FR2623510B1 - Polymeres a base d'halo et de methacrylates de pentafluorophenyle et leur application a la realisation de fibres optiques, de photoresists positifs, de verres organiques et de resines pour disques optiques - Google Patents
Polymeres a base d'halo et de methacrylates de pentafluorophenyle et leur application a la realisation de fibres optiques, de photoresists positifs, de verres organiques et de resines pour disques optiquesInfo
- Publication number
- FR2623510B1 FR2623510B1 FR8716671A FR8716671A FR2623510B1 FR 2623510 B1 FR2623510 B1 FR 2623510B1 FR 8716671 A FR8716671 A FR 8716671A FR 8716671 A FR8716671 A FR 8716671A FR 2623510 B1 FR2623510 B1 FR 2623510B1
- Authority
- FR
- France
- Prior art keywords
- pentafluorophenyl
- methacrylates
- halo
- resins
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 PENTAFLUOROPHENYL METHACRYLATES Chemical class 0.000 title 1
- 239000011521 glass Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000003287 optical effect Effects 0.000 title 1
- 239000013307 optical fiber Substances 0.000 title 1
- 229920002120 photoresistant polymer Polymers 0.000 title 1
- 229920000642 polymer Polymers 0.000 title 1
- 229920005989 resin Polymers 0.000 title 1
- 239000011347 resin Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/22—Esters containing halogen
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8716671A FR2623510B1 (fr) | 1987-11-20 | 1987-11-20 | Polymeres a base d'halo et de methacrylates de pentafluorophenyle et leur application a la realisation de fibres optiques, de photoresists positifs, de verres organiques et de resines pour disques optiques |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8716671A FR2623510B1 (fr) | 1987-11-20 | 1987-11-20 | Polymeres a base d'halo et de methacrylates de pentafluorophenyle et leur application a la realisation de fibres optiques, de photoresists positifs, de verres organiques et de resines pour disques optiques |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2623510A1 FR2623510A1 (fr) | 1989-05-26 |
FR2623510B1 true FR2623510B1 (fr) | 1992-10-23 |
Family
ID=9357359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8716671A Expired - Lifetime FR2623510B1 (fr) | 1987-11-20 | 1987-11-20 | Polymeres a base d'halo et de methacrylates de pentafluorophenyle et leur application a la realisation de fibres optiques, de photoresists positifs, de verres organiques et de resines pour disques optiques |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2623510B1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11851454B2 (en) | 2021-12-30 | 2023-12-26 | Hongene Biotech Corporation | Compositions and methods for liquid phase oligonucleotide synthesis |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0818712B1 (fr) * | 1989-11-17 | 2007-08-01 | Dai Nippon Printing Co., Ltd. | Médium d'enregistrement d'information électrostatique et procédé pour l'enregistrement et la reproduction d'information électrostatique |
GB9400016D0 (en) * | 1994-01-04 | 1994-03-02 | Minnesota Mining & Mfg | 2-Fluoroacrylate ester polymers and use thereof as optical materials |
US6005137A (en) * | 1997-06-10 | 1999-12-21 | 3M Innovative Properties Company | Halogenated acrylates and polymers derived therefrom |
US6849377B2 (en) | 1998-09-23 | 2005-02-01 | E. I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
US6593058B1 (en) | 1998-09-23 | 2003-07-15 | E. I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
CN107033306A (zh) * | 2017-04-21 | 2017-08-11 | 苏州博纳化学科技有限公司 | 丙烯酸酯‑氟代苯乙烯共聚物的分散剂及其制备方法 |
US11725073B2 (en) | 2020-12-29 | 2023-08-15 | Hongene Biotech Corporation | Compositions and methods for liquid phase oligonucleotide synthesis |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0230656B1 (fr) * | 1985-12-25 | 1991-03-13 | Tosoh Corporation | Dérivés de polyacrylates contenant de l'halogène |
-
1987
- 1987-11-20 FR FR8716671A patent/FR2623510B1/fr not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11851454B2 (en) | 2021-12-30 | 2023-12-26 | Hongene Biotech Corporation | Compositions and methods for liquid phase oligonucleotide synthesis |
Also Published As
Publication number | Publication date |
---|---|
FR2623510A1 (fr) | 1989-05-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TP | Transmission of property | ||
ST | Notification of lapse |