JP2015505155A - スーパージャンクションmosfetデバイスのためのエッジ終端 - Google Patents
スーパージャンクションmosfetデバイスのためのエッジ終端 Download PDFInfo
- Publication number
- JP2015505155A JP2015505155A JP2014544967A JP2014544967A JP2015505155A JP 2015505155 A JP2015505155 A JP 2015505155A JP 2014544967 A JP2014544967 A JP 2014544967A JP 2014544967 A JP2014544967 A JP 2014544967A JP 2015505155 A JP2015505155 A JP 2015505155A
- Authority
- JP
- Japan
- Prior art keywords
- region
- type dopant
- mosfet device
- field effect
- edge termination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002019 doping agent Substances 0.000 claims abstract description 116
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims description 65
- 230000005669 field effect Effects 0.000 claims description 57
- 239000004065 semiconductor Substances 0.000 claims description 13
- 229910044991 metal oxide Inorganic materials 0.000 claims description 8
- 150000004706 metal oxides Chemical class 0.000 claims description 8
- 239000007943 implant Substances 0.000 description 26
- 238000004519 manufacturing process Methods 0.000 description 21
- 230000015556 catabolic process Effects 0.000 description 16
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 7
- 229910052796 boron Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 238000002161 passivation Methods 0.000 description 5
- 238000010891 electric arc Methods 0.000 description 4
- 238000002513 implantation Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- 239000005380 borophosphosilicate glass Substances 0.000 description 2
- 238000013500 data storage Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 description 1
- 210000000746 body region Anatomy 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/266—Bombardment with radiation with high-energy radiation producing ion implantation using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7816—Lateral DMOS transistors, i.e. LDMOS transistors
- H01L29/7823—Lateral DMOS transistors, i.e. LDMOS transistors with an edge termination structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
- H01L29/063—Reduced surface field [RESURF] pn-junction structures
- H01L29/0634—Multiple reduced surface field (multi-RESURF) structures, e.g. double RESURF, charge compensation, cool, superjunction (SJ), 3D-RESURF, composite buffer (CB) structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66674—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/66712—Vertical DMOS transistors, i.e. VDMOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7811—Vertical DMOS transistors, i.e. VDMOS transistors with an edge termination structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7813—Vertical DMOS transistors, i.e. VDMOS transistors with trench gate electrode, e.g. UMOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
- H01L29/0619—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE] with a supplementary region doped oppositely to or in rectifying contact with the semiconductor containing or contacting region, e.g. guard rings with PN or Schottky junction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0843—Source or drain regions of field-effect devices
- H01L29/0847—Source or drain regions of field-effect devices of field-effect transistors with insulated gate
- H01L29/0852—Source or drain regions of field-effect devices of field-effect transistors with insulated gate of DMOS transistors
- H01L29/0873—Drain regions
- H01L29/0878—Impurity concentration or distribution
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/402—Field plates
- H01L29/404—Multiple field plate structures
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical & Material Sciences (AREA)
- Composite Materials (AREA)
- Electrodes Of Semiconductors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Junction Field-Effect Transistors (AREA)
Abstract
Description
本願は、「スーパージャンクションMOSFETのデバイスのためのエッジ終端」を発明の名称とし、2011年12月1日に出願された米国特許出願第13/309、444号に関連し、かつこの出願に基づく優先権を主張するものであり、本願では、前記米国特許出願の内容を援用する。
一実施形態では、前記段落に記載した電界効果トランジスタは、N型ドーパントの前記複数のコラムのうちの1つにマージしたN型ドーパント領域を含むことができる。一実施形態では、前記段落に記載した電界効果トランジスタは、接合型電界効果トランジスタを含む。
なお、図面全体に記載した同様な参照符号は、同様の要素を示すことに留意されたい。
以下本発明に係わる実施形態について詳細に参照するが、これら例は、添付図に示されている。以下、種々の実施形態に関連させて本発明について説明するが、これらの種々の実施形態は本発明を限定するものではないことが理解できよう。むしろ、本発明は、特許請求の範囲に従って解釈される本発明の範囲内に含まれ得る代替例、改変例および均等物を包含するものである。さらに、本発明に係る種々の実施形態の次の詳細な説明では、本発明を完全に理解できるように多数の特定の細部について記載する。しかしながら、これらの特定の細部またはその均等物がなくても本発明を実施できることは当業者には明らかであろう。他の例では、本発明の要旨を不必要に不明瞭にしないように周知の方法、手順、構成成分および回路については詳細には説明していない。
基板と、
前記基板の上方に位置し、N型ドーパント領域内にP型ドーパントの複数のコラムを含む電荷補償領域と、
前記電荷補償領域の上方に位置し、N−型ドーパント層を含む終端領域と、
エッジ終端構造とを含み、前記終端領域が前記エッジ終端構造の一部を含む、スーパージャンクション金属酸化膜半導体電界効果(MOSFET)デバイス。
(発明の概念2)
前記エッジ終端構造は、フィールドリングとフィールドプレートの組を含む、発明の概念1に記載のスーパージャンクションMOSFETデバイス。
(発明の概念3)
前記エッジ終端構造は、フィールドプレートの組を含む、発明の概念1に記載のスーパージャンクションMOSFETデバイス。
(発明の概念4)
前記エッジ終端構造は、接合終端拡張領域を含む、発明の概念1に記載のスーパージャンクションMOSFETデバイス。
(発明の概念5)
電界効果トランジスタを含み、前記終端領域は、前記電界効果トランジスタの一部を含む発明の概念1に記載のスーパージャンクションMOSFETデバイス。
(発明の概念6)
前記電界効果トランジスタは、P型ドーパントの前記複数のコラムのうちの1つにマージしたP型ドーパント領域を含む発明の概念5に記載のスーパージャンクションMOSFETデバイス。
(発明の概念7)
前記電界効果トランジスタは、接合型電界効果トランジスタを含む発明の概念5に記載のスーパージャンクションMOSFETデバイス。
(発明の概念8)
基板と、
前記基板の上方に位置し、P型ドーパント領域内にN型ドーパントの複数のコラムを含む電荷補償領域と、
前記電荷補償領域の上方に位置し、P−型ドーパント層を含む終端領域と、
エッジ終端構造とを含み、前記終端領域が前記エッジ終端構造の一部を含む、スーパージャンクション金属酸化膜半導体電界効果(MOSFET)デバイス。
(発明の概念9)
前記エッジ終端構造は、フィールドリングとフィールドプレートの組を含む、発明の概念8に記載のスーパージャンクションMOSFETデバイス。
(発明の概念10)
前記エッジ終端構造は、フィールドプレートの組を含む、発明の概念8に記載のスーパージャンクションMOSFETデバイス。
(発明の概念11)
前記エッジ終端構造は、接合終端拡張領域を含む、発明の概念8に記載のスーパージャンクションMOSFETデバイス。
(発明の概念12)
電界効果トランジスタを含み、前記終端領域は、前記電界効果トランジスタの一部を含む発明の概念8に記載のスーパージャンクションMOSFETデバイス。
(発明の概念13)
前記電界効果トランジスタは、N型ドーパントの前記複数のコラムのうちの1つにマージしたN型ドーパント領域を含む発明の概念8に記載のスーパージャンクションMOSFETデバイス。
(発明の概念14)
前記電界効果トランジスタは、接合型電界効果トランジスタを含む発明の概念8に記載のスーパージャンクションMOSFETデバイス。
(発明の概念15)
基板の上方に位置し、第2型ドーパント領域内に第1型ドーパントの複数のコラムを含む、スーパージャンクション金属酸化膜半導体電界効果トランジスタ(MOSFET)の電荷補償領域を生成するステップと、
前記電荷補償領域よりも上方に位置し、前記第2型ドーパント層よりも低い濃度の前記第2のドーパントを含む、終端領域を生成するステップと、
前記終端領域がエッジ終端構造の少なくとも一部を含むよう、前記エッジ終端構造を生成するステップとを含む方法。
(発明の概念16)
前記第1型ドーパントは、P型ドーパントを含み、前記第2型ドーパントは、N型ドーパントを含む、発明の概念15に記載の方法。
(発明の概念17)
前記第1型ドーパントは、N型ドーパントを含み、前記第2型ドーパントは、P型ドーパントを含む、発明の概念15に記載の方法。
(発明の概念18)
前記エッジ終端構造は、フィールドリングと、フィールドプレートと、接合終端拡張部とからなる群から選択されたものである発明の概念15に記載の方法。
(発明の概念19)
前記終端領域が、前記電界効果トランジスタの少なくとも一部を含むよう電界効果トランジスタを生成するステップを含む発明の概念15に記載の方法。
(発明の概念20)
前記電界効果トランジスタを生成する前記ステップは、第1型ドーパントの前記複数のコラムのうちの1つにマージした前記第1型ドーパントの領域を含む前記電界効果トランジスタを生成することを含む発明の概念15に記載の方法。
Claims (20)
- 基板と、
前記基板の上方に位置し、N型ドーパント領域内にP型ドーパントの複数のコラムを含む電荷補償領域と、
前記電荷補償領域の上方に位置し、N−型ドーパント層を含む終端領域と、
エッジ終端構造とを含み、前記終端領域が前記エッジ終端構造の一部を含む、スーパージャンクション金属酸化膜半導体電界効果(MOSFET)デバイス。 - 前記エッジ終端構造は、フィールドリングとフィールドプレートの組を含む、請求項1に記載のスーパージャンクションMOSFETデバイス。
- 前記エッジ終端構造は、フィールドプレートの組を含む、請求項1に記載のスーパージャンクションMOSFETデバイス。
- 前記エッジ終端構造は、接合終端拡張領域を含む、請求項1に記載のスーパージャンクションMOSFETデバイス。
- 電界効果トランジスタを含み、前記終端領域は、前記電界効果トランジスタの一部を含む請求項1に記載のスーパージャンクションMOSFETデバイス。
- 前記電界効果トランジスタは、P型ドーパントの前記複数のコラムのうちの1つにマージしたP型ドーパント領域を含む請求項5に記載のスーパージャンクションMOSFETデバイス。
- 前記電界効果トランジスタは、接合型電界効果トランジスタを含む請求項5に記載のスーパージャンクションMOSFETデバイス。
- 基板と、
前記基板の上方に位置し、P型ドーパント領域内にN型ドーパントの複数のコラムを含む電荷補償領域と、
前記電荷補償領域の上方に位置し、P−型ドーパント層を含む終端領域と、
エッジ終端構造とを含み、前記終端領域が前記エッジ終端構造の一部を含む、スーパージャンクション金属酸化膜半導体電界効果(MOSFET)デバイス。 - 前記エッジ終端構造は、フィールドリングとフィールドプレートの組を含む、請求項8に記載のスーパージャンクションMOSFETデバイス。
- 前記エッジ終端構造は、フィールドプレートの組を含む、請求項8に記載のスーパージャンクションMOSFETデバイス。
- 前記エッジ終端構造は、接合終端拡張領域を含む、請求項8に記載のスーパージャンクションMOSFETデバイス。
- 電界効果トランジスタを含み、前記終端領域は、前記電界効果トランジスタの一部を含む請求項8に記載のスーパージャンクションMOSFETデバイス。
- 前記電界効果トランジスタは、N型ドーパントの前記複数のコラムのうちの1つにマージしたN型ドーパント領域を含む請求項8に記載のスーパージャンクションMOSFETデバイス。
- 前記電界効果トランジスタは、接合型電界効果トランジスタを含む請求項8に記載のスーパージャンクションMOSFETデバイス。
- 基板の上方に位置し、第2型ドーパント領域内に第1型ドーパントの複数のコラムを含む、スーパージャンクション金属酸化膜半導体電界効果トランジスタ(MOSFET)の電荷補償領域を生成するステップと、
前記電荷補償領域よりも上方に位置し、前記第2型ドーパント層よりも低い濃度の前記第2のドーパントを含む、終端領域を生成するステップと、
前記終端領域がエッジ終端構造の少なくとも一部を含むよう、前記エッジ終端構造を生成するステップとを含む方法。 - 前記第1型ドーパントは、P型ドーパントを含み、前記第2型ドーパントは、N型ドーパントを含む、請求項15に記載の方法。
- 前記第1型ドーパントは、N型ドーパントを含み、前記第2型ドーパントは、P型ドーパントを含む、請求項15に記載の方法。
- 前記エッジ終端構造は、フィールドリングと、フィールドプレートと、接合終端拡張部とからなる群から選択されたものである請求項15に記載の方法。
- 前記終端領域が、前記電界効果トランジスタの少なくとも一部を含むよう電界効果トランジスタを生成するステップを含む請求項15に記載の方法。
- 前記電界効果トランジスタを生成する前記ステップは、第1型ドーパントの前記複数のコラムのうちの1つにマージした前記第1型ドーパントの領域を含む前記電界効果トランジスタを生成することを含む請求項15に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/309,444 | 2011-12-01 | ||
US13/309,444 US9431249B2 (en) | 2011-12-01 | 2011-12-01 | Edge termination for super junction MOSFET devices |
PCT/US2012/067486 WO2013082561A1 (en) | 2011-12-01 | 2012-11-30 | Edge termination for super junction mosfet devices |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2015505155A true JP2015505155A (ja) | 2015-02-16 |
Family
ID=48523383
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014544967A Pending JP2015505155A (ja) | 2011-12-01 | 2012-11-30 | スーパージャンクションmosfetデバイスのためのエッジ終端 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9431249B2 (ja) |
JP (1) | JP2015505155A (ja) |
KR (1) | KR101709565B1 (ja) |
CN (1) | CN104011871B (ja) |
DE (1) | DE112012005031B4 (ja) |
WO (1) | WO2013082561A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019102761A (ja) * | 2017-12-07 | 2019-06-24 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9484451B2 (en) | 2007-10-05 | 2016-11-01 | Vishay-Siliconix | MOSFET active area and edge termination area charge balance |
US9614043B2 (en) | 2012-02-09 | 2017-04-04 | Vishay-Siliconix | MOSFET termination trench |
US9842911B2 (en) | 2012-05-30 | 2017-12-12 | Vishay-Siliconix | Adaptive charge balanced edge termination |
DE102014005879B4 (de) * | 2014-04-16 | 2021-12-16 | Infineon Technologies Ag | Vertikale Halbleitervorrichtung |
US9508596B2 (en) | 2014-06-20 | 2016-11-29 | Vishay-Siliconix | Processes used in fabricating a metal-insulator-semiconductor field effect transistor |
US20150372132A1 (en) * | 2014-06-23 | 2015-12-24 | Vishay-Siliconix | Semiconductor device with composite trench and implant columns |
US9887259B2 (en) | 2014-06-23 | 2018-02-06 | Vishay-Siliconix | Modulated super junction power MOSFET devices |
KR102098996B1 (ko) | 2014-08-19 | 2020-04-08 | 비쉐이-실리코닉스 | 초접합 금속 산화물 반도체 전계 효과 트랜지스터 |
US9698256B2 (en) | 2014-09-24 | 2017-07-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Termination of super junction power MOSFET |
US9590092B2 (en) * | 2014-11-13 | 2017-03-07 | Ixys Corporation | Super junction field effect transistor with internal floating ring |
DE102015106979B4 (de) | 2015-05-05 | 2023-01-12 | Infineon Technologies Austria Ag | Halbleiterwafer und Verfahren zum Herstellen von Halbleitervorrichtungen in einem Halbleiterwafer |
US9450045B1 (en) | 2015-06-23 | 2016-09-20 | Alpha And Omega Semiconductor Incorporated | Method for forming lateral super-junction structure |
US9312381B1 (en) | 2015-06-23 | 2016-04-12 | Alpha And Omega Semiconductor Incorporated | Lateral super-junction MOSFET device and termination structure |
KR102404114B1 (ko) * | 2015-08-20 | 2022-05-30 | 온세미컨덕터코리아 주식회사 | 슈퍼정션 반도체 장치 및 그 제조 방법 |
US10541300B2 (en) | 2016-05-26 | 2020-01-21 | General Electric Company | Semiconductor device and method of making thereof |
DE102016115759B4 (de) * | 2016-08-25 | 2018-06-28 | Infineon Technologies Austria Ag | Verfahren zum herstellen einer superjunction-halbleitervorrichtung und superjunction-halbleitervorrichtung |
US10861931B2 (en) | 2016-12-08 | 2020-12-08 | Cree, Inc. | Power semiconductor devices having gate trenches and buried edge terminations and related methods |
US10312710B1 (en) * | 2017-01-31 | 2019-06-04 | The United States Of America, As Represented By The Secretary Of The Navy | Energy recovery pulse forming network |
US10580884B2 (en) * | 2017-03-08 | 2020-03-03 | D3 Semiconductor LLC | Super junction MOS bipolar transistor having drain gaps |
JP2019046991A (ja) * | 2017-09-04 | 2019-03-22 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
EP3490006A1 (en) * | 2017-11-24 | 2019-05-29 | Nexperia B.V. | Semiconductor device with edge termination structure and method of manufacture |
US10644102B2 (en) | 2017-12-28 | 2020-05-05 | Alpha And Omega Semiconductor (Cayman) Ltd. | SGT superjunction MOSFET structure |
US10957759B2 (en) * | 2018-12-21 | 2021-03-23 | General Electric Company | Systems and methods for termination in silicon carbide charge balance power devices |
KR102554248B1 (ko) * | 2019-02-28 | 2023-07-11 | 주식회사 디비하이텍 | 수퍼 정션 반도체 장치 및 이의 제조 방법 |
US10957791B2 (en) * | 2019-03-08 | 2021-03-23 | Infineon Technologies Americas Corp. | Power device with low gate charge and low figure of merit |
US11227928B1 (en) * | 2020-07-09 | 2022-01-18 | Semiconductor Components Industries, Llc | Termination structures for trench-gate field-effect transistors |
WO2023154046A1 (en) * | 2022-02-10 | 2023-08-17 | Vishay Siliconix Llc | Adaptive edge termination by design for efficient and rugged high voltage silicon carbide power device |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03270273A (ja) * | 1990-03-20 | 1991-12-02 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
JP2006005275A (ja) * | 2004-06-21 | 2006-01-05 | Toshiba Corp | 電力用半導体素子 |
JP2008294214A (ja) * | 2007-05-24 | 2008-12-04 | Toshiba Corp | 半導体装置 |
US20100078775A1 (en) * | 2008-09-30 | 2010-04-01 | Infineon Technologies Austria Ag | Semiconductor device with a charge carrier compensation structure and method for the production of a semiconductor device |
WO2010132144A1 (en) * | 2009-05-12 | 2010-11-18 | Cree, Inc. | Diffused junction termination structures for silicon carbide devices and methods of fabricating silicon carbide devices incorporating same |
JP2011192824A (ja) * | 2010-03-15 | 2011-09-29 | Fuji Electric Co Ltd | 超接合半導体装置の製造方法 |
Family Cites Families (125)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4191603A (en) | 1978-05-01 | 1980-03-04 | International Business Machines Corporation | Making semiconductor structure with improved phosphosilicate glass isolation |
DK157272C (da) | 1978-10-13 | 1990-04-30 | Int Rectifier Corp | Mosfet med hoej effekt |
JPS56115525A (en) | 1980-02-18 | 1981-09-10 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor device |
US4680853A (en) | 1980-08-18 | 1987-07-21 | International Rectifier Corporation | Process for manufacture of high power MOSFET with laterally distributed high carrier density beneath the gate oxide |
US4593302B1 (en) | 1980-08-18 | 1998-02-03 | Int Rectifier Corp | Process for manufacture of high power mosfet laterally distributed high carrier density beneath the gate oxide |
JPS62536Y2 (ja) | 1980-09-29 | 1987-01-08 | ||
US4399449A (en) | 1980-11-17 | 1983-08-16 | International Rectifier Corporation | Composite metal and polysilicon field plate structure for high voltage semiconductor devices |
US4412242A (en) | 1980-11-17 | 1983-10-25 | International Rectifier Corporation | Planar structure for high voltage semiconductor devices with gaps in glassy layer over high field regions |
US4532534A (en) | 1982-09-07 | 1985-07-30 | Rca Corporation | MOSFET with perimeter channel |
JPS5980823U (ja) | 1982-11-20 | 1984-05-31 | ソニー株式会社 | テープレコーダの切換操作機構 |
US4803532A (en) | 1982-11-27 | 1989-02-07 | Nissan Motor Co., Ltd. | Vertical MOSFET having a proof structure against puncture due to breakdown |
JPS5984474U (ja) | 1982-11-30 | 1984-06-07 | ソニー株式会社 | 音響機器における周波数発生器用の成形体 |
US4974059A (en) | 1982-12-21 | 1990-11-27 | International Rectifier Corporation | Semiconductor high-power mosfet device |
GB2134705B (en) | 1983-01-28 | 1985-12-24 | Philips Electronic Associated | Semiconductor devices |
JPS6037498Y2 (ja) | 1983-03-11 | 1985-11-08 | 株式会社昭空 | 安全弁装置 |
US4789882A (en) | 1983-03-21 | 1988-12-06 | International Rectifier Corporation | High power MOSFET with direct connection from connection pads to underlying silicon |
JPS60117613A (ja) | 1983-11-30 | 1985-06-25 | Fujitsu Ltd | 半導体装置の製造方法 |
JPS60249367A (ja) | 1984-05-25 | 1985-12-10 | Hitachi Ltd | 絶縁ゲ−ト形トランジスタ |
US4620211A (en) | 1984-08-13 | 1986-10-28 | General Electric Company | Method of reducing the current gain of an inherent bipolar transistor in an insulated-gate semiconductor device and resulting devices |
US4631564A (en) | 1984-10-23 | 1986-12-23 | Rca Corporation | Gate shield structure for power MOS device |
JPS639659Y2 (ja) | 1984-10-30 | 1988-03-22 | ||
US4646117A (en) | 1984-12-05 | 1987-02-24 | General Electric Company | Power semiconductor devices with increased turn-off current ratings and limited current density in peripheral portions |
JPS61182264A (ja) | 1985-02-08 | 1986-08-14 | Nissan Motor Co Ltd | 縦型mosトランジスタ |
JPH0648716B2 (ja) | 1985-11-30 | 1994-06-22 | ヤマハ株式会社 | 集積回路装置の製法 |
EP0227894A3 (en) | 1985-12-19 | 1988-07-13 | SILICONIX Incorporated | High density vertical dmos transistor |
JPS62176168U (ja) | 1986-04-28 | 1987-11-09 | ||
EP0256315B1 (de) | 1986-08-13 | 1992-01-29 | Siemens Aktiengesellschaft | Integrierte Bipolar- und komplementäre MOS-Transistoren auf einem gemeinsamen Substrat enthaltende Schaltung und Verfahren zu ihrer Herstellung |
US5160491A (en) | 1986-10-21 | 1992-11-03 | Texas Instruments Incorporated | Method of making a vertical MOS transistor |
US4941026A (en) | 1986-12-05 | 1990-07-10 | General Electric Company | Semiconductor devices exhibiting minimum on-resistance |
US4819052A (en) | 1986-12-22 | 1989-04-04 | Texas Instruments Incorporated | Merged bipolar/CMOS technology using electrically active trench |
EP0279403A3 (en) | 1987-02-16 | 1988-12-07 | Nec Corporation | Vertical mos field effect transistor having a high withstand voltage and a high switching speed |
JPS6489465A (en) | 1987-09-30 | 1989-04-03 | Toshiba Corp | Double-diffusion type mos field effect transistor |
JP2771172B2 (ja) | 1988-04-01 | 1998-07-02 | 日本電気株式会社 | 縦型電界効果トランジスタ |
JPH0783118B2 (ja) | 1988-06-08 | 1995-09-06 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
KR910004318B1 (ko) | 1988-06-27 | 1991-06-25 | 현대전자산업 주식회사 | 수직형 d mos 트랜지스터의 셀 |
US5034346A (en) | 1988-08-25 | 1991-07-23 | Micrel Inc. | Method for forming shorting contact for semiconductor which allows for relaxed alignment tolerance |
US5019526A (en) | 1988-09-26 | 1991-05-28 | Nippondenso Co., Ltd. | Method of manufacturing a semiconductor device having a plurality of elements |
JPH0291976A (ja) | 1988-09-29 | 1990-03-30 | Oki Electric Ind Co Ltd | 縦型溝型mos fetの製造方法 |
JPH0294477A (ja) | 1988-09-30 | 1990-04-05 | Toshiba Corp | 半導体装置及びその製造方法 |
US5072266A (en) | 1988-12-27 | 1991-12-10 | Siliconix Incorporated | Trench DMOS power transistor with field-shaping body profile and three-dimensional geometry |
US4954854A (en) | 1989-05-22 | 1990-09-04 | International Business Machines Corporation | Cross-point lightly-doped drain-source trench transistor and fabrication process therefor |
JP2689606B2 (ja) | 1989-05-24 | 1997-12-10 | 富士電機株式会社 | 絶縁ゲート電界効果型トランジスタの製造方法 |
EP0460251B1 (de) | 1990-06-05 | 1998-11-18 | Siemens Aktiengesellschaft | Herstellverfahren für einen Leistungs-MISFET |
US5156993A (en) | 1990-08-17 | 1992-10-20 | Industrial Technology Research Institute | Fabricating a memory cell with an improved capacitor |
JP2751612B2 (ja) | 1990-10-01 | 1998-05-18 | 株式会社デンソー | 縦型パワートランジスタ及びその製造方法 |
US5171699A (en) | 1990-10-03 | 1992-12-15 | Texas Instruments Incorporated | Vertical DMOS transistor structure built in an N-well CMOS-based BiCMOS process and method of fabrication |
US5304831A (en) | 1990-12-21 | 1994-04-19 | Siliconix Incorporated | Low on-resistance power MOS technology |
US5404040A (en) | 1990-12-21 | 1995-04-04 | Siliconix Incorporated | Structure and fabrication of power MOSFETs, including termination structures |
US5168331A (en) | 1991-01-31 | 1992-12-01 | Siliconix Incorporated | Power metal-oxide-semiconductor field effect transistor |
US5268586A (en) | 1992-02-25 | 1993-12-07 | North American Philips Corporation | Vertical power MOS device with increased ruggedness and method of fabrication |
US5233215A (en) | 1992-06-08 | 1993-08-03 | North Carolina State University At Raleigh | Silicon carbide power MOSFET with floating field ring and floating field plate |
US5430324A (en) | 1992-07-23 | 1995-07-04 | Siliconix, Incorporated | High voltage transistor having edge termination utilizing trench technology |
US5316959A (en) | 1992-08-12 | 1994-05-31 | Siliconix, Incorporated | Trenched DMOS transistor fabrication using six masks |
US5374569A (en) | 1992-09-21 | 1994-12-20 | Siliconix Incorporated | Method for forming a BiCDMOS |
US5341011A (en) | 1993-03-15 | 1994-08-23 | Siliconix Incorporated | Short channel trenched DMOS transistor |
GB9306895D0 (en) | 1993-04-01 | 1993-05-26 | Philips Electronics Uk Ltd | A method of manufacturing a semiconductor device comprising an insulated gate field effect device |
US5366932A (en) | 1993-04-26 | 1994-11-22 | Harris Corporation | Semi-conductor chip packaging method and semi-conductor chip having interdigitated gate runners with gate bonding pads |
JP3383377B2 (ja) | 1993-10-28 | 2003-03-04 | 株式会社東芝 | トレンチ構造の縦型のノーマリーオン型のパワーmosfetおよびその製造方法 |
US5396085A (en) | 1993-12-28 | 1995-03-07 | North Carolina State University | Silicon carbide switching device with rectifying-gate |
US5362665A (en) | 1994-02-14 | 1994-11-08 | Industrial Technology Research Institute | Method of making vertical DRAM cross point memory cell |
JP3273180B2 (ja) | 1994-10-11 | 2002-04-08 | 未来工業株式会社 | 配線床における配線引出口の構造 |
US5597765A (en) | 1995-01-10 | 1997-01-28 | Siliconix Incorporated | Method for making termination structure for power MOSFET |
US5937287A (en) | 1997-07-22 | 1999-08-10 | Micron Technology, Inc. | Fabrication of semiconductor structures by ion implantation |
DE19839970C2 (de) * | 1998-09-02 | 2000-11-02 | Siemens Ag | Randstruktur und Driftbereich für ein Halbleiterbauelement sowie Verfahren zu ihrer Herstellung |
DE19913375B4 (de) | 1999-03-24 | 2009-03-26 | Infineon Technologies Ag | Verfahren zur Herstellung einer MOS-Transistorstruktur |
US6228700B1 (en) | 1999-09-03 | 2001-05-08 | United Microelectronics Corp. | Method for manufacturing dynamic random access memory |
US6580123B2 (en) | 2000-04-04 | 2003-06-17 | International Rectifier Corporation | Low voltage power MOSFET device and process for its manufacture |
JP4534303B2 (ja) * | 2000-04-27 | 2010-09-01 | 富士電機システムズ株式会社 | 横型超接合半導体素子 |
EP1162664A1 (en) * | 2000-06-09 | 2001-12-12 | Motorola, Inc. | Lateral semiconductor device with low on-resistance and method of making the same |
TW523816B (en) | 2000-06-16 | 2003-03-11 | Gen Semiconductor Inc | Semiconductor trench device with enhanced gate oxide integrity structure |
JP4528460B2 (ja) | 2000-06-30 | 2010-08-18 | 株式会社東芝 | 半導体素子 |
US6509233B2 (en) | 2000-10-13 | 2003-01-21 | Siliconix Incorporated | Method of making trench-gated MOSFET having cesium gate oxide layer |
US6710403B2 (en) | 2002-07-30 | 2004-03-23 | Fairchild Semiconductor Corporation | Dual trench power MOSFET |
KR100393201B1 (ko) * | 2001-04-16 | 2003-07-31 | 페어차일드코리아반도체 주식회사 | 낮은 온 저항과 높은 브레이크다운 전압을 갖는 고전압수평형 디모스 트랜지스터 |
US6621122B2 (en) * | 2001-07-06 | 2003-09-16 | International Rectifier Corporation | Termination structure for superjunction device |
JP3708057B2 (ja) | 2001-07-17 | 2005-10-19 | 株式会社東芝 | 高耐圧半導体装置 |
US6489204B1 (en) | 2001-08-20 | 2002-12-03 | Episil Technologies, Inc. | Save MOS device |
US7045859B2 (en) | 2001-09-05 | 2006-05-16 | International Rectifier Corporation | Trench fet with self aligned source and contact |
WO2003028108A1 (fr) | 2001-09-19 | 2003-04-03 | Kabushiki Kaisha Toshiba | Semi-conducteur et procede de fabrication |
JP2003179223A (ja) | 2001-12-12 | 2003-06-27 | Sony Corp | トレンチゲート型半導体装置およびその製造方法 |
US6838722B2 (en) | 2002-03-22 | 2005-01-04 | Siliconix Incorporated | Structures of and methods of fabricating trench-gated MIS devices |
JP4004843B2 (ja) | 2002-04-24 | 2007-11-07 | Necエレクトロニクス株式会社 | 縦型mosfetの製造方法 |
US6855985B2 (en) | 2002-09-29 | 2005-02-15 | Advanced Analogic Technologies, Inc. | Modular bipolar-CMOS-DMOS analog integrated circuit & power transistor technology |
US6861701B2 (en) | 2003-03-05 | 2005-03-01 | Advanced Analogic Technologies, Inc. | Trench power MOSFET with planarized gate bus |
TW587338B (en) | 2003-05-06 | 2004-05-11 | Mosel Vitelic Inc | Stop structure of trench type DMOS device and its formation method |
US7638841B2 (en) | 2003-05-20 | 2009-12-29 | Fairchild Semiconductor Corporation | Power semiconductor devices and methods of manufacture |
US7973381B2 (en) | 2003-09-08 | 2011-07-05 | International Rectifier Corporation | Thick field oxide termination for trench schottky device |
US7041560B2 (en) | 2003-12-19 | 2006-05-09 | Third Dimension (3D) Semiconductor, Inc. | Method of manufacturing a superjunction device with conventional terminations |
JP4731816B2 (ja) | 2004-01-26 | 2011-07-27 | 三菱電機株式会社 | 半導体装置 |
US6927451B1 (en) | 2004-03-26 | 2005-08-09 | Siliconix Incorporated | Termination for trench MIS device having implanted drain-drift region |
TWI256676B (en) | 2004-03-26 | 2006-06-11 | Siliconix Inc | Termination for trench MIS device having implanted drain-drift region |
US7045857B2 (en) | 2004-03-26 | 2006-05-16 | Siliconix Incorporated | Termination for trench MIS device having implanted drain-drift region |
GB0419867D0 (en) | 2004-09-08 | 2004-10-13 | Koninkl Philips Electronics Nv | Semiconductor devices and methods of manufacture thereof |
JP4414863B2 (ja) | 2004-10-29 | 2010-02-10 | トヨタ自動車株式会社 | 絶縁ゲート型半導体装置およびその製造方法 |
US7453119B2 (en) | 2005-02-11 | 2008-11-18 | Alphs & Omega Semiconductor, Ltd. | Shielded gate trench (SGT) MOSFET cells implemented with a schottky source contact |
US9419092B2 (en) | 2005-03-04 | 2016-08-16 | Vishay-Siliconix | Termination for SiC trench devices |
AT504998A2 (de) | 2005-04-06 | 2008-09-15 | Fairchild Semiconductor | Trenched-gate-feldeffekttransistoren und verfahren zum bilden derselben |
JP2006310576A (ja) | 2005-04-28 | 2006-11-09 | Renesas Technology Corp | 半導体装置およびその製造方法 |
US20060273390A1 (en) | 2005-06-06 | 2006-12-07 | M-Mos Sdn. Bhd. | Gate contact and runners for high density trench MOSFET |
TWI400757B (zh) | 2005-06-29 | 2013-07-01 | Fairchild Semiconductor | 形成遮蔽閘極場效應電晶體之方法 |
JP2007157799A (ja) | 2005-11-30 | 2007-06-21 | Toyota Central Res & Dev Lab Inc | 半導体装置 |
US7449354B2 (en) | 2006-01-05 | 2008-11-11 | Fairchild Semiconductor Corporation | Trench-gated FET for power device with active gate trenches and gate runner trench utilizing one-mask etch |
US7521773B2 (en) | 2006-03-31 | 2009-04-21 | Fairchild Semiconductor Corporation | Power device with improved edge termination |
US7541660B2 (en) | 2006-04-20 | 2009-06-02 | Infineon Technologies Austria Ag | Power semiconductor device |
US7319256B1 (en) | 2006-06-19 | 2008-01-15 | Fairchild Semiconductor Corporation | Shielded gate trench FET with the shield and gate electrodes being connected together |
DE102006036347B4 (de) | 2006-08-03 | 2012-01-12 | Infineon Technologies Austria Ag | Halbleiterbauelement mit einer platzsparenden Randstruktur |
US7476591B2 (en) * | 2006-10-13 | 2009-01-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lateral power MOSFET with high breakdown voltage and low on-resistance |
WO2008086366A2 (en) | 2007-01-09 | 2008-07-17 | Maxpower Semiconductor, Inc. | Semiconductor device |
JP2008182054A (ja) | 2007-01-25 | 2008-08-07 | Toshiba Corp | 半導体装置 |
CN103762243B (zh) | 2007-09-21 | 2017-07-28 | 飞兆半导体公司 | 功率器件 |
US20090085099A1 (en) | 2007-10-02 | 2009-04-02 | Shih Tzung Su | Trench mosfet and method of manufacture utilizing three masks |
US9484451B2 (en) | 2007-10-05 | 2016-11-01 | Vishay-Siliconix | MOSFET active area and edge termination area charge balance |
US8224891B2 (en) | 2008-06-12 | 2012-07-17 | The Board Of Regents Of The University Of Oklahoma | Electronic game-based learning system |
US20090315104A1 (en) | 2008-06-20 | 2009-12-24 | Force Mos Technology Co. Ltd. | Trench MOSFET with shallow trench structures |
US7960786B2 (en) * | 2008-07-09 | 2011-06-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Breakdown voltages of ultra-high voltage devices by forming tunnels |
US7910486B2 (en) | 2009-06-12 | 2011-03-22 | Alpha & Omega Semiconductor, Inc. | Method for forming nanotube semiconductor devices |
US9431530B2 (en) | 2009-10-20 | 2016-08-30 | Vishay-Siliconix | Super-high density trench MOSFET |
US8247296B2 (en) | 2009-12-09 | 2012-08-21 | Semiconductor Components Industries, Llc | Method of forming an insulated gate field effect transistor device having a shield electrode structure |
US8394702B2 (en) | 2010-03-24 | 2013-03-12 | Alpha And Omega Semiconductor Incorporated | Method for making dual gate oxide trench MOSFET with channel stop using three or four masks process |
TWI426568B (zh) | 2010-03-29 | 2014-02-11 | Sinopower Semiconductor Inc | 半導體功率元件與其製作方法 |
CN101969074B (zh) * | 2010-10-28 | 2012-07-04 | 电子科技大学 | 一种高压ldmos器件 |
JP5530992B2 (ja) | 2011-09-16 | 2014-06-25 | 株式会社東芝 | 電力用半導体装置 |
US10522675B2 (en) | 2012-01-25 | 2019-12-31 | Infineon Technologies Ag | Integrated circuit including field effect transistor structures with gate and field electrodes and methods for manufacturing and operating an integrated circuit |
US9614043B2 (en) | 2012-02-09 | 2017-04-04 | Vishay-Siliconix | MOSFET termination trench |
US9842911B2 (en) | 2012-05-30 | 2017-12-12 | Vishay-Siliconix | Adaptive charge balanced edge termination |
-
2011
- 2011-12-01 US US13/309,444 patent/US9431249B2/en active Active
-
2012
- 2012-11-30 JP JP2014544967A patent/JP2015505155A/ja active Pending
- 2012-11-30 WO PCT/US2012/067486 patent/WO2013082561A1/en active Application Filing
- 2012-11-30 DE DE112012005031.2T patent/DE112012005031B4/de active Active
- 2012-11-30 KR KR1020147015968A patent/KR101709565B1/ko active IP Right Grant
- 2012-11-30 CN CN201280059411.7A patent/CN104011871B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03270273A (ja) * | 1990-03-20 | 1991-12-02 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
JP2006005275A (ja) * | 2004-06-21 | 2006-01-05 | Toshiba Corp | 電力用半導体素子 |
JP2008294214A (ja) * | 2007-05-24 | 2008-12-04 | Toshiba Corp | 半導体装置 |
US20100078775A1 (en) * | 2008-09-30 | 2010-04-01 | Infineon Technologies Austria Ag | Semiconductor device with a charge carrier compensation structure and method for the production of a semiconductor device |
WO2010132144A1 (en) * | 2009-05-12 | 2010-11-18 | Cree, Inc. | Diffused junction termination structures for silicon carbide devices and methods of fabricating silicon carbide devices incorporating same |
JP2011192824A (ja) * | 2010-03-15 | 2011-09-29 | Fuji Electric Co Ltd | 超接合半導体装置の製造方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019102761A (ja) * | 2017-12-07 | 2019-06-24 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
US11322607B2 (en) | 2017-12-07 | 2022-05-03 | Fuji Electric Co., Ltd. | Semiconductor device |
JP7073698B2 (ja) | 2017-12-07 | 2022-05-24 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2013082561A1 (en) | 2013-06-06 |
DE112012005031B4 (de) | 2020-10-01 |
US9431249B2 (en) | 2016-08-30 |
KR20140097350A (ko) | 2014-08-06 |
US20130140633A1 (en) | 2013-06-06 |
KR101709565B1 (ko) | 2017-02-23 |
CN104011871B (zh) | 2017-06-23 |
DE112012005031T5 (de) | 2014-08-21 |
CN104011871A (zh) | 2014-08-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2015505155A (ja) | スーパージャンクションmosfetデバイスのためのエッジ終端 | |
US10229988B2 (en) | Adaptive charge balanced edge termination | |
US20200146945A1 (en) | Lateral mosfet with buried drain extension layer | |
KR101712038B1 (ko) | 트렌치-쉴드된 반도체 장치들 및 쇼트키 장벽 정류기 장치들을 개선하는 구조체들 및 방법들 | |
US20150179764A1 (en) | Semiconductor device and method for manufacturing same | |
US9722041B2 (en) | Breakdown voltage blocking device | |
US20200266287A1 (en) | Semiconductor device comprising counter-doped regions | |
JP2016021538A (ja) | 半導体装置の製造方法 | |
US20220231161A1 (en) | Termination for trench field plate power mosfet | |
US11764257B2 (en) | Systems and methods for junction termination of wide band gap super-junction power devices | |
CN103000533B (zh) | 自对准超结功率晶体管的制作方法 | |
KR20170042596A (ko) | 초접합 금속 산화물 반도체 전계 효과 트랜지스터 | |
JP2010056486A (ja) | 半導体装置及び半導体装置の製造方法 | |
JP2018046161A (ja) | 半導体装置および半導体装置の製造方法 | |
US9698024B2 (en) | Partial SOI on power device for breakdown voltage improvement | |
JP2004119982A (ja) | 高出力mosfet半導体装置 | |
US9437494B2 (en) | Semiconductor arrangement and formation thereof | |
JP6678615B2 (ja) | 半導体装置 | |
TWI798825B (zh) | 半導體元件的製造方法 | |
US9397171B2 (en) | Semiconductor device and manufacturing method for the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20141226 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20151218 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160128 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20160421 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160524 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20161101 |