|
DE224448C
(https=)
|
|
|
|
|
|
DE221563C
(https=)
|
|
|
|
|
|
GB1242527A
(en)
*
|
1967-10-20 |
1971-08-11 |
Kodak Ltd |
Optical instruments
|
|
JPS5919912Y2
(ja)
|
1978-08-21 |
1984-06-08 |
清水建設株式会社 |
複合熱交換器
|
|
US4346164A
(en)
*
|
1980-10-06 |
1982-08-24 |
Werner Tabarelli |
Photolithographic method for the manufacture of integrated circuits
|
|
US4509852A
(en)
*
|
1980-10-06 |
1985-04-09 |
Werner Tabarelli |
Apparatus for the photolithographic manufacture of integrated circuit elements
|
|
JPS57153433A
(en)
*
|
1981-03-18 |
1982-09-22 |
Hitachi Ltd |
Manufacturing device for semiconductor
|
|
JPS58202448A
(ja)
|
1982-05-21 |
1983-11-25 |
Hitachi Ltd |
露光装置
|
|
JPS5919912A
(ja)
*
|
1982-07-26 |
1984-02-01 |
Hitachi Ltd |
液浸距離保持装置
|
|
DD221563A1
(de)
*
|
1983-09-14 |
1985-04-24 |
Mikroelektronik Zt Forsch Tech |
Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur
|
|
DD224448A1
(de)
|
1984-03-01 |
1985-07-03 |
Zeiss Jena Veb Carl |
Einrichtung zur fotolithografischen strukturuebertragung
|
|
FI73950C
(fi)
|
1985-02-15 |
1987-12-10 |
Hackman Ab Oy |
Foerfarande och anordning vid pumpning och volymmaetning av livsmedelsvaetskor.
|
|
JPS6265326A
(ja)
|
1985-09-18 |
1987-03-24 |
Hitachi Ltd |
露光装置
|
|
JPS6265326U
(https=)
|
1985-10-16 |
1987-04-23 |
|
|
|
JPS63157419A
(ja)
|
1986-12-22 |
1988-06-30 |
Toshiba Corp |
微細パタ−ン転写装置
|
|
JPS63157419U
(https=)
|
1987-03-31 |
1988-10-14 |
|
|
|
JPH04305917A
(ja)
|
1991-04-02 |
1992-10-28 |
Nikon Corp |
密着型露光装置
|
|
JPH04305915A
(ja)
|
1991-04-02 |
1992-10-28 |
Nikon Corp |
密着型露光装置
|
|
JPH0562877A
(ja)
|
1991-09-02 |
1993-03-12 |
Yasuko Shinohara |
光によるlsi製造縮小投影露光装置の光学系
|
|
JPH06124873A
(ja)
*
|
1992-10-09 |
1994-05-06 |
Canon Inc |
液浸式投影露光装置
|
|
JP2753930B2
(ja)
*
|
1992-11-27 |
1998-05-20 |
キヤノン株式会社 |
液浸式投影露光装置
|
|
US5312552A
(en)
|
1993-02-02 |
1994-05-17 |
Norman J M |
Method and apparatus for removing BTX-type gases from a liquid
|
|
JPH07220990A
(ja)
|
1994-01-28 |
1995-08-18 |
Hitachi Ltd |
パターン形成方法及びその露光装置
|
|
US5874820A
(en)
|
1995-04-04 |
1999-02-23 |
Nikon Corporation |
Window frame-guided stage mechanism
|
|
US5528118A
(en)
|
1994-04-01 |
1996-06-18 |
Nikon Precision, Inc. |
Guideless stage with isolated reaction stage
|
|
JPH08905A
(ja)
*
|
1994-06-20 |
1996-01-09 |
Fujitsu Ltd |
脱泡機能を有する洗浄装置及び洗浄方法
|
|
US5623853A
(en)
|
1994-10-19 |
1997-04-29 |
Nikon Precision Inc. |
Precision motion stage with single guide beam and follower stage
|
|
JPH08316124A
(ja)
*
|
1995-05-19 |
1996-11-29 |
Hitachi Ltd |
投影露光方法及び露光装置
|
|
JPH08316125A
(ja)
|
1995-05-19 |
1996-11-29 |
Hitachi Ltd |
投影露光方法及び露光装置
|
|
US5825043A
(en)
*
|
1996-10-07 |
1998-10-20 |
Nikon Precision Inc. |
Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
|
|
JP4029183B2
(ja)
|
1996-11-28 |
2008-01-09 |
株式会社ニコン |
投影露光装置及び投影露光方法
|
|
JP4029182B2
(ja)
|
1996-11-28 |
2008-01-09 |
株式会社ニコン |
露光方法
|
|
EP1944654A3
(en)
|
1996-11-28 |
2010-06-02 |
Nikon Corporation |
An exposure apparatus and an exposure method
|
|
WO1998028665A1
(en)
|
1996-12-24 |
1998-07-02 |
Koninklijke Philips Electronics N.V. |
Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
|
|
JPH10255319A
(ja)
*
|
1997-03-12 |
1998-09-25 |
Hitachi Maxell Ltd |
原盤露光装置及び方法
|
|
JP3747566B2
(ja)
*
|
1997-04-23 |
2006-02-22 |
株式会社ニコン |
液浸型露光装置
|
|
JPH10314503A
(ja)
*
|
1997-05-15 |
1998-12-02 |
Sony Corp |
流体の脱気装置
|
|
JP3817836B2
(ja)
*
|
1997-06-10 |
2006-09-06 |
株式会社ニコン |
露光装置及びその製造方法並びに露光方法及びデバイス製造方法
|
|
US5938922A
(en)
*
|
1997-08-19 |
1999-08-17 |
Celgard Llc |
Contactor for degassing liquids
|
|
JPH11176727A
(ja)
|
1997-12-11 |
1999-07-02 |
Nikon Corp |
投影露光装置
|
|
US6208407B1
(en)
|
1997-12-22 |
2001-03-27 |
Asm Lithography B.V. |
Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
|
|
US6400411B1
(en)
*
|
1998-01-13 |
2002-06-04 |
Avid Technology, Inc. |
System and process for maintaining consistent video levels when digitizing video signals using different video capture devices
|
|
WO1999049504A1
(fr)
|
1998-03-26 |
1999-09-30 |
Nikon Corporation |
Procede et systeme d'exposition par projection
|
|
JP2000058436A
(ja)
|
1998-08-11 |
2000-02-25 |
Nikon Corp |
投影露光装置及び露光方法
|
|
US6612619B2
(en)
*
|
1999-01-05 |
2003-09-02 |
Martin H. Wieder |
Quick coupler retention clip and method
|
|
AU5653699A
(en)
|
1999-09-20 |
2001-04-24 |
Nikon Corporation |
Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices
|
|
JP2001179252A
(ja)
*
|
1999-12-22 |
2001-07-03 |
Japan Organo Co Ltd |
酸化性物質低減純水製造方法及び装置
|
|
JP3548976B2
(ja)
*
|
1999-12-28 |
2004-08-04 |
柏田 昌男 |
減圧化状態を利用した半導体ウェハーのエッチング処理方法およびその装置
|
|
US6995930B2
(en)
*
|
1999-12-29 |
2006-02-07 |
Carl Zeiss Smt Ag |
Catadioptric projection objective with geometric beam splitting
|
|
US7187503B2
(en)
*
|
1999-12-29 |
2007-03-06 |
Carl Zeiss Smt Ag |
Refractive projection objective for immersion lithography
|
|
JP4504537B2
(ja)
*
|
2000-08-29 |
2010-07-14 |
芝浦メカトロニクス株式会社 |
スピン処理装置
|
|
KR100866818B1
(ko)
*
|
2000-12-11 |
2008-11-04 |
가부시키가이샤 니콘 |
투영광학계 및 이 투영광학계를 구비한 노광장치
|
|
WO2002091078A1
(en)
|
2001-05-07 |
2002-11-14 |
Massachusetts Institute Of Technology |
Methods and apparatus employing an index matching medium
|
|
EP1276016B1
(en)
|
2001-07-09 |
2009-06-10 |
Canon Kabushiki Kaisha |
Exposure apparatus
|
|
JP2003086486A
(ja)
*
|
2001-09-11 |
2003-03-20 |
Canon Inc |
露光装置
|
|
US6700688B2
(en)
*
|
2001-08-24 |
2004-03-02 |
Megasense, Inc. |
Rolling mirror apparatus and method of use
|
|
JP3956671B2
(ja)
*
|
2001-11-02 |
2007-08-08 |
栗田工業株式会社 |
半導体製品製造工程用純水製造装置
|
|
DE10210899A1
(de)
|
2002-03-08 |
2003-09-18 |
Zeiss Carl Smt Ag |
Refraktives Projektionsobjektiv für Immersions-Lithographie
|
|
US7092069B2
(en)
*
|
2002-03-08 |
2006-08-15 |
Carl Zeiss Smt Ag |
Projection exposure method and projection exposure system
|
|
DE10229818A1
(de)
*
|
2002-06-28 |
2004-01-15 |
Carl Zeiss Smt Ag |
Verfahren zur Fokusdetektion und Abbildungssystem mit Fokusdetektionssystem
|
|
KR20050035890A
(ko)
|
2002-08-23 |
2005-04-19 |
가부시키가이샤 니콘 |
투영 광학계, 포토리소그래피 방법, 노광 장치 및 그 이용방법
|
|
US6954993B1
(en)
*
|
2002-09-30 |
2005-10-18 |
Lam Research Corporation |
Concentric proximity processing head
|
|
US7383843B2
(en)
*
|
2002-09-30 |
2008-06-10 |
Lam Research Corporation |
Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer
|
|
US7367345B1
(en)
|
2002-09-30 |
2008-05-06 |
Lam Research Corporation |
Apparatus and method for providing a confined liquid for immersion lithography
|
|
US6988326B2
(en)
*
|
2002-09-30 |
2006-01-24 |
Lam Research Corporation |
Phobic barrier meniscus separation and containment
|
|
US7093375B2
(en)
*
|
2002-09-30 |
2006-08-22 |
Lam Research Corporation |
Apparatus and method for utilizing a meniscus in substrate processing
|
|
US6788477B2
(en)
*
|
2002-10-22 |
2004-09-07 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Apparatus for method for immersion lithography
|
|
US7110081B2
(en)
*
|
2002-11-12 |
2006-09-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
SG121819A1
(en)
*
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
CN101470360B
(zh)
*
|
2002-11-12 |
2013-07-24 |
Asml荷兰有限公司 |
光刻装置和器件制造方法
|
|
DE60335595D1
(de)
*
|
2002-11-12 |
2011-02-17 |
Asml Netherlands Bv |
Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
|
|
SG135052A1
(en)
*
|
2002-11-12 |
2007-09-28 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
SG121822A1
(en)
*
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
SG131766A1
(en)
*
|
2002-11-18 |
2007-05-28 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
DE10253679A1
(de)
*
|
2002-11-18 |
2004-06-03 |
Infineon Technologies Ag |
Optische Einrichtung zur Verwendung bei einem Lithographie-Verfahren, insbesondere zur Herstellung eines Halbleiter-Bauelements, sowie optisches Lithographieverfahren
|
|
DE10258718A1
(de)
*
|
2002-12-09 |
2004-06-24 |
Carl Zeiss Smt Ag |
Projektionsobjektiv, insbesondere für die Mikrolithographie, sowie Verfahren zur Abstimmung eines Projektionsobjektives
|
|
US7948604B2
(en)
|
2002-12-10 |
2011-05-24 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
|
JP4529433B2
(ja)
*
|
2002-12-10 |
2010-08-25 |
株式会社ニコン |
露光装置及び露光方法、デバイス製造方法
|
|
US6992750B2
(en)
*
|
2002-12-10 |
2006-01-31 |
Canon Kabushiki Kaisha |
Exposure apparatus and method
|
|
KR101101737B1
(ko)
|
2002-12-10 |
2012-01-05 |
가부시키가이샤 니콘 |
노광장치 및 노광방법, 디바이스 제조방법
|
|
JP4608876B2
(ja)
*
|
2002-12-10 |
2011-01-12 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
SG157962A1
(en)
*
|
2002-12-10 |
2010-01-29 |
Nikon Corp |
Exposure apparatus and method for producing device
|
|
KR20050085236A
(ko)
*
|
2002-12-10 |
2005-08-29 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
CN100370533C
(zh)
|
2002-12-13 |
2008-02-20 |
皇家飞利浦电子股份有限公司 |
用于照射层的方法和用于将辐射导向层的装置
|
|
EP1584089B1
(en)
|
2002-12-19 |
2006-08-02 |
Koninklijke Philips Electronics N.V. |
Method and device for irradiating spots on a layer
|
|
US7010958B2
(en)
*
|
2002-12-19 |
2006-03-14 |
Asml Holding N.V. |
High-resolution gas gauge proximity sensor
|
|
ATE365962T1
(de)
|
2002-12-19 |
2007-07-15 |
Koninkl Philips Electronics Nv |
Verfahren und anordnung zum bestrahlen einer schicht mittels eines lichtpunkts
|
|
US6781670B2
(en)
*
|
2002-12-30 |
2004-08-24 |
Intel Corporation |
Immersion lithography
|
|
US7090964B2
(en)
|
2003-02-21 |
2006-08-15 |
Asml Holding N.V. |
Lithographic printing with polarized light
|
|
KR101643112B1
(ko)
*
|
2003-02-26 |
2016-07-26 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
US6943941B2
(en)
*
|
2003-02-27 |
2005-09-13 |
Asml Netherlands B.V. |
Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
|
|
US7206059B2
(en)
*
|
2003-02-27 |
2007-04-17 |
Asml Netherlands B.V. |
Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
|
|
US7029832B2
(en)
|
2003-03-11 |
2006-04-18 |
Samsung Electronics Co., Ltd. |
Immersion lithography methods using carbon dioxide
|
|
US20050164522A1
(en)
|
2003-03-24 |
2005-07-28 |
Kunz Roderick R. |
Optical fluids, and systems and methods of making and using the same
|
|
JP4347105B2
(ja)
*
|
2003-04-03 |
2009-10-21 |
富士フイルム株式会社 |
画像処理方法および装置並びにデータベース並びにプログラム
|
|
JP4902201B2
(ja)
*
|
2003-04-07 |
2012-03-21 |
株式会社ニコン |
露光装置、露光方法及びデバイス製造方法
|
|
KR20110104084A
(ko)
|
2003-04-09 |
2011-09-21 |
가부시키가이샤 니콘 |
액침 리소그래피 유체 제어 시스템
|
|
KR101431938B1
(ko)
|
2003-04-10 |
2014-08-19 |
가부시키가이샤 니콘 |
액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
|
|
EP3352010A1
(en)
|
2003-04-10 |
2018-07-25 |
Nikon Corporation |
Run-off path to collect liquid for an immersion lithography apparatus
|
|
SG141426A1
(en)
*
|
2003-04-10 |
2008-04-28 |
Nikon Corp |
Environmental system including vacuum scavange for an immersion lithography apparatus
|
|
JP4656057B2
(ja)
|
2003-04-10 |
2011-03-23 |
株式会社ニコン |
液浸リソグラフィ装置用電気浸透素子
|
|
KR101289959B1
(ko)
|
2003-04-11 |
2013-07-26 |
가부시키가이샤 니콘 |
액침 리소그래피에 의한 광학기기의 세정방법
|
|
JP4582089B2
(ja)
|
2003-04-11 |
2010-11-17 |
株式会社ニコン |
液浸リソグラフィ用の液体噴射回収システム
|
|
SG139733A1
(en)
|
2003-04-11 |
2008-02-29 |
Nikon Corp |
Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
|
|
KR20050122269A
(ko)
|
2003-04-17 |
2005-12-28 |
가부시키가이샤 니콘 |
액침 리소그래피를 이용하기 위한 오토포커스 소자의광학적 배열
|
|
JP4146755B2
(ja)
*
|
2003-05-09 |
2008-09-10 |
松下電器産業株式会社 |
パターン形成方法
|
|
JP4025683B2
(ja)
*
|
2003-05-09 |
2007-12-26 |
松下電器産業株式会社 |
パターン形成方法及び露光装置
|
|
TWI295414B
(en)
*
|
2003-05-13 |
2008-04-01 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
US6995833B2
(en)
*
|
2003-05-23 |
2006-02-07 |
Canon Kabushiki Kaisha |
Projection optical system, exposure apparatus, and device manufacturing method
|
|
JP2004349645A
(ja)
*
|
2003-05-26 |
2004-12-09 |
Sony Corp |
液浸差動排液静圧浮上パッド、原盤露光装置および液侵差動排液による露光方法
|
|
TWI442694B
(zh)
*
|
2003-05-30 |
2014-06-21 |
Asml荷蘭公司 |
微影裝置及元件製造方法
|
|
US7213963B2
(en)
|
2003-06-09 |
2007-05-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
EP1486827B1
(en)
*
|
2003-06-11 |
2011-11-02 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7317504B2
(en)
|
2004-04-08 |
2008-01-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JP4054285B2
(ja)
*
|
2003-06-12 |
2008-02-27 |
松下電器産業株式会社 |
パターン形成方法
|
|
JP4084710B2
(ja)
|
2003-06-12 |
2008-04-30 |
松下電器産業株式会社 |
パターン形成方法
|
|
EP3104396B1
(en)
*
|
2003-06-13 |
2018-03-21 |
Nikon Corporation |
Exposure method, substrate stage, exposure apparatus, and device manufacturing method
|
|
US6867844B2
(en)
|
2003-06-19 |
2005-03-15 |
Asml Holding N.V. |
Immersion photolithography system and method using microchannel nozzles
|
|
JP4029064B2
(ja)
|
2003-06-23 |
2008-01-09 |
松下電器産業株式会社 |
パターン形成方法
|
|
JP4084712B2
(ja)
|
2003-06-23 |
2008-04-30 |
松下電器産業株式会社 |
パターン形成方法
|
|
JP2005019616A
(ja)
*
|
2003-06-25 |
2005-01-20 |
Canon Inc |
液浸式露光装置
|
|
JP4343597B2
(ja)
*
|
2003-06-25 |
2009-10-14 |
キヤノン株式会社 |
露光装置及びデバイス製造方法
|
|
DE60308161T2
(de)
|
2003-06-27 |
2007-08-09 |
Asml Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
|
|
US6809794B1
(en)
|
2003-06-27 |
2004-10-26 |
Asml Holding N.V. |
Immersion photolithography system and method using inverted wafer-projection optics interface
|
|
JP3862678B2
(ja)
|
2003-06-27 |
2006-12-27 |
キヤノン株式会社 |
露光装置及びデバイス製造方法
|
|
EP1498778A1
(en)
*
|
2003-06-27 |
2005-01-19 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
EP1494074A1
(en)
*
|
2003-06-30 |
2005-01-05 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
WO2005006026A2
(en)
|
2003-07-01 |
2005-01-20 |
Nikon Corporation |
Using isotopically specified fluids as optical elements
|
|
EP2264531B1
(en)
*
|
2003-07-09 |
2013-01-16 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
|
US7384149B2
(en)
|
2003-07-21 |
2008-06-10 |
Asml Netherlands B.V. |
Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
|
|
US7006209B2
(en)
|
2003-07-25 |
2006-02-28 |
Advanced Micro Devices, Inc. |
Method and apparatus for monitoring and controlling imaging in immersion lithography systems
|
|
EP1503244A1
(en)
*
|
2003-07-28 |
2005-02-02 |
ASML Netherlands B.V. |
Lithographic projection apparatus and device manufacturing method
|
|
US7175968B2
(en)
*
|
2003-07-28 |
2007-02-13 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and a substrate
|
|
US7326522B2
(en)
*
|
2004-02-11 |
2008-02-05 |
Asml Netherlands B.V. |
Device manufacturing method and a substrate
|
|
US7579135B2
(en)
*
|
2003-08-11 |
2009-08-25 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Lithography apparatus for manufacture of integrated circuits
|
|
US7700267B2
(en)
*
|
2003-08-11 |
2010-04-20 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Immersion fluid for immersion lithography, and method of performing immersion lithography
|
|
US7061578B2
(en)
|
2003-08-11 |
2006-06-13 |
Advanced Micro Devices, Inc. |
Method and apparatus for monitoring and controlling imaging in immersion lithography systems
|
|
US7085075B2
(en)
|
2003-08-12 |
2006-08-01 |
Carl Zeiss Smt Ag |
Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
|
|
US6844206B1
(en)
|
2003-08-21 |
2005-01-18 |
Advanced Micro Devices, Llp |
Refractive index system monitor and control for immersion lithography
|
|
US7070915B2
(en)
|
2003-08-29 |
2006-07-04 |
Tokyo Electron Limited |
Method and system for drying a substrate
|
|
US6954256B2
(en)
*
|
2003-08-29 |
2005-10-11 |
Asml Netherlands B.V. |
Gradient immersion lithography
|
|
US7014966B2
(en)
*
|
2003-09-02 |
2006-03-21 |
Advanced Micro Devices, Inc. |
Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems
|
|
EP1660925B1
(en)
|
2003-09-03 |
2015-04-29 |
Nikon Corporation |
Apparatus and method for providing fluid for immersion lithography
|
|
US6961186B2
(en)
*
|
2003-09-26 |
2005-11-01 |
Takumi Technology Corp. |
Contact printing using a magnified mask image
|
|
US7369217B2
(en)
|
2003-10-03 |
2008-05-06 |
Micronic Laser Systems Ab |
Method and device for immersion lithography
|
|
US7678527B2
(en)
*
|
2003-10-16 |
2010-03-16 |
Intel Corporation |
Methods and compositions for providing photoresist with improved properties for contacting liquids
|
|
EP1685446A2
(en)
|
2003-11-05 |
2006-08-02 |
DSM IP Assets B.V. |
A method and apparatus for producing microchips
|
|
US7924397B2
(en)
*
|
2003-11-06 |
2011-04-12 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Anti-corrosion layer on objective lens for liquid immersion lithography applications
|
|
WO2005054953A2
(en)
|
2003-11-24 |
2005-06-16 |
Carl-Zeiss Smt Ag |
Holding device for an optical element in an objective
|
|
US7545481B2
(en)
|
2003-11-24 |
2009-06-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7125652B2
(en)
*
|
2003-12-03 |
2006-10-24 |
Advanced Micro Devices, Inc. |
Immersion lithographic process using a conforming immersion medium
|
|
EP1700163A1
(en)
|
2003-12-15 |
2006-09-13 |
Carl Zeiss SMT AG |
Objective as a microlithography projection objective with at least one liquid lens
|
|
WO2005059617A2
(en)
|
2003-12-15 |
2005-06-30 |
Carl Zeiss Smt Ag |
Projection objective having a high aperture and a planar end surface
|
|
US7460206B2
(en)
*
|
2003-12-19 |
2008-12-02 |
Carl Zeiss Smt Ag |
Projection objective for immersion lithography
|
|
US20050185269A1
(en)
*
|
2003-12-19 |
2005-08-25 |
Carl Zeiss Smt Ag |
Catadioptric projection objective with geometric beam splitting
|
|
JP5102492B2
(ja)
|
2003-12-19 |
2012-12-19 |
カール・ツァイス・エスエムティー・ゲーエムベーハー |
結晶素子を有するマイクロリソグラフィー投影用対物レンズ
|
|
US7394521B2
(en)
*
|
2003-12-23 |
2008-07-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7589818B2
(en)
*
|
2003-12-23 |
2009-09-15 |
Asml Netherlands B.V. |
Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
|
|
US7119884B2
(en)
|
2003-12-24 |
2006-10-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US20050147920A1
(en)
*
|
2003-12-30 |
2005-07-07 |
Chia-Hui Lin |
Method and system for immersion lithography
|
|
US7088422B2
(en)
*
|
2003-12-31 |
2006-08-08 |
International Business Machines Corporation |
Moving lens for immersion optical lithography
|
|
JP4371822B2
(ja)
*
|
2004-01-06 |
2009-11-25 |
キヤノン株式会社 |
露光装置
|
|
JP4429023B2
(ja)
*
|
2004-01-07 |
2010-03-10 |
キヤノン株式会社 |
露光装置及びデバイス製造方法
|
|
US20050153424A1
(en)
*
|
2004-01-08 |
2005-07-14 |
Derek Coon |
Fluid barrier with transparent areas for immersion lithography
|
|
DE602005008707D1
(de)
|
2004-01-14 |
2008-09-18 |
Zeiss Carl Smt Ag |
Catadioptrisches projektionsobjektiv
|
|
CN101799587B
(zh)
|
2004-01-16 |
2012-05-30 |
卡尔蔡司Smt有限责任公司 |
光学系统、投影系统及微结构半导体部件的制造方法
|
|
WO2005069078A1
(en)
|
2004-01-19 |
2005-07-28 |
Carl Zeiss Smt Ag |
Microlithographic projection exposure apparatus with immersion projection lens
|
|
CN1938646B
(zh)
|
2004-01-20 |
2010-12-15 |
卡尔蔡司Smt股份公司 |
曝光装置和用于投影透镜的测量装置
|
|
US7026259B2
(en)
*
|
2004-01-21 |
2006-04-11 |
International Business Machines Corporation |
Liquid-filled balloons for immersion lithography
|
|
US7391501B2
(en)
*
|
2004-01-22 |
2008-06-24 |
Intel Corporation |
Immersion liquids with siloxane polymer for immersion lithography
|
|
US8852850B2
(en)
|
2004-02-03 |
2014-10-07 |
Rochester Institute Of Technology |
Method of photolithography using a fluid and a system thereof
|
|
US7050146B2
(en)
*
|
2004-02-09 |
2006-05-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
WO2005076084A1
(en)
|
2004-02-09 |
2005-08-18 |
Carl Zeiss Smt Ag |
Projection objective for a microlithographic projection exposure apparatus
|
|
CN101727021A
(zh)
|
2004-02-13 |
2010-06-09 |
卡尔蔡司Smt股份公司 |
微平版印刷投影曝光装置的投影物镜
|
|
EP1721201A1
(en)
|
2004-02-18 |
2006-11-15 |
Corning Incorporated |
Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light
|
|
US20050205108A1
(en)
*
|
2004-03-16 |
2005-09-22 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Method and system for immersion lithography lens cleaning
|
|
US7027125B2
(en)
*
|
2004-03-25 |
2006-04-11 |
International Business Machines Corporation |
System and apparatus for photolithography
|
|
US7084960B2
(en)
*
|
2004-03-29 |
2006-08-01 |
Intel Corporation |
Lithography using controlled polarization
|
|
US7227619B2
(en)
*
|
2004-04-01 |
2007-06-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7034917B2
(en)
*
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
|
US7295283B2
(en)
*
|
2004-04-02 |
2007-11-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7712905B2
(en)
|
2004-04-08 |
2010-05-11 |
Carl Zeiss Smt Ag |
Imaging system with mirror group
|
|
US7898642B2
(en)
*
|
2004-04-14 |
2011-03-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7271878B2
(en)
*
|
2004-04-22 |
2007-09-18 |
International Business Machines Corporation |
Wafer cell for immersion lithography
|
|
US7244665B2
(en)
*
|
2004-04-29 |
2007-07-17 |
Micron Technology, Inc. |
Wafer edge ring structures and methods of formation
|
|
US7379159B2
(en)
*
|
2004-05-03 |
2008-05-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
EP1747499A2
(en)
|
2004-05-04 |
2007-01-31 |
Nikon Corporation |
Apparatus and method for providing fluid for immersion lithography
|
|
US20060244938A1
(en)
|
2004-05-04 |
2006-11-02 |
Karl-Heinz Schuster |
Microlitographic projection exposure apparatus and immersion liquid therefore
|
|
US7091502B2
(en)
*
|
2004-05-12 |
2006-08-15 |
Taiwan Semiconductor Manufacturing, Co., Ltd. |
Apparatus and method for immersion lithography
|
|
KR20160085375A
(ko)
|
2004-05-17 |
2016-07-15 |
칼 짜이스 에스엠티 게엠베하 |
중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
|
|
US7616383B2
(en)
*
|
2004-05-18 |
2009-11-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7486381B2
(en)
*
|
2004-05-21 |
2009-02-03 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
KR101199076B1
(ko)
|
2004-06-04 |
2012-11-07 |
칼 짜이스 에스엠티 게엠베하 |
강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소
|
|
CN100594430C
(zh)
|
2004-06-04 |
2010-03-17 |
卡尔蔡司Smt股份公司 |
用于测量光学成像系统的图像质量的系统
|
|
US7481867B2
(en)
|
2004-06-16 |
2009-01-27 |
Edwards Limited |
Vacuum system for immersion photolithography
|
|
US7379155B2
(en)
|
2004-10-18 |
2008-05-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|