JP6871161B2 - ケイ素含有膜の堆積のための組成物及びそれを使用した方法 - Google Patents

ケイ素含有膜の堆積のための組成物及びそれを使用した方法 Download PDF

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JP6871161B2
JP6871161B2 JP2017522023A JP2017522023A JP6871161B2 JP 6871161 B2 JP6871161 B2 JP 6871161B2 JP 2017522023 A JP2017522023 A JP 2017522023A JP 2017522023 A JP2017522023 A JP 2017522023A JP 6871161 B2 JP6871161 B2 JP 6871161B2
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plasma
silicon
nitrogen
reactor
silicon nitride
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JP2017533589A5 (enExample
JP2017533589A (ja
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レイ シンジエン
レイ シンジエン
ム−ソン キム
ム−ソン キム
アール．マクドナルド マシュー
アール．マクドナルド マシュー
シヤオ マンチャオ
シヤオ マンチャオ
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バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー
バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー
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