JP2011529626A5 - - Google Patents

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Publication number
JP2011529626A5
JP2011529626A5 JP2011513482A JP2011513482A JP2011529626A5 JP 2011529626 A5 JP2011529626 A5 JP 2011529626A5 JP 2011513482 A JP2011513482 A JP 2011513482A JP 2011513482 A JP2011513482 A JP 2011513482A JP 2011529626 A5 JP2011529626 A5 JP 2011529626A5
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JP
Japan
Prior art keywords
nanotopography
polymerizable material
pattern
desired shape
parasitic effect
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JP2011513482A
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English (en)
Japanese (ja)
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JP5349588B2 (ja
JP2011529626A (ja
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Priority claimed from PCT/US2009/003420 external-priority patent/WO2009151560A2/en
Publication of JP2011529626A publication Critical patent/JP2011529626A/ja
Publication of JP2011529626A5 publication Critical patent/JP2011529626A5/ja
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Publication of JP5349588B2 publication Critical patent/JP5349588B2/ja
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JP2011513482A 2008-06-09 2009-06-05 適応ナノトポグラフィ・スカルプティング Active JP5349588B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US6000708P 2008-06-09 2008-06-09
US61/060,007 2008-06-09
US12/479,200 2009-06-05
PCT/US2009/003420 WO2009151560A2 (en) 2008-06-09 2009-06-05 Adaptive nanotopography sculpting
US12/479,200 US8394282B2 (en) 2008-06-09 2009-06-05 Adaptive nanotopography sculpting

Publications (3)

Publication Number Publication Date
JP2011529626A JP2011529626A (ja) 2011-12-08
JP2011529626A5 true JP2011529626A5 (enExample) 2012-07-12
JP5349588B2 JP5349588B2 (ja) 2013-11-20

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JP2011513482A Active JP5349588B2 (ja) 2008-06-09 2009-06-05 適応ナノトポグラフィ・スカルプティング

Country Status (6)

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US (1) US8394282B2 (enExample)
EP (1) EP2304501A2 (enExample)
JP (1) JP5349588B2 (enExample)
KR (1) KR101653195B1 (enExample)
CN (1) CN102089708A (enExample)
WO (1) WO2009151560A2 (enExample)

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CN109445247B (zh) * 2018-11-16 2020-06-19 京东方科技集团股份有限公司 压印模板及其制备方法和压印方法
JP7171394B2 (ja) 2018-11-29 2022-11-15 キヤノン株式会社 成形装置、成形方法、および物品の製造方法
JP7676307B2 (ja) 2018-12-13 2025-05-14 ボード オブ リージェンツ，ザ ユニバーシティ オブ テキサス システム 基板を改質するためのシステム及び方法
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US11209730B2 (en) * 2019-03-14 2021-12-28 Canon Kabushiki Kaisha Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern
JP7278828B2 (ja) * 2019-03-26 2023-05-22 キヤノン株式会社 成形方法、成形装置、インプリント方法、および物品の製造方法
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