JP2012508978A5 - - Google Patents

Download PDF

Info

Publication number
JP2012508978A5
JP2012508978A5 JP2011536331A JP2011536331A JP2012508978A5 JP 2012508978 A5 JP2012508978 A5 JP 2012508978A5 JP 2011536331 A JP2011536331 A JP 2011536331A JP 2011536331 A JP2011536331 A JP 2011536331A JP 2012508978 A5 JP2012508978 A5 JP 2012508978A5
Authority
JP
Japan
Prior art keywords
layer
pattern
etching
depositing
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011536331A
Other languages
English (en)
Japanese (ja)
Other versions
JP5723779B2 (ja
JP2012508978A (ja
Filing date
Publication date
Priority claimed from US12/616,896 external-priority patent/US8529778B2/en
Application filed filed Critical
Publication of JP2012508978A publication Critical patent/JP2012508978A/ja
Publication of JP2012508978A5 publication Critical patent/JP2012508978A5/ja
Application granted granted Critical
Publication of JP5723779B2 publication Critical patent/JP5723779B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011536331A 2008-11-13 2009-11-13 ナノサイズ形状の大面積パターニング Active JP5723779B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US11423908P 2008-11-13 2008-11-13
US61/114,239 2008-11-13
US12/616,896 2009-11-12
US12/616,896 US8529778B2 (en) 2008-11-13 2009-11-12 Large area patterning of nano-sized shapes
PCT/US2009/006113 WO2010056349A2 (en) 2008-11-13 2009-11-13 Large area patterning of nano-sized shapes

Publications (3)

Publication Number Publication Date
JP2012508978A JP2012508978A (ja) 2012-04-12
JP2012508978A5 true JP2012508978A5 (enExample) 2012-12-27
JP5723779B2 JP5723779B2 (ja) 2015-05-27

Family

ID=42165606

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011536331A Active JP5723779B2 (ja) 2008-11-13 2009-11-13 ナノサイズ形状の大面積パターニング

Country Status (5)

Country Link
US (2) US8529778B2 (enExample)
EP (1) EP2344926B1 (enExample)
JP (1) JP5723779B2 (enExample)
TW (1) TWI453106B (enExample)
WO (1) WO2010056349A2 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110048518A1 (en) * 2009-08-26 2011-03-03 Molecular Imprints, Inc. Nanostructured thin film inorganic solar cells
CN102648438A (zh) * 2009-08-26 2012-08-22 分子制模股份有限公司 功能性纳米微粒
KR101274715B1 (ko) * 2009-12-22 2013-06-12 엘지디스플레이 주식회사 박막트랜지스터 기판 및 그 제조 방법
JP2013517943A (ja) * 2010-01-29 2013-05-20 モレキュラー・インプリンツ・インコーポレーテッド ナノ粒子を形成するためのナノインプリントリソグラフィプロセス
JP2013538447A (ja) * 2010-08-05 2013-10-10 エーエスエムエル ネザーランズ ビー．ブイ． インプリントリソグラフィ
JP2013542591A (ja) * 2010-09-08 2013-11-21 モレキュラー・インプリンツ・インコーポレーテッド インプリント・リソフラフィで用いる蒸気供給システム
US8828297B2 (en) 2010-11-05 2014-09-09 Molecular Imprints, Inc. Patterning of non-convex shaped nanostructures
JP2014505018A (ja) 2010-11-05 2014-02-27 モレキュラー・インプリンツ・インコーポレーテッド 二重剥離層を用いる機能性ナノ粒子のナノインプリントリソグラフィ形成
TWI400160B (zh) * 2010-11-18 2013-07-01 Univ Nat Taiwan Science Tech 應用於微奈米壓印製程之模具
US8938864B2 (en) 2011-10-28 2015-01-27 D B Industries, Llc Connector
US20130167916A1 (en) * 2011-12-28 2013-07-04 Taiwan Semiconductor Manufacturing Co., Ltd. Thin film photovoltaic cells and methods of forming the same
CN103018819B (zh) * 2012-11-09 2014-05-21 浙江大学 基于纳米压印的高分子微纳光纤布拉格光栅制备方法
JP6135119B2 (ja) * 2012-12-19 2017-05-31 大日本印刷株式会社 インプリント方法、インプリント樹脂滴下位置決定方法及びインプリント装置
JP6171424B2 (ja) * 2013-03-12 2017-08-02 大日本印刷株式会社 インプリントモールドの製造方法及び設計方法
WO2014144133A1 (en) * 2013-03-15 2014-09-18 The Trustees Of The Princeton University Analyte detection enhancement by targeted immobilization, surface amplification, and pixelated reading and analysis
TWI637234B (zh) * 2013-07-12 2018-10-01 美商佳能奈米科技股份有限公司 用於壓印微影術之利用方向性圖案化模板的液滴圖案生成技術
KR101427160B1 (ko) * 2014-04-07 2014-08-07 서울과학기술대학교 산학협력단 다중 미세 패턴 성형 장치 및 방법
JP6279430B2 (ja) * 2014-08-21 2018-02-14 東芝メモリ株式会社 テンプレート、テンプレート形成方法および半導体装置の製造方法
US10349424B2 (en) * 2015-11-05 2019-07-09 Gainspan Corporation Efficient dual-mode operation of a wireless device as an access point and a wireless station of respective WLAN networks
US10609660B2 (en) * 2017-04-19 2020-03-31 Qualcomm Incorporated Synchronization for wideband coverage enhancement
US10484954B2 (en) * 2017-05-10 2019-11-19 Qualcomm Incorporated Synchronization for wideband coverage enhancement
JP6447657B2 (ja) * 2017-04-25 2019-01-09 大日本印刷株式会社 インプリント樹脂滴下順序決定方法及びインプリント方法
US10942398B1 (en) * 2017-05-19 2021-03-09 Facebook Technologies, Llc Continuous liquid crystal alignment patterns for geometric phase optics
CN118946451B (zh) * 2022-01-20 2025-12-05 奇跃公司 具有高折射率抗蚀剂的表面浮雕波导

Family Cites Families (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6921615B2 (en) 2000-07-16 2005-07-26 Board Of Regents, The University Of Texas System High-resolution overlay alignment methods for imprint lithography
JP2004523906A (ja) 2000-10-12 2004-08-05 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 室温かつ低圧マイクロおよびナノ転写リソグラフィのためのテンプレート
JP3589201B2 (ja) * 2001-07-02 2004-11-17 Ｔｄｋ株式会社 薄膜パターニング方法、薄膜デバイスの製造方法及び薄膜磁気ヘッドの製造方法
US20050064344A1 (en) 2003-09-18 2005-03-24 University Of Texas System Board Of Regents Imprint lithography templates having alignment marks
US7144539B2 (en) 2002-04-04 2006-12-05 Obducat Ab Imprint method and device
US7037639B2 (en) 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US7179079B2 (en) 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6900881B2 (en) 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US7027156B2 (en) 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7070405B2 (en) 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US8349241B2 (en) * 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US7378347B2 (en) * 2002-10-28 2008-05-27 Hewlett-Packard Development Company, L.P. Method of forming catalyst nanoparticles for nanowire growth and other applications
US7186656B2 (en) * 2004-05-21 2007-03-06 Molecular Imprints, Inc. Method of forming a recessed structure employing a reverse tone process
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7323417B2 (en) * 2004-09-21 2008-01-29 Molecular Imprints, Inc. Method of forming a recessed structure employing a reverse tone process
US7136150B2 (en) 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
US20050084804A1 (en) 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
JP2005150333A (ja) * 2003-11-14 2005-06-09 Sony Corp 半導体装置の製造方法
US20050189676A1 (en) 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
US20050230882A1 (en) 2004-04-19 2005-10-20 Molecular Imprints, Inc. Method of forming a deep-featured template employed in imprint lithography
US7785526B2 (en) 2004-07-20 2010-08-31 Molecular Imprints, Inc. Imprint alignment method, system, and template
US7309225B2 (en) 2004-08-13 2007-12-18 Molecular Imprints, Inc. Moat system for an imprint lithography template
US7252777B2 (en) 2004-09-21 2007-08-07 Molecular Imprints, Inc. Method of forming an in-situ recessed structure
JP5167583B2 (ja) * 2004-11-10 2013-03-21 東レ株式会社 パターン形成方法、およびパターン形成用シート
US7357876B2 (en) 2004-12-01 2008-04-15 Molecular Imprints, Inc. Eliminating printability of sub-resolution defects in imprint lithography
US8252191B2 (en) * 2005-05-10 2012-08-28 Dow Corning Corporation Sub-micron decal transfer lithography
US8557351B2 (en) * 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US8808808B2 (en) 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
JP2007069604A (ja) * 2005-08-10 2007-03-22 Toray Ind Inc パターン形成方法、パターン形成用シート、およびそれを用いて形成される光学機能性シート
US8603381B2 (en) 2005-10-03 2013-12-10 Massachusetts Insitute Of Technology Nanotemplate arbitrary-imprint lithography
AU2005337438B2 (en) * 2005-10-20 2010-02-18 Agency For Science, Technology And Research Hierarchical nanopatterns by nanoimprint lithography
US7759253B2 (en) 2006-08-07 2010-07-20 Taiwan Semiconductor Manufacturing Company, Ltd. Method and material for forming a double exposure lithography pattern
TW200801794A (en) 2006-04-03 2008-01-01 Molecular Imprints Inc Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks
US8142850B2 (en) 2006-04-03 2012-03-27 Molecular Imprints, Inc. Patterning a plurality of fields on a substrate to compensate for differing evaporation times
US7341825B2 (en) 2006-05-25 2008-03-11 Hitachi Global Storage Technologies Netherlands B.V. Method for producing high resolution nano-imprinting masters
TW200818257A (en) * 2006-07-06 2008-04-16 Nxp Bv Imprint lithography
WO2008047447A1 (en) * 2006-10-20 2008-04-24 Fujitsu Limited Stamper for transferring pattern, method for manufacturing magnetic recording medium by using the stamper, and the magnetic recording medium
US7758981B2 (en) * 2007-07-25 2010-07-20 Hitachi Global Storage Technologies Netherlands B.V. Method for making a master disk for nanoimprinting patterned magnetic recording disks, master disk made by the method, and disk imprinted by the master disk
JP4445538B2 (ja) * 2007-09-26 2010-04-07 株式会社東芝 パターン形成方法
JP2009107128A (ja) * 2007-10-26 2009-05-21 Hitachi Maxell Ltd ウェルプレート成形用金型の製造方法、ウェルプレート成形用金型、それを用いたウェルプレート成形方法およびウェルプレート
US7906274B2 (en) 2007-11-21 2011-03-15 Molecular Imprints, Inc. Method of creating a template employing a lift-off process
US8012394B2 (en) 2007-12-28 2011-09-06 Molecular Imprints, Inc. Template pattern density doubling
US20090212012A1 (en) 2008-02-27 2009-08-27 Molecular Imprints, Inc. Critical dimension control during template formation
US8119017B2 (en) * 2008-06-17 2012-02-21 Hitachi Global Storage Technologies Netherlands B.V. Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks
US20100015270A1 (en) 2008-07-15 2010-01-21 Molecular Imprints, Inc. Inner cavity system for nano-imprint lithography
US20100095862A1 (en) 2008-10-22 2010-04-22 Molecular Imprints, Inc. Double Sidewall Angle Nano-Imprint Template
US8877073B2 (en) 2008-10-27 2014-11-04 Canon Nanotechnologies, Inc. Imprint lithography template
US9122148B2 (en) 2008-11-03 2015-09-01 Canon Nanotechnologies, Inc. Master template replication

Similar Documents

Publication Publication Date Title
JP2012508978A5 (enExample)
JP2005530338A5 (enExample)
JP2010507261A5 (enExample)
WO2009018059A3 (en) Process of semiconductor fabrication with mask overlay on pitch multiplied features and associated structures
TW200643609A (en) Pitch reduced patterns relative to photolithography features
JP2011508686A5 (enExample)
CN104459854B (zh) 金属光栅的制备方法
JP2014510394A5 (enExample)
WO2008091279A3 (en) Etching and hole arrays
JP2010503995A5 (enExample)
JP2009060084A5 (enExample)
WO2008033695A3 (en) Efficient pitch multiplication process
JP2013134435A5 (enExample)
EP1906229A3 (en) Process for forming a feature by undercutting a printed mask
RU2012104621A (ru) Формирование рисунка
JP2014502418A5 (enExample)
TWI630424B (zh) 松樹狀金屬奈米光柵
WO2008097278A3 (en) Etch-enhanced technique for lift-off patterning
JP2018142701A5 (enExample)
JP2016510515A5 (enExample)
WO2011011142A3 (en) Method and materials for reverse patterning
CN103030107A (zh) 三维纳米结构阵列的制备方法
CN101246307B (zh) 使用半导体工艺制造压印模板的方法及所制得的压印模板
JP2015088216A5 (enExample)
JP2008500727A5 (enExample)