JP4582089B2 - 液浸リソグラフィ用の液体噴射回収システム - Google Patents

液浸リソグラフィ用の液体噴射回収システム Download PDF

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Publication number
JP4582089B2
JP4582089B2 JP2006509591A JP2006509591A JP4582089B2 JP 4582089 B2 JP4582089 B2 JP 4582089B2 JP 2006509591 A JP2006509591 A JP 2006509591A JP 2006509591 A JP2006509591 A JP 2006509591A JP 4582089 B2 JP4582089 B2 JP 4582089B2
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Prior art keywords
fluid
workpiece
immersion
nozzles
exposure area
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Expired - Fee Related
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Japanese (ja)
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JP2006523029A5 (https=
JP2006523029A (ja
Inventor
ダブリュー．， トーマス ノヴァック，
アンドリュー， ジェイ． ハゼルトン，
ダグラス， シィ． ワトソン，
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2006509591A 2003-04-11 2004-04-01 液浸リソグラフィ用の液体噴射回収システム Expired - Fee Related JP4582089B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46278603P 2003-04-11 2003-04-11
PCT/US2004/010071 WO2004092830A2 (en) 2003-04-11 2004-04-01 Liquid jet and recovery system for immersion lithography

Publications (3)

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JP2006523029A JP2006523029A (ja) 2006-10-05
JP2006523029A5 JP2006523029A5 (https=) 2007-07-19
JP4582089B2 true JP4582089B2 (ja) 2010-11-17

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US (9) US7443482B2 (https=)
JP (1) JP4582089B2 (https=)
WO (1) WO2004092830A2 (https=)

Families Citing this family (178)

* Cited by examiner, † Cited by third party
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