積回路装置の製造方法
US20020096196A1 (en) * 2001-01-23 2002-07-25 Takayuki Toshima Substrate processing apparatus and substrate processing method
JP3511514B2 (ja) * 2001-05-31 2004-03-29 エム・エフエスアイ株式会社 基板浄化処理装置、ディスペンサー、基板保持機構、基板の浄化処理用チャンバー、及びこれらを用いた基板の浄化処理方法
JP2003031536A (ja) 2001-07-12 2003-01-31 Nec Corp ウエハの洗浄方法
AT500984B1 (de) 2002-06-25 2007-05-15 Sez Ag Vorrichtung zur flüssigkeitsbehandlung von scheibenförmigen gegenständen
JP2004055722A (ja) * 2002-07-18 2004-02-19 Renesas Technology Corp 洗浄装置、基板の洗浄方法および半導体装置の製造方法
US6938629B2 (en) * 2002-11-13 2005-09-06 Taiwan Semiconductor Manufacturing Co., Ltd Rinsing lid for wet bench
US20040115957A1 (en) * 2002-12-17 2004-06-17 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for enhancing wet stripping of photoresist
US7612483B2 (en) * 2004-02-27 2009-11-03 Georgia Tech Research Corporation Harmonic cMUT devices and fabrication methods
US7730898B2 (en) 2005-03-01 2010-06-08 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor wafer lifter
KR20070044126A (ko) * 2005-10-24 2007-04-27 주식회사 케이씨텍 웨이퍼 정렬장치 및 방법
US20080060676A1 (en) * 2006-09-11 2008-03-13 Dana Scranton Workpiece processing with preheat
KR100839913B1 (ko) * 2007-01-12 2008-06-19 세메스 주식회사 기판 처리 장치 및 방법
WO2009084406A1 (ja) * 2007-12-27 2009-07-09 Tokyo Electron Limited 液処理装置、液処理方法および記憶媒体
KR101042538B1 (ko) * 2009-06-08 2011-06-17 세메스 주식회사 기판 처리 장치
JP5588418B2 (ja) * 2011-10-24 2014-09-10 東京エレクトロン株式会社 基板処理装置及び基板処理方法
US20130233356A1 (en) * 2012-03-12 2013-09-12 Lam Research Ag Process and apparatus for treating surfaces of wafer-shaped articles
JP6577385B2 (ja) * 2016-02-12 2019-09-18 株式会社荏原製作所 基板保持モジュール、基板処理装置、および基板処理方法
JP6736386B2 (ja) 2016-07-01 2020-08-05 東京エレクトロン株式会社 基板液処理装置、基板液処理方法および記録媒体
JP6924614B2 (ja) * 2017-05-18 2021-08-25 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP6926233B2 (ja) 2017-12-01 2021-08-25 東京エレクトロン株式会社 基板液処理装置
CN114188245B (zh) * 2021-11-30 2025-04-08 北京北方华创微电子装备有限公司 晶圆清洗设备和晶圆清洗方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57166032A (en) * 1981-04-03 1982-10-13 Toshiba Corp Spray type developing device for positive resist
US4827867A (en) * 1985-11-28 1989-05-09 Daikin Industries, Ltd. Resist developing apparatus
JPH084063B2 (ja) * 1986-12-17 1996-01-17 富士通株式会社 半導体基板の保存方法
JPH03136232A (ja) * 1989-08-31 1991-06-11 Dainippon Screen Mfg Co Ltd 基板の表面処理装置
JPH0432230A (ja) * 1990-05-29 1992-02-04 Tokyo Electron Ltd ドライ洗浄装置
JP2732392B2 (ja) * 1992-03-17 1998-03-30 信越半導体株式会社 半導体ウェーハの処理方法
US5395482A (en) * 1992-11-13 1995-03-07 Fuji Photo Film Co., Ltd. Ultra high purity vapor phase treatment
JP3277404B2 (ja) * 1993-03-31 2002-04-22 ソニー株式会社 基板洗浄方法及び基板洗浄装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980087206A (ko) * 1997-05-23 1998-12-05 프란쯔 숨니취 웨이퍼형 물품, 특히 실리콘 웨이퍼의 처리용 장치
KR20020092864A (ko) * 2002-11-01 2002-12-12 주식회사 엠오에이 피세정체의 표면 세정장치
KR101668139B1 (ko) 2011-07-12 2016-10-20 도쿄엘렉트론가부시키가이샤 액처리 장치 및 액처리 방법

Also Published As

Publication number Publication date
TW300177B (enExample) 1997-03-11
JP3250090B2 (ja) 2002-01-28
EP0753884B1 (en) 2004-02-18
US5868865A (en) 1999-02-09
DE69631566D1 (de) 2004-03-25
DE69631566T2 (de) 2004-07-29
JPH0917761A (ja) 1997-01-17
KR970003595A (ko) 1997-01-28
EP0753884A3 (en) 1997-07-09
EP0753884A2 (en) 1997-01-15

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