CN100383859C - 磁记录介质的制造方法及其制造装置 - Google Patents
磁记录介质的制造方法及其制造装置 Download PDFInfo
- Publication number
- CN100383859C CN100383859C CNB2004800015656A CN200480001565A CN100383859C CN 100383859 C CN100383859 C CN 100383859C CN B2004800015656 A CNB2004800015656 A CN B2004800015656A CN 200480001565 A CN200480001565 A CN 200480001565A CN 100383859 C CN100383859 C CN 100383859C
- Authority
- CN
- China
- Prior art keywords
- mask layer
- layer
- recording medium
- magnetic recording
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/855—Coating only part of a support with a magnetic layer
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP283567/2003 | 2003-07-31 | ||
| JP2003283567A JP4223348B2 (ja) | 2003-07-31 | 2003-07-31 | 磁気記録媒体の製造方法及び製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1717723A CN1717723A (zh) | 2006-01-04 |
| CN100383859C true CN100383859C (zh) | 2008-04-23 |
Family
ID=34113810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004800015656A Expired - Fee Related CN100383859C (zh) | 2003-07-31 | 2004-07-28 | 磁记录介质的制造方法及其制造装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7470374B2 (enExample) |
| JP (1) | JP4223348B2 (enExample) |
| CN (1) | CN100383859C (enExample) |
| WO (1) | WO2005013264A1 (enExample) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3816911B2 (ja) | 2003-09-30 | 2006-08-30 | 株式会社東芝 | 磁気記録媒体 |
| JP4071787B2 (ja) * | 2004-12-13 | 2008-04-02 | Tdk株式会社 | 磁気記録媒体の製造方法 |
| JP4008933B2 (ja) | 2005-05-16 | 2007-11-14 | 株式会社東芝 | 磁気記録媒体およびその製造方法ならびに磁気記録装置 |
| JP4528677B2 (ja) * | 2005-06-24 | 2010-08-18 | 株式会社東芝 | パターンド媒体の製造方法及び製造装置 |
| JPWO2007032379A1 (ja) | 2005-09-13 | 2009-03-19 | キヤノンアネルバ株式会社 | 磁気抵抗効果素子の製造方法及び製造装置 |
| JP4626600B2 (ja) * | 2006-09-29 | 2011-02-09 | Tdk株式会社 | 磁気記録媒体の製造方法 |
| EP2109678B1 (en) | 2007-02-06 | 2013-01-02 | BASF Plant Science GmbH | Nematode inducible plant mtn3-like gene promotors and regulatory elements |
| JP2008282512A (ja) * | 2007-05-14 | 2008-11-20 | Toshiba Corp | 磁気記録媒体及び磁気記録再生装置 |
| JP4382843B2 (ja) | 2007-09-26 | 2009-12-16 | 株式会社東芝 | 磁気記録媒体およびその製造方法 |
| US20100290155A1 (en) * | 2007-11-07 | 2010-11-18 | Showa Denko K.K. | Method of manufacturing perpendicular magnetic recording medium and magnetic recording and reproducing apparatus |
| JP2009169993A (ja) | 2008-01-10 | 2009-07-30 | Fuji Electric Device Technology Co Ltd | パターンドメディア型磁気記録媒体の製造方法 |
| JP4468469B2 (ja) | 2008-07-25 | 2010-05-26 | 株式会社東芝 | 磁気記録媒体の製造方法 |
| JP4489132B2 (ja) | 2008-08-22 | 2010-06-23 | 株式会社東芝 | 磁気記録媒体の製造方法 |
| JP2010086586A (ja) * | 2008-09-30 | 2010-04-15 | Hoya Corp | 垂直磁気記録媒体の製造方法 |
| JP4551957B2 (ja) | 2008-12-12 | 2010-09-29 | 株式会社東芝 | 磁気記録媒体の製造方法 |
| JP4575498B2 (ja) | 2009-02-20 | 2010-11-04 | 株式会社東芝 | 磁気記録媒体の製造方法 |
| JP4575499B2 (ja) | 2009-02-20 | 2010-11-04 | 株式会社東芝 | 磁気記録媒体の製造方法 |
| JP4568367B2 (ja) | 2009-02-20 | 2010-10-27 | 株式会社東芝 | 磁気記録媒体の製造方法 |
| JP4686623B2 (ja) * | 2009-07-17 | 2011-05-25 | 株式会社東芝 | 磁気記録媒体の製造方法 |
| JP2011070753A (ja) * | 2009-08-27 | 2011-04-07 | Fuji Electric Device Technology Co Ltd | ディスクリートトラックメディア型垂直磁気記録媒体の製造方法 |
| JP2011138572A (ja) * | 2009-12-28 | 2011-07-14 | Canon Anelva Corp | 磁気記録媒体の製造方法 |
| JP5238780B2 (ja) | 2010-09-17 | 2013-07-17 | 株式会社東芝 | 磁気記録媒体とその製造方法及び磁気記録装置 |
| JP5666248B2 (ja) | 2010-11-02 | 2015-02-12 | キヤノンアネルバ株式会社 | 磁気記録媒体の製造装置 |
| JP5651628B2 (ja) * | 2012-03-22 | 2015-01-14 | 株式会社東芝 | 磁気記録媒体の製造方法 |
| JP5392375B2 (ja) * | 2012-05-07 | 2014-01-22 | 富士電機株式会社 | 記録媒体 |
| US9705077B2 (en) | 2015-08-31 | 2017-07-11 | International Business Machines Corporation | Spin torque MRAM fabrication using negative tone lithography and ion beam etching |
| US10164175B2 (en) | 2016-03-07 | 2018-12-25 | Samsung Electronics Co., Ltd. | Method and system for providing a magnetic junction usable in spin transfer torque applications using multiple stack depositions |
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| US6014296A (en) * | 1995-07-24 | 2000-01-11 | Kabushiki Kaisha Toshiba | Magnetic disk, method of manufacturing magnetic disk and magnetic recording apparatus |
| JP2001167420A (ja) * | 1999-09-27 | 2001-06-22 | Tdk Corp | 磁気記録媒体およびその製造方法 |
| JP2003157520A (ja) * | 2001-11-22 | 2003-05-30 | Toshiba Corp | 加工方法、磁気転写方法及び記録媒体 |
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| JPS5730130A (en) | 1980-07-28 | 1982-02-18 | Hitachi Ltd | Production of abrasive-dish original disk with groove for video disk stylus |
| US4632898A (en) | 1985-04-15 | 1986-12-30 | Eastman Kodak Company | Process for fabricating glass tooling |
| JP3034879B2 (ja) | 1989-07-06 | 2000-04-17 | 株式会社日立製作所 | 磁気ディスクの製造方法 |
| KR960000375B1 (ko) * | 1991-01-22 | 1996-01-05 | 가부시끼가이샤 도시바 | 반도체장치의 제조방법 |
| JPH05508266A (ja) * | 1991-04-03 | 1993-11-18 | イーストマン・コダック・カンパニー | GaAsをドライエッチングするための高耐久性マスク |
| JPH0620230A (ja) * | 1992-07-03 | 1994-01-28 | Mitsubishi Electric Corp | 薄膜磁気ヘッドおよびその製法 |
| JP3312146B2 (ja) * | 1993-06-25 | 2002-08-05 | 株式会社日立製作所 | 磁気ヘッドおよびその製造方法 |
| JPH0997419A (ja) | 1995-07-24 | 1997-04-08 | Toshiba Corp | 磁気ディスク、磁気ディスクの製造方法、及び磁気記録装置 |
| JP3058062B2 (ja) | 1995-10-13 | 2000-07-04 | 日本電気株式会社 | 光ディスク用記録原盤の製造方 |
| US6055139A (en) * | 1995-12-14 | 2000-04-25 | Fujitsu Limited | Magnetic recording medium and method of forming the same and magnetic disk drive |
| JP3647961B2 (ja) * | 1996-03-05 | 2005-05-18 | 富士通株式会社 | 磁気ヘッド用スライダ及び磁気記録装置 |
| US5789320A (en) * | 1996-04-23 | 1998-08-04 | International Business Machines Corporation | Plating of noble metal electrodes for DRAM and FRAM |
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| JP4257808B2 (ja) | 1999-05-11 | 2009-04-22 | 独立行政法人科学技術振興機構 | 磁性材料のエッチング方法及びプラズマエッチング装置 |
| JP2001077196A (ja) * | 1999-09-08 | 2001-03-23 | Sony Corp | 半導体装置の製造方法 |
| JP2001243665A (ja) * | 1999-11-26 | 2001-09-07 | Canon Inc | 光ディスク基板成型用スタンパおよびその製造方法 |
| JP2001185531A (ja) * | 1999-12-15 | 2001-07-06 | Read Rite Corp | 多層レジストのエッチング方法と薄膜磁気ヘッドの製造方法 |
| US6949203B2 (en) * | 1999-12-28 | 2005-09-27 | Applied Materials, Inc. | System level in-situ integrated dielectric etch process particularly useful for copper dual damascene |
| JP3861197B2 (ja) * | 2001-03-22 | 2006-12-20 | 株式会社東芝 | 記録媒体の製造方法 |
| DE10153310A1 (de) * | 2001-10-29 | 2003-05-22 | Infineon Technologies Ag | Photolithographisches Strukturierungsverfahren mit einer durch ein plasmaunterstützes Abscheideeverfahren hergestellten Kohlenstoff-Hartmaskenschicht diamantartiger Härte |
| US20040016918A1 (en) * | 2001-12-18 | 2004-01-29 | Amin Mohammad H. S. | System and method for controlling superconducting qubits |
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| JP4304947B2 (ja) * | 2002-09-26 | 2009-07-29 | 株式会社日立製作所 | 磁気記録媒体とそれを用いた磁気メモリ装置、磁気記録方法、信号再生方法 |
| US6884630B2 (en) * | 2002-10-30 | 2005-04-26 | Infineon Technologies Ag | Two-step magnetic tunnel junction stack deposition |
| US7405860B2 (en) * | 2002-11-26 | 2008-07-29 | Texas Instruments Incorporated | Spatial light modulators with light blocking/absorbing areas |
| JP2004266008A (ja) * | 2003-02-28 | 2004-09-24 | Toshiba Corp | 半導体装置の製造方法 |
| JP4076889B2 (ja) * | 2003-03-26 | 2008-04-16 | Tdk株式会社 | 磁気記録媒体の製造方法 |
| US20040229470A1 (en) * | 2003-05-14 | 2004-11-18 | Applied Materials, Inc. | Method for etching an aluminum layer using an amorphous carbon mask |
| US6939794B2 (en) * | 2003-06-17 | 2005-09-06 | Micron Technology, Inc. | Boron-doped amorphous carbon film for use as a hard etch mask during the formation of a semiconductor device |
| US6806096B1 (en) * | 2003-06-18 | 2004-10-19 | Infineon Technologies Ag | Integration scheme for avoiding plasma damage in MRAM technology |
| US6984529B2 (en) * | 2003-09-10 | 2006-01-10 | Infineon Technologies Ag | Fabrication process for a magnetic tunnel junction device |
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| JP4322096B2 (ja) * | 2003-11-14 | 2009-08-26 | Tdk株式会社 | レジストパターン形成方法並びに磁気記録媒体及び磁気ヘッドの製造方法 |
| JP4775806B2 (ja) * | 2004-02-10 | 2011-09-21 | Tdk株式会社 | 磁気記録媒体の製造方法 |
| JP4111276B2 (ja) * | 2004-02-26 | 2008-07-02 | Tdk株式会社 | 磁気記録媒体及び磁気記録再生装置 |
| JP2005276275A (ja) * | 2004-03-23 | 2005-10-06 | Tdk Corp | 磁気記録媒体 |
| JP3802539B2 (ja) * | 2004-04-30 | 2006-07-26 | Tdk株式会社 | 磁気記録媒体の製造方法 |
| JP2006012285A (ja) * | 2004-06-25 | 2006-01-12 | Tdk Corp | 磁気記録媒体及び磁気記録媒体の製造方法 |
| JP2006012332A (ja) * | 2004-06-28 | 2006-01-12 | Tdk Corp | ドライエッチング方法、磁気記録媒体の製造方法及び磁気記録媒体 |
| US7910288B2 (en) * | 2004-09-01 | 2011-03-22 | Micron Technology, Inc. | Mask material conversion |
| US7806988B2 (en) * | 2004-09-28 | 2010-10-05 | Micron Technology, Inc. | Method to address carbon incorporation in an interpoly oxide |
| US7253118B2 (en) * | 2005-03-15 | 2007-08-07 | Micron Technology, Inc. | Pitch reduced patterns relative to photolithography features |
-
2003
- 2003-07-31 JP JP2003283567A patent/JP4223348B2/ja not_active Expired - Fee Related
-
2004
- 2004-07-28 US US10/535,265 patent/US7470374B2/en not_active Expired - Fee Related
- 2004-07-28 CN CNB2004800015656A patent/CN100383859C/zh not_active Expired - Fee Related
- 2004-07-28 WO PCT/JP2004/010710 patent/WO2005013264A1/ja not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6014296A (en) * | 1995-07-24 | 2000-01-11 | Kabushiki Kaisha Toshiba | Magnetic disk, method of manufacturing magnetic disk and magnetic recording apparatus |
| JP2001167420A (ja) * | 1999-09-27 | 2001-06-22 | Tdk Corp | 磁気記録媒体およびその製造方法 |
| JP2003157520A (ja) * | 2001-11-22 | 2003-05-30 | Toshiba Corp | 加工方法、磁気転写方法及び記録媒体 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4223348B2 (ja) | 2009-02-12 |
| CN1717723A (zh) | 2006-01-04 |
| WO2005013264A1 (ja) | 2005-02-10 |
| US20060021966A1 (en) | 2006-02-02 |
| JP2005050468A (ja) | 2005-02-24 |
| US7470374B2 (en) | 2008-12-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20080423 Termination date: 20120728 |