JP4223348B2 - 磁気記録媒体の製造方法及び製造装置 - Google Patents

磁気記録媒体の製造方法及び製造装置 Download PDF

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Publication number
JP4223348B2
JP4223348B2 JP2003283567A JP2003283567A JP4223348B2 JP 4223348 B2 JP4223348 B2 JP 4223348B2 JP 2003283567 A JP2003283567 A JP 2003283567A JP 2003283567 A JP2003283567 A JP 2003283567A JP 4223348 B2 JP4223348 B2 JP 4223348B2
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Japan
Prior art keywords
layer
mask layer
processing step
continuous recording
mask
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Expired - Fee Related
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JP2003283567A
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Japanese (ja)
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JP2005050468A5 (enExample
JP2005050468A (ja
Inventor
一博 服部
充 高井
秀一 大川
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TDK Corp
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TDK Corp
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Priority to JP2003283567A priority Critical patent/JP4223348B2/ja
Priority to US10/535,265 priority patent/US7470374B2/en
Priority to PCT/JP2004/010710 priority patent/WO2005013264A1/ja
Priority to CNB2004800015656A priority patent/CN100383859C/zh
Publication of JP2005050468A publication Critical patent/JP2005050468A/ja
Publication of JP2005050468A5 publication Critical patent/JP2005050468A5/ja
Application granted granted Critical
Publication of JP4223348B2 publication Critical patent/JP4223348B2/ja
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer

Landscapes

  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Heads (AREA)
JP2003283567A 2003-07-31 2003-07-31 磁気記録媒体の製造方法及び製造装置 Expired - Fee Related JP4223348B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003283567A JP4223348B2 (ja) 2003-07-31 2003-07-31 磁気記録媒体の製造方法及び製造装置
US10/535,265 US7470374B2 (en) 2003-07-31 2004-07-28 Manufacturing method and manufacturing apparatus of magnetic recording medium
PCT/JP2004/010710 WO2005013264A1 (ja) 2003-07-31 2004-07-28 磁気記録媒体の製造方法及び製造装置
CNB2004800015656A CN100383859C (zh) 2003-07-31 2004-07-28 磁记录介质的制造方法及其制造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003283567A JP4223348B2 (ja) 2003-07-31 2003-07-31 磁気記録媒体の製造方法及び製造装置

Publications (3)

Publication Number Publication Date
JP2005050468A JP2005050468A (ja) 2005-02-24
JP2005050468A5 JP2005050468A5 (enExample) 2005-08-25
JP4223348B2 true JP4223348B2 (ja) 2009-02-12

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JP2003283567A Expired - Fee Related JP4223348B2 (ja) 2003-07-31 2003-07-31 磁気記録媒体の製造方法及び製造装置

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Country Link
US (1) US7470374B2 (enExample)
JP (1) JP4223348B2 (enExample)
CN (1) CN100383859C (enExample)
WO (1) WO2005013264A1 (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3816911B2 (ja) 2003-09-30 2006-08-30 株式会社東芝 磁気記録媒体
JP4071787B2 (ja) * 2004-12-13 2008-04-02 Ｔｄｋ株式会社 磁気記録媒体の製造方法
JP4008933B2 (ja) 2005-05-16 2007-11-14 株式会社東芝 磁気記録媒体およびその製造方法ならびに磁気記録装置
JP4528677B2 (ja) * 2005-06-24 2010-08-18 株式会社東芝 パターンド媒体の製造方法及び製造装置
JPWO2007032379A1 (ja) 2005-09-13 2009-03-19 キヤノンアネルバ株式会社 磁気抵抗効果素子の製造方法及び製造装置
JP4626600B2 (ja) * 2006-09-29 2011-02-09 Ｔｄｋ株式会社 磁気記録媒体の製造方法
EP2109678B1 (en) 2007-02-06 2013-01-02 BASF Plant Science GmbH Nematode inducible plant mtn3-like gene promotors and regulatory elements
JP2008282512A (ja) * 2007-05-14 2008-11-20 Toshiba Corp 磁気記録媒体及び磁気記録再生装置
JP4382843B2 (ja) 2007-09-26 2009-12-16 株式会社東芝 磁気記録媒体およびその製造方法
US20100290155A1 (en) * 2007-11-07 2010-11-18 Showa Denko K.K. Method of manufacturing perpendicular magnetic recording medium and magnetic recording and reproducing apparatus
JP2009169993A (ja) 2008-01-10 2009-07-30 Fuji Electric Device Technology Co Ltd パターンドメディア型磁気記録媒体の製造方法
JP4468469B2 (ja) 2008-07-25 2010-05-26 株式会社東芝 磁気記録媒体の製造方法
JP4489132B2 (ja) 2008-08-22 2010-06-23 株式会社東芝 磁気記録媒体の製造方法
JP2010086586A (ja) * 2008-09-30 2010-04-15 Hoya Corp 垂直磁気記録媒体の製造方法
JP4551957B2 (ja) 2008-12-12 2010-09-29 株式会社東芝 磁気記録媒体の製造方法
JP4575498B2 (ja) 2009-02-20 2010-11-04 株式会社東芝 磁気記録媒体の製造方法
JP4575499B2 (ja) 2009-02-20 2010-11-04 株式会社東芝 磁気記録媒体の製造方法
JP4568367B2 (ja) 2009-02-20 2010-10-27 株式会社東芝 磁気記録媒体の製造方法
JP4686623B2 (ja) * 2009-07-17 2011-05-25 株式会社東芝 磁気記録媒体の製造方法
JP2011070753A (ja) * 2009-08-27 2011-04-07 Fuji Electric Device Technology Co Ltd ディスクリートトラックメディア型垂直磁気記録媒体の製造方法
JP2011138572A (ja) * 2009-12-28 2011-07-14 Canon Anelva Corp 磁気記録媒体の製造方法
JP5238780B2 (ja) 2010-09-17 2013-07-17 株式会社東芝 磁気記録媒体とその製造方法及び磁気記録装置
JP5666248B2 (ja) 2010-11-02 2015-02-12 キヤノンアネルバ株式会社 磁気記録媒体の製造装置
JP5651628B2 (ja) * 2012-03-22 2015-01-14 株式会社東芝 磁気記録媒体の製造方法
JP5392375B2 (ja) * 2012-05-07 2014-01-22 富士電機株式会社 記録媒体
US9705077B2 (en) 2015-08-31 2017-07-11 International Business Machines Corporation Spin torque MRAM fabrication using negative tone lithography and ion beam etching
US10164175B2 (en) 2016-03-07 2018-12-25 Samsung Electronics Co., Ltd. Method and system for providing a magnetic junction usable in spin transfer torque applications using multiple stack depositions

Family Cites Families (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5730130A (en) 1980-07-28 1982-02-18 Hitachi Ltd Production of abrasive-dish original disk with groove for video disk stylus
US4632898A (en) 1985-04-15 1986-12-30 Eastman Kodak Company Process for fabricating glass tooling
JP3034879B2 (ja) 1989-07-06 2000-04-17 株式会社日立製作所 磁気ディスクの製造方法
KR960000375B1 (ko) * 1991-01-22 1996-01-05 가부시끼가이샤 도시바 반도체장치의 제조방법
JPH05508266A (ja) * 1991-04-03 1993-11-18 イーストマン・コダック・カンパニー ＧａＡｓをドライエッチングするための高耐久性マスク
JPH0620230A (ja) * 1992-07-03 1994-01-28 Mitsubishi Electric Corp 薄膜磁気ヘッドおよびその製法
JP3312146B2 (ja) * 1993-06-25 2002-08-05 株式会社日立製作所 磁気ヘッドおよびその製造方法
JPH0997419A (ja) 1995-07-24 1997-04-08 Toshiba Corp 磁気ディスク、磁気ディスクの製造方法、及び磁気記録装置
US6014296A (en) * 1995-07-24 2000-01-11 Kabushiki Kaisha Toshiba Magnetic disk, method of manufacturing magnetic disk and magnetic recording apparatus
JP3058062B2 (ja) 1995-10-13 2000-07-04 日本電気株式会社 光ディスク用記録原盤の製造方
US6055139A (en) * 1995-12-14 2000-04-25 Fujitsu Limited Magnetic recording medium and method of forming the same and magnetic disk drive
JP3647961B2 (ja) * 1996-03-05 2005-05-18 富士通株式会社 磁気ヘッド用スライダ及び磁気記録装置
US5789320A (en) * 1996-04-23 1998-08-04 International Business Machines Corporation Plating of noble metal electrodes for DRAM and FRAM
JP3257533B2 (ja) * 1999-01-25 2002-02-18 日本電気株式会社 無機反射防止膜を使った配線形成方法
JP4257808B2 (ja) 1999-05-11 2009-04-22 独立行政法人科学技術振興機構 磁性材料のエッチング方法及びプラズマエッチング装置
JP2001077196A (ja) * 1999-09-08 2001-03-23 Sony Corp 半導体装置の製造方法
JP2001167420A (ja) * 1999-09-27 2001-06-22 Tdk Corp 磁気記録媒体およびその製造方法
JP2001243665A (ja) * 1999-11-26 2001-09-07 Canon Inc 光ディスク基板成型用スタンパおよびその製造方法
JP2001185531A (ja) * 1999-12-15 2001-07-06 Read Rite Corp 多層レジストのエッチング方法と薄膜磁気ヘッドの製造方法
US6949203B2 (en) * 1999-12-28 2005-09-27 Applied Materials, Inc. System level in-situ integrated dielectric etch process particularly useful for copper dual damascene
JP3861197B2 (ja) * 2001-03-22 2006-12-20 株式会社東芝 記録媒体の製造方法
DE10153310A1 (de) * 2001-10-29 2003-05-22 Infineon Technologies Ag Photolithographisches Strukturierungsverfahren mit einer durch ein plasmaunterstützes Abscheideeverfahren hergestellten Kohlenstoff-Hartmaskenschicht diamantartiger Härte
JP3850718B2 (ja) * 2001-11-22 2006-11-29 株式会社東芝 加工方法
US20040016918A1 (en) * 2001-12-18 2004-01-29 Amin Mohammad H. S. System and method for controlling superconducting qubits
US6689622B1 (en) * 2002-04-26 2004-02-10 Micron Technology, Inc. Magnetoresistive memory or sensor devices having improved switching properties and method of fabrication
US20050181604A1 (en) * 2002-07-11 2005-08-18 Hans-Peter Sperlich Method for structuring metal by means of a carbon mask
US6884733B1 (en) * 2002-08-08 2005-04-26 Advanced Micro Devices, Inc. Use of amorphous carbon hard mask for gate patterning to eliminate requirement of poly re-oxidation
US6989332B1 (en) * 2002-08-13 2006-01-24 Advanced Micro Devices, Inc. Ion implantation to modulate amorphous carbon stress
US6875664B1 (en) * 2002-08-29 2005-04-05 Advanced Micro Devices, Inc. Formation of amorphous carbon ARC stack having graded transition between amorphous carbon and ARC material
JP4304947B2 (ja) * 2002-09-26 2009-07-29 株式会社日立製作所 磁気記録媒体とそれを用いた磁気メモリ装置、磁気記録方法、信号再生方法
US6884630B2 (en) * 2002-10-30 2005-04-26 Infineon Technologies Ag Two-step magnetic tunnel junction stack deposition
US7405860B2 (en) * 2002-11-26 2008-07-29 Texas Instruments Incorporated Spatial light modulators with light blocking/absorbing areas
JP2004266008A (ja) * 2003-02-28 2004-09-24 Toshiba Corp 半導体装置の製造方法
JP4076889B2 (ja) * 2003-03-26 2008-04-16 Ｔｄｋ株式会社 磁気記録媒体の製造方法
US20040229470A1 (en) * 2003-05-14 2004-11-18 Applied Materials, Inc. Method for etching an aluminum layer using an amorphous carbon mask
US6939794B2 (en) * 2003-06-17 2005-09-06 Micron Technology, Inc. Boron-doped amorphous carbon film for use as a hard etch mask during the formation of a semiconductor device
US6806096B1 (en) * 2003-06-18 2004-10-19 Infineon Technologies Ag Integration scheme for avoiding plasma damage in MRAM technology
US6984529B2 (en) * 2003-09-10 2006-01-10 Infineon Technologies Ag Fabrication process for a magnetic tunnel junction device
US7050326B2 (en) * 2003-10-07 2006-05-23 Hewlett-Packard Development Company, L.P. Magnetic memory device with current carrying reference layer
JP4322096B2 (ja) * 2003-11-14 2009-08-26 Ｔｄｋ株式会社 レジストパターン形成方法並びに磁気記録媒体及び磁気ヘッドの製造方法
JP4775806B2 (ja) * 2004-02-10 2011-09-21 Ｔｄｋ株式会社 磁気記録媒体の製造方法
JP4111276B2 (ja) * 2004-02-26 2008-07-02 Ｔｄｋ株式会社 磁気記録媒体及び磁気記録再生装置
JP2005276275A (ja) * 2004-03-23 2005-10-06 Tdk Corp 磁気記録媒体
JP3802539B2 (ja) * 2004-04-30 2006-07-26 Ｔｄｋ株式会社 磁気記録媒体の製造方法
JP2006012285A (ja) * 2004-06-25 2006-01-12 Tdk Corp 磁気記録媒体及び磁気記録媒体の製造方法
JP2006012332A (ja) * 2004-06-28 2006-01-12 Tdk Corp ドライエッチング方法、磁気記録媒体の製造方法及び磁気記録媒体
US7910288B2 (en) * 2004-09-01 2011-03-22 Micron Technology, Inc. Mask material conversion
US7806988B2 (en) * 2004-09-28 2010-10-05 Micron Technology, Inc. Method to address carbon incorporation in an interpoly oxide
US7253118B2 (en) * 2005-03-15 2007-08-07 Micron Technology, Inc. Pitch reduced patterns relative to photolithography features

Also Published As

Publication number Publication date
CN1717723A (zh) 2006-01-04
CN100383859C (zh) 2008-04-23
WO2005013264A1 (ja) 2005-02-10
US20060021966A1 (en) 2006-02-02
JP2005050468A (ja) 2005-02-24
US7470374B2 (en) 2008-12-30

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