JP4065932B2 - ハロゲン化アクリレート類およびそれから誘導されるポリマー - Google Patents

ハロゲン化アクリレート類およびそれから誘導されるポリマー Download PDF

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Publication number
JP4065932B2
JP4065932B2 JP50235299A JP50235299A JP4065932B2 JP 4065932 B2 JP4065932 B2 JP 4065932B2 JP 50235299 A JP50235299 A JP 50235299A JP 50235299 A JP50235299 A JP 50235299A JP 4065932 B2 JP4065932 B2 JP 4065932B2
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group
halogenated
groups
aliphatic
acrylate
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Expired - Fee Related
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JP50235299A
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Japanese (ja)
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JP2002514259A5 (enExample
JP2002514259A (ja
Inventor
ジー．アイ． ムーア，ジョージ
ビー． マコーミック，フレッド
チャットラジ，ミタ
エム． クロス，エリサ
ジェイコブ リウ，ジュンカン
アール． ロバーツ，ラルフ
エフ． シュルツ，ジェイ
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3M Co
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3M Co
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Publication of JP2002514259A5 publication Critical patent/JP2002514259A5/ja
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Publication of JP4065932B2 publication Critical patent/JP4065932B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62—Oxygen or sulfur atoms
    • C07D213/63—One oxygen atom
    • C07D213/64—One oxygen atom attached in position 2 or 6
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/455—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation with carboxylic acids or their derivatives
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62—Halogen-containing esters
    • C07C69/65—Halogen-containing esters of unsaturated acids
    • C07C69/653—Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/22—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/38—Esters containing sulfur

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pyridine Compounds (AREA)
JP50235299A 1997-06-10 1997-09-29 ハロゲン化アクリレート類およびそれから誘導されるポリマー Expired - Fee Related JP4065932B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/872,235 1997-06-10
US08/872,235 US6005137A (en) 1997-06-10 1997-06-10 Halogenated acrylates and polymers derived therefrom
PCT/US1997/017437 WO1998056749A1 (en) 1997-06-10 1997-09-29 Halogenated acrylates and polymers derived therefrom

Publications (3)

Publication Number Publication Date
JP2002514259A JP2002514259A (ja) 2002-05-14
JP2002514259A5 JP2002514259A5 (enExample) 2005-06-16
JP4065932B2 true JP4065932B2 (ja) 2008-03-26

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP50235299A Expired - Fee Related JP4065932B2 (ja) 1997-06-10 1997-09-29 ハロゲン化アクリレート類およびそれから誘導されるポリマー

Country Status (8)

Country Link
US (4) US6005137A (enExample)
EP (1) EP1009729B1 (enExample)
JP (1) JP4065932B2 (enExample)
KR (1) KR100597970B1 (enExample)
CN (1) CN1125030C (enExample)
AU (1) AU4739297A (enExample)
DE (1) DE69732310T2 (enExample)
WO (1) WO1998056749A1 (enExample)

Families Citing this family (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6005137A (en) * 1997-06-10 1999-12-21 3M Innovative Properties Company Halogenated acrylates and polymers derived therefrom
US6555288B1 (en) 1999-06-21 2003-04-29 Corning Incorporated Optical devices made from radiation curable fluorinated compositions
US6306563B1 (en) 1999-06-21 2001-10-23 Corning Inc. Optical devices made from radiation curable fluorinated compositions
WO2001096961A2 (en) 2000-06-15 2001-12-20 3M Innovative Properties Company Multipass multiphoton absorption method and apparatus
KR100810547B1 (ko) 2000-06-15 2008-03-18 쓰리엠 이노베이티브 프로퍼티즈 캄파니 캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법
US6852766B1 (en) 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
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US6444830B1 (en) 2000-06-16 2002-09-03 Corning Incorporated Electron acceptors for polymeric thin film waveguide media
US6514434B1 (en) 2000-06-16 2003-02-04 Corning Incorporated Electro-optic chromophore bridge compounds and donor-bridge compounds for polymeric thin film waveguides
US6584266B1 (en) 2000-06-16 2003-06-24 Corning Incorporated Chromophores for polymeric thin films and optical waveguides and devices comprising the same
DE60118576T2 (de) 2000-08-18 2006-11-02 3M Innovative Properties Co., Saint Paul Fluoro(meth)acrylatecopolymer-beschichtungsmassen
CN1237395C (zh) * 2000-12-27 2006-01-18 三井化学株式会社 薄膜和薄膜的制造方法以及薄膜用粘合剂
US6929899B2 (en) 2001-01-25 2005-08-16 E. I. Du Pont De Nemours And Company Fluorinated photopolymer composition and waveguide device
US7078445B2 (en) * 2001-02-01 2006-07-18 E. I. Du Pont De Nemours And Company Photosensitive acrylate composition and waveguide device
US6689844B2 (en) * 2001-05-29 2004-02-10 Rohmax Additives Gmbh Process for synthesis of polymer compositions with reduced halogen content, polymer composition with reduced halogen content as well as use of this composition
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
DE10257711B4 (de) * 2001-12-27 2019-09-26 Merck Patent Gmbh Polymerisierbare monocyclische Verbindungen enthaltende Flüssigkristallmischungen
CA2471810A1 (en) * 2002-02-04 2003-08-14 Ciba Speciality Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
JP4222120B2 (ja) * 2002-10-07 2009-02-12 Ｊｓｒ株式会社 光導波路形成用感光性樹脂組成物および光導波路
CN100381411C (zh) * 2002-11-01 2008-04-16 嘉吉有限公司 制备1,3-丙二醇的方法
JP2004240122A (ja) * 2003-02-05 2004-08-26 Fuji Photo Film Co Ltd プラスチック光ファイバケーブルおよび製造方法
US20060056031A1 (en) * 2004-09-10 2006-03-16 Capaldo Kevin P Brightness enhancement film, and methods of making and using the same
US6833391B1 (en) * 2003-05-27 2004-12-21 General Electric Company Curable (meth)acrylate compositions
TWI254717B (en) * 2003-08-06 2006-05-11 Chung Shan Inst Of Science Method for the preparation of pentafluorophenylacrylate polymer
US7271283B2 (en) * 2003-08-29 2007-09-18 General Electric Company High refractive index, UV-curable monomers and coating compositions prepared therefrom
JP2005140909A (ja) * 2003-11-05 2005-06-02 Omron Corp 光学部品
JP4687651B2 (ja) * 2004-05-26 2011-05-25 Ｊｓｒ株式会社 微細パターン形成用樹脂組成物および微細パターン形成方法
US7341784B2 (en) * 2004-09-10 2008-03-11 General Electric Company Light management film and its preparation and use
WO2006032020A1 (en) * 2004-09-14 2006-03-23 E.I. Dupont De Nemours And Company Optical organic polymer
WO2006032017A1 (en) * 2004-09-14 2006-03-23 E.I. Dupont De Nemours And Company Polymeric optical waveguide
WO2006034011A1 (en) * 2004-09-14 2006-03-30 E.I. Dupont De Nemours And Company Process for preparing an optical organic polymer
US7491441B2 (en) * 2004-12-30 2009-02-17 3M Innovative Properties Company High refractive index, durable hard coats
US7264872B2 (en) * 2004-12-30 2007-09-04 3M Innovative Properties Company Durable high index nanocomposites for AR coatings
US7297810B2 (en) * 2004-12-30 2007-11-20 3M Innovative Properties Company High refractive index monomers for optical applications
US7231127B2 (en) * 2005-01-21 2007-06-12 Lumera Corporation Waveguide devices with low loss clads and tunable refractive indices
US7262230B2 (en) * 2005-01-21 2007-08-28 Lumera Corporation Process of preparing crosslinked, low loss polymers with tunable refractive indices
WO2007129418A1 (en) * 2006-05-05 2007-11-15 Japan Science And Technology Agency Novel copolymer of methacrylic ester, composition, optical element and electric member
US8791254B2 (en) * 2006-05-19 2014-07-29 3M Innovative Properties Company Cyclic hydrofluoroether compounds and processes for their preparation and use
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US7981986B2 (en) * 2008-04-29 2011-07-19 3M Innovative Properties Company Optical films comprising fluorenol (meth)acrylate monomer
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US7957621B2 (en) 2008-12-17 2011-06-07 3M Innovative Properties Company Light extraction film with nanoparticle coatings
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KR101829941B1 (ko) * 2010-07-22 2018-02-19 메르크 파텐트 게엠베하 중합체-안정화 액정 매질 및 디스플레이
US9182662B2 (en) * 2012-02-15 2015-11-10 Rohm And Haas Electronic Materials Llc Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom
WO2016064674A1 (en) * 2014-10-21 2016-04-28 Saint-Gobain Performance Plastics Corporation Support for a flexible oled
CN107250097B (zh) * 2015-02-16 2020-08-07 中央硝子株式会社 含氟α-酮羧酸酯类的实用制造方法
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JP2023109483A (ja) * 2022-01-27 2023-08-08 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、及び、化合物
KR102898751B1 (ko) * 2022-10-21 2025-12-11 주식회사 트리엘 신규한 아크릴계 화합물 및 이를 포함하는 저유전 코팅액 조성물
KR102784676B1 (ko) * 2024-01-17 2025-03-21 주식회사 트리엘 대면적 코팅을 위한 잉크젯용 포토레지스트 조성물 및 이의 제조방법

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE621655A (enExample) * 1961-09-20
US3981928A (en) * 1962-10-30 1976-09-21 Minnesota Mining And Manufacturing Company Perfluorotertiaryalkyl ethers
US3321515A (en) * 1963-04-24 1967-05-23 Du Pont Method of making fluorinated carbonyl compounds
US3723507A (en) * 1965-06-24 1973-03-27 Allied Chem Perfluoro cycloalkyl acrylates
US3520863A (en) * 1965-06-24 1970-07-21 Allied Chem Novel acrylic monomers,polymers and intermediates
US3544535A (en) * 1965-07-26 1970-12-01 Allied Chem Novel carbinol and derivatives thereof
SE371829B (enExample) * 1966-07-11 1974-12-02 Montedison Spa
FR1547223A (fr) * 1966-12-17 1968-11-22 Dynamit Nobel Ag Procédé de préparation d'esters phényliques
US4010212A (en) * 1970-04-13 1977-03-01 Minnesota Mining And Manufacturing Company Perfluorotertiaryalkyl ethers
US3668223A (en) * 1970-08-19 1972-06-06 Merck & Co Inc 2-oxo-3-benzoxepins
JPS5023019B1 (enExample) * 1970-12-14 1975-08-05
US5132455A (en) * 1982-03-31 1992-07-21 Exfluor Research Corporation Method for synthesizing perfluorinated ether compounds via polyesters
DE3678146D1 (de) * 1985-12-25 1991-04-18 Tosoh Corp Halogen enthaltende polyacrylat-derivate.
DE3620050A1 (de) * 1986-06-14 1987-12-17 Hoechst Ag Substituierte (alpha)-fluoracrylsaeurephenylester
US5045397A (en) * 1987-02-13 1991-09-03 Hughes Aircraft Company Optical adhesive system having low refractive index
DE3707923A1 (de) * 1987-03-12 1988-09-22 Hoechst Ag Transparente thermoplastische formmasse
FR2623510B1 (fr) * 1987-11-20 1992-10-23 Ecole Nale Superieure Chimie Polymeres a base d'halo et de methacrylates de pentafluorophenyle et leur application a la realisation de fibres optiques, de photoresists positifs, de verres organiques et de resines pour disques optiques
US5236919A (en) 1989-02-28 1993-08-17 Imperial Chemical Industries Plc Quinoxalinyl derivatives suitable for use in leukotriene mediated disease
JP2854669B2 (ja) * 1990-04-27 1999-02-03 株式会社 日立製作所 光伝送体とそれを用いた光伝送システムおよびエンジンの制御システム
US5136117A (en) 1990-08-23 1992-08-04 Battelle Memorial Institute Monomeric recovery from polymeric materials
US5384374A (en) * 1991-01-11 1995-01-24 Minnesota Mining And Manufacturing Company Curing fluorocarbon elastomers
US5223593A (en) * 1991-08-08 1993-06-29 Minnesota Mining And Manufacturing Company Fluorine containing plastic optical fiber cores
EP0560043B1 (de) * 1992-03-07 1997-06-18 Minnesota Mining And Manufacturing Company Verfahren zum Herstellen von Bauelementen für Lichtwellenleiternetze und nach diesem Verfahren hergestellte Bauelemente
US5420359A (en) * 1992-12-11 1995-05-30 Minnesota Mining And Manufacturing Company Chlorofluoroether compositions and preparation thereof
US5350497A (en) * 1993-05-21 1994-09-27 E. I. Du Pont De Nemours And Company Production of perfluoro(alkyl vinyl ethers)
US5343544A (en) * 1993-07-02 1994-08-30 Minnesota Mining And Manufacturing Company Integrated optical fiber coupler and method of making same
US5466877A (en) * 1994-03-15 1995-11-14 Minnesota Mining And Manufacturing Company Process for converting perfluorinated esters to perfluorinated acyl fluorides and/or ketones
US6005137A (en) * 1997-06-10 1999-12-21 3M Innovative Properties Company Halogenated acrylates and polymers derived therefrom

Also Published As

Publication number Publication date
US6362379B2 (en) 2002-03-26
AU4739297A (en) 1998-12-30
US6005137A (en) 1999-12-21
CN1259932A (zh) 2000-07-12
WO1998056749A1 (en) 1998-12-17
EP1009729B1 (en) 2005-01-19
KR100597970B1 (ko) 2006-07-13
DE69732310T2 (de) 2005-12-22
US6313245B1 (en) 2001-11-06
JP2002514259A (ja) 2002-05-14
CN1125030C (zh) 2003-10-22
EP1009729A1 (en) 2000-06-21
US20010037028A1 (en) 2001-11-01
US6288266B1 (en) 2001-09-11
KR20010013585A (ko) 2001-02-26
DE69732310D1 (de) 2005-02-24

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