JP2005240171A - 耐食性部材およびその製造方法 - Google Patents
耐食性部材およびその製造方法 Download PDFInfo
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- JP2005240171A JP2005240171A JP2004310859A JP2004310859A JP2005240171A JP 2005240171 A JP2005240171 A JP 2005240171A JP 2004310859 A JP2004310859 A JP 2004310859A JP 2004310859 A JP2004310859 A JP 2004310859A JP 2005240171 A JP2005240171 A JP 2005240171A
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Abstract
【解決手段】セラミックスまたは金属からなる基材の表面に、少なくとも一層の耐食膜を形成してなる耐食性部材であって、前記耐食膜の少なくとも一層が3族元素化合物を主成分とし、Ti、AlまたはSiのいずれか少なくとも1種を酸化物換算で0.001〜3質量%含有してなり、かつその平均結晶粒径が0.5〜10μmである溶射耐食膜を有するものである。
【選択図】図1
Description
2:結晶
3:結晶粒界
5:PVD耐食膜
6:溶射耐食膜
11:イオンプレーティング装置
12:真空容器
13:試料
14:蒸発物質
15:蒸発源
16:フィラメント
17:プラズマ発生用電源
18:蒸発用電源
Claims (12)
- セラミックスまたは金属からなる基材の表面に、少なくとも一層の耐食膜を形成してなる耐食性部材であって、前記耐食膜の少なくとも一層が3族元素化合物を主成分とし、Ti、AlまたはSiのいずれか少なくとも1種を酸化物換算で0.001〜3質量%含有してなり、かつその平均結晶粒径が0.5〜10μmである溶射耐食膜であることを特徴とする耐食性部材。
- 前記溶射耐食膜中のFeをFe2O3換算で10ppm以下、CrをCr2O3換算で10ppm以下としたことを特徴とする請求項1に記載の耐食性部材。
- 前記溶射耐食膜がY2O3を主成分とすることを特徴とする請求項1または2に記載の耐食性部材。
- 前記溶射耐食膜の気孔率が10%以下、厚みが500μm以下、表面粗さ(Ra)が5μm以下であることを特徴とする請求項1〜3のいずれかに記載の耐食性部材。
- セラミックスまたは金属からなる基材の表面に、少なくとも一層の耐食膜を形成してなる耐食性部材であって、前記耐食膜の少なくとも一層が3族元素を主成分とし、X線回折による(222)面帰属ピーク強度をI222、(400)面帰属ピーク強度をI400としたとき、I400/I222が0.5以下であるPVD耐食膜であることを特徴とする耐食性部材。
- 前記PVD耐食膜の平均結晶粒子径を50nm以上、1000nm以下の範囲としたことを特徴とする請求項5に記載の耐食性部材。
- 前記耐食膜が複数層からなり、前記溶射耐食膜と、前記PVD耐食膜とからなることを特徴とする請求項1〜6のいずれかに記載の耐食性部材。
- 前記基材の表面粗さが(Ra)1μm以上であり、基材側に前記溶射耐食膜を形成したことを特徴とする請求項7に記載の耐食性部材。
- 前記基材の表面粗さが(Ra)1μm未満であり、基材側に前記PVD耐食膜を形成したことを特徴とする請求項7に記載の耐食性部材。
- 前記溶射耐食膜として、平均粒径0.5〜10μmの1次原料を予め造粒して平均粒径10〜50μmの溶射材料を得、得られた溶射材料を基材表面に溶射して溶射膜を形成した後、該溶射膜を1000〜1400℃で熱処理することを特徴とする耐食性部材の製造方法。
- 前記PVD耐食膜として、イオンプレーティング法を用いて形成することを特徴とする請求項10に記載の耐食性部材の製造方法。
- 前記イオンプレーティング法の蒸発源として、セラミックス焼結体を用いたことを特徴とする請求項11に記載の耐食性部材の製造方法。
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