JP2014510394A5 - - Google Patents

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Publication number
JP2014510394A5
JP2014510394A5 JP2013552018A JP2013552018A JP2014510394A5 JP 2014510394 A5 JP2014510394 A5 JP 2014510394A5 JP 2013552018 A JP2013552018 A JP 2013552018A JP 2013552018 A JP2013552018 A JP 2013552018A JP 2014510394 A5 JP2014510394 A5 JP 2014510394A5
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JP
Japan
Prior art keywords
bcp
block
polystyrene
resist
template
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JP2013552018A
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English (en)
Japanese (ja)
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JP5990539B2 (ja
JP2014510394A (ja
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Publication date
Priority claimed from US13/018,416 external-priority patent/US20120196094A1/en
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Publication of JP2014510394A publication Critical patent/JP2014510394A/ja
Publication of JP2014510394A5 publication Critical patent/JP2014510394A5/ja
Application granted granted Critical
Publication of JP5990539B2 publication Critical patent/JP5990539B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013552018A 2011-01-31 2012-01-18 個別領域を有するテンプレートの形成 Expired - Fee Related JP5990539B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/018,416 US20120196094A1 (en) 2011-01-31 2011-01-31 Hybrid-guided block copolymer assembly
US13/018,416 2011-01-31
PCT/US2012/021781 WO2012106121A2 (en) 2011-01-31 2012-01-18 Forming a template with discrete domains

Publications (3)

Publication Number Publication Date
JP2014510394A JP2014510394A (ja) 2014-04-24
JP2014510394A5 true JP2014510394A5 (enExample) 2015-02-19
JP5990539B2 JP5990539B2 (ja) 2016-09-14

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Family Applications (1)

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JP2013552018A Expired - Fee Related JP5990539B2 (ja) 2011-01-31 2012-01-18 個別領域を有するテンプレートの形成

Country Status (3)

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US (2) US20120196094A1 (enExample)
JP (1) JP5990539B2 (enExample)
WO (1) WO2012106121A2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012199410A (ja) * 2011-03-22 2012-10-18 Toshiba Corp パターン形成方法
CN102983065B (zh) * 2011-09-06 2015-12-16 中芯国际集成电路制造(北京)有限公司 图案、掩模图案形成方法和半导体器件制造方法
WO2013050338A1 (en) * 2011-10-03 2013-04-11 Asml Netherlands B.V. Method to provide a patterned orientation template for a self-assemblable polymer
US9478429B2 (en) * 2012-03-13 2016-10-25 Massachusetts Institute Of Technology Removable templates for directed self assembly
JP5781023B2 (ja) * 2012-06-28 2015-09-16 株式会社東芝 磁気記録媒体の製造方法
US9034197B2 (en) * 2012-09-13 2015-05-19 HGST Netherlands B.V. Method for separately processing regions on a patterned medium
US8911846B2 (en) * 2012-10-05 2014-12-16 Seagate Technology Llc Block copolymer assembly
US9050621B2 (en) * 2013-01-24 2015-06-09 Corning Incorporated Surface nanofabrication methods using self-assembled polymer nanomasks
US9566609B2 (en) * 2013-01-24 2017-02-14 Corning Incorporated Surface nanoreplication using polymer nanomasks
NL2012143A (en) 2013-02-14 2014-08-18 Asml Netherlands Bv Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers.
WO2014139793A1 (en) * 2013-03-15 2014-09-18 Asml Netherlands B.V. Methods for providing lithography features on a substrate by self-assembly of block copolymers
KR102127784B1 (ko) * 2013-06-12 2020-06-29 삼성전자주식회사 패턴 형성 방법
US9466324B2 (en) 2013-10-31 2016-10-11 Seagate Technology Llc Bit patterned media template including alignment mark and method of using same
US9489974B2 (en) * 2014-04-11 2016-11-08 Seagate Technology Llc Method of fabricating a BPM template using hierarchical BCP density patterns
CN110504474B (zh) * 2019-08-26 2022-05-13 西北工业大学 一种调控界面微结构制备异质复合质子交换膜的方法

Family Cites Families (17)

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Publication number Priority date Publication date Assignee Title
US6746825B2 (en) * 2001-10-05 2004-06-08 Wisconsin Alumni Research Foundation Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates
JP3967114B2 (ja) * 2001-11-22 2007-08-29 株式会社東芝 加工方法
US7378028B2 (en) * 2004-06-03 2008-05-27 Seagate Technology Llc Method for fabricating patterned magnetic recording media
JP4543004B2 (ja) * 2006-05-11 2010-09-15 株式会社東芝 パタン形成方法、インプリントモールド、および磁気記録媒体の製造方法
US7723009B2 (en) * 2006-06-02 2010-05-25 Micron Technology, Inc. Topography based patterning
US8394483B2 (en) * 2007-01-24 2013-03-12 Micron Technology, Inc. Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly
US7767099B2 (en) * 2007-01-26 2010-08-03 International Business Machines Corporaiton Sub-lithographic interconnect patterning using self-assembling polymers
US8404124B2 (en) * 2007-06-12 2013-03-26 Micron Technology, Inc. Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces
US8147914B2 (en) * 2007-06-12 2012-04-03 Massachusetts Institute Of Technology Orientation-controlled self-assembled nanolithography using a block copolymer
KR101291223B1 (ko) * 2007-08-09 2013-07-31 한국과학기술원 블록 공중합체를 이용한 미세 패턴 형성 방법
US20090092803A1 (en) * 2007-09-27 2009-04-09 Massachusetts Institute Of Technology Self-assembly technique applicable to large areas and nanofabrication
WO2009079241A2 (en) * 2007-12-07 2009-06-25 Wisconsin Alumni Research Foundation Density multiplication and improved lithography by directed block copolymer assembly
US7989026B2 (en) * 2008-01-12 2011-08-02 International Business Machines Corporation Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films
US8993060B2 (en) * 2008-11-19 2015-03-31 Seagate Technology Llc Chemical pinning to direct addressable array using self-assembling materials
JP2010152013A (ja) * 2008-12-24 2010-07-08 Toshiba Corp パターン形成方法、インプリントモールド、および磁気記録媒体の製造方法
US20120135159A1 (en) * 2010-11-30 2012-05-31 Seagate Technology Llc System and method for imprint-guided block copolymer nano-patterning
US9469525B2 (en) * 2011-01-31 2016-10-18 Seagate Technology Llc Modified surface for block copolymer self-assembly

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