JP5674479B2 - 還元プラズマに耐性のイットリウム含有セラミックコーティング - Google Patents
還元プラズマに耐性のイットリウム含有セラミックコーティング Download PDFInfo
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- JP5674479B2 JP5674479B2 JP2010547620A JP2010547620A JP5674479B2 JP 5674479 B2 JP5674479 B2 JP 5674479B2 JP 2010547620 A JP2010547620 A JP 2010547620A JP 2010547620 A JP2010547620 A JP 2010547620A JP 5674479 B2 JP5674479 B2 JP 5674479B2
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- plasma
- yttrium oxide
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- yttrium
- spray
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- 229910052727 yttrium Inorganic materials 0.000 title claims description 20
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 title claims description 20
- 238000005524 ceramic coating Methods 0.000 title claims description 8
- 238000000576 coating method Methods 0.000 claims description 95
- 239000011248 coating agent Substances 0.000 claims description 84
- 239000000758 substrate Substances 0.000 claims description 48
- 239000002245 particle Substances 0.000 claims description 46
- 239000007921 spray Substances 0.000 claims description 35
- 230000003628 erosive effect Effects 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 26
- 238000012545 processing Methods 0.000 claims description 25
- 239000004065 semiconductor Substances 0.000 claims description 23
- 239000006104 solid solution Substances 0.000 claims description 15
- 230000003746 surface roughness Effects 0.000 claims description 14
- 229910010293 ceramic material Inorganic materials 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 230000015556 catabolic process Effects 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 238000005260 corrosion Methods 0.000 claims description 6
- 230000007797 corrosion Effects 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 238000012360 testing method Methods 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 239000007858 starting material Substances 0.000 claims 1
- 210000002381 plasma Anatomy 0.000 description 114
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 95
- 239000000843 powder Substances 0.000 description 43
- 238000005507 spraying Methods 0.000 description 35
- 229910000838 Al alloy Inorganic materials 0.000 description 24
- 238000000034 method Methods 0.000 description 20
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 17
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 17
- 239000010419 fine particle Substances 0.000 description 15
- 238000004519 manufacturing process Methods 0.000 description 11
- 238000001000 micrograph Methods 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 8
- 238000007750 plasma spraying Methods 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 239000000919 ceramic Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000011253 protective coating Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- RUDFQVOCFDJEEF-UHFFFAOYSA-N oxygen(2-);yttrium(3+) Chemical group [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 238000012876 topography Methods 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- 238000009966 trimming Methods 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000006199 nebulizer Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000010587 phase diagram Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- DEXZEPDUSNRVTN-UHFFFAOYSA-K yttrium(3+);trihydroxide Chemical compound [OH-].[OH-].[OH-].[Y+3] DEXZEPDUSNRVTN-UHFFFAOYSA-K 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249967—Inorganic matrix in void-containing component
- Y10T428/24997—Of metal-containing material
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Coating By Spraying Or Casting (AREA)
- Drying Of Semiconductors (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Description
本発明の実施形態は、半導体処理環境における処理表面上の保護コーティングとして有用な、プラズマ又は火炎溶射されたイットリウム含有コーティングに関する。プラズマ又は火炎溶射されたイットリウム含有コーティングは特に還元プラズマにおいて有用であり、処理対象である基板の微粒子による汚染を防止する。
この項では、本発明で開示の実施形態に関連した背景となる主題について説明する。この項で論じる背景技術が先行技術を法的に構成すると表明又は含意する意図はない。
Claims (10)
- 化学的に活性である還元プラズマによるコロージョン又はエロージョンに耐性のある半導体処理部品装置として使用される物品であって、金属又は合金の基体を備え、基体はその表面上に溶射被覆されたイットリウム含有セラミックコーティングを有し、前記セラミックコーティングは、22μm〜0.1μmの平均有効粒径を有する開始材料から形成され、前記粒子は、Y 2 O 3 −ZrO 2 固溶体、Y 2 O 3 −Al 2 O 3 固溶体、Y 2 O 3 −Al 2 O 3 −ZrO 2 固溶体、YAG、YF 3 及びこれらの組み合わせから成る群から選択される少なくとも1つの成分を含み、前記セラミックコーティングの多孔率が1.5%未満であり、前記セラミックコーティングの表面粗さが3μmRa未満であり、水素、酸素、又はフッ素を含む還元プラズマ内でのエロージョン速度が0.08μm/時間未満である物品。
- 前記多孔率が1.5%未満〜0.1%である請求項1記載の物品。
- 前記多孔率が1%〜0.1%である請求項2記載の物品。
- 前記表面粗さが1.5μmRa未満〜0.6μmRaである請求項3記載の物品。
- 前記溶射被覆されたイットリウム含有セラミックコーティング材料の降伏電圧が少なくとも650V/milより高い請求項1記載の物品。
- 前記降伏電圧が650V/milから900V/milである請求項5記載の物品。
- 前記溶射被覆されたイットリウム含有セラミック材料が5μm〜400μmの厚さを有する請求項1又は5記載の物品。
- 前記材料の厚さが25μm〜300μmである請求項7記載の物品。
- 前記溶射被覆されたイットリウム含有セラミック材料が、少なくとも8時間にわたってHClバブルテストを通過する請求項2記載の物品。
- 前記溶射被覆されたイットリウム含有セラミック材料が、少なくとも10時間にわたってHClバブルテストを通過する請求項3記載の物品。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/072,530 US20090214825A1 (en) | 2008-02-26 | 2008-02-26 | Ceramic coating comprising yttrium which is resistant to a reducing plasma |
US12/072,530 | 2008-02-26 | ||
PCT/US2009/000949 WO2009108275A2 (en) | 2008-02-26 | 2009-02-13 | Ceramic coating comprising yttrium which is resistant to a reducing plasma |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2011514933A JP2011514933A (ja) | 2011-05-12 |
JP2011514933A5 JP2011514933A5 (ja) | 2013-01-17 |
JP5674479B2 true JP5674479B2 (ja) | 2015-02-25 |
Family
ID=40998600
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010547620A Active JP5674479B2 (ja) | 2008-02-26 | 2009-02-13 | 還元プラズマに耐性のイットリウム含有セラミックコーティング |
Country Status (7)
Country | Link |
---|---|
US (1) | US20090214825A1 (ja) |
JP (1) | JP5674479B2 (ja) |
KR (1) | KR20100118994A (ja) |
CN (1) | CN102084020B (ja) |
SG (2) | SG187415A1 (ja) |
TW (1) | TWI455820B (ja) |
WO (1) | WO2009108275A2 (ja) |
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WO2009108275A9 (en) | 2011-02-03 |
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TWI455820B (zh) | 2014-10-11 |
TW200946331A (en) | 2009-11-16 |
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R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |