JP2002514259A - ハロゲン化アクリレート類およびそれから誘導されるポリマー - Google Patents
ハロゲン化アクリレート類およびそれから誘導されるポリマーInfo
- Publication number
- JP2002514259A JP2002514259A JP50235299A JP50235299A JP2002514259A JP 2002514259 A JP2002514259 A JP 2002514259A JP 50235299 A JP50235299 A JP 50235299A JP 50235299 A JP50235299 A JP 50235299A JP 2002514259 A JP2002514259 A JP 2002514259A
- Authority
- JP
- Japan
- Prior art keywords
- group
- aliphatic
- groups
- acrylate
- halogenated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D213/62—Oxygen or sulfur atoms
- C07D213/63—One oxygen atom
- C07D213/64—One oxygen atom attached in position 2 or 6
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
- C07C45/455—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation with carboxylic acids or their derivatives
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/62—Halogen-containing esters
- C07C69/65—Halogen-containing esters of unsaturated acids
- C07C69/653—Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/22—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/38—Esters containing sulfur
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.一般式 を有するハロゲン化アクリレートであって、 式中、 MはH、CH3、F、Cl、Br、I、またはCF3であり、 Aは、酸素またはイオウであり、 Zは、 (1) (式中、各R1は互いに独立にF、Cl、またはBrである) (2) 式中、各R2は互いに独立に (a)過フッ素化基、過塩素化基、またはペル(クロロフルオロ)基(i)、 (ii)、(iii)、(iv)、または(v)でああり、ここで (i)はC1〜C20脂肪族基であり、 (ii)はC3〜C20脂環式アルキル基であり、 (iii)はC6〜C20アリール基であり、 (iv)はC7〜C20アラルキル基であり、且つ (v)はC7〜C20アルカリル基であり、 (b)F、Cl、Br、I、Q(以下に規定する)、R4COO−、R4O−、 −COOR4、−OSO2R4、または−SO2OR4(式中、R4は、(a)(i)、 (a)(ii)、(a)(iii)、(a)(iv)、および(a)(v)の中の任意の基であ るか、または、n個のR2基(nは環部分の遊離部位の数を表す0〜25の範囲 内の整数である)をさらに含んでもよい過フッ素化、過塩素化、またはペル(ク ロロフルオロ)脂環式または芳香族環部分を、任意の2つの隣接するR2基が一 緒に形成してもよく、式中Qは、 であり、 (式中、R2がCl、F、BrまたはIでない時に限って分子内の全てのR2基 が同じであってもよいという条件で、Aは上記の通りであり、各R3は互いに独 立に (a)過フッ素化、過塩素化、またはペル(クロロフルオロ) (i)C1〜C20脂肪族基、 (ii)C3〜C20脂環式基、 (iii)C6〜C20アリール基、 (iv)C7〜C20アラルキル基、および (v)C7〜C20アルカリル基、 (b)F、Cl、Br、I、Q(上記の通り)、R4COO−、R4O−、−CO OR4、−OSO2R4であってもよく、 または−SO2OR4(式中、R4は、(a)(i)、(a)(ii)、(a)(iii)、( a)(iv)、および(a)(v)の中の任意の基である) であってもよく、または、 n個のR3基(nは環部分の遊離部位の数を表す0〜25の範囲内の整数である )をさらに含んでもよい、過フッ素化、過塩素化、またはペル(クロロフルオロ )脂環式または芳香族環部分を、任意の2つの隣接するR3基が一緒に形成して もよい))、 (3)―C(Rf)2E (式中、両Rf基は、共に過フッ素化、過塩素化、またはペル(クロロフルオ ロ)脂環式環基の一部であるか、またはそれぞれ互いに独立に過フッ素化された 、過塩素化された、またはペル(クロロフルオロ) (a)C1〜C20脂肪族基、 (b)C3〜C20脂環式基、 (c)C6〜C20アリール基、 (d)C7〜C20アラルキル基、または (e)C7〜C20アルカリル基、 (f)C4〜C20ヘテロアリール基、 (g)C4〜C20ヘテロアラルキル基、 (h)C4〜C20ヘテロアルカリル基、 (式中、ヘテロ原子は1つまたは複数のO原子、N原子、およびS原子である )であるが、 但し、少なくとも1つのRf基が1つまたは複数の、(i)少なくとも1つの 直鎖C4〜C20脂肪族またはC4〜C20脂環式基、 (ii)少なくとも1つのエーテル酸素原子、および(iii)少なくとも1つの分 枝C3〜C20脂肪族基であり、 EはRf、 (式中、R1、R2、Rf、およびQは上記の通りである)であり、および (4)−CRf(E)2、 (式中、各Eは、互いに独立に上記の通りであり、且つRfは上記の通りである ) からなる群より選択された、せいぜい150個の炭素原子を有する基である、 ハロゲン化アクリレート。 2.Aが酸素である、請求項1に記載のハロゲン化アクリレート。 3.Mが水素である、請求項1に記載のハロゲン化アクリレート。 4.Zが、(1)―C(Rf)2E(式中、各Rf基は互いに独立に上記の通り であり、Eは上記の通りである) (2) (式中、Qは であり、各R2およびR3は、互いに独立にF、Cl、およびCF3の1つである ) (3) (式中、各R2は前述の通りである)、および (4) (式中、1つのRf基がC4〜C20脂肪族またはC4〜C20脂環式基を含み、第2 のRf基が少なくとも1つのエーテル酸素原子またはC3〜C20分枝脂肪族基を含 み、Eは前述の通りである) からなる群から選択される、請求項1、2または3のいずれか1項に記載のハロ ゲン化アクリレート。 5.オレフィン系結合の重合によって、実施例3に記載のハロゲン化アクリレ ートから誘導された単量体単位を少なくとも1つ含むポリマー。 6.多官能価ハロゲン化アクリレート類により架橋されている、請求項5に記 載のポリマー。 7.前記多官能価ハロゲン化アクリレート類が臭素化芳香族ポリアクリレート 類、アクリル系脂肪族ハロゲン化ポリオールポリアクリレート類、および式 R9 fCR18Rf(OC(O)CH=CH2)q (式中、R9 fは、脂肪族基に不飽和が全くなく、少なくとも1個の炭素原子およ び任意にO原子、N原子、またはS原子を有するアクリル系脂肪族ハロゲン化基 である)を有する多官能価ハロゲン化アクリレートからなる群から選択された、 請求項6に記載のポリマー。 8.ClCF2CFClOR8 fおよびCl2CFCFClOR8からなる群から 選択される、請求項1〜7に記載の化合物のいずれかの生産における中間体を調 製する方法であって、それぞれ、Cl2CHCH2OR8およびCl3CCH2OR8 を直接フッ素化するステップを含む(式中、R8は、C1〜C20アルキル含有基ま たはアシル−含有基であり、R8 fは、任意に5個までのエーテル酸素原子を含む 、対応するペルフルオロアルキル含有基またはペルフルオロアシル含有基である )方法。 9.R8 fが範囲1〜12個の範囲の炭素原子を含み、且つ任意に少なくとも1 つのSO2F基およびCOF基で置換されている、請求項8に記載の方法。 10.前記中間体が構造R5 fCF2COCF3、R5 fOCF2COCF2Cl、ま たはR5 fOCF2COCF2OR5 f、(R5 fは、2〜20の範囲の炭素原子を有す る線状のペルフルオロアルキル基またはペルフルオロオキシアルキル基である) を有する過フッ素化ケトンである、請求項1〜7に記載の化合物のいずれかの生 産における中間体。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/872,235 US6005137A (en) | 1997-06-10 | 1997-06-10 | Halogenated acrylates and polymers derived therefrom |
US08/872,235 | 1997-06-10 | ||
PCT/US1997/017437 WO1998056749A1 (en) | 1997-06-10 | 1997-09-29 | Halogenated acrylates and polymers derived therefrom |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002514259A true JP2002514259A (ja) | 2002-05-14 |
JP2002514259A5 JP2002514259A5 (ja) | 2005-06-16 |
JP4065932B2 JP4065932B2 (ja) | 2008-03-26 |
Family
ID=25359127
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50235299A Expired - Fee Related JP4065932B2 (ja) | 1997-06-10 | 1997-09-29 | ハロゲン化アクリレート類およびそれから誘導されるポリマー |
Country Status (8)
Country | Link |
---|---|
US (4) | US6005137A (ja) |
EP (1) | EP1009729B1 (ja) |
JP (1) | JP4065932B2 (ja) |
KR (1) | KR100597970B1 (ja) |
CN (1) | CN1125030C (ja) |
AU (1) | AU4739297A (ja) |
DE (1) | DE69732310T2 (ja) |
WO (1) | WO1998056749A1 (ja) |
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1997
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- 1997-09-29 DE DE69732310T patent/DE69732310T2/de not_active Expired - Lifetime
- 1997-09-29 JP JP50235299A patent/JP4065932B2/ja not_active Expired - Fee Related
- 1997-09-29 EP EP97909884A patent/EP1009729B1/en not_active Expired - Lifetime
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- 1997-09-29 KR KR1019997011592A patent/KR100597970B1/ko not_active IP Right Cessation
- 1997-09-29 CN CN97182296A patent/CN1125030C/zh not_active Expired - Fee Related
- 1997-09-29 WO PCT/US1997/017437 patent/WO1998056749A1/en active IP Right Grant
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1999
- 1999-08-23 US US09/379,156 patent/US6313245B1/en not_active Expired - Fee Related
- 1999-08-24 US US09/382,300 patent/US6288266B1/en not_active Expired - Fee Related
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Cited By (4)
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JP2009139909A (ja) * | 2007-08-03 | 2009-06-25 | Tokyo Ohka Kogyo Co Ltd | 含フッ素化合物、液浸露光用レジスト組成物およびレジストパターン形成方法 |
JP2012255170A (ja) * | 2007-08-03 | 2012-12-27 | Tokyo Ohka Kogyo Co Ltd | 含フッ素化合物 |
JP2013538249A (ja) * | 2010-07-22 | 2013-10-10 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | ポリマー安定化液晶媒体およびディスプレイ |
WO2023145535A1 (ja) * | 2022-01-27 | 2023-08-03 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、及び、化合物 |
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US6362379B2 (en) | 2002-03-26 |
EP1009729B1 (en) | 2005-01-19 |
KR100597970B1 (ko) | 2006-07-13 |
US20010037028A1 (en) | 2001-11-01 |
CN1259932A (zh) | 2000-07-12 |
CN1125030C (zh) | 2003-10-22 |
EP1009729A1 (en) | 2000-06-21 |
US6288266B1 (en) | 2001-09-11 |
KR20010013585A (ko) | 2001-02-26 |
WO1998056749A1 (en) | 1998-12-17 |
US6313245B1 (en) | 2001-11-06 |
AU4739297A (en) | 1998-12-30 |
US6005137A (en) | 1999-12-21 |
JP4065932B2 (ja) | 2008-03-26 |
DE69732310D1 (de) | 2005-02-24 |
DE69732310T2 (de) | 2005-12-22 |
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