AU2001266918A1 - Multidirectional photoreactive absorption method - Google Patents

Multidirectional photoreactive absorption method

Info

Publication number
AU2001266918A1
AU2001266918A1 AU2001266918A AU6691801A AU2001266918A1 AU 2001266918 A1 AU2001266918 A1 AU 2001266918A1 AU 2001266918 A AU2001266918 A AU 2001266918A AU 6691801 A AU6691801 A AU 6691801A AU 2001266918 A1 AU2001266918 A1 AU 2001266918A1
Authority
AU
Australia
Prior art keywords
multidirectional
absorption method
photoreactive
photoreactive absorption
multidirectional photoreactive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001266918A
Inventor
Todd A. Ballen
Robert J. De Voe
Patrick R. Fleming
Catherine A. Leatherdale
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of AU2001266918A1 publication Critical patent/AU2001266918A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00Apparatus for additive manufacturing; Details thereof or accessories therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lasers (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AU2001266918A 2000-06-15 2001-06-14 Multidirectional photoreactive absorption method Abandoned AU2001266918A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21170800P 2000-06-15 2000-06-15
US60211708 2000-06-15
PCT/US2001/019124 WO2001096959A2 (en) 2000-06-15 2001-06-14 Multidirectional photoreactive absorption method

Publications (1)

Publication Number Publication Date
AU2001266918A1 true AU2001266918A1 (en) 2001-12-24

Family

ID=22788030

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001266918A Abandoned AU2001266918A1 (en) 2000-06-15 2001-06-14 Multidirectional photoreactive absorption method

Country Status (6)

Country Link
US (1) US7790353B2 (en)
EP (1) EP1292861B1 (en)
JP (1) JP2004503928A (en)
KR (1) KR100811017B1 (en)
AU (1) AU2001266918A1 (en)
WO (1) WO2001096959A2 (en)

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WO2001096959A3 (en) 2002-05-02
EP1292861A2 (en) 2003-03-19
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JP2004503928A (en) 2004-02-05
WO2001096959A2 (en) 2001-12-20

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