JPH11513652A - 五酸化ニオブ及びタンタル化合物 - Google Patents
五酸化ニオブ及びタンタル化合物Info
- Publication number
- JPH11513652A JPH11513652A JP9515130A JP51513097A JPH11513652A JP H11513652 A JPH11513652 A JP H11513652A JP 9515130 A JP9515130 A JP 9515130A JP 51513097 A JP51513097 A JP 51513097A JP H11513652 A JPH11513652 A JP H11513652A
- Authority
- JP
- Japan
- Prior art keywords
- pentoxide
- valve metal
- niobium
- solution
- surface area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 title claims abstract description 33
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 title claims abstract description 31
- 150000003482 tantalum compounds Chemical class 0.000 title description 2
- 229910052751 metal Inorganic materials 0.000 claims abstract description 67
- 239000002184 metal Substances 0.000 claims abstract description 67
- 239000002243 precursor Substances 0.000 claims abstract description 43
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims abstract description 29
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims description 62
- 239000000203 mixture Substances 0.000 claims description 37
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 28
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 28
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 28
- 239000010955 niobium Substances 0.000 claims description 26
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 19
- 239000000843 powder Substances 0.000 claims description 18
- 229910052758 niobium Inorganic materials 0.000 claims description 14
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 14
- 238000002156 mixing Methods 0.000 claims description 13
- 238000001556 precipitation Methods 0.000 claims description 13
- 230000036571 hydration Effects 0.000 claims description 11
- 238000006703 hydration reaction Methods 0.000 claims description 11
- 239000002253 acid Substances 0.000 claims description 6
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 6
- 238000002441 X-ray diffraction Methods 0.000 claims description 4
- 238000001354 calcination Methods 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- NRPLRCRDLQSRSK-UHFFFAOYSA-N dioxoniobium;hydrofluoride Chemical compound F.O=[Nb]=O NRPLRCRDLQSRSK-UHFFFAOYSA-N 0.000 claims description 3
- RPAJSBKBKSSMLJ-DFWYDOINSA-N (2s)-2-aminopentanedioic acid;hydrochloride Chemical class Cl.OC(=O)[C@@H](N)CCC(O)=O RPAJSBKBKSSMLJ-DFWYDOINSA-N 0.000 claims description 2
- -1 metal oxide compound Chemical class 0.000 claims description 2
- 239000002245 particle Substances 0.000 abstract description 71
- 238000009826 distribution Methods 0.000 abstract description 8
- 230000029087 digestion Effects 0.000 abstract description 3
- 239000007769 metal material Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 83
- 239000000243 solution Substances 0.000 description 42
- 239000000047 product Substances 0.000 description 30
- 239000000725 suspension Substances 0.000 description 30
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 24
- 238000010517 secondary reaction Methods 0.000 description 15
- 239000012467 final product Substances 0.000 description 13
- 229910021529 ammonia Inorganic materials 0.000 description 12
- 239000007787 solid Substances 0.000 description 12
- 230000008569 process Effects 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000010419 fine particle Substances 0.000 description 7
- 125000001153 fluoro group Chemical group F* 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000001878 scanning electron micrograph Methods 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000004064 recycling Methods 0.000 description 4
- 239000012798 spherical particle Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- MAKKVCWGJXNRMD-UHFFFAOYSA-N niobium(5+);oxygen(2-);hydrate Chemical class O.[O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] MAKKVCWGJXNRMD-UHFFFAOYSA-N 0.000 description 3
- JHQADNCUJQNQAN-UHFFFAOYSA-N oxygen(2-);tantalum(5+);hydrate Chemical compound O.[O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] JHQADNCUJQNQAN-UHFFFAOYSA-N 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- 241001072332 Monia Species 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 2
- 229910000484 niobium oxide Inorganic materials 0.000 description 2
- 229910001936 tantalum oxide Inorganic materials 0.000 description 2
- 239000003832 thermite Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 238000011437 continuous method Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000000887 hydrating effect Effects 0.000 description 1
- 238000001027 hydrothermal synthesis Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012702 metal oxide precursor Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 230000000877 morphologic effect Effects 0.000 description 1
- MZPXBMFKEAZGAM-UHFFFAOYSA-N niobium hydrate Chemical compound O.[Nb] MZPXBMFKEAZGAM-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000002572 peristaltic effect Effects 0.000 description 1
- 239000011295 pitch Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000011027 product recovery Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- IQFNDONPIKTUQM-UHFFFAOYSA-N tantalum hydrate Chemical class O.[Ta] IQFNDONPIKTUQM-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G33/00—Compounds of niobium
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
- F02M—SUPPLYING COMBUSTION ENGINES IN GENERAL WITH COMBUSTIBLE MIXTURES OR CONSTITUENTS THEREOF
- F02M51/00—Fuel-injection apparatus characterised by being operated electrically
- F02M51/06—Injectors peculiar thereto with means directly operating the valve needle
- F02M51/061—Injectors peculiar thereto with means directly operating the valve needle using electromagnetic operating means
- F02M51/0625—Injectors peculiar thereto with means directly operating the valve needle using electromagnetic operating means characterised by arrangement of mobile armatures
- F02M51/0664—Injectors peculiar thereto with means directly operating the valve needle using electromagnetic operating means characterised by arrangement of mobile armatures having a cylindrically or partly cylindrically shaped armature, e.g. entering the winding; having a plate-shaped or undulated armature entering the winding
- F02M51/0671—Injectors peculiar thereto with means directly operating the valve needle using electromagnetic operating means characterised by arrangement of mobile armatures having a cylindrically or partly cylindrically shaped armature, e.g. entering the winding; having a plate-shaped or undulated armature entering the winding the armature having an elongated valve body attached thereto
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G35/00—Compounds of tantalum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
- F02M—SUPPLYING COMBUSTION ENGINES IN GENERAL WITH COMBUSTIBLE MIXTURES OR CONSTITUENTS THEREOF
- F02M61/00—Fuel-injectors not provided for in groups F02M39/00 - F02M57/00 or F02M67/00
- F02M61/16—Details not provided for in, or of interest apart from, the apparatus of groups F02M61/02 - F02M61/14
- F02M61/168—Assembling; Disassembling; Manufacturing; Adjusting
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
- F02M—SUPPLYING COMBUSTION ENGINES IN GENERAL WITH COMBUSTIBLE MIXTURES OR CONSTITUENTS THEREOF
- F02M61/00—Fuel-injectors not provided for in groups F02M39/00 - F02M57/00 or F02M67/00
- F02M61/16—Details not provided for in, or of interest apart from, the apparatus of groups F02M61/02 - F02M61/14
- F02M61/18—Injection nozzles, e.g. having valve seats; Details of valve member seated ends, not otherwise provided for
- F02M61/1853—Orifice plates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
- H01G9/0525—Powder therefor
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/10—Particle morphology extending in one dimension, e.g. needle-like
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/30—Particle morphology extending in three dimensions
- C01P2004/32—Spheres
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/50—Agglomerated particles
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/11—Powder tap density
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/40—Electric properties
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
- F02B—INTERNAL-COMBUSTION PISTON ENGINES; COMBUSTION ENGINES IN GENERAL
- F02B75/00—Other engines
- F02B75/12—Other methods of operation
- F02B2075/125—Direct injection in the combustion chamber for spark ignition engines, i.e. not in pre-combustion chamber
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Combustion & Propulsion (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Furan Compounds (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.アンモニア溶液とフルオロタンタル酸又はニオブオキシフルオリドを含む フッ化物含有溶液との水性混合物を、一次容器中で、弁金属がタンタル又はニオ ブである水和弁金属五酸化物の沈殿を開始させる温度、pH及び滞留時間で混合 し; 前記混合物を少なくとも1つの別の容器に移して、同一又は異なる温度、pH 及び滞留時間で混合して、水和弁金属五酸化物の沈殿をさらに継続させる工程を 含む、弁金属酸化物化合物の製造方法。 2.前記混合物を少なくとも3つの容器に移して、同一又は異なる温度、pH 及び滞留時間条件で混合して水和弁金属五酸化物の沈殿をさらに継続させる工程 をさらに含む請求項1の方法。 3.付加的アンモニア溶液又はフッ化物含有溶液を、前記二次容器又は前記三 次溶液に、あるいは両方に付加する請求項2記載の方法。 4.少なくとも790 ℃以上の温度で焼成することにより前記水和弁金属五酸化 物を弁金属五酸化物に転化して、五酸化タンタルを提供するか、又は少なくとも 650 ℃以上の温度で五酸化ニオブを提供する請求項3の方法。 5.(a)BET表面積が2m2/g未満、及び圧縮嵩密度が1.8 g/cc以上である か、あるいは(b)BET表面積が2m2/g以上、及び圧縮嵩密度が1.8 g/cc未満 であることを特徴とする五酸化ニオブ粉末。 6.(a)BET表面積が3m2/g未満、及び圧縮嵩密度が3.0 g/cc以上である か、あるいは(b)BET表面積が3m2/g以上、及び圧縮嵩密度が3.0 g/cc未満 であることを特徴とする五酸化タンタル粉末。 7.X線分析下でのライン拡大化d値が6±0.3 、3±0.2 及び 1.8±0.1 で あることを特徴とする弁金属前駆体であって、弁金属がニオブ又はタンタルであ り、前駆体のフッ化物含量が500 ppm 未満である弁金属前駆体。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/542,286 | 1995-10-12 | ||
US08/542,286 US6338832B1 (en) | 1995-10-12 | 1995-10-12 | Process for producing niobium and tantalum compounds |
PCT/US1996/016109 WO1997013724A1 (en) | 1995-10-12 | 1996-10-08 | Niobium and tantalum pentoxide compounds |
Related Child Applications (1)
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JP2007335112A Division JP4843601B2 (ja) | 1995-10-12 | 2007-12-26 | 五酸化ニオブ及びタンタル化合物 |
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JPH11513652A true JPH11513652A (ja) | 1999-11-24 |
JP4105227B2 JP4105227B2 (ja) | 2008-06-25 |
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JP51513097A Expired - Fee Related JP4105227B2 (ja) | 1995-10-12 | 1996-10-08 | 五酸化ニオブ及びタンタル化合物 |
JP2007335112A Expired - Lifetime JP4843601B2 (ja) | 1995-10-12 | 2007-12-26 | 五酸化ニオブ及びタンタル化合物 |
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Country Status (13)
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US (3) | US6338832B1 (ja) |
EP (1) | EP0854841B1 (ja) |
JP (3) | JP4105227B2 (ja) |
KR (1) | KR100442079B1 (ja) |
CN (2) | CN1106347C (ja) |
AT (1) | ATE201661T1 (ja) |
AU (1) | AU714039B2 (ja) |
CA (1) | CA2234672A1 (ja) |
DE (1) | DE69613135T2 (ja) |
HK (1) | HK1017661A1 (ja) |
RU (1) | RU2189359C2 (ja) |
TW (1) | TW425374B (ja) |
WO (1) | WO1997013724A1 (ja) |
Cited By (4)
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JP2001144272A (ja) * | 1999-11-09 | 2001-05-25 | Hyundai Electronics Ind Co Ltd | 半導体素子のキャパシタ製造方法 |
JP2005001920A (ja) * | 2003-06-10 | 2005-01-06 | Mitsui Mining & Smelting Co Ltd | 水酸化タンタル、水酸化ニオブ、酸化タンタル、酸化ニオブ、およびこれらの製造方法 |
JP2007505025A (ja) * | 2003-09-12 | 2007-03-08 | ハー ツェー シュタルク ゲゼルシャフト ミット ベシュレンクテル ハフツング | バルブ金属酸化物粉末及びその製造方法 |
JP2011144110A (ja) * | 1995-10-12 | 2011-07-28 | Cabot Corp | 五酸化ニオブ及びタンタル化合物 |
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-
1995
- 1995-10-12 US US08/542,286 patent/US6338832B1/en not_active Expired - Lifetime
-
1996
- 1996-10-08 CA CA002234672A patent/CA2234672A1/en not_active Abandoned
- 1996-10-08 EP EP96937666A patent/EP0854841B1/en not_active Revoked
- 1996-10-08 DE DE69613135T patent/DE69613135T2/de not_active Revoked
- 1996-10-08 RU RU98108444/12A patent/RU2189359C2/ru not_active IP Right Cessation
- 1996-10-08 AT AT96937666T patent/ATE201661T1/de not_active IP Right Cessation
- 1996-10-08 CN CN96198814A patent/CN1106347C/zh not_active Expired - Fee Related
- 1996-10-08 CN CNB031067700A patent/CN1326779C/zh not_active Expired - Fee Related
- 1996-10-08 AU AU75152/96A patent/AU714039B2/en not_active Ceased
- 1996-10-08 WO PCT/US1996/016109 patent/WO1997013724A1/en active IP Right Grant
- 1996-10-08 KR KR10-1998-0702688A patent/KR100442079B1/ko not_active IP Right Cessation
- 1996-10-08 JP JP51513097A patent/JP4105227B2/ja not_active Expired - Fee Related
- 1996-10-12 TW TW085112461A patent/TW425374B/zh not_active IP Right Cessation
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1999
- 1999-06-22 HK HK99102657A patent/HK1017661A1/xx not_active IP Right Cessation
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2002
- 2002-01-14 US US10/047,440 patent/US6984370B2/en not_active Expired - Fee Related
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- 2005-06-01 US US11/142,066 patent/US7276225B2/en not_active Expired - Fee Related
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- 2007-12-26 JP JP2007335112A patent/JP4843601B2/ja not_active Expired - Lifetime
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011144110A (ja) * | 1995-10-12 | 2011-07-28 | Cabot Corp | 五酸化ニオブ及びタンタル化合物 |
JP2001144272A (ja) * | 1999-11-09 | 2001-05-25 | Hyundai Electronics Ind Co Ltd | 半導体素子のキャパシタ製造方法 |
JP2005001920A (ja) * | 2003-06-10 | 2005-01-06 | Mitsui Mining & Smelting Co Ltd | 水酸化タンタル、水酸化ニオブ、酸化タンタル、酸化ニオブ、およびこれらの製造方法 |
JP2007505025A (ja) * | 2003-09-12 | 2007-03-08 | ハー ツェー シュタルク ゲゼルシャフト ミット ベシュレンクテル ハフツング | バルブ金属酸化物粉末及びその製造方法 |
JP2012126645A (ja) * | 2003-09-12 | 2012-07-05 | Hc Starck Gmbh | バルブ金属酸化物粉末及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO1997013724A1 (en) | 1997-04-17 |
ATE201661T1 (de) | 2001-06-15 |
US6984370B2 (en) | 2006-01-10 |
CN1106347C (zh) | 2003-04-23 |
CN1203567A (zh) | 1998-12-30 |
DE69613135T2 (de) | 2002-03-07 |
US7276225B2 (en) | 2007-10-02 |
CA2234672A1 (en) | 1997-04-17 |
AU714039B2 (en) | 1999-12-16 |
JP2011144110A (ja) | 2011-07-28 |
TW425374B (en) | 2001-03-11 |
JP5250658B2 (ja) | 2013-07-31 |
EP0854841B1 (en) | 2001-05-30 |
CN1442370A (zh) | 2003-09-17 |
JP4105227B2 (ja) | 2008-06-25 |
EP0854841A1 (en) | 1998-07-29 |
US20050232850A1 (en) | 2005-10-20 |
US20030082097A1 (en) | 2003-05-01 |
AU7515296A (en) | 1997-04-30 |
CN1326779C (zh) | 2007-07-18 |
RU2189359C2 (ru) | 2002-09-20 |
KR19990064202A (ko) | 1999-07-26 |
JP2008088055A (ja) | 2008-04-17 |
HK1017661A1 (en) | 1999-11-26 |
US6338832B1 (en) | 2002-01-15 |
JP4843601B2 (ja) | 2011-12-21 |
DE69613135D1 (de) | 2001-07-05 |
KR100442079B1 (ko) | 2004-09-18 |
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