JP2002514259A5 - - Google Patents

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Publication number
JP2002514259A5
JP2002514259A5 JP1999502352A JP50235299A JP2002514259A5 JP 2002514259 A5 JP2002514259 A5 JP 2002514259A5 JP 1999502352 A JP1999502352 A JP 1999502352A JP 50235299 A JP50235299 A JP 50235299A JP 2002514259 A5 JP2002514259 A5 JP 2002514259A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP1999502352A
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English (en)
Japanese (ja)
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JP2002514259A (ja
JP4065932B2 (ja
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Publication date
Priority claimed from US08/872,235 external-priority patent/US6005137A/en
Application filed filed Critical
Publication of JP2002514259A publication Critical patent/JP2002514259A/ja
Publication of JP2002514259A5 publication Critical patent/JP2002514259A5/ja
Application granted granted Critical
Publication of JP4065932B2 publication Critical patent/JP4065932B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP50235299A 1997-06-10 1997-09-29 ハロゲン化アクリレート類およびそれから誘導されるポリマー Expired - Fee Related JP4065932B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/872,235 1997-06-10
US08/872,235 US6005137A (en) 1997-06-10 1997-06-10 Halogenated acrylates and polymers derived therefrom
PCT/US1997/017437 WO1998056749A1 (en) 1997-06-10 1997-09-29 Halogenated acrylates and polymers derived therefrom

Publications (3)

Publication Number Publication Date
JP2002514259A JP2002514259A (ja) 2002-05-14
JP2002514259A5 true JP2002514259A5 (enExample) 2005-06-16
JP4065932B2 JP4065932B2 (ja) 2008-03-26

Family

ID=25359127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50235299A Expired - Fee Related JP4065932B2 (ja) 1997-06-10 1997-09-29 ハロゲン化アクリレート類およびそれから誘導されるポリマー

Country Status (8)

Country Link
US (4) US6005137A (enExample)
EP (1) EP1009729B1 (enExample)
JP (1) JP4065932B2 (enExample)
KR (1) KR100597970B1 (enExample)
CN (1) CN1125030C (enExample)
AU (1) AU4739297A (enExample)
DE (1) DE69732310T2 (enExample)
WO (1) WO1998056749A1 (enExample)

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US7341784B2 (en) * 2004-09-10 2008-03-11 General Electric Company Light management film and its preparation and use
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US7264872B2 (en) * 2004-12-30 2007-09-04 3M Innovative Properties Company Durable high index nanocomposites for AR coatings
US7491441B2 (en) * 2004-12-30 2009-02-17 3M Innovative Properties Company High refractive index, durable hard coats
US7297810B2 (en) * 2004-12-30 2007-11-20 3M Innovative Properties Company High refractive index monomers for optical applications
US7262230B2 (en) * 2005-01-21 2007-08-28 Lumera Corporation Process of preparing crosslinked, low loss polymers with tunable refractive indices
US7231127B2 (en) * 2005-01-21 2007-06-12 Lumera Corporation Waveguide devices with low loss clads and tunable refractive indices
US8435610B2 (en) * 2006-05-05 2013-05-07 Japan Science And Technology Agency Copolymer of (meth)acrylic ester, composition, optical element and electric member
US8791254B2 (en) * 2006-05-19 2014-07-29 3M Innovative Properties Company Cyclic hydrofluoroether compounds and processes for their preparation and use
US8193397B2 (en) * 2006-12-06 2012-06-05 3M Innovative Properties Company Hydrofluoroether compounds and processes for their preparation and use
US20080145545A1 (en) * 2006-12-15 2008-06-19 Bret Ja Chisholm Metal oxide and sulfur-containing coating compositions, methods of use, and articles prepared therefrom
US8179034B2 (en) 2007-07-13 2012-05-15 3M Innovative Properties Company Light extraction film for organic light emitting diode display and lighting devices
US20090015142A1 (en) 2007-07-13 2009-01-15 3M Innovative Properties Company Light extraction film for organic light emitting diode display devices
KR101004984B1 (ko) * 2007-08-03 2011-01-04 도오꾜오까고오교 가부시끼가이샤 불소 함유 화합물, 액침 노광용 레지스트 조성물 및레지스트 패턴 형성 방법
JP5150327B2 (ja) * 2007-08-03 2013-02-20 東京応化工業株式会社 液浸露光用レジスト組成物およびレジストパターン形成方法
JP2009098658A (ja) * 2007-09-25 2009-05-07 Fujifilm Corp 光学フィルム、偏光板、及び画像表示装置
JP5303142B2 (ja) * 2007-11-30 2013-10-02 東京応化工業株式会社 含フッ素化合物、含フッ素高分子化合物、液浸露光用レジスト組成物およびレジストパターン形成方法
US7981986B2 (en) * 2008-04-29 2011-07-19 3M Innovative Properties Company Optical films comprising fluorenol (meth)acrylate monomer
US20090275720A1 (en) * 2008-04-30 2009-11-05 3M Innovative Properties Company Ortho-benzylphenol mono(meth)acrylate monomers suitable for microstructured optical films
US7957621B2 (en) 2008-12-17 2011-06-07 3M Innovative Properties Company Light extraction film with nanoparticle coatings
TWI503334B (zh) * 2009-02-19 2015-10-11 Jsr Corp 聚合物及敏輻射線性組成物、及單體
WO2012022388A1 (de) * 2010-07-22 2012-02-23 Merck Patent Gmbh Polymerstabilisierte flüssigkristallmedien und anzeigen
US9182662B2 (en) * 2012-02-15 2015-11-10 Rohm And Haas Electronic Materials Llc Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom
WO2016064674A1 (en) * 2014-10-21 2016-04-28 Saint-Gobain Performance Plastics Corporation Support for a flexible oled
CN107250097B (zh) * 2015-02-16 2020-08-07 中央硝子株式会社 含氟α-酮羧酸酯类的实用制造方法
SG11201810474SA (en) 2016-05-27 2018-12-28 3M Innovative Properties Co Oled display with improved color uniformity
JP7040864B2 (ja) 2016-10-28 2022-03-23 スリーエム イノベイティブ プロパティズ カンパニー ナノ構造化物品
KR101965194B1 (ko) * 2017-07-12 2019-04-03 이화여자대학교 산학협력단 불소계 모노머 및 올리고머 화합물, 광중합형 조성물, 및 이들을 이용한 소수성 필름
JP7438128B2 (ja) 2018-04-18 2024-02-26 スリーエム イノベイティブ プロパティズ カンパニー 色補正構成要素を有する有機発光ダイオードディスプレイ及びその作製方法
CN109534968B (zh) * 2018-11-15 2022-07-08 广东广山新材料股份有限公司 一种不饱和氟碳化合物及其制备方法和应用
JP7526742B2 (ja) 2019-04-18 2024-08-01 スリーエム イノベイティブ プロパティズ カンパニー 色補正構成要素を有する有機発光ダイオードディスプレイ
US12161013B2 (en) 2019-09-18 2024-12-03 3M Innovative Properties Company Articles including nanostructured surfaces and enclosed voids, and methods of making same
US12464939B2 (en) 2020-08-28 2025-11-04 3M Innovative Properties Company Articles including nanostructured surfaces and enclosed voids, methods of making same, and optical elements
JP2023109483A (ja) * 2022-01-27 2023-08-08 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、及び、化合物
KR102898751B1 (ko) * 2022-10-21 2025-12-11 주식회사 트리엘 신규한 아크릴계 화합물 및 이를 포함하는 저유전 코팅액 조성물
KR102784676B1 (ko) * 2024-01-17 2025-03-21 주식회사 트리엘 대면적 코팅을 위한 잉크젯용 포토레지스트 조성물 및 이의 제조방법

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