JP2015088216A5 - - Google Patents
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- Publication number
- JP2015088216A5 JP2015088216A5 JP2014221591A JP2014221591A JP2015088216A5 JP 2015088216 A5 JP2015088216 A5 JP 2015088216A5 JP 2014221591 A JP2014221591 A JP 2014221591A JP 2014221591 A JP2014221591 A JP 2014221591A JP 2015088216 A5 JP2015088216 A5 JP 2015088216A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- alignment mark
- guide pattern
- forming
- lithographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 21
- 229920001400 block copolymer Polymers 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 238000000059 patterning Methods 0.000 claims 2
- 238000000137 annealing Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/068,050 | 2013-10-31 | ||
| US14/068,050 US9466324B2 (en) | 2013-10-31 | 2013-10-31 | Bit patterned media template including alignment mark and method of using same |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017245246A Division JP6491733B2 (ja) | 2013-10-31 | 2017-12-21 | 位置合わせマークを含むビットパターン媒体テンプレート |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015088216A JP2015088216A (ja) | 2015-05-07 |
| JP2015088216A5 true JP2015088216A5 (enExample) | 2017-07-06 |
| JP6363470B2 JP6363470B2 (ja) | 2018-07-25 |
Family
ID=52995052
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014221591A Expired - Fee Related JP6363470B2 (ja) | 2013-10-31 | 2014-10-30 | 位置合わせマークを含むビットパターン媒体テンプレートを用いる方法 |
| JP2017245246A Expired - Fee Related JP6491733B2 (ja) | 2013-10-31 | 2017-12-21 | 位置合わせマークを含むビットパターン媒体テンプレート |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017245246A Expired - Fee Related JP6491733B2 (ja) | 2013-10-31 | 2017-12-21 | 位置合わせマークを含むビットパターン媒体テンプレート |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US9466324B2 (enExample) |
| JP (2) | JP6363470B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2005975A (en) | 2010-03-03 | 2011-09-06 | Asml Netherlands Bv | Imprint lithography. |
| US9336809B2 (en) * | 2014-08-28 | 2016-05-10 | HGST Netherlands B.V. | Method for making an imprint template with data regions and non-data regions using block copolymers |
| US10134624B2 (en) | 2015-03-26 | 2018-11-20 | Doug Carson & Associates, Inc. | Substrate alignment detection using circumferentially extending timing pattern |
| US9953806B1 (en) | 2015-03-26 | 2018-04-24 | Doug Carson & Associates, Inc. | Substrate alignment detection using circumferentially extending timing pattern |
| WO2018226198A1 (en) * | 2017-06-05 | 2018-12-13 | Doug Carson & Associates, Inc. | Substrate alignment detection using circumferentially extending timing pattern |
| JP7127512B2 (ja) * | 2018-11-28 | 2022-08-30 | 株式会社Ｊｖｃケンウッド | 光ディスク装置及び光ディスク回転位置検出方法 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3169068B2 (ja) | 1997-12-04 | 2001-05-21 | 日本電気株式会社 | 電子線露光方法及び半導体ウエハ |
| JP3583044B2 (ja) * | 1999-12-17 | 2004-10-27 | シャープ株式会社 | 半導体装置及びアライメントずれの制御方法 |
| US7068833B1 (en) | 2000-08-30 | 2006-06-27 | Kla-Tencor Corporation | Overlay marks, methods of overlay mark design and methods of overlay measurements |
| US7077992B2 (en) | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
| US7027156B2 (en) | 2002-08-01 | 2006-04-11 | Molecular Imprints, Inc. | Scatterometry alignment for imprint lithography |
| US7136150B2 (en) | 2003-09-25 | 2006-11-14 | Molecular Imprints, Inc. | Imprint lithography template having opaque alignment marks |
| KR100879047B1 (ko) * | 2005-03-25 | 2009-01-15 | 샤프 가부시키가이샤 | 반도체 장치 및 그 제조방법 |
| JP4290177B2 (ja) * | 2005-06-08 | 2009-07-01 | キヤノン株式会社 | モールド、アライメント方法、パターン形成装置、パターン転写装置、及びチップの製造方法 |
| US8404432B2 (en) | 2007-06-29 | 2013-03-26 | Seagate Technology Llc | Lithography process |
| JP5431661B2 (ja) * | 2007-09-05 | 2014-03-05 | ルネサスエレクトロニクス株式会社 | 半導体集積回路およびそのパターンレイアウト方法 |
| US8268545B2 (en) | 2008-06-09 | 2012-09-18 | Seagate Technology Llc | Formation of a device using block copolymer lithography |
| US7976715B2 (en) | 2008-06-17 | 2011-07-12 | Hitachi Global Storage Technologies Netherlands B.V. | Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks |
| US8119017B2 (en) | 2008-06-17 | 2012-02-21 | Hitachi Global Storage Technologies Netherlands B.V. | Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks |
| US7713753B2 (en) | 2008-09-04 | 2010-05-11 | Seagate Technology Llc | Dual-level self-assembled patterning method and apparatus fabricated using the method |
| US8231821B2 (en) | 2008-11-04 | 2012-07-31 | Molecular Imprints, Inc. | Substrate alignment |
| JP2011048864A (ja) * | 2009-08-25 | 2011-03-10 | Fujifilm Corp | 電子ビーム描画方法およびモールド |
| US8427772B2 (en) | 2010-05-18 | 2013-04-23 | HGST Netherlands B.V. | Patterned-media magnetic recording disk drive with data island misplacement information in the servo sectors |
| US8673541B2 (en) | 2010-10-29 | 2014-03-18 | Seagate Technology Llc | Block copolymer assembly methods and patterns formed thereby |
| US20120135159A1 (en) | 2010-11-30 | 2012-05-31 | Seagate Technology Llc | System and method for imprint-guided block copolymer nano-patterning |
| US20120196094A1 (en) | 2011-01-31 | 2012-08-02 | Seagate Technology Llc | Hybrid-guided block copolymer assembly |
| US9079216B2 (en) | 2011-01-31 | 2015-07-14 | Seagate Technology Llc | Methods of patterning with protective layers |
| US20120273999A1 (en) | 2011-04-29 | 2012-11-01 | Seagate Technology, Llc | Method for patterning a stack |
| US8743496B2 (en) | 2011-07-06 | 2014-06-03 | HGST Netherlands B.V. | Servo pattern compatible with planarization constraints of patterned media and use of a single master template |
| US8501022B2 (en) | 2011-11-02 | 2013-08-06 | HGST Netherlands B.V. | Method using block copolymers for making a master disk with radial nondata marks for nanoimprinting patterned magnetic recording disks |
| US8754421B2 (en) * | 2012-02-24 | 2014-06-17 | Raytheon Company | Method for processing semiconductors using a combination of electron beam and optical lithography |
| US9377683B2 (en) * | 2013-03-22 | 2016-06-28 | HGST Netherlands B.V. | Imprint template with optically-detectable alignment marks and method for making using block copolymers |
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2013
- 2013-10-31 US US14/068,050 patent/US9466324B2/en not_active Expired - Fee Related
-
2014
- 2014-10-30 JP JP2014221591A patent/JP6363470B2/ja not_active Expired - Fee Related
-
2016
- 2016-10-10 US US15/289,505 patent/US9964855B2/en active Active
-
2017
- 2017-12-21 JP JP2017245246A patent/JP6491733B2/ja not_active Expired - Fee Related