JP6363470B2 - 位置合わせマークを含むビットパターン媒体テンプレートを用いる方法 - Google Patents

位置合わせマークを含むビットパターン媒体テンプレートを用いる方法 Download PDF

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Publication number
JP6363470B2
JP6363470B2 JP2014221591A JP2014221591A JP6363470B2 JP 6363470 B2 JP6363470 B2 JP 6363470B2 JP 2014221591 A JP2014221591 A JP 2014221591A JP 2014221591 A JP2014221591 A JP 2014221591A JP 6363470 B2 JP6363470 B2 JP 6363470B2
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Japan
Prior art keywords
substrate
alignment mark
guide pattern
vernier
alignment
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Expired - Fee Related
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JP2014221591A
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English (en)
Japanese (ja)
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JP2015088216A (ja
JP2015088216A5 (enExample
Inventor
ホン・イン・ワン
キム・ワイ・リー
フー・ヤウツォン
伸雄 倉高
伸雄 倉高
ゲンナジー・ガウズナー
シャオ・シュアイガン
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Seagate Technology LLC
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Seagate Technology LLC
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2014221591A 2013-10-31 2014-10-30 位置合わせマークを含むビットパターン媒体テンプレートを用いる方法 Expired - Fee Related JP6363470B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/068,050 2013-10-31
US14/068,050 US9466324B2 (en) 2013-10-31 2013-10-31 Bit patterned media template including alignment mark and method of using same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017245246A Division JP6491733B2 (ja) 2013-10-31 2017-12-21 位置合わせマークを含むビットパターン媒体テンプレート

Publications (3)

Publication Number Publication Date
JP2015088216A JP2015088216A (ja) 2015-05-07
JP2015088216A5 JP2015088216A5 (enExample) 2017-07-06
JP6363470B2 true JP6363470B2 (ja) 2018-07-25

Family

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Family Applications (2)

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JP2014221591A Expired - Fee Related JP6363470B2 (ja) 2013-10-31 2014-10-30 位置合わせマークを含むビットパターン媒体テンプレートを用いる方法
JP2017245246A Expired - Fee Related JP6491733B2 (ja) 2013-10-31 2017-12-21 位置合わせマークを含むビットパターン媒体テンプレート

Family Applications After (1)

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JP2017245246A Expired - Fee Related JP6491733B2 (ja) 2013-10-31 2017-12-21 位置合わせマークを含むビットパターン媒体テンプレート

Country Status (2)

Country Link
US (2) US9466324B2 (enExample)
JP (2) JP6363470B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2005975A (en) * 2010-03-03 2011-09-06 Asml Netherlands Bv Imprint lithography.
US9336809B2 (en) * 2014-08-28 2016-05-10 HGST Netherlands B.V. Method for making an imprint template with data regions and non-data regions using block copolymers
US10134624B2 (en) 2015-03-26 2018-11-20 Doug Carson & Associates, Inc. Substrate alignment detection using circumferentially extending timing pattern
US9953806B1 (en) 2015-03-26 2018-04-24 Doug Carson & Associates, Inc. Substrate alignment detection using circumferentially extending timing pattern
WO2018226198A1 (en) * 2017-06-05 2018-12-13 Doug Carson & Associates, Inc. Substrate alignment detection using circumferentially extending timing pattern
JP7127512B2 (ja) * 2018-11-28 2022-08-30 株式会社Ｊｖｃケンウッド 光ディスク装置及び光ディスク回転位置検出方法

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3169068B2 (ja) 1997-12-04 2001-05-21 日本電気株式会社 電子線露光方法及び半導体ウエハ
JP3583044B2 (ja) * 1999-12-17 2004-10-27 シャープ株式会社 半導体装置及びアライメントずれの制御方法
US7068833B1 (en) 2000-08-30 2006-06-27 Kla-Tencor Corporation Overlay marks, methods of overlay mark design and methods of overlay measurements
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7027156B2 (en) 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7136150B2 (en) 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
US7999400B2 (en) * 2005-03-25 2011-08-16 Sharp Kabushiki Kaisha Semiconductor device with recessed registration marks partially covered and partially uncovered
JP4290177B2 (ja) 2005-06-08 2009-07-01 キヤノン株式会社 モールド、アライメント方法、パターン形成装置、パターン転写装置、及びチップの製造方法
US8404432B2 (en) 2007-06-29 2013-03-26 Seagate Technology Llc Lithography process
JP5431661B2 (ja) * 2007-09-05 2014-03-05 ルネサスエレクトロニクス株式会社 半導体集積回路およびそのパターンレイアウト方法
US8268545B2 (en) 2008-06-09 2012-09-18 Seagate Technology Llc Formation of a device using block copolymer lithography
US8119017B2 (en) 2008-06-17 2012-02-21 Hitachi Global Storage Technologies Netherlands B.V. Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks
US7976715B2 (en) 2008-06-17 2011-07-12 Hitachi Global Storage Technologies Netherlands B.V. Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks
US7713753B2 (en) 2008-09-04 2010-05-11 Seagate Technology Llc Dual-level self-assembled patterning method and apparatus fabricated using the method
US8231821B2 (en) 2008-11-04 2012-07-31 Molecular Imprints, Inc. Substrate alignment
JP2011048864A (ja) * 2009-08-25 2011-03-10 Fujifilm Corp 電子ビーム描画方法およびモールド
US8427772B2 (en) 2010-05-18 2013-04-23 HGST Netherlands B.V. Patterned-media magnetic recording disk drive with data island misplacement information in the servo sectors
US8673541B2 (en) 2010-10-29 2014-03-18 Seagate Technology Llc Block copolymer assembly methods and patterns formed thereby
US20120135159A1 (en) 2010-11-30 2012-05-31 Seagate Technology Llc System and method for imprint-guided block copolymer nano-patterning
US20120196094A1 (en) 2011-01-31 2012-08-02 Seagate Technology Llc Hybrid-guided block copolymer assembly
US9079216B2 (en) 2011-01-31 2015-07-14 Seagate Technology Llc Methods of patterning with protective layers
US20120273999A1 (en) 2011-04-29 2012-11-01 Seagate Technology, Llc Method for patterning a stack
US8743496B2 (en) 2011-07-06 2014-06-03 HGST Netherlands B.V. Servo pattern compatible with planarization constraints of patterned media and use of a single master template
US8501022B2 (en) 2011-11-02 2013-08-06 HGST Netherlands B.V. Method using block copolymers for making a master disk with radial nondata marks for nanoimprinting patterned magnetic recording disks
US8754421B2 (en) * 2012-02-24 2014-06-17 Raytheon Company Method for processing semiconductors using a combination of electron beam and optical lithography
US9377683B2 (en) * 2013-03-22 2016-06-28 HGST Netherlands B.V. Imprint template with optically-detectable alignment marks and method for making using block copolymers

Also Published As

Publication number Publication date
US9964855B2 (en) 2018-05-08
JP2018055762A (ja) 2018-04-05
US9466324B2 (en) 2016-10-11
JP2015088216A (ja) 2015-05-07
JP6491733B2 (ja) 2019-03-27
US20170023866A1 (en) 2017-01-26
US20150116690A1 (en) 2015-04-30

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