JP2012506635A5 - - Google Patents

Download PDF

Info

Publication number
JP2012506635A5
JP2012506635A5 JP2011533172A JP2011533172A JP2012506635A5 JP 2012506635 A5 JP2012506635 A5 JP 2012506635A5 JP 2011533172 A JP2011533172 A JP 2011533172A JP 2011533172 A JP2011533172 A JP 2011533172A JP 2012506635 A5 JP2012506635 A5 JP 2012506635A5
Authority
JP
Japan
Prior art keywords
dispensing
voltage
heads
layer thickness
residual layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011533172A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012506635A (ja
JP5638529B2 (ja
Filing date
Publication date
Priority claimed from US12/582,041 external-priority patent/US8480933B2/en
Application filed filed Critical
Publication of JP2012506635A publication Critical patent/JP2012506635A/ja
Publication of JP2012506635A5 publication Critical patent/JP2012506635A5/ja
Application granted granted Critical
Publication of JP5638529B2 publication Critical patent/JP5638529B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2011533172A 2008-10-22 2009-10-21 流体分注装置の較正 Active JP5638529B2 (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US10736008P 2008-10-22 2008-10-22
US61/107,360 2008-10-22
US10783708P 2008-10-23 2008-10-23
US61/107,837 2008-10-23
US10960808P 2008-10-30 2008-10-30
US61/109,608 2008-10-30
US12/582,041 2009-10-20
US12/582,041 US8480933B2 (en) 2008-10-22 2009-10-20 Fluid dispense device calibration
PCT/US2009/005723 WO2010047790A2 (en) 2008-10-22 2009-10-21 Fluid dispense device calibration

Publications (3)

Publication Number Publication Date
JP2012506635A JP2012506635A (ja) 2012-03-15
JP2012506635A5 true JP2012506635A5 (enExample) 2012-12-06
JP5638529B2 JP5638529B2 (ja) 2014-12-10

Family

ID=42108900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011533172A Active JP5638529B2 (ja) 2008-10-22 2009-10-21 流体分注装置の較正

Country Status (6)

Country Link
US (1) US8480933B2 (enExample)
EP (1) EP2342600A2 (enExample)
JP (1) JP5638529B2 (enExample)
KR (1) KR101743979B1 (enExample)
TW (1) TWI430038B (enExample)
WO (1) WO2010047790A2 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100102471A1 (en) * 2008-10-24 2010-04-29 Molecular Imprints, Inc. Fluid transport and dispensing
US20100101493A1 (en) * 2008-10-27 2010-04-29 Molecular Imprints, Inc. Dispense System
US20100112220A1 (en) * 2008-11-03 2010-05-06 Molecular Imprints, Inc. Dispense system set-up and characterization
JP5520612B2 (ja) * 2010-01-04 2014-06-11 東芝機械株式会社 ディスペンサを備えた転写装置、ディスペンサの吐出量検出方法、及びディスペンサの吐出量制御方法
JP5595949B2 (ja) * 2011-02-15 2014-09-24 株式会社東芝 インプリント装置、インプリント方法および凹凸板の製造方法
JP5727905B2 (ja) * 2011-09-15 2015-06-03 富士フイルム株式会社 インクジェットヘッドの吐出量補正方法、吐出量補正装置、及びナノインプリントシステム
JP6329425B2 (ja) * 2014-05-02 2018-05-23 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP2016004794A (ja) * 2014-06-13 2016-01-12 キヤノン株式会社 インプリント方法、インプリント装置、および物品の製造方法
JP6661334B2 (ja) * 2015-02-03 2020-03-11 キヤノン株式会社 装置、および物品の製造方法
CN108349155B (zh) * 2015-10-20 2021-07-09 惠普发展公司，有限责任合伙企业 用于图案化层沉积的系统、方法及计算机可读介质
JP6655988B2 (ja) * 2015-12-25 2020-03-04 キヤノン株式会社 インプリント装置の調整方法、インプリント方法および物品製造方法
US9993962B2 (en) 2016-05-23 2018-06-12 Canon Kabushiki Kaisha Method of imprinting to correct for a distortion within an imprint system
WO2018075174A1 (en) * 2016-10-18 2018-04-26 Molecular Imprints, Inc. Microlithographic fabrication of structures
CN110461571A (zh) * 2017-03-27 2019-11-15 株式会社大赛璐 树脂成型品的制造方法及光学部件的制造方法
JP6938189B2 (ja) * 2017-03-27 2021-09-22 株式会社ダイセル 樹脂成型品の製造方法及び光学部品の製造方法
US20200080880A1 (en) * 2017-05-05 2020-03-12 Brighton Technologies Llc Method and device for measuring minute volume of liquid
US11194247B2 (en) 2018-01-31 2021-12-07 Canon Kabushiki Kaisha Extrusion control by capillary force reduction
US11927883B2 (en) 2018-03-30 2024-03-12 Canon Kabushiki Kaisha Method and apparatus to reduce variation of physical attribute of droplets using performance characteristic of dispensers
US10739675B2 (en) 2018-05-31 2020-08-11 Canon Kabushiki Kaisha Systems and methods for detection of and compensation for malfunctioning droplet dispensing nozzles
JP7596134B2 (ja) * 2020-12-09 2024-12-09 キヤノン株式会社 形成装置、形成方法及び物品の製造方法
WO2022132164A1 (en) * 2020-12-18 2022-06-23 Hewlett-Packard Development Company, L.P. Print agent recirculation within printheads for decap performance

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5653389A (en) * 1995-09-15 1997-08-05 Henderson; Graeme W. Independent flow rate and droplet size control system and method for sprayer
US6936194B2 (en) * 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US8349241B2 (en) * 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US20040065252A1 (en) * 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US20050106321A1 (en) * 2003-11-14 2005-05-19 Molecular Imprints, Inc. Dispense geometery to achieve high-speed filling and throughput
WO2005120834A2 (en) 2004-06-03 2005-12-22 Molecular Imprints, Inc. Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
JP5044092B2 (ja) * 2004-07-23 2012-10-10 株式会社東芝 インクジェット塗布装置および塗布体の製造方法
US7483767B2 (en) * 2004-10-14 2009-01-27 The George Washington University Feedback mechanism for smart nozzles and nebulizers
US20070076040A1 (en) * 2005-09-29 2007-04-05 Applied Materials, Inc. Methods and apparatus for inkjet nozzle calibration
US7360851B1 (en) * 2006-02-15 2008-04-22 Kla-Tencor Technologies Corporation Automated pattern recognition of imprint technology
US8001924B2 (en) * 2006-03-31 2011-08-23 Asml Netherlands B.V. Imprint lithography
KR100781997B1 (ko) 2006-08-21 2007-12-06 삼성전기주식회사 잉크젯 헤드의 캘리브레이션 방법 및 그 장치

Similar Documents

Publication Publication Date Title
JP2012506635A5 (enExample)
PL2323775T3 (pl) Narzędzie powlekające do nanoszenia warstwy cieczy na substrat
JP2010534132A5 (enExample)
EP2553712A4 (en) NANOPRÄGE PROFAHREN, METHOD FOR THE PRODUCTION OF A DROP ASSEMBLY PATTERN AND METHOD FOR THE PRODUCTION OF SUBSTRATES
PL2753669T3 (pl) Kompozycja tuszu do nieprzywierającej powłoki i powlekane podłoże zawierające wzór z niej
WO2010047790A3 (en) Fluid dispense device calibration
EP2165366B8 (en) A method for forming a patterned layer on a substrate
JP2007320098A5 (enExample)
JP2014057015A5 (enExample)
WO2008044617A3 (en) Method of manufacturing liquid crystal display device
DE602007009544D1 (de) Verfahren zur formung eines musters aus einem funktionsmaterial auf einem substrat
JP2013508561A5 (enExample)
DE602008004862D1 (de) Verfahren zur Herstellung eines Kaolinprodukts zur Papierbeschichtung
DE112011102800T8 (de) Phosphorfilm, Verfahren zum Herstellen desselben, Beschichtungsverfahren für eine Phosphorschicht, Verfahren zum Herstellen eines LED-Gehäuses und dadurch hergestelltes LED-Gehäuse
PL2360213T3 (pl) Przeciwporostowa kompozycja powłokowa, przeciwporostowa błona powłokowa wytworzona z kompozycji, powlekany obiekt zawierający błonę powłokową na powierzchni oraz sposób obróbki przeciwporostowej przez wytworzenie błony powłokowej
WO2012078894A3 (en) Method for depositing viscous material on a substrate with a combination stencil printer and dispenser
FI20085113A0 (fi) Menetelmä grafiinirakenteiden valmistamiseksi alustoille
EP2049338A4 (en) PRINTING ON A HEATED SUPPORT
ZA201006895B (en) Method for depositing a film onto a substrate
TWI347266B (en) Print head unit and method for manufacturing patterned layer on substrate with the same
JP2009043998A5 (enExample)
JP2011136559A5 (enExample)
AU2014227157B2 (en) Method of manufacturing member having relief structure, and member having relief structure manufactured thereby
DE602006011671D1 (de) Verfahren zur Herstellung eines mehrschichtigen Keramiksubstrats
EP2743016A4 (en) SURFACE-MODIFIED WC-BASED HARD-METAL ELEMENT, HARD-FILM-COATED WC-BASED HARD-METAL ELEMENT, METHOD FOR PRODUCING A SURFACE-MODIFIED WC-BASED HARD-METAL ELEMENT AND METHOD FOR PRODUCING A HARD-FILM-COATED, WC-BASED, HARD-METAL ELEMENT