JP2011521438A5 - - Google Patents

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Publication number
JP2011521438A5
JP2011521438A5 JP2010545889A JP2010545889A JP2011521438A5 JP 2011521438 A5 JP2011521438 A5 JP 2011521438A5 JP 2010545889 A JP2010545889 A JP 2010545889A JP 2010545889 A JP2010545889 A JP 2010545889A JP 2011521438 A5 JP2011521438 A5 JP 2011521438A5
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JP
Japan
Prior art keywords
feature
pattern
polymerizable material
labyrinth
mesa
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JP2010545889A
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English (en)
Japanese (ja)
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JP2011521438A (ja
JP5216871B2 (ja
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Priority claimed from US12/367,079 external-priority patent/US8361371B2/en
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Publication of JP2011521438A5 publication Critical patent/JP2011521438A5/ja
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JP2010545889A 2008-02-08 2009-02-09 インプリント・リソグラフィにおけるはみ出し低減 Active JP5216871B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US2715308P 2008-02-08 2008-02-08
US61/027,153 2008-02-08
US9409208P 2008-09-04 2008-09-04
US61/094,092 2008-09-04
US12/367,079 2009-02-06
US12/367,079 US8361371B2 (en) 2008-02-08 2009-02-06 Extrusion reduction in imprint lithography
PCT/US2009/000803 WO2009099666A1 (en) 2008-02-08 2009-02-09 Extrusion reduction in imprint lithography

Publications (3)

Publication Number Publication Date
JP2011521438A JP2011521438A (ja) 2011-07-21
JP2011521438A5 true JP2011521438A5 (enExample) 2012-03-22
JP5216871B2 JP5216871B2 (ja) 2013-06-19

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ID=40938224

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010545889A Active JP5216871B2 (ja) 2008-02-08 2009-02-09 インプリント・リソグラフィにおけるはみ出し低減

Country Status (7)

Country Link
US (2) US8361371B2 (enExample)
EP (1) EP2240826A4 (enExample)
JP (1) JP5216871B2 (enExample)
KR (3) KR102065400B1 (enExample)
CN (1) CN101939704B (enExample)
TW (1) TWI430015B (enExample)
WO (1) WO2009099666A1 (enExample)

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